TWI435404B - Support device and exposure device - Google Patents

Description

Support device and exposure device

The present invention relates to a support device for tilt adjustment of a movable stage used in various manufacturing, inspection, and the like, and an exposure apparatus.

In the semiconductor manufacturing step or the like, an interferometer may be used to measure the difference in flatness, parallelism, and thickness of the semiconductor germanium wafer. In addition, in order to accurately measure the respective dimensions of the semiconductor wafer to be measured, it is necessary to illuminate the inspection light of the interferometer with a certain angle accuracy on the surface of the measurement target. Therefore, it is possible to use a device that supports the stage so that the measurement target can be tilted with high precision. Patent Document 1 discloses a prior art support device for use in this use. In the support device of Patent Document 1, an arbitrary angle adjustment of the stage is performed by driving the three points of the stage in the Z-axis direction by an arbitrary amount by the three Z-axis driving units.

[Advanced technical literature] [Patent Literature]

[Patent Document 1] Japanese Patent Laid-Open Publication No. 2004-47825

However, when driving the three points of the stage in the Z-axis direction, one of the problems is how to constrain the stage in the direction (X-axis direction or Y-axis direction) crossing the Z-axis direction. If the constraint is too strong, the angle adjustment of the stage is difficult. On the other hand, if the constraint is too weak, the stage moves in the X-axis direction or the Y-axis direction, and positioning of the stage becomes difficult.

Therefore, a technique has been developed in which a stage spring that is not easily deflected in the X-axis direction or the Y-axis direction and is easily deflected in the Z-axis direction is coupled to the stage and the base supporting the stage, and Z is utilized. When the shaft drive unit moves the stage in the Z-axis direction, the leaf spring restricts the movement of the stage in the X-axis direction or the Y-axis direction, but allows the stage to move in the Z-axis direction. However, since the leaf spring is coupled to the base, if the stage moves in the Z-axis direction, there is a slight reproducibility that cannot be obtained in the X-axis direction or the Y-axis direction with respect to the base. The problem. On the other hand, although a technique of using an E-shaped leaf spring to reduce the movement of the stage in the X-axis direction or the Y-axis direction with respect to the Z-axis direction has been developed, the shape of the leaf spring is changed. In the case of a large situation, there is a problem that the performance of the stage is unstable and the position of the stage is unstable.

Therefore, the present invention has been made in view of the problems of the prior art, and an object thereof is to provide a support device and an exposure device that can adjust the angle of the stage with high reproducibility.

The support device of the present invention is a movably supporting stage, and comprises: a base; a moving member that is movably mounted on the base in a vertical direction; and a driving mechanism that drives the moving member in the up and down direction a joint mechanism that connects the both of the stage and the moving member while tilting; and a spring member that connects the stage and the moving member; and the spring member has a spring rigidity in the up-and-down direction as compared with The spring rigidity in the direction orthogonal to the vertical direction is low.

An exposure apparatus according to the present invention includes: a mask holding portion that holds a mask; a mask driving mechanism that drives the mask holding portion; a substrate holding portion that holds the substrate; and a substrate driving mechanism that drives the substrate holding portion; An illumination mechanism for irradiating the substrate with light for pattern exposure by the mask; and the substrate driving mechanism is capable of driving the substrate holding portion in the vertical direction and adjusting the inclination of the substrate holding portion, and is included in the foregoing At least one of the opposite sides of the substrate holding portion is disposed, and at least two of the upper and lower directions and the tilt adjustment mechanism are disposed on the other side, and the vertical direction and the tilt adjustment mechanism are configured by the support device.

According to the invention, in the spring member that connects the stage and the moving member, since the spring rigidity in the vertical direction is lower than the spring rigidity in the direction orthogonal to the vertical direction, the load is limited. The displacement of the stage in the direction orthogonal to the vertical direction is, although the displacement of the stage is allowed in the vertical direction, and the spring member moves together with the moving member, the shape change of the spring member can be suppressed. The positional accuracy of the aforementioned stage can be obtained regardless of the movement of the moving member.

Further, when the moving member is provided with a guide rail that is disposed in the vertical direction and a slider that is relatively movable with respect to the guide rail is provided on the base, the movement of the moving member can be accurately performed. However, a slider may be provided on the moving member, and a guide rail may be provided on the base.

Furthermore, it is preferable that the driving mechanism includes a motor, a switching mechanism that converts a rotational motion of the motor into an axis motion, and a vertical movement that intersects with the axial direction by the axis motion converted by the conversion mechanism. a wedge member that moves in a horizontal direction; and the moving member is movable in the vertical direction corresponding to the wedge member moving in the horizontal direction.

Hereinafter, the exposure unit using the support device of the present invention will be described in detail based on the drawings. Here, the Z-axis direction is referred to as the vertical direction, and the X-axis direction and the Y-axis direction are referred to as the horizontal direction.

The exposure unit includes: a first proximity exposure device body that exposes the first layer, a second proximity exposure device body that exposes the second layer, a third proximity exposure device body that exposes the third layer, and a fourth proximity exposure that exposes the fourth layer. Device body. Here, the first to fourth proximity exposure apparatus main bodies may be configured to be different from the adsorption surface of the substrate holding portion to be described later. Therefore, only the first proximity exposure apparatus main body 2 will be described in detail below, and other omitted. .

As shown in FIG. 1 , the first proximity exposure apparatus main body 2 includes a mask stage (mask holding unit) 10 that holds the mask M, and a substrate stage (substrate holder that holds the glass substrate (exposure material) W). 20; an illumination optical system 30 as an irradiation means for pattern exposure; a substrate stage moving mechanism (substrate) for moving the substrate stage 20 in the X-axis, Y-axis, and Z-axis directions and tilting the substrate stage 20 The drive mechanism 40; and the device base 50 supporting the mask stage 10 and the substrate stage moving mechanism 40.

Further, the glass substrate W is disposed opposite to the mask M, and is coated with a sensitizer on the surface of the mask pattern (the opposite surface side of the mask M) to be exposed and transferred onto the mask M. . Further, the mask M is made of fused silica and formed in a rectangular shape.

First, the illumination optical system 30 will be described. The illumination optical system 30 includes, for example, a high-pressure mercury lamp 31, which is a light source for ultraviolet irradiation, a concave mirror 32 that collects light irradiated from the high-pressure mercury lamp 31, and two types of optical integrators that are disposed in the vicinity of the focal point of the concave mirror 32. 33; a plane mirror 35, 36 and a spherical mirror 37 for changing the direction of the optical path; and an exposure control shutter 34 disposed between the plane mirror 36 and the optical integrator 33 and having a switch for controlling the illumination path.

Further, in the illumination optical system 30, when the exposure control shutter 34 is opened during exposure, the light irradiated from the high pressure mercury lamp 31 is held by the mask stage 10 via the optical path L shown in FIG. The mask M and the surface of the substrate W held by the substrate stage 20 are vertically irradiated as parallel light for pattern exposure. Thereby, the mask pattern of the mask M is exposed and transferred onto the substrate W.

As shown in FIGS. 1 to 3, the mask stage 10 includes a mask stage base 11 in which a rectangular opening 11a is formed in a central portion, and is movable in the X-axis, the Y-axis, and the θ direction. a mask holding frame 12 mounted on the opening 11a of the mask stage base 11; attached to the mask holding frame 12, sucking and holding the chuck portion 14 of the mask M; and holding the mask holding frame 12 and the clip The disk portion is moved in the X-axis, the Y-axis, and the θ direction, and the mask position adjusting mechanism (mask driving mechanism) 16 held at the position of the mask M of the mask holding frame 12 is adjusted.

The mask stage base 11 can be supported by the support 51 that is erected on the apparatus base 50 and the Z-axis moving device 52 provided at the upper end of the support 51 in the Z-axis direction, and is disposed on the substrate. Above the stage 20. The Z-axis moving device 52 has, for example, an electric actuator including a motor and a ball screw, or a pneumatic cylinder, and the like, and the mask stage 10 is raised and lowered to a specific position by a simple vertical movement. Further, the Z-axis moving device 52 is used when the mask M is replaced or the workpiece chuck 21 is cleaned or the like.

The mask position adjusting mechanism 16 has one Y-axis direction driving device 16y attached to one side of the mask holding frame 12 in the X-axis direction, and two units mounted on one side of the Y-axis direction of the mask holding frame 12. The X-axis direction drive device 16x.

Further, in the mask position adjusting mechanism 16, the mask holding frame 12 is moved in the Y-axis direction by driving one Y-axis direction driving device 16y, and the two X-axis direction driving devices 16x are driven in the same manner. The mask holding frame 12 is moved in the X-axis direction. Further, the mask holding frame 12 is moved in the θ direction (rotation around the Z axis) by driving either of the two X-axis direction driving devices 16x.

Further, on the upper surface of the mask stage base 11, as shown in FIG. 3, a gap sensor 17 for measuring a gap between the opposing faces of the mask M and the substrate W is provided, and is provided for confirmation and retention. The mask for the mounting position of the mask M of the chuck portion 14 is aligned with the camera 18. The gap sensor 17 and the mask alignment camera 18 are held by the moving mechanism 19 so as to be movable in the X-axis and Y-axis directions, and are disposed in the mask holding frame 12.

Further, on the upper surface of the mask stage base 11, as shown in FIG. 3, the both ends of the opening portion 11a of the mask stage base 11 in the X-axis direction are provided, and the mask M is shielded as necessary. The shielding aperture 38 at both ends. The shielding aperture 38 is movable in the X-axis direction by a shielding aperture driving mechanism 39 including a motor, a ball screw, and a linear slide to adjust the shielding area of both ends of the mask M. Further, the shielding hole 38 is provided not only at both end portions of the opening portion 11a in the X-axis direction but also at both end portions of the opening portion 11a in the Y-axis direction.

The substrate stage 20 is provided on the substrate stage moving mechanism 40 as shown in FIGS. 1 and 2, and has a workpiece chuck having an adsorption surface 22 for holding the substrate W on the substrate stage 20 thereon. twenty one. Further, the workpiece chuck 21 holds the substrate W by vacuum suction.

As shown in FIGS. 1 and 2, the substrate stage moving mechanism 40 includes a Y-axis feed mechanism 41 that moves the substrate stage 20 in the Y-axis direction, and an X-axis that moves the substrate stage 20 in the X-axis direction. The feed mechanism 42 and the Z-tilt adjustment mechanism (the vertical direction and the tilt adjustment mechanism and the support device) 43 that adjust the tilting of the substrate stage 20 and slightly move the substrate stage 20 in the Z-axis direction.

The Y-axis feed mechanism 41 includes: a pair of linear slide rails 44 disposed on the upper surface of the apparatus base 50 in the Y-axis direction; and a Y-axis platform 45 supported by the linear slide rails 44 to be movable in the Y-axis direction; And the Y-axis feed drive unit 46 that moves the Y-axis stage 45 in the Y-axis direction. Further, by driving the motor 46c of the Y-axis feed driving device 46 and rotating the ball screw shaft 46b, the Y-axis table 45 is moved along the guide rail 44a of the linear slide rail 44 together with the ball screw nut 46a, and The substrate stage 20 moves in the Y-axis direction.

Further, the X-axis feed mechanism 42 includes one pair of linear slide rails 47 disposed on the upper surface of the Y-axis stage 45 in the X-axis direction, and an X-axis platform supported by the linear slide rails 47 to be moved in the X-axis direction. 48; and an X-axis feed drive unit 49 that moves the X-axis stage 48 in the X-axis direction. Further, by driving the motor 49c of the X-axis feed driving device 49 and rotating the ball screw shaft 49b, the X-axis table 48 is moved along the guide rail 47a of the linear slide 47 together with a ball screw nut (not shown). And the substrate stage 20 is moved in the X-axis direction.

The Z-tilt adjustment mechanism 43 will be described. 4 is a perspective view of the Z-tilt adjustment mechanism 43; FIG. 5 is a side view of the Z-tilt adjustment mechanism 43; and FIG. 6(a) is a plan view of the substrate stage 20 displayed together with the Z-tilt adjustment mechanism 43. As shown in FIG. 6( a ), the Z-tilt adjustment mechanism 43 is provided on one of the opposite sides of the substrate stage 20 and two on the other side, and is provided in three places in total. The tilt adjustment of the substrate stage 20 can be performed by arbitrarily adjusting the position of the Z-axis direction of three points.

In the Z-tilt adjustment mechanism 43 shown in FIG. 5, a casing 431 is fixed to the upper surface of the X-axis stage (base) 48. A motor 432 is attached to an end portion of the outer casing 431, and a rotating shaft 432a of the motor 432 and a ball screw shaft 433 disposed in series with respect to the rotating shaft 432a are coupled to each other by a coupling 434 in the outer casing 431. The ball screw shaft 433 is rotatably supported by the bearing 435 with respect to the outer casing 431, and the opposite end side is screwed to the nut 437 fixed to the wedge member 436 via a screw (not shown). The ball screw mechanism 433, the nut 437, and the balls (not shown) constitute a ball screw mechanism, that is, a switching mechanism.

Further, a pair of (only one illustrated) guide rails 438 are provided on the upper surface of the X-axis stage 48 so as to extend in the direction orthogonal to the Z-axis direction so as to extend in the axial direction of the ball screw shaft 433. Further, the slider 436a attached to the lower side of both sides of the wedge member 436 having a right-angled triangular shape on the side surface is fastened to the guide rail 438. Thus, the wedge member 436 is movably disposed along the guide rail 438 with respect to the X-axis stage 48 in the Y-axis direction.

The guide rail 436b is attached to the upper portion of the wedge member 436 so as to be inclined with respect to the axial direction of the ball screw shaft 433 with respect to the Z-axis direction (to extend in the β direction inclined at an angle β with respect to the X-axis stage). Further, the slider 439a attached to the lower portion of the moving member 439 can be engaged with the guide rail 436b, and thus, the moving member 439 can be disposed to move relatively in the β direction with respect to the wedge member 436 along the guide rail 436b.

The moving member 439 has an arm 439c that supports the upper surface 439b and extends in the Z-axis direction. The support upper surface 439b is decomposably provided with a seat 439d having a conical inner circumference. Further, a pair of guide rails 439e extending in the Z-axis direction (only one side view) are attached to the side surface of the support arm 439c extending upward from the support upper surface 439b. A slider 431a fixed to the outer casing 431 is respectively fastened to the guide rail 439e. Thus, the moving member 439 can also be disposed relative to the outer casing 431 along the guide rail 439e. According to this support structure, the support rigidity of the arm 439c can be improved, and the positional accuracy in the X-axis direction and the Y-axis direction of the mounting position of the spring member 450 to be described later can be ensured.

A tilting support portion 440 is provided as a joint mechanism in such a manner as to support the upper surface 439b of the moving member 439. On the lower surface of the tilting support portion 440, the upper seat 439d is detachably provided with a conical outer seat 440a. The spherical body 441 is disposed between the lower seat 439d and the upper seat 440a to form a spherical seat as a joint mechanism. Therefore, the moving member 439 and the tilting support portion 440 are mutually restrained in a direction orthogonal to the Z-axis direction, but are relatively tiltable. .

A substrate supporting portion 442 attached to the lower surface of the substrate stage 20 is disposed above the tilting support portion 440, and a plurality of balls 443 are disposed between the upper surface of the tilting support portion 440 and the lower surface of the substrate supporting portion 442. Therefore, the tilt support portion 440 and the substrate supporting portion 442 can relatively move in a certain range in a direction orthogonal to the Z-axis direction. However, if the substrate supporting portion 442 is not restrained at all, the substrate stage 20 cannot be positioned. Therefore, in the present embodiment, the spring member 450 for positional restraint is provided.

More specifically, the spring member 450 is made of a thin rectangular plate-shaped spring steel sheet such as SUP3, SUP6, SUP7, SUP9, SUP10, SUP12, etc. as shown in FIG. 4, and has a side extending from one side toward the center. A pair of parallel slits 450a. Preferably, a circular hole 450d for stress relaxation is formed at the end of the slit 450a (see FIG. 6(c)), and when the width of the slit 450a is "t", the diameter D of the circular hole 450d is set to t≦D≦2t is preferred. The edge portion of the central portion 450b sandwiched by the slit 450a is fixed by the bolt B1 to the lower surface of the substrate supporting portion 442 in the Z-axis direction and above the arm 439c of the moving member 439. On the other hand, the edge of the peripheral portion 450c on both sides of the slit 450a is fixed to the lower surface of the substrate supporting portion 442 by a bolt B2 (see FIG. 5). Further, the edge portion on the side opposite to the edge portion to which the central portion 450b and the peripheral portion 450c are attached is not restrained and is free. Further, as shown in FIG. 6(c), the length of the central portion 450b is formed to be shorter than the length of the peripheral portion 450c, and an inclined surface 450e is formed in a portion of the peripheral portion 450c that protrudes from the edge portion of the central portion 450b. The inclination angle θ of the inclined surface 450e with respect to the extending direction of the slit 450a may be 0° ≦ θ < 90°, and when considering the rigidity of the peripheral portion 450c, it is preferably 0° ≦ θ ≦ 60°. Further, in consideration of both the weight reduction of the spring member 450 and the rigidity of the peripheral portion 450c, it is more preferable to set it to 30° ≦ θ ≦ 60°.

Next, the operation of the Z-tilt adjustment mechanism 43 will be described. When a control signal is transmitted from the control device (not shown) to the motor 432, the rotation shaft 432a is rotated, and the rotation motion is transmitted to the ball screw shaft 433 via the coupling 434. Thus, the rotation is caused to rotate relative to the fixed nut 437, whereby the axial force is transmitted to the nut 437, and the nut 437 moves with the wedge member 436 toward the axis of the ball screw shaft 433. .

If the wedge member 436 moves toward the axial direction of the ball screw shaft 433, the moving member 439 also receives the force in the same direction, but the moving member 439 is only allowed to move in the Z-axis direction, so that the one side is opposed to the wedge member 436 When the β direction is relatively moved, the slider 431a is relatively slid on the guide rail 439e, and is movable in the Z-axis direction (up and down) with respect to the casing 431. Thereby, the substrate stage 20 can be moved in the Z-axis direction via the spherical seat, the tilting support portion 440, and the substrate supporting portion 442.

Here, when the driving amounts of the three Z-tilt adjustment mechanisms 43 in the Z-axis direction are different, the substrate stage 20 is inclined with respect to the X-axis stage 48, but the inclination is caused by the spherical seat to tilt The support portion 440 is allowed to tilt with respect to the moving member 439. Further, in the case where the substrate stage 20 is slightly moved in the X-axis direction or the Y-axis direction with respect to the X-axis stage 48, the balls 443 allow this.

On the other hand, the spring member 450 functions to suppress the substrate stage 20 from moving unrestricted in the X-axis direction or the Y-axis direction with respect to the X-axis stage 48. In other words, the central portion 450b and the peripheral portion 450c connected to the inner end side of the slit 450a are respectively fixed in a single direction, and are easily bent in a V-shape in the opposite direction, thereby allowing the substrate supporting portion 442 to be opposed to The moving member 439 is inclined. On the other hand, in the X-axis direction and the Y-axis direction (the surface direction of the spring member 450), since the spring member 450 is high in rigidity and is not easily deformed, the substrate supporting portion 442 can be prevented from moving relative to the moving member 439. Thereby, even if the substrate stage 20 moves in the Z-axis direction with respect to the X-axis stage 48, the positioning accuracy in the X-axis direction or the Y-axis direction can be ensured. In particular, in order to secure the positioning accuracy in the X-axis direction, it is preferable to set the width a of the central portion 450b to 1/2 or less of the width L of the spring member 450 so as to obtain the rigidity of the central portion 450b (a<L). /2) (Refer to Figure 6(b)).

Further, as shown in FIG. 6(c), when the length of the peripheral portion 450c is X1, the rigidity of the central portion 450b can be further increased by setting the length X of the central portion 450b to X≦X1/2. Further, in Fig. 6(a), the spring rigidity of the spring member 450 of the Z-tilt adjustment mechanism 43A provided on one of the opposite sides of the substrate stage 20 is preferably set to be larger than the other side. The spring member 450 of the two Z-tilt adjustment mechanisms 43B has a large spring rigidity, and is preferably set to twice the spring rigidity of the spring member 450 of the Z-tilt adjustment mechanism 43B. Thereby, the rigidity deviation can be eliminated and the positioning accuracy can be improved.

Further, in order to sufficiently support the substrate stage 20 by the rigidity of the spring member 450, if the width of the substrate stage 20 is L', the width L of the spring member 450 is preferably set to 0.1 ≦L/L. '≦0.5.

According to the present embodiment, since the spring member 450 is attached to the upper surface of the arm 439c of the moving member 439 and the lower surface of the substrate supporting portion 442, and is moved integrally in the Z-axis direction, it is connected to the outer casing 431. In other words, the shape change of the spring member 450 can be suppressed, and thus the positional accuracy of the stabilized substrate stage 20 can be obtained irrespective of the movement of the moving member 439. Based on the above-described fine adjustment of the position of the Z-axis and the tilting direction of the substrate stage 20, the mask M and the substrate W can be aligned at a predetermined interval and in parallel.

Further, on the first proximity exposure device main body 2, as shown in FIGS. 1 and 2, a laser length measuring device 60 which is a position measuring device for detecting the position of the substrate stage 20 is provided. The laser length measuring device 60 measures the moving distance of the substrate stage 20 generated when the substrate stage moving mechanism 40 is driven.

The laser length measuring device 60 includes an X-axis mirror 64 that is fixed to the bracket 71 so as to be disposed along the side surface of the substrate stage 20 in the X-axis direction, and is fixed to the bracket 71 so as to be along the Y of the substrate stage 20. A Y-axis mirror 65 disposed on the side in the axial direction; disposed at an end portion of the apparatus base 50 in the X-axis direction, irradiates laser light (measured light) to the X-axis mirror 64, and receives a mirror for the X-axis 64-reflected laser light, X-axis length measuring device (length measuring device) 61 and yaw measuring device (length measuring device) 62 for measuring the position of the substrate stage 20; and Y-axis disposed on the device base 50 A Y-axis length measuring device (elongation measuring device) 63 that irradiates the laser light to the Y-axis mirror 65 and receives the laser light reflected by the Y-axis mirror 65 to measure the position of the substrate stage 20 at the direction end portion. .

In the laser length measuring device 60, the X-axis length measuring device 61, the yaw measuring device 62, and the Y-axis length measuring device 63 are used to irradiate the X-axis mirror 64 and the Y-axis mirror 65 with laser light. The X-axis mirror 64 and the Y-axis mirror 65 reflect the position of the substrate stage 20 in the X-axis and Y-axis directions with high precision. Further, the positional data in the X-axis direction is measured by the X-axis length measuring device 61, and the position in the θ direction is measured by the yaw measuring device 62. Further, since the position of the substrate stage 20 is calculated by the position in the X-axis direction, the position in the Y-axis direction, and the position in the θ direction measured by the laser length measuring device 60, and is calculated by appropriate correction, the substrate stage moving mechanism is added. 40 can adjust the position of the substrate W based on the result.

The present invention has been described above with reference to the embodiments, but the invention should not be construed as being limited to the embodiments described above.

In the above embodiment, the drive mechanism includes a motor 432, a switching mechanism constituted by a ball screw mechanism that converts rotational motion of the motor 432 into an axis motion, and a Y-axis that can be moved by an axis that is converted by the conversion mechanism. The wedge member 436 is moved in the direction, but the driving mechanism of the present invention is not limited thereto. For example, as in the first modification shown in FIG. 7, the drive mechanism may be a linear motor constituted by the movable member 501 and the fixing member 502 fixed to the driving member 500, thereby corresponding to the driving member fixed to the axial movement. The wedge member 436 on the 500 moves in the Y-axis direction, and the moving member 439 can be moved in the up and down direction.

Further, the spring member of the present invention may be configured by stacking a plurality of spring members 450 as in the second modification shown in FIG.

In addition, the up-down direction and the tilt adjustment mechanism of the present invention may be configured to drive the substrate holding portion in the vertical direction and adjust the inclination of the substrate holding portion, and have at least one of the opposite sides of the substrate holding portion. One may have at least two on the other side.

10. . . Mask stage

11. . . Mask stage abutment

11a. . . Opening

12. . . Mask holding frame

14. . . Chuck section

16. . . Mask position adjustment mechanism (mask drive mechanism)

16x. . . X-axis direction drive

16y. . . Y-axis direction drive

17. . . Gap sensor

18. . . Aligning camera with mask

19. . . Mobile agency

20. . . Substrate stage

twenty one. . . Workpiece chuck

twenty two. . . Adsorption surface

30. . . Lighting optical system

31. . . High pressure mercury lamp

32. . . concave mirror

33. . . Optical integrator

34. . . Exposure control shutter

35. . . Plane mirror

36. . . Plane mirror

37. . . Spherical mirror

38. . . Shadow aperture

39. . . Shielding aperture drive mechanism

40. . . Substrate stage moving mechanism (substrate driving mechanism)

41. . . Y-axis feed mechanism

42. . . X-axis feed mechanism

43. . . Z-tilt adjustment mechanism (up and down direction and tilt adjustment mechanism, support device)

44. . . Linear slide

44a. . . guide

45. . . Y-axis platform

46. . . Drive unit

46a. . . Nut

46b. . . Ball screw shaft

46c. . . motor

47. . . Linear slide

47a. . . guide

48. . . X-axis platform

49. . . Drive unit

49b. . . Ball screw shaft

49c. . . motor

50. . . Device abutment

51. . . pillar

52. . . Z-axis mobile device

60. . . Laser length measuring device

61. . . X-axis length measuring device

62. . . Yaw tester

63. . . Y-axis length measuring device

64. . . X-axis mirror

65. . . Y-axis mirror

71. . . support

431. . . shell

431a. . . Slider

432. . . motor

432a. . . Rotary axis

433. . . Ball screw shaft

434. . . Coupling

435. . . Bearing

436. . . Wedge member

436a. . . Slider

436b. . . guide

437. . . Nut

438. . . guide

439. . . Moving member

439a. . . Slider

439b. . . Support above

439c. . . arm

439d. . . Lower seat

439e. . . guide

440. . . Tilting support

440a. . . Sitting

441. . . Sphere

442. . . Substrate support

443. . . Ball

450. . . Spring member

450a. . . Slit

450b. . . Central department

450c. . . Peripheral part

L. . . Light path

M. . . Mask

W. . . Substrate

1 is a partially exploded perspective view showing a body of a proximity exposure device suitable for an exposure unit;

Figure 2 is a front view of the body of the proximity exposure device shown in Figure 1;

Figure 3 is an enlarged perspective view of the mask holding portion shown in Figure 1;

Figure 4 is a perspective view of the Z-tilt adjustment mechanism 43;

Figure 5 is a side view of the Z-tilt adjustment mechanism 43;

6(a) is a plan view of the substrate stage 20 displayed together with the Z-tilt adjustment mechanism 43; (b) is an enlarged plan view of the Z-tilt adjustment mechanism 43; (c) is a partial enlarged view of the spring member 450 ;

Figure 7 (a) is a side view of the Z-tilt adjustment mechanism 43 according to the first modification of the present invention; (b) is a view of the drive mechanism observed from the arrow VII of (a);

Fig. 8 is an enlarged side elevational view showing the vicinity of a spring member 450 according to a second modification of the present invention.

20. . . Substrate stage

43. . . Z-tilt adjustment mechanism

48. . . X-axis platform

431. . . shell

431a. . . Slider

432. . . motor

432a. . . Rotary axis

433. . . Ball screw shaft

434. . . Coupling

435. . . Bearing

436. . . Wedge member

436a. . . Slider

436b. . . guide

437. . . Nut

438. . . guide

439. . . Moving member

439a. . . Slider

439b. . . Support above

439c. . . arm

439d. . . Lower seat

439e. . . guide

440. . . Tilting support

440a. . . Sitting

441. . . Sphere

442. . . Substrate support

443. . . Ball

450. . . Spring member

B1. . . bolt

B2. . . bolt

β. . . slope

Claims (4)

A support device for movably supporting a stage, comprising: a base; a moving member movably mounted on the base in a vertical direction; and a driving mechanism for driving the moving member in the up and down direction a joint mechanism that allows the stage to tilt relative to the moving member and connects the two; and a spring member that connects the stage and the moving member; and the spring member has a spring rigidity in the vertical direction compared to the foregoing The spring rigidity in the direction orthogonal to the vertical direction is low. A support device according to claim 1, wherein the moving member is provided with a guide rail disposed along the vertical direction, and the base is provided with a slider movable relative to the guide rail. The support device of claim 1 or 2, wherein the driving mechanism comprises: a motor, a conversion mechanism for converting the rotational motion of the motor into an axis motion, and the upward and downward direction by the axial movement converted by the conversion mechanism a wedge member that moves in a horizontal direction of intersection; and the moving member is movable in the vertical direction corresponding to the wedge member moving in the horizontal direction. An exposure apparatus comprising: a mask holding portion for holding a mask; a mask driving mechanism for driving the mask holding portion; a substrate holding portion for holding the substrate; a substrate driving mechanism for driving the substrate holding portion; The substrate is configured to illuminate the substrate with a light for pattern exposure; and the substrate driving mechanism is configured to be capable of driving the substrate holding portion in the vertical direction and to adjust the inclination of the substrate holding portion, and includes the substrate At least one of the two sides of the holding portion is disposed at least one of the two sides, and at least two of the upper and lower directions and the tilting adjustment mechanism are disposed on the other side, and each of the vertical direction and the tilt adjustment mechanism is by any one of claims 1 to 3 The item is supported by a device.