CN102484046B - Supporting device and light exposure device - Google Patents
Supporting device and light exposure device Download PDFInfo
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- CN102484046B CN102484046B CN201180003623.9A CN201180003623A CN102484046B CN 102484046 B CN102484046 B CN 102484046B CN 201180003623 A CN201180003623 A CN 201180003623A CN 102484046 B CN102484046 B CN 102484046B
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/7035—Proximity or contact printers
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
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- G—PHYSICS
- G12—INSTRUMENT DETAILS
- G12B—CONSTRUCTIONAL DETAILS OF INSTRUMENTS, OR COMPARABLE DETAILS OF OTHER APPARATUS, NOT OTHERWISE PROVIDED FOR
- G12B5/00—Adjusting position or attitude, e.g. level, of instruments or other apparatus, or of parts thereof; Compensating for the effects of tilting or acceleration, e.g. for optical apparatus
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
Disclosed are a supporting device and a light exposure device, both of which can achieve the control of an angle of a stage with high repeatability. A spring member (450) is attached to the upper surface of an arm (439c) of a movable member (439) and the lower surface of a substrate support (442), so that the spring member (450), the arm (439c) and the substrate support (442) can move together in the Z-axis direction. In this manner, the change in the form of the spring member (450) can be prevented compared with a case where the spring member (450) is connected to a housing (431), and therefore the accurate positioning of a substrate stage (20) can be achieved stably regardless of the movement of the movable member (439).
Description
Technical field
The present invention relates to supporting arrangement and the exposure device of the tilt adjustments of the movable stage used in such as various manufacture, inspection etc.
Background technology
In semiconductor fabrication sequence etc., in order to the deviation of the flatness and the depth of parallelism and thickness that measure semiconductor wafers, sometimes use interferometer.And, in order to measure each size becoming the semiconductor wafers of determination object accurately, need interferometric detection light to be radiated on the surface of determination object with predetermined angle high-precision.Therefore, for determination object being made to tilt accurately and using the device for supporting table (stage).Patent documentation 1 discloses the supporting arrangement of the prior art for this purposes.The supporting arrangement of patent documentation 1 by by three Z axis drive divisions by three of workbench along Z-direction to measure the arbitrarily angled adjustment driving and carry out workbench arbitrarily.
Patent documentation 1: Japanese Unexamined Patent Publication 2004-47852 publication
But problem when driving three of workbench along Z-direction how to limit this workbench on the direction (X-direction or Y direction) crossing with Z-direction.When this restriction is crossed strong, the angle adjustment of workbench becomes difficulty, and on the other hand, when limiting weak, workbench can carry out X-direction or Y direction moves, and the location of workbench becomes difficulty.
For this reason, have developed following a kind of technology, namely, be used in and X-direction or Y direction be difficult to bending and be easy to bending flat spring in the Z-axis direction the base station of workbench with this workbench of supporting is linked, and when workbench being moved by Z axis drive division to Z-direction, flat spring restriction workbench moves to X-direction or Y direction, but allows workbench to move in the Z-axis direction.But, because flat spring and base station link, thus make the movement of workbench when moving along Z-direction relative to base station small, but also can move to X-direction or Y direction, and there is the problem that cannot obtain location reproducibility.To this, develop the technology using the flat spring of E shape more to reduce to the movement of Z-direction relative to it to make workbench to the movement of X-direction or Y direction, but, when flat spring change of shape is large, be present in its performance and occur error, the problem of operating position instability.
Summary of the invention
For this reason, the present invention, in view of the problem of such prior art, its object is to provide reproducibility highland to carry out supporting arrangement and the exposure device of the angle adjustment of workbench.
Stage support for moving, is characterized in that by supporting arrangement of the present invention, has: base workbench; Moving-member, it can be arranged on above-mentioned base workbench along the vertical direction movably; Driving mechanism, above-mentioned moving-member drives by along the vertical direction; Articulation mechanism, it allows above-mentioned workbench and above-mentioned moving-member tilting toward each other, and both is linked up; And spring member, above-mentioned workbench and above-mentioned moving-member link up by it; Spring stiffness on the above-mentioned above-below direction of above-mentioned spring member is lower than the spring stiffness in the direction orthogonal with above-mentioned above-below direction.
Exposure device of the present invention has: mask maintaining part, and it keeps mask; Mask driving mechanism, it drives aforementioned mask maintaining part; Board holder, it keeps substrate; Base plate driving mechanism, it drives aforesaid substrate maintaining part; With irradiation component, its light exposed to aforesaid substrate irradiation pattern across aforementioned mask, it is characterized in that, aforesaid substrate maintaining part can drive by aforesaid substrate driving mechanism along the vertical direction, and have and at least can configure one, at least configure above-below direction and the tilt adjusting mechanism of two at another side in the one side respectively in the relative both sides of aforesaid substrate maintaining part, to adjust the inclination of aforesaid substrate maintaining part, above-mentioned each above-below direction and tilt adjusting mechanism are made up of above-mentioned supporting arrangement.
Invention effect
According to the present invention, in the spring member that above-mentioned workbench and above-mentioned moving-member are connected, spring stiffness on above-mentioned above-below direction is lower than the spring stiffness in the direction orthogonal with above-mentioned above-below direction, therefore the displacement in the direction that restriction is orthogonal with the above-mentioned above-below direction of above-mentioned workbench, and on above-mentioned above-below direction, allow the displacement of above-mentioned workbench, above-mentioned spring member and above-mentioned moving-member are together moved, inhibit the change of shape of above-mentioned spring member like this, thus, no matter how above-mentioned moving-member moves, stable above-mentioned operating position precision can both be acquired.
In addition, the guide rail configured along above-mentioned above-below direction is set at above-mentioned moving-member, arranges relative to the slide block of above-mentioned guide rail movement, now, can carry out the movement of above-mentioned moving-member accurately at above-mentioned base workbench.But, also slide block can be set on above-mentioned moving-member, above-mentioned base workbench arranges guide rail.
Also have, above-mentioned driving mechanism has motor, the rotary motion of above-mentioned motor is converted to the switching mechanism of axial-movement and can along the wedge component of the horizontal direction movement crossing with above-mentioned above-below direction by the axial-movement changed by above-mentioned switching mechanism, moved in above-mentioned horizontal direction by above-mentioned wedge component and above-mentioned moving-member is moved up at above-mentioned upper and lower, then comparatively preferred.
Accompanying drawing explanation
Fig. 1 is the exploded partial perspective view close to exposure device for illustration of being applicable to exposing unit.
Fig. 2 is the front view close to exposure device main body shown in Fig. 1.
Fig. 3 is the amplification stereogram of the mask maintaining part shown in Fig. 1.
Fig. 4 is the stereogram of Z-tilt adjusting mechanism 43.
Fig. 5 is the end view of Z-tilt adjusting mechanism 43.
(a) of Fig. 6 is the vertical view of the substrate stage 20 together illustrated with Z-tilt adjusting mechanism 43, and (b) is the amplification plan view of Z-tilt adjusting mechanism 43, and (c) is the partial enlarged drawing of spring member 450.
Fig. 7 (a) is the end view of the Z-tilt adjusting mechanism 43 involved by the present invention first variation, and (b) is the figure of the driving mechanism observed from arrow VII.
Fig. 8 is the enlarged side view around the spring member 450 involved by the present invention second variation.
Description of reference numerals:
10: mask platform; 11: mask platform pedestal; 11a: peristome; 12: mask holding frame; 14: chuck segment; 16: mask position adjusting mechanism (mask driving mechanism); 16x:X direction of principal axis drive unit; 16y:Y direction of principal axis drive unit; 17: pitch sensors; 18: mask calibrated cameras; 19: travel mechanism; 20: Substrate table; 21: workpiece chuck; 22: adsorption plane; 30: lamp optical system; 31: high-pressure mercury-vapor lamp; 32: concave mirror; 33: light integrator; 34: spectrum assignment shutter; 35: level crossing; 36: level crossing; 37: spherical mirror; 38: hide aperture; 39: hide aperture drive mechanism; 40: Substrate table driving mechanism (base plate driving mechanism); 41:Y axle feed mechanism; 42:X axle feed mechanism; 43:Z tilt adjusting mechanism (above-below direction and tilt adjusting mechanism, supporting arrangement); 44: straight line guidance; 44a: guide rail; 45:Y shaft platform; 46: drive unit; 46a: nut; 46b: ballscrew shaft; 46c: motor; 47: straight line guidance; 47a: guide rail; 48:X shaft platform; 49: drive unit; 49b: ballscrew shaft; 49c: motor; 50: device pedestal; 51: pillar; 52:Z shaft moving device; 60: laser ranging system; 61:X axle distance measuring equipment; 62: deflection analyzer; 63:Y axle distance measuring equipment; 64:X axle mirror; 65:Y axle mirror; 71: pillar; 431: housing; 431a: slide block; 432: motor; 432a: rotating shaft; 433: ballscrew shaft; 434: shaft coupling; 435: bearing; 436: wedge component; 436a: slide block; 436b: guide rail; 437: nut; 438: guide rail; 439: moving-member; 439a: slide block; 439b: support upper surface; 439c: arm; 439d: lower seat; 439e: guide rail; 440: inclination support; 440a: the seat of honour; 441: spheroid; 442: substrate supporting portion; 443: ball; 450: spring member; 450a: slit; 450b: central portion; 450c: periphery; L: light path; M: mask; W: substrate.
Embodiment
Below, with reference to the accompanying drawings to using the exposing unit of supporting arrangement involved in the present invention to be described in detail.Here, Z-direction is set to above-below direction, X-direction and Y direction are set to horizontal direction.
Exposing unit has: exposed by ground floor first close to exposure device main body; Exposed by the second layer second close to exposure device main body; Third layer exposed the 3rd close to exposure device main body; With the 4th layer is exposed the 4th close to exposure device main body.Here, as long as the first ~ four close to the different formation of the adsorption plane of exposure device main body board holder described later, be therefore only described in detail close to exposure device main body 2 first hereinafter, explanation in addition is all omitted.
As shown in Figure 1, first possesses close to exposure device main body 2: the mask platform (mask maintaining part) 10 keeping mask M; Keep the Substrate table (board holder) 20 of glass substrate (being exposed material) W; As the lamp optical system 30 of pattern exposure irradiation means; Substrate table 20 is moved respectively in X-axis, Y-axis and Z-direction, and carries out the Substrate table travel mechanism (base plate driving mechanism) 40 of the tilt adjustments of Substrate table 20; And for supporting the device pedestal 50 of mask platform 10 and Substrate table travel mechanism 40.
In addition, substrate W and the mask M of glass are oppositely disposed, and are needing to apply emulsion by the surface of the mask pattern be depicted on this mask M exposure transcription.In addition, mask M is made up of vitreous silica, and is formed as rectangular shape.
First, be described from lamp optical system 30.Lamp optical system 30 possesses: as the such as high-pressure mercury-vapor lamp 31 of light source for ultraviolet ray irradiation; Make the concave mirror 32 that the light irradiated from high-pressure mercury-vapor lamp 31 converges; Switch the two kinds of light integrators 33 being configured in the near focal point of this concave mirror 32 freely; For changing the level crossing 35 of optical path direction, level crossing 36 and level crossing 37; And be configured between this level crossing 36 and light integrator 33 with the spectrum assignment shutter 34 of open and close controlling illumination path.
And, in lamp optical system 30, when exposing, control is opened to spectrum assignment shutter 34, now, the light irradiated from high-pressure mercury-vapor lamp 31 through the light path L shown in Fig. 1, and is vertically irradiated to the surface of the mask M remained in the mask platform 10 and substrate W remaining on Substrate table 20 as the directional light of pattern exposure.Like this, the mask pattern of mask M is exposed transcription on substrate W.
As shown in FIG. 1 to 3, mask platform 10 possesses: the mask platform pedestal 11 forming the peristome 11a of rectangular shape at central portion; Be arranged on mask platform pedestal 11 peristome 11a place and can along the mask holding frame 12 of X-axis, Y-axis, the movement of θ direction; Be arranged in mask holding frame 12 for adsorbing the chuck segment 14 keeping mask M; And mask holding frame 12 and chuck segment are moved up in X-axis, Y-axis, θ side, and adjustment remains on the mask position adjusting mechanism (mask driving mechanism) 16 of the position of the mask M in this mask holding frame 12.
Mask platform pedestal 11 is supported as moving along Z-direction with the Z axis mobile device 52 of the upper end being arranged on this pillar 51 by the pillar 51 erected on device pedestal 50, and is configured in the top of Substrate table 20.Z axis mobile device 52 has the electric actuator or air pressure cylinder etc. that are such as made up of motor and ball-screw etc., makes mask platform 10 be elevated to preposition by simply moving up and down.In addition, during the cleaning etc. of Z axis mobile device 52 for the replacing of mask M, workpiece chuck 21.
Mask position adjusting mechanism 16 possesses: be arranged on mask holder 12 along a Y direction drive unit 16y on a limit of X-direction; Be arranged on mask holder 12 along two X-direction drive unit 16x on a limit of Y direction.
And, in mask driving mechanism 16, by driving a Y direction drive unit 16y, mask holder 12 is moved in the Y-axis direction, and by driving two X-direction drive unit 16x comparably, mask holder 12 is moved along X-direction.In addition, by drive in two X-direction drive unit 16x any one and mask holder 12 is moved (rotation around Z axis) along θ direction.
In addition, as shown in Figure 3, on the upper surface of mask platform pedestal 11, the pitch sensors 17 of the spacing between the opposite face for measuring mask M and substrate W and the mask calibrated cameras 18 for the installation site that confirms the mask M kept by chuck segment 14 is provided with.This pitch sensors 17 and mask calibrated cameras 18 are retained as and can move along X-axis, Y direction by travel mechanism 19, and are configured in mask holder 12.
In addition, as shown in Figure 3, on the upper surface of mask platform pedestal 11, at the X-direction both ends of the peristome 11a of mask platform pedestal 11, the covering aperture 38 covered as required and by the both ends of mask M is provided with.This covering aperture 38 utilizes the covering aperture drive mechanism 39 be made up of motor, ball-screw and straight line guidance etc. can to move in the X-axis direction, to adjust the dead area at the both ends of mask M.In addition, hide the X-direction both ends that aperture 38 not only can be arranged on peristome 11a, also similarly can be arranged on the Y direction both ends of peristome 11a.
As depicted in figs. 1 and 2, Substrate table 20 possesses workpiece chuck 21, and this workpiece chuck 2 is arranged in Substrate table travel mechanism 40, and its upper surface has the adsorption plane 22 for being remained on by substrate W on Substrate table 20.In addition, workpiece chuck 21 keeps substrate W by vacuum suction.
As depicted in figs. 1 and 2, Substrate table travel mechanism 40 possesses: the Y-axis feed mechanism 41 making Substrate table 20 movement in the Y-axis direction; Make the X-axis feed mechanism 42 of Substrate table 20 movement in the X-axis direction; And for carrying out the tilt adjustments of Substrate table 20, and make the Z tilt adjusting mechanism (above-below direction and tilt adjusting mechanism, supporting arrangement) 43 of Substrate table 20 fine motion in the Z-axis direction.
Y-axis feed mechanism 41 possesses: a pair straight line guidance 44 arranged along Y direction at the upper surface of device pedestal 50; Support as can the Y-axis platform 45 of movement in the Y-axis direction by straight line guidance 44; And make the Y-axis feed drive unit 46 of Y-axis platform 45 movement in the Y-axis direction.And, the motor 46c of Y-axis feed drive unit 46 is driven, to make ballscrew shaft 46b rotate, thus make Y-axis platform 45 and ball-screw nut 46a together linearly the guide rail 44a of guidance 44 move, and Substrate table 20 is moved in the Y-axis direction.
In addition, X-axis feed mechanism 42 possesses: along a pair straight line guidance 47 that X-direction is arranged on the upper surface of Y-axis platform 45; Support as can along the X-axis platform 48 of X-direction movement by straight line guidance 47; And make X-axis platform 48 along the X-axis feed drive unit 49 of X-direction movement.And, the motor 49c of X-axis feed drive unit 49 is driven, to make ballscrew shaft 49b rotate, thus make X-axis platform 48 and not shown ball-screw nut together linearly the guide rail 47a of guidance 47 move, and Substrate table 20 is moved in the X-axis direction.
Below, Z tilt adjusting mechanism 43 is described.Fig. 4 is the stereogram of Z-tilt adjusting mechanism 43, and Fig. 5 is the end view of Z-tilt adjusting mechanism 43, and Fig. 6 (a) is the vertical view of the Substrate table 20 be together illustrated with Z-tilt adjusting mechanism 43.As shown in Fig. 6 (a), Z tilt adjusting mechanism 43 is arranged on a position on a limit in the relative both sides of Substrate table 20, two positions of another side and amounts on three positions, to be adjusted arbitrarily the Z-direction position of 3, carry out the tilt adjustments of Substrate table 20 thus.
In the Z tilt adjusting mechanism 43 shown in Fig. 5, the upper surface of X-axis platform (base station) 48 is fixed with housing 431.In the end of housing 431, motor 432 is installed, the rotating shaft 432a of motor 432 with linked up by shaft coupling 434 in housing 431 relative to the ballscrew shaft 433 of rotating shaft 432a configured in series.Ballscrew shaft 433 supports as rotating freely relative to housing 431 by bearing 435, and its contrary side is screwed to through not shown ball in the nut 437 be fixed on wedge component 436.Ball screw framework and switching mechanism is formed by ball screw framework 433, nut 437 and not shown ball.
Or, on the upper surface of X-axis platform 48, be provided with a pair (only illustrating one) guide rail 438 that the axis direction of the direction orthogonal with Z-direction, edge and ballscrew shaft 433 extends.In addition, slide block 436a that side is two side lower parts of the wedge component 436 of right-angle triangle is installed on and guide rail 438 fastens.Therefore, wedge component 436 is configured to move in the Y-axis direction along guide rail 438 relative to X-axis platform 48.
On the top of wedge component 436, in the mode of all tilt relative to the axis direction of Z-direction and ballscrew shaft 433 (extending along the β direction tilted with angle beta relative to X-axis platform), guide rail 436b is installed.And then the slide block 439a and the guide rail 436b that are installed on the bottom of moving-member 439 fasten, therefore, moving-member is configured 439 for can along guide rail 436b relative to wedge component 436 relative movement on β direction.
The arm 439c that moving-member 439 has support upper surface 439b and extends along Z-direction.On support upper surface 439b, be provided with the lower seat 439d that inner circumferential is cone shape decomposable asymmetric choice net.Or, on the side of the supporting arm 439c extended upward from support upper surface 439b, a pair (only illustrating one) the guide rail 439e extended along Z-direction is installed.In guide rail 439e, engaging has the slide block 431a be fixed on housing 431 respectively.Therefore, moving-member 439 is configured to carry out relative movement along guide rail 439e relative to housing 431.Formed by this supporting, the supporting rigidity of arm 439c can be improved especially, the X-direction of installation site and the positional precision of Y direction of aftermentioned spring member 450 can be guaranteed.
Inclination support 440 is relatively provided with, using as articulation mechanism with the support upper surface 439b of moving-member 439.On the lower surface of inclination support 440, be relatively provided with lower seat 439d the decomposable seat of honour 440a that inner circumferential is cone shape.Between lower seat 439d and seat of honour 440a, be formed and be configured with spheroid 441 and the spheric seating becoming articulation mechanism, therefore, moving-member 439 and inclination support 440 are restricted mutually on the direction orthogonal with Z-direction, but both can relative tilt.
Above inclination support 440, be configured be installed on Substrate table 20 lower surface substrate supporting portion 442, between the upper plane and the lower plane in substrate supporting portion 442 of inclination support 440, be configured with multiple ball 443.Therefore, inclination support 440 can carry out relative movement within the scope of certain on the direction orthogonal with Z-direction with substrate supporting portion 442, but, when making substrate supporting portion 442 completely free, Substrate table 20 can not be located.So, in the present embodiment, be provided with the spring member 450 of position limitation.
More particularly, as shown in Figure 4, spring member 450 for constituent material, has a pair slit 450a be parallel to each other from extending to central authorities with the spring steel of the such thin rectangular shape tabular of such as SUP3, SUP6, SUP7, SUP9, SUP10, SUP12.Be preferably the end at slit 450a, be formed with the circular hole 450d (with reference to Fig. 6 (c)) that stress relaxes, when the width of slit 450a being set to t, the diameter D of circular hole 450d is preferably set to t≤D≤2t.The edge being sandwiched in the central portion 450b in slit 450a is fixed on the upper surface of arm 439c of moving-member 439 with bolt B 1, and this arm 439c extends to the lower surface position in substrate supporting portion 442 along Z-direction.On the other hand, be fixed on the lower surface (with reference to Fig. 5) in substrate supporting portion 442 with bolt B 2 as the edge of the periphery 450c of slit 450a both sides.In addition, unrestricted with the edge of the edge opposite side being separately installed with central portion 450b and periphery 450c and become state freely.In addition, as shown in Fig. 6 (c), the length of central portion 450b is formed as shorter than the length of periphery 450c, is formed with inclined plane 450e in the part of the periphery 450c given prominence to from the edge of central portion 450b.This inclined plane 450e can be 0 °≤θ < 90 ° relative to the tiltangleθ of the bearing of trend of slit 450a, when considering the rigidity of periphery 450c, be preferably 0 °≤θ≤60 °, in addition, when considering the rigidity of the lightweight of spring member 450 and periphery 450c, be preferably set to 30 °≤θ≤60 °.
Secondly, the action of Z tilt adjusting mechanism 43 is described.When never illustrated control device sends drive singal to motor 432, rotating shaft 432a rotates, and therefore this rotary motion is delivered to ballscrew shaft 433 through shaft coupling 434.So, rotating shaft 432a and by securing for rotation nut 437 between produce relative rotation, thus to nut 437 axis transfer direction force, make nut 437 and wedge component 436 1 coexist ballscrew shaft 433 axis direction on move.
When wedge component 436 moves on the axis direction of ballscrew shaft 433, moving-member 439 is also stressed in the same direction, but, only allow moving-member 439 to the movement of Z-direction, therefore at moving-member 439 relative to wedge component 436 while carrying out relative movement along β direction, slide block 431a carries out relative sliding and mobile to Z-direction (up and down) relative to housing 431 on guide rail 439e.Like this, Substrate table 20 can be made through spheric seating, inclination support 440, substrate supporting portion 442 and moving along Z-direction.
Here, when the Z-direction drive volume of three tilt adjusting mechanisms 43 is different, Substrate table 20 tilts relative to X-axis platform 48, but this is tilted through the effect of spheric seating and allows inclination support 440 to tilt relative to moving-member 439.In addition, when Substrate table 20 moves in X-direction or Y direction minutely relative to X-axis platform 48, ball 443 allows this to move.
On the other hand, spring member 450 plays function, unrestrictedly moves relative to X-axis platform 48 to suppress Substrate table 20 in X-direction or Y direction.That is, the central portion 450b and the periphery 450c that are linked to square end side in slit 450a are respectively cantilever-shaped and bend to opposite direction each other easily V-shapedly, thus allow substrate supporting portion 442 to tilt relative to moving-member 439.On the other hand, in X-direction and Y direction (direction, face of spring member 450), spring member 450 rigidity high and be difficult to distortion, therefore suppress substrate supporting portion 442 move relative to moving-member 439.Like this, even if Substrate table 20 moves along Z-direction relative to X-axis platform 48, the positioning precision of X-direction or Y direction can also be guaranteed.Particularly in order to ensure the positioning precision of X-direction, preferably make the width a of central portion 450b be less than the width L of spring member 450 1/2 (a < L/2=, with obtain central portion 450b rigidity (with reference to Fig. 6 (b)).
In addition, as shown in Fig. 6 (c), when the length of periphery 450c is set to X1, the length X of central portion 450b is set as X≤X1/2, can further improve the rigidity of central portion 450b thus.In addition, in Fig. 6 (a), preferably the spring stiffness of the spring member 450 of the Z tilt adjusting mechanism 43A be arranged on the one side on the opposite both sides being arranged on Substrate table 20 is set as larger than the spring stiffness of the spring member 450 being arranged in two the Z tilt adjusting mechanism 43B be arranged on another side, more preferably sets it to 2 times of the spring stiffness of the spring member 450 being arranged in Z tilt adjusting mechanism 43B.Like this, can not deviation in rigidity, can positioning precision be improved.
In addition, the width of Substrate table 20 is set to L ' time, the width L of spring member 450 is preferably set to 0.1≤L/L '≤0.5, to make the adequate rigidity of spring spring member 450 to bear the supporting to Substrate table 20.
And then, according to the present embodiment, spring member 450 is arranged on the upper surface of the arm 439c of moving-member 439 and the lower surface in substrate supporting portion 442 and can moves along Z-direction integratedly, therefore with the situation that housing 431 links the change of shape that can suppress spring member 450 is compared, therefore no matter how moving-member 439 moves, and all can acquire the positional precision of stable Substrate table 20.By above structure, by whole for the fine position of the Z axis of Substrate table 20, incline direction, mask M can be made relative abreast with predetermined space with substrate W.
In addition, as depicted in figs. 1 and 2, first close in exposure device main body 2, the laser ranging system 60 of the position measuring device as the position detecting Substrate table 20 is provided with.This laser ranging system 60 is determined at the displacement of the Substrate table 20 produced when Substrate table travel mechanism 40 drives.
Laser ranging system 60 possesses: be fixed on pillar 71 along the X-axis mirror 64 that the X-direction side of Substrate table 20 configures; Be fixed on pillar 71 along the Y-axis mirror 65 that the Y direction side of Substrate table 20 configures; X-axis distance measuring equipment (distance measuring equipment) 61 and deflection analyzer (distance measuring equipment) 62, it is configured on the X-direction end of device pedestal 50, laser (measurement light) is irradiated to X-axis mirror 64, and receive the laser reflected by X-axis mirror 64, to measure the position of Substrate table 20; And a Y-axis distance measuring equipment (distance measuring equipment) 63, it is configured on the Y direction end of device pedestal 50, is irradiated by laser to Y-axis mirror 65, and receives the laser reflected by Y-axis mirror 65, to measure the position of Substrate table 20.
And, in laser ranging system 60, the laser irradiated to X-axis mirror 64 and Y-axis mirror 65 from X-axis distance measuring equipment 61, deflection analyzer 62 and Y-axis distance measuring equipment 63 is reflected by X-axis mirror 64 and Y-axis mirror 65, can measure the position of Substrate table 20 in X-axis, Y direction accurately thus.In addition, the position data in X-direction is measured by X-axis distance measuring equipment 61, and the position on θ direction measures by being partial to analyzer 62.In addition, the position of Substrate table 20 is by carrying out correction to calculate together by the position Synthesis in the X-direction determined by laser ranging system 60 position, Y direction position and θ direction, and therefore Substrate table travel mechanism 40 can adjust the position of substrate W according to this result.
Above, with reference to the present invention, execution mode is described, but the present invention should not be limited to above-mentioned execution mode, suitably can change in the nature of things, improve.
In the above-described embodiment, driving mechanism has: motor 432, comprise the switching mechanism that the rotary motion of motor 432 is converted to the ball screw framework of axial-movement and utilize the axial-movement changed by switching mechanism and can along the wedge component 426 of Y direction movement, but driving mechanism of the present invention is not limited to this.Such as, the first variation is as shown in Figure 7 such, driving mechanism can be the linear electric machine be made up of the movable piece 501 be fixed on driver part 500 and stator 502, like this, by be fixed on carry out axial-movement driver part 500 on wedge component 436 move in the Y-axis direction, and moving-member 439 correspondingly moves in the vertical direction.
In addition, the second variation is as shown in Figure 8 such, and spring member of the present invention is by forming multiple spring member 450 overlap.
And then, as long as above-below direction of the present invention and tilt adjusting mechanism are configured to drive board holder along the vertical direction, and the inclination of adjustable board holder; As long as and be configured to that the one side in the relative both sides of board holder at least has one, at another side, at least there are two.
In addition, the present invention is based on the Japanese patent application (Patent 2010-107100) of application on May 7th, 2010, the Japanese patent application (Patent 2011-098044) of application on April 26th, 2011 and the Japanese patent application (Patent 2011-098045) of application on April 26th, 2011, its content is introduced as reference herein.
Claims (4)
1. a supporting arrangement, has:
Base station;
Moving-member, it can be arranged on described base station along the vertical direction movably;
Driving mechanism, described moving-member drives by along the vertical direction;
Support unit, that support workbench, and workbench is moved;
Articulation mechanism, it allows described workbench and described moving-member tilting toward each other, and both is linked up; And
Spring member, described workbench and described moving-member link up by it,
It is characterized in that,
Spring stiffness on the direction that the spring stiffness of the described above-below direction of described spring member is more orthogonal with described above-below direction than it is low.
2. supporting arrangement according to claim 1, is characterized in that, on described moving-member, is provided with the guide rail configured along described above-below direction, and on described base station, being provided with can relative to the slide block of described guide rail movement.
3. supporting arrangement according to claim 1 and 2, is characterized in that,
Described driving mechanism has: motor; The rotary motion of described motor is converted to the switching mechanism of axial-movement; And utilizing the axial-movement changed by described switching mechanism and can along the wedge component of the horizontal direction movement orthogonal with described above-below direction, described moving-member, corresponding to the movement in the horizontal direction of described wedge component, moves along described above-below direction.
4. an exposure device, has: the mask maintaining part keeping mask; Drive the mask driving mechanism of described mask maintaining part; Keep the board holder of substrate; Drive the base plate driving mechanism of described board holder; Irradiation component with the light exposed to described substrate irradiation pattern across described mask, is characterized in that,
Described board holder can drive by described base plate driving mechanism along the vertical direction, and there is above-below direction and tilt adjusting mechanism, described above-below direction and tilt adjusting mechanism can regulate the inclination of described board holder, one side respectively in the relative both sides of described board holder at least configures one, at least configures two at another side, and each described above-below direction and tilt adjusting mechanism comprise the supporting arrangement according to any one of claims 1 to 3.
Applications Claiming Priority (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010107100 | 2010-05-07 | ||
| JP2010-107100 | 2010-05-07 | ||
| JP2011-098044 | 2011-04-26 | ||
| JP2011-098045 | 2011-04-26 | ||
| JP2011098044 | 2011-04-26 | ||
| JP2011098045 | 2011-04-26 | ||
| PCT/JP2011/060516 WO2011138938A1 (en) | 2010-05-07 | 2011-05-02 | Supporting device and light exposure device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102484046A CN102484046A (en) | 2012-05-30 |
| CN102484046B true CN102484046B (en) | 2015-04-08 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201180003623.9A Active CN102484046B (en) | 2010-05-07 | 2011-05-02 | Supporting device and light exposure device |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP5702373B2 (en) |
| KR (1) | KR101415371B1 (en) |
| CN (1) | CN102484046B (en) |
| TW (1) | TWI435404B (en) |
| WO (1) | WO2011138938A1 (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6053154B2 (en) * | 2013-03-28 | 2016-12-27 | リンテック株式会社 | Light irradiation apparatus and light irradiation method |
| JP5594404B1 (en) * | 2013-07-02 | 2014-09-24 | 日本精工株式会社 | Table device, transfer device, semiconductor manufacturing device, and flat panel display manufacturing device |
| JP6442831B2 (en) * | 2014-02-17 | 2018-12-26 | 日本精工株式会社 | Table device and transfer device |
| JP2021067925A (en) * | 2019-10-21 | 2021-04-30 | キヤノン株式会社 | Support device, projection optic system, exposure device, method of adjusting support device, and method of producing article |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6381002B1 (en) * | 1998-07-09 | 2002-04-30 | Ushiodenki Kabushiki Kaisha | Process for controlling a gap between a mask and a workpiece in proximity exposure and a proximity exposure device |
| CN1662821A (en) * | 2002-08-07 | 2005-08-31 | 东京毅力科创株式会社 | Placing table drive device and probe method |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2601834B2 (en) * | 1987-08-26 | 1997-04-16 | 株式会社東芝 | Table equipment |
| JPH0359494A (en) * | 1989-07-28 | 1991-03-14 | Nec Corp | Fine adjustment z-stage device |
| JPH0329236U (en) * | 1989-07-31 | 1991-03-22 | ||
| JP2001230305A (en) | 2000-02-18 | 2001-08-24 | Canon Inc | Supporting apparatus |
| JP4112919B2 (en) * | 2002-07-15 | 2008-07-02 | 住友重機械工業株式会社 | Z tilt stage |
-
2011
- 2011-05-02 CN CN201180003623.9A patent/CN102484046B/en active Active
- 2011-05-02 JP JP2012513819A patent/JP5702373B2/en active Active
- 2011-05-02 WO PCT/JP2011/060516 patent/WO2011138938A1/en active Application Filing
- 2011-05-02 KR KR1020127006711A patent/KR101415371B1/en active IP Right Grant
- 2011-05-04 TW TW100115653A patent/TWI435404B/en active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6381002B1 (en) * | 1998-07-09 | 2002-04-30 | Ushiodenki Kabushiki Kaisha | Process for controlling a gap between a mask and a workpiece in proximity exposure and a proximity exposure device |
| CN1662821A (en) * | 2002-08-07 | 2005-08-31 | 东京毅力科创株式会社 | Placing table drive device and probe method |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2011138938A1 (en) | 2011-11-10 |
| TW201203440A (en) | 2012-01-16 |
| JP5702373B2 (en) | 2015-04-15 |
| KR20120040748A (en) | 2012-04-27 |
| TWI435404B (en) | 2014-04-21 |
| KR101415371B1 (en) | 2014-07-04 |
| CN102484046A (en) | 2012-05-30 |
| JPWO2011138938A1 (en) | 2013-07-22 |
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