JPH0359494A - Fine adjustment z-stage device - Google Patents
Fine adjustment z-stage deviceInfo
- Publication number
- JPH0359494A JPH0359494A JP19754289A JP19754289A JPH0359494A JP H0359494 A JPH0359494 A JP H0359494A JP 19754289 A JP19754289 A JP 19754289A JP 19754289 A JP19754289 A JP 19754289A JP H0359494 A JPH0359494 A JP H0359494A
- Authority
- JP
- Japan
- Prior art keywords
- stage
- block
- elastic hinges
- eccentric pins
- fine movement
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000007246 mechanism Effects 0.000 abstract description 10
- 230000003028 elevating effect Effects 0.000 description 7
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は微動Zステージ装置に関し、特に半導体プロセ
スにJ3けるウェハおよびマスクをのせる微動Zステー
ジ装置に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a fine movement Z stage device, and more particularly to a fine movement Z stage device on which a wafer and a mask are placed in J3 in a semiconductor process.
従来の微動Zステージ装置について図面を参照して説明
する。第3図は従来の微動Zステージ装置の一例を示す
断面図である。A conventional fine movement Z stage device will be explained with reference to the drawings. FIG. 3 is a sectional view showing an example of a conventional fine movement Z stage device.
第3図に示す微動Zステージ装置は、ベース部1に対し
て水平方向に移動可能な水平移動プレート2と、ベース
部1に対して上下方向に移動可能な昇降ステージ3と、
水平移動プレート2を駆動するモータ4およびボールね
じ5と、水平移動プレート2に形成されたテーパブロッ
ク14と、昇降ステージ3に形成されたテーパブロック
14のテーパ面と係合するカムフォロワ8と、昇降ステ
ージ3を上下方向に案内する板ばね9とを含んで構成さ
れている。The fine movement Z stage device shown in FIG. 3 includes a horizontal movement plate 2 that is movable in the horizontal direction with respect to the base part 1, an elevating stage 3 that is movable in the vertical direction with respect to the base part 1,
A motor 4 and a ball screw 5 that drive the horizontally moving plate 2, a tapered block 14 formed on the horizontally moving plate 2, a cam follower 8 that engages with the tapered surface of the tapered block 14 formed on the elevating stage 3, It is configured to include a leaf spring 9 that guides the stage 3 in the vertical direction.
そして、水平移動プレート2を、モータ4とボールねじ
5とにより、水平方向に動かすと、各テーパブロック1
4が同時に同方向に移動し、各カムフォロワ8との係合
点の高さが、同時に上下し、それにともない昇降ステー
ジ3が上下方向に移動する。このとき、板ばね9により
昇降ステージ3は、回転および水平方向に移動すること
なく、上下方向に案内される。Then, when the horizontal movement plate 2 is moved horizontally by the motor 4 and the ball screw 5, each taper block 1
4 simultaneously move in the same direction, the height of the engagement point with each cam follower 8 rises and falls at the same time, and the elevating stage 3 moves in the vertical direction accordingly. At this time, the lift stage 3 is guided in the vertical direction by the leaf spring 9 without rotating or moving in the horizontal direction.
「発明が解決しようとする課題〕
上述した従来の微動Zステージ装置は、テーバブロック
のテーバ角を調整する機構が欠如しており、テーバの形
状誤差が、昇降ステージの平面度および真直度を阻害す
る大きな要因となっているので、テーバに対する高い形
状精度が必要になるという欠点を有している。“Problems to be Solved by the Invention” The conventional fine movement Z stage device described above lacks a mechanism for adjusting the Taber angle of the Taber block, and the shape error of the Taber impedes the flatness and straightness of the lifting stage. Therefore, it has the disadvantage that high shape accuracy with respect to the taber is required.
本発明の微動Zステージ装置は、同時に水平移動する複
数のテーバブロックにより、上下動する微動Zステージ
装置において、前記テーバブロックの各々を搭載する微
小移動ステージ部と、前記微小移動ステージ部を水平方
向に拘束して上下方向に変位自在に支持する2つの弾性
ヒンジと、前記弾性ヒンジをそれぞれ上下方向に駆動す
る2つの偏心ピンとを含んで構成されている。The fine movement Z stage device of the present invention is a fine movement Z stage device that moves up and down by a plurality of Taber blocks that move horizontally at the same time, and includes a fine movement stage section on which each of the Taber blocks is mounted, and a fine movement stage section that moves the fine movement stage section in the horizontal direction. It is configured to include two elastic hinges that are restrained and supported so as to be freely displaceable in the vertical direction, and two eccentric pins that respectively drive the elastic hinges in the vertical direction.
次に、本発明について図面を参照して説明する。 Next, the present invention will be explained with reference to the drawings.
第1図は本発明の微動Zステージ装置の一実施例を示す
断面図である。FIG. 1 is a sectional view showing an embodiment of the fine movement Z stage device of the present invention.
第1図に示す微動Zステージ装置は、ベース部1に対し
て水平方向に移動可能な水平移動プレート2と、ベース
部1に対して上下方向に移動可能な昇降ステージ3と、
水平移動プレート2を水平方向に駆動するモータ4およ
びボールねじ5と、水平移動プレート2に形成された微
小移動機構6を持つテーバブロック7と、昇降ステージ
3に形、威されたテーバブロック7のテーパ面と係合す
るカムフォロワ8と、昇降ステージ3を上下方向に案内
する板ばね9とを含んで構成されている。The fine movement Z stage device shown in FIG. 1 includes a horizontally moving plate 2 that is movable horizontally with respect to a base portion 1, an elevating stage 3 that is movable vertically with respect to the base portion 1,
A motor 4 and a ball screw 5 that drive the horizontally moving plate 2 in the horizontal direction, a Taber block 7 having a minute movement mechanism 6 formed on the horizontally moving plate 2, and a Taber block 7 shaped and controlled by the lifting stage 3. It is configured to include a cam follower 8 that engages with the tapered surface and a leaf spring 9 that guides the elevating stage 3 in the vertical direction.
第2図は第1図の微小移動機構6の一例を示す正面図で
ある。FIG. 2 is a front view showing an example of the minute movement mechanism 6 shown in FIG. 1.
第2図に示す微小移動機構6の各々は、各テーバブロッ
ク7を独立に上下方向に微小移動し、がつ各テーバ角を
独立に微小増減することができる。Each of the fine movement mechanisms 6 shown in FIG. 2 can independently slightly move each Taber block 7 in the vertical direction, and can independently slightly increase or decrease each Taber angle.
微小移動機構6は、テーバブロック7を搭載する微小移
動ステージ部10と、微小移動ステージ部10を水平方
向に拘束して上下方向に変位自在に支持する2つの弾性
ヒンジ11と、弾性ヒンジ11をそれぞれ上下方向に駆
動する2つの偏心ピン12と、微調整後にテーバブロッ
ク7を水平移動プレート2に固定するネジ13とを含ん
で構成されている。The micro-movement mechanism 6 includes a micro-movement stage section 10 on which the Taber block 7 is mounted, two elastic hinges 11 that restrain the micro-movement stage section 10 in the horizontal direction and support the micro-movement stage section 10 so as to be freely displaceable in the vertical direction, and the elastic hinges 11. It is configured to include two eccentric pins 12 that are driven in the vertical direction, and screws 13 that fix the Taber block 7 to the horizontally moving plate 2 after fine adjustment.
微小移動機構6の2つの偏心ピン12で2つの弾性ヒン
ジ11をそれぞれ同方向に同じ量だけ駆動することによ
り、微小移動ステージ部10を上下方向に微小移動させ
、テーバブロック7とカムフォロワ8との係合点の高さ
を微小に変化させるこのことにより昇降ステージ面のあ
おり角を微調整することが可能となる。By driving the two elastic hinges 11 in the same direction and by the same amount using the two eccentric pins 12 of the micro-movement mechanism 6, the micro-movement stage section 10 is slightly moved in the vertical direction, and the movement between the Taper block 7 and the cam follower 8 is By minutely changing the height of the engagement point, it is possible to finely adjust the tilt angle of the elevation stage surface.
また、微小移動機構6の2つの偏心ピン12で2つの弾
性ヒンジ11をそれぞれ異なる量駆動することにより、
微小移動ステージ部10を微小回転させ、すべてのテー
バブロック7のテーバ角を合わせることが可能となる。In addition, by driving the two elastic hinges 11 by different amounts with the two eccentric pins 12 of the minute movement mechanism 6,
By slightly rotating the micro-movement stage section 10, it is possible to match the Taber angles of all the Taber blocks 7.
このことにより昇降ステージ3の真直度を高精度にだす
ことができる。Thereby, the straightness of the elevating stage 3 can be achieved with high precision.
本発明の微動Zステージ装置は、各テーバブロックを搭
載する微小移動ステージ部と、微小移動ステージ部を水
平方向に拘束して上下方向に変位自在に支持する2つの
弾性ヒンジと、弾性ヒンジをそれぞれ上下方向に駆動す
る2つの偏心ピンとを備えているので、昇降ステージ面
のあおり角の調整および真直度を容易に調整することが
できるとともに、テーバブロックの高精度加工が不要に
なるという効果を有している。The fine movement Z stage device of the present invention includes a fine movement stage section on which each Taber block is mounted, two elastic hinges that restrain the fine movement stage section in the horizontal direction and support the fine movement stage section so as to be freely displaceable in the vertical direction, and an elastic hinge, respectively. Since it is equipped with two eccentric pins that drive in the vertical direction, it is possible to easily adjust the tilt angle and straightness of the elevation stage surface, and it also has the effect of eliminating the need for high-precision machining of the Taber block. are doing.
第1図は本発明の微動Zステージ装置の一実施例を示す
断面図、第2図は第1図の微小移動機構の一例を示す正
面図、第3図は従来の微動Zステージ装置の一例を示す
断面図である。
l・・・ベース部、2・・・水平移動プレート、3・・
・昇降ステージ、4・・・モータ、5・・・ボールねじ
、6・・・微小移動機構、7・・・テーバブロック、8
・・・カムフォロワ、9・・・板ばね、10・・・微小
移動ステージ部、1
1・・・弾性ヒンジ、
2・・・偏心ピン、
3・・・ねじ、
4・・・テーパブロック。FIG. 1 is a sectional view showing an embodiment of the fine movement Z stage device of the present invention, FIG. 2 is a front view showing an example of the fine movement mechanism of FIG. 1, and FIG. 3 is an example of a conventional fine movement Z stage device. FIG. l...base part, 2...horizontal movement plate, 3...
・Elevating stage, 4... Motor, 5... Ball screw, 6... Minute movement mechanism, 7... Taber block, 8
... Cam follower, 9 ... Leaf spring, 10 ... Micro-movement stage section, 1 1 ... Elastic hinge, 2 ... Eccentric pin, 3 ... Screw, 4 ... Taper block.
Claims (1)
動する微動Zステージ装置において、前記テーパブロッ
クの各々を搭載する微小移動ステージ部と、前記微小移
動ステージ部を水平方向に拘束して上下方向に変位自在
に支持する2つの弾性ヒンジと、前記弾性ヒンジをそれ
ぞれ上下方向に駆動する2つの偏心ピンとを含むことを
特徴とする微動Zステージ装置。In a fine movement Z stage device that moves up and down by a plurality of taper blocks that move horizontally at the same time, a fine movement stage section on which each of the taper blocks is mounted, and the fine movement stage section are restrained in the horizontal direction and can be freely displaced in the vertical direction. A fine movement Z stage device comprising: two elastic hinges that support the elastic hinges; and two eccentric pins that drive the elastic hinges in the vertical direction.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19754289A JPH0359494A (en) | 1989-07-28 | 1989-07-28 | Fine adjustment z-stage device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19754289A JPH0359494A (en) | 1989-07-28 | 1989-07-28 | Fine adjustment z-stage device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0359494A true JPH0359494A (en) | 1991-03-14 |
Family
ID=16376213
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP19754289A Pending JPH0359494A (en) | 1989-07-28 | 1989-07-28 | Fine adjustment z-stage device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0359494A (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007103655A (en) * | 2005-10-04 | 2007-04-19 | Tokyo Seimitsu Co Ltd | Prober |
JP2008277283A (en) * | 2007-03-30 | 2008-11-13 | Kyoto Univ | Sample stage mobile unit of charged particle beam device |
JP2009274196A (en) * | 2008-05-19 | 2009-11-26 | Olympus Corp | Moving stage device |
WO2011138938A1 (en) * | 2010-05-07 | 2011-11-10 | Nskテクノロジー株式会社 | Supporting device and light exposure device |
JP2016058341A (en) * | 2014-09-12 | 2016-04-21 | 株式会社日立ハイテクノロジーズ | Vertically movable stage for charged particle beam device, and charged particle beam device |
CN106113022A (en) * | 2016-08-24 | 2016-11-16 | 广东工业大学 | A kind of single-freedom and flexible mini positioning platform |
-
1989
- 1989-07-28 JP JP19754289A patent/JPH0359494A/en active Pending
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007103655A (en) * | 2005-10-04 | 2007-04-19 | Tokyo Seimitsu Co Ltd | Prober |
JP2008277283A (en) * | 2007-03-30 | 2008-11-13 | Kyoto Univ | Sample stage mobile unit of charged particle beam device |
JP2009274196A (en) * | 2008-05-19 | 2009-11-26 | Olympus Corp | Moving stage device |
WO2011138938A1 (en) * | 2010-05-07 | 2011-11-10 | Nskテクノロジー株式会社 | Supporting device and light exposure device |
CN102484046A (en) * | 2010-05-07 | 2012-05-30 | 恩斯克科技有限公司 | Supporting device and light exposure device |
JP5702373B2 (en) * | 2010-05-07 | 2015-04-15 | Nskテクノロジー株式会社 | Support apparatus and exposure apparatus |
JP2016058341A (en) * | 2014-09-12 | 2016-04-21 | 株式会社日立ハイテクノロジーズ | Vertically movable stage for charged particle beam device, and charged particle beam device |
CN106113022A (en) * | 2016-08-24 | 2016-11-16 | 广东工业大学 | A kind of single-freedom and flexible mini positioning platform |
CN106113022B (en) * | 2016-08-24 | 2019-02-22 | 广东工业大学 | A kind of single-freedom and flexible mini positioning platform |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN106291855B (en) | The manual adjustment mechanism of five degree of freedom can be achieved | |
JPH0359494A (en) | Fine adjustment z-stage device | |
KR20040023897A (en) | Height regulator for machining | |
CN111534809B (en) | Semiconductor process equipment | |
KR20000011618A (en) | Method of controlling a gap between a mask and a work in proximity exposure and proximity exposure apparatus | |
JP2746670B2 (en) | Cleaning equipment | |
CN108818956B (en) | Large plate ceramic cutting equipment | |
JPH0353193A (en) | Inching z stage device | |
US6689419B2 (en) | Method for manufacturing semiconductor device | |
KR101657079B1 (en) | Level adjusting apparatus of substrate processing apparatus and level adjusting method using the same | |
JPS62152632A (en) | Table device | |
JP2001220011A (en) | Tray holder positioning and driving mechanism | |
CN113008182A (en) | Top inclination adjustable lifts testing platform | |
JPS59115137A (en) | Minute-angle adjusting apparatus on work installation base | |
CN219027086U (en) | Polishing workbench and polishing machine for die core | |
JPS62242812A (en) | Automatic measuring instrument | |
JPH02202031A (en) | Turntable device | |
CN210789644U (en) | Multi-angle adjustable alignment platform | |
JPH0610671Y2 (en) | Mobile table device | |
CN115000779A (en) | High-precision compensation type terminal bending mechanism | |
KR0173711B1 (en) | Ama panel adjusting apparatus | |
JPH075958Y2 (en) | Floating base | |
CN109969986A (en) | A kind of lifting device | |
JPH03265527A (en) | Forming mold driving device for glass lens forming device | |
JP3078301B2 (en) | Machine tool pallet changer |