CN101069888A - Method and apparatus for washing single silicon-chip - Google Patents
Method and apparatus for washing single silicon-chip Download PDFInfo
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- CN101069888A CN101069888A CN 200710118905 CN200710118905A CN101069888A CN 101069888 A CN101069888 A CN 101069888A CN 200710118905 CN200710118905 CN 200710118905 CN 200710118905 A CN200710118905 A CN 200710118905A CN 101069888 A CN101069888 A CN 101069888A
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Abstract
The present invention relates to a method for cleaning monocrystal silicon chip and its equipment. Said method includes the following steps: (1), setting cleaning liquor sprayer with ultrasonic or megasonic generator; (2), mounting linear moving device; (3), setting monocrystal silicon chip horizontal rotation device; (4), setting the speed of the linear moving device and horizontal rotation device; (5), creating set of equations, solving set of equations to obtain its value; (6), according to the numerical value obtained by solving said set of equations setting rotating speed valve in the motor controller; and (7), starting and implementing cleaning process. Said cleaning equipment mainly includes cleaning cavity, linear moving component, horizontal rotation component and control component.
Description
Technical field
The invention belongs to a kind of industrial cleaning method and device, concrete is the method and apparatus that is used for cleaning silicon chip, especially for the method and the device that clean single silicon-chip.
Background technology
In the semi-conductor industry, the cleaning of silicon chip is divided into batch formula cleaning usually and single silicon-chip cleans dual mode.Clean with batch formula and to compare, single silicon-chip cleans to have: cleaning performance is good, and cleaning agent organic efficiency height can effectively prevent cross pollution, not advantage such as fragile silicon chip.Along with the increase of silicon chip product size, the closeness of the CD of silicon chip surface (critical dimension) lines increases, and its lines are more and more fragile, and silicon chip itself is rapid wear more and more also.For preventing in silicon chip cleans, silicon chip to be caused damage, also just more and more higher to the requirement of cleaning.And the method that single silicon-chip cleans is more convenient for accurately controlling and regulating, and to preventing to have the damage of the cleaning fluid of ultrasonic or million acoustic energies to silicon sheet material and circuit, more superiority is arranged.But the method that present some single silicon-chips that use clean has some shortcomings: the control of cleaning process is accurate inadequately, and the appearance leakage is washed and repeated, effect and efficient that influence is cleaned easily.Therefore, need to propose a kind of cleaning method and device of improved single silicon-chip.
Summary of the invention
The objective of the invention is at the problems referred to above, propose a kind of cleaning method and device of single silicon-chip.The control of this method and apparatus is accurately regulated flexibly, cleaning effective, efficient height.
The objective of the invention is to be achieved through the following technical solutions:
A kind of cleaning method of single silicon-chip is characterized in that mainly may further comprise the steps:
(1) is provided with washer fluid spraying apparatus ultrasonic or million acoustic generators: ultrasonic or million acoustic generators that are fit to of allocating power size as required, the nozzle and the supporting pipeline that can produce the effective cleaning fluid jet that is fit to are set, ultrasonic or million acoustic generators and nozzle are assembled together, and are fixedly installed on the movable stand; Described nozzle can move up and down, and the distance of nozzle and single silicon-chip is adjustable, and the surface of shower nozzle and single silicon-chip is 30-90 degree angle.
(2) assembling linear moving apparatus: give in the above-mentioned washer fluid spraying apparatus configuration and can do the linear moving apparatus that straight line moves, select buncher for use, be equipped with the precise rotation controller, this buncher drive washer fluid spraying apparatus is done radial alignment along the radius of single silicon-chip and is moved;
(3) single silicon-chip is set and horizontally rotates device: the single silicon-chip carriage is set, and the configuration level whirligig is selected buncher for use, is equipped with the precise rotation controller, and this buncher drive single silicon-chip is done on carriage and horizontally rotated;
(4) linear moving apparatus and the speed that horizontally rotates device are set:
If: the speed that linear motion device drive nozzle moves along the silicon chip radius is Vr, and unit is mm/s;
If: horizontally rotate device and drive single silicon-chip to do the speed that horizontally rotates motion be V ω, unit is radian/s;
If: the effective width of the jet of nozzle is a, and unit is mm;
If: the cleaning fluid jet is r to the distance at single silicon-chip center, and unit is mm;
Concrete condition, the performance of cleaning fluid and the requirement of cleaning fluid jet pressure, cleaning quality and efficient according to the single silicon-chip that cleans are provided with washing speed, just when horizontally rotating the rotation of device drive silicon chip, linear moving apparatus is radially covered the speed of radius distance along single silicon-chip, be made as S, unit is mm/s;
(5) set up equation:
V
t＝a×Vω
S, a, r are datum in the equation, and determined value is arranged; Vr, V ω are unknown number, try to achieve its value by separating above-mentioned equation group.
(6) numerical value that solves according to the 5th step is set tachometer value respectively in the controller of straight line mobile motor and electric rotating machine;
(7) shower nozzle is placed the edge or the center initial point of single silicon-chip, open cleaning fluid shower nozzle and power supply, finish cleaning process.
The cleaning method of a kind of single silicon-chip of the present invention adopts the silicon wafer horizontal rotation, the remover liquid nozzle radial alignment moves, form the method for the synthetic speed change Archimedes spiral Yun Dong Gui Trace of interpolation, reached ultrasonic or the even distribution of million acoustic energies on silicon chip, satisfied following 3 requirement: a, cleaning fluid evenly is injected on each silicon chip point; Anyly on b, the silicon chip surface do not miss; Any repetition on c, the silicon chip.Therefore, the present invention has that cleaning performance is good, cleaning efficiency is high, saves the not advantage of easy damaged of cleaning fluid, silicon chip, and easy and simple to handle, realizes the matting whole-course automation easily.
A kind of device that cleans the single silicon-chip method, it is characterized in that: mainly comprise cleaning chambers, displacement part of straight line, horizontally rotate parts and control assembly composition, described cleaning chambers is the basin-like body of a upper shed, the centre is provided with the described parts that horizontally rotate, this rotary part is provided with a silicon wafer horizontal carriage, this carriage is provided with the fixedly bayonet lock of silicon chip, and carriage is in transmission connection below by the connecting shaft and the buncher A of hermetically passing cleaning chambers bottom, is provided with lift cylinder A below this buncher; Bottom at cleaning chambers also has liquid outlet; Described displacement part of straight line is provided with a bracing frame, on this bracing frame, be provided with ultrasonic or million acoustic energy generators and remover liquid nozzle that is assembled together with it and pipeline, this bracing frame is in transmission connection by a connecting rod and buncher B, is provided with lift cylinder B below these parts; Also be provided with the buncher A and the speed regulator control connection that horizontally rotates the buncher B of parts of a controller and displacement part of straight line.
The employed device of a kind of cleaning single silicon-chip method of the present invention, owing to be provided with the parts that straight line moves and horizontally rotate parts, remover liquid nozzle is located on the displacement part of straight line, silicon chip is placed in to be done on the parts that horizontally rotate, and be provided with control assembly, this control assembly can be controlled shower nozzle according to the actual requirements and do synthetic speed change Archimedes spiral motion, this cleaning way can be accomplished not miss on each point of silicon chip and not repeat, and cleaning fluid can evenly effectively utilize, so, be equal under the condition of cleaning performance in assurance, the conventional cleaning device of ratio greatly reduces the damage ratio to the silicon chip striped, has improved quality and clear Xian's efficient of cleaning effectively.Device of the present invention has novel structure, and is easy and simple to handle, regulates flexibly, and cleaning performance is good, cleaning efficiency height, the particularly little advantage of silicon chip damage ratio.
Description of drawings
Fig. 1 is a structural representation of the present invention.
Specific embodiment
The present invention is described further below by embodiment: embodiment 1: a kind of method of cleaning single silicon-chip: mainly may further comprise the steps:
(1) is provided with washer fluid spraying apparatus ultrasonic or million acoustic generators: allocating power million acoustic generators that are as required, the nozzle and the supporting pipeline that can produce effective cleaning fluid jet 5mm are set, ultrasonic or million acoustic generators and nozzle are assembled together, and are fixedly installed on the movable stand; Described nozzle can move up and down, and the distance of nozzle and single silicon-chip is adjustable, and the surface of shower nozzle and single silicon-chip is 30-90 degree angle.
(2) assembling linear moving apparatus: give in the above-mentioned washer fluid spraying apparatus configuration and can do the linear moving apparatus that straight line moves, select Panasonic's servomotor for use, be equipped with the Omron servomechanism, this buncher drive washer fluid spraying apparatus is done radial alignment along the radius of single silicon-chip and is moved;
(3) single silicon-chip is set and horizontally rotates device: the single silicon-chip carriage is set, and the configuration level whirligig is selected Panasonic's servomotor for use, is equipped with the Omron servomechanism, and this buncher drive single silicon-chip is done on carriage and horizontally rotated;
(4) linear moving apparatus and the speed that horizontally rotates device are set:
If: the speed that linear motion device drive nozzle moves along the silicon chip radius is Vr, and unit is mm/s;
If: horizontally rotate device and drive single silicon-chip to do the speed that horizontally rotates motion be V ω, unit is radian/s;
If: the effective width of the jet of nozzle is a=5mm;
If: the cleaning fluid jet is r to the distance at single silicon-chip center, and unit is mm;
Concrete condition, the performance of cleaning fluid and the requirement of cleaning fluid jet pressure, cleaning quality and efficient according to the single silicon-chip that cleans are provided with washing speed, just when horizontally rotating the rotation of device drive silicon chip, linear moving apparatus is radially covered the speed of radius distance along single silicon-chip, be made as S=10mm/ second, the diameter of single silicon-chip is 200mm;
(5) set up equation:
V
r＝a×Vω
S, a, r are datum in the equation, and determined value is arranged; Vr, V ω are unknown number, try to achieve its value: Vr=50mm/r, V ω=Vr/5 by separating above-mentioned equation group, wherein r represents that the center with single silicon-chip is the radical length that initial point arrives current current position, and adopting the INTERPOLATION CONTROL OF PULSE motor that rotatablely moves is 1/5 of rectilinear motion motor speed;
(6) numerical value that solves according to the 5th step is set tachometer value respectively in the controller of straight line mobile motor and electric rotating machine, promptly adopts the mode of programming that institute's value is write electric machine controller;
(7) shower nozzle is placed the edge starting point of single silicon-chip, open cleaning fluid shower nozzle and power supply, finish cleaning process.
Embodiment 2: a kind of device that cleans the single silicon-chip method, mainly comprise cleaning chambers, displacement part of straight line, horizontally rotate parts and control assembly composition, described cleaning chambers 1 is the basin-like body of a upper shed, the centre is provided with the described parts that horizontally rotate, this rotary part is provided with a silicon wafer horizontal carriage 2, this carriage is provided with the fixedly bayonet lock 2.1 of silicon chip 5, carriage is in transmission connection with buncher A2.3 below by the connecting shaft 2.2 of hermetically passing cleaning chambers bottom, is provided with lift cylinder A2.4 below this buncher; Also has liquid outlet 1.1 in the bottom of cleaning chambers; Described displacement part of straight line is provided with a bracing frame 3.3, on this bracing frame, be provided with million acoustic energy generators 3 and remover liquid nozzle 3.1 that is assembled together with it and pipeline 3.2, this bracing frame is in transmission connection with buncher B3.5 by a connecting rod 3.4, is provided with lift cylinder B3.6 below these parts; Also be provided with the buncher A and the speed regulator control connection that horizontally rotates the buncher B of parts of a controller 4 and displacement part of straight line.
Use the apparatus of the present invention among the embodiment 2 to compare with the single silicon-chip cleaning device of the routine of cleaning not according to this track, under million identical acoustic energies, find with scanning electron microscopic observation, adopt the device of present embodiment to clean to not damage of striped on the silicon chip, and cleaning method that need not this track is reaching under the prerequisite of same cleaning performance, and is very big to the damage of the striped on the silicon chip.When million acoustic energies reduced, cleaning that need not this track can reduce the damage on the silicon chip, but can reduce cleaning performance, can leave a lot of residual particles dirts.So the cleaning method effect of this track is fine.
Claims (2)
1, a kind of cleaning method of single silicon-chip is characterized in that may further comprise the steps:
(1) is provided with washer fluid spraying apparatus ultrasonic or million acoustic generators: ultrasonic or million acoustic generators that are fit to of allocating power size as required, the nozzle and the supporting pipeline that can produce the effective cleaning fluid jet that is fit to are set, ultrasonic or million acoustic generators and nozzle are assembled together, and are fixedly installed on the movable stand; Described nozzle can move up and down, and the distance of nozzle and single silicon-chip is adjustable, and the surface of shower nozzle and single silicon-chip is 30-90 degree angle.
(2) assembling linear moving apparatus: give in the above-mentioned washer fluid spraying apparatus configuration and can do the linear moving apparatus that straight line moves, select buncher for use, be equipped with the precise rotation controller, this buncher drive washer fluid spraying apparatus is done radial alignment along the radius of single silicon-chip and is moved;
(3) single silicon-chip is set and horizontally rotates device: the single silicon-chip carriage is set, and the configuration level whirligig is selected buncher for use, is equipped with the precise rotation controller, and this buncher drive single silicon-chip is done on carriage and horizontally rotated;
(4) linear moving apparatus and the speed that horizontally rotates device are set:
If: the speed that linear motion device drive nozzle moves along the silicon chip radius is Vr, and unit is mm/s;
If: horizontally rotate device and drive single silicon-chip to do the speed that horizontally rotates motion be V ω, unit is radian/s;
If: the effective width of the jet of nozzle is a, and unit is mm;
If: the cleaning fluid jet is r to the distance at single silicon-chip center, and unit is mm;
Concrete condition, the performance of cleaning fluid and the requirement of cleaning fluid jet pressure, cleaning quality and efficient according to the single silicon-chip that cleans are provided with washing speed, just when horizontally rotating the rotation of device drive silicon chip, linear moving apparatus is radially covered the speed of radius distance along single silicon-chip, be made as S, unit is mm/s;
(5) set up equation:
V
r＝a?×Vω
S, a, r are datum in the equation, and determined value is arranged; Vr, V ω are unknown number, try to achieve its value by separating above-mentioned equation group.
(6) numerical value that solves according to the 5th step is set tachometer value respectively in the controller of straight line mobile motor and electric rotating machine;
(7) shower nozzle is placed the edge or the center initial point of single silicon-chip, open cleaning fluid shower nozzle and power supply, finish cleaning process.
2, a kind of device that cleans the single silicon-chip method according to claim 1, it is characterized in that: mainly comprise cleaning chambers, displacement part of straight line, horizontally rotating parts and control assembly forms, described cleaning chambers (1) is the basin-like body of a upper shed, the centre is provided with the described parts that horizontally rotate, this rotary part is provided with a silicon wafer horizontal carriage (2), this carriage is provided with the fixedly bayonet lock (2.1) of silicon chip (5), carriage is in transmission connection with buncher A (2.3) below by the connecting shaft (2.2) of hermetically passing cleaning chambers bottom, is provided with lift cylinder A (2.4) below this buncher; Also has liquid outlet (1.1) in the bottom of cleaning chambers; Described displacement part of straight line is provided with a bracing frame (3.3), on this bracing frame, be provided with ultrasonic or million acoustic energy generators (3) and remover liquid nozzle (3.1) that is assembled together with it and pipeline (3.2), this bracing frame is in transmission connection by a connecting rod (3.4) and buncher B (3.5), is provided with lift cylinder B (3.6) below these parts; Also be provided with the buncher A and the speed regulator control connection that horizontally rotates the buncher B of parts of a controller (4) and displacement part of straight line.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200710118905 CN101069888A (en) | 2007-06-14 | 2007-06-14 | Method and apparatus for washing single silicon-chip |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200710118905 CN101069888A (en) | 2007-06-14 | 2007-06-14 | Method and apparatus for washing single silicon-chip |
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Cited By (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102243670A (en) * | 2011-04-27 | 2011-11-16 | 北京七星华创电子股份有限公司 | Method and system for generating semiconductor process formula |
| CN102357481A (en) * | 2011-08-22 | 2012-02-22 | 深圳深爱半导体股份有限公司 | Mask spinning cleaning machine and cleaning method of mask |
| CN102359676A (en) * | 2011-09-26 | 2012-02-22 | 常州捷佳创精密机械有限公司 | Connecting device for tank-bottom drainage pipeline |
| CN101879511B (en) * | 2009-05-08 | 2013-01-02 | 盛美半导体设备（上海）有限公司 | Method and device for cleaning semiconductor silicon wafer |
| CN103586232A (en) * | 2013-11-14 | 2014-02-19 | 无锡南方声学工程有限公司 | Ultrasonic cleaning device applied to disc-shaped filter in polyester film industry |
| CN104377153A (en) * | 2014-11-18 | 2015-02-25 | 南通富士通微电子股份有限公司 | Wafer cleaner, nozzle, nozzle moving method and wafer moving method |
| CN105414084A (en) * | 2015-12-10 | 2016-03-23 | 北京七星华创电子股份有限公司 | Ultrasonic or mega-sonic oscillatory two-phase-flow atomization washing device and ultrasonic or mega-sonic oscillatory two-phase-flow atomization washing method |
| CN105436143A (en) * | 2015-11-24 | 2016-03-30 | 无锡普瑞腾传动机械有限公司 | Directional ultrasonic cleaning machine |
| CN104103559B (en) * | 2014-07-23 | 2017-01-04 | 济南晶博电子有限公司 | Clipping silicon chip coating whirler |
| CN108364884A (en) * | 2017-12-08 | 2018-08-03 | 中国电子科技集团公司第十三研究所 | semiconductor wafer megasonic cleaning device |
| CN108554889A (en) * | 2018-04-14 | 2018-09-21 | 安徽吉乃尔电器科技有限公司 | A kind of microelectronic component rotary cleaning device |
| CN110976377A (en) * | 2019-12-10 | 2020-04-10 | 谢广钦 | Ultrasonic cleaning device for wafer cleaning |
| CN114871199A (en) * | 2022-07-12 | 2022-08-09 | 江苏芯梦半导体设备有限公司 | Multi-frequency megasonic wave coupling wafer cleaning equipment and multi-frequency injection device |
| CN115090596A (en) * | 2022-07-12 | 2022-09-23 | 江苏芯梦半导体设备有限公司 | Wafer cleaning equipment and cleaning method based on megasonic technology |
-
2007
- 2007-06-14 CN CN 200710118905 patent/CN101069888A/en active Pending
Cited By (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101879511B (en) * | 2009-05-08 | 2013-01-02 | 盛美半导体设备（上海）有限公司 | Method and device for cleaning semiconductor silicon wafer |
| CN102243670A (en) * | 2011-04-27 | 2011-11-16 | 北京七星华创电子股份有限公司 | Method and system for generating semiconductor process formula |
| CN102357481A (en) * | 2011-08-22 | 2012-02-22 | 深圳深爱半导体股份有限公司 | Mask spinning cleaning machine and cleaning method of mask |
| CN102359676A (en) * | 2011-09-26 | 2012-02-22 | 常州捷佳创精密机械有限公司 | Connecting device for tank-bottom drainage pipeline |
| CN102359676B (en) * | 2011-09-26 | 2015-12-09 | 常州捷佳创精密机械有限公司 | A kind of connecting device for tank-bottom drainage pipeline |
| CN103586232A (en) * | 2013-11-14 | 2014-02-19 | 无锡南方声学工程有限公司 | Ultrasonic cleaning device applied to disc-shaped filter in polyester film industry |
| CN104103559B (en) * | 2014-07-23 | 2017-01-04 | 济南晶博电子有限公司 | Clipping silicon chip coating whirler |
| CN104377153A (en) * | 2014-11-18 | 2015-02-25 | 南通富士通微电子股份有限公司 | Wafer cleaner, nozzle, nozzle moving method and wafer moving method |
| CN105436143A (en) * | 2015-11-24 | 2016-03-30 | 无锡普瑞腾传动机械有限公司 | Directional ultrasonic cleaning machine |
| CN105414084A (en) * | 2015-12-10 | 2016-03-23 | 北京七星华创电子股份有限公司 | Ultrasonic or mega-sonic oscillatory two-phase-flow atomization washing device and ultrasonic or mega-sonic oscillatory two-phase-flow atomization washing method |
| CN108364884A (en) * | 2017-12-08 | 2018-08-03 | 中国电子科技集团公司第十三研究所 | semiconductor wafer megasonic cleaning device |
| CN108554889A (en) * | 2018-04-14 | 2018-09-21 | 安徽吉乃尔电器科技有限公司 | A kind of microelectronic component rotary cleaning device |
| CN110976377A (en) * | 2019-12-10 | 2020-04-10 | 谢广钦 | Ultrasonic cleaning device for wafer cleaning |
| CN114871199A (en) * | 2022-07-12 | 2022-08-09 | 江苏芯梦半导体设备有限公司 | Multi-frequency megasonic wave coupling wafer cleaning equipment and multi-frequency injection device |
| CN115090596A (en) * | 2022-07-12 | 2022-09-23 | 江苏芯梦半导体设备有限公司 | Wafer cleaning equipment and cleaning method based on megasonic technology |
| CN115090596B (en) * | 2022-07-12 | 2023-09-05 | 江苏芯梦半导体设备有限公司 | Wafer cleaning equipment and method based on megasonic technology |
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Open date: 20071114 |