CN101051190A - 光致抗蚀剂剥离装置、再循环光致抗蚀剂剥离剂的方法 - Google Patents

光致抗蚀剂剥离装置、再循环光致抗蚀剂剥离剂的方法 Download PDF

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Publication number
CN101051190A
CN101051190A CNA2007100898429A CN200710089842A CN101051190A CN 101051190 A CN101051190 A CN 101051190A CN A2007100898429 A CNA2007100898429 A CN A2007100898429A CN 200710089842 A CN200710089842 A CN 200710089842A CN 101051190 A CN101051190 A CN 101051190A
Authority
CN
China
Prior art keywords
remover
stripping
filter
filter unit
filtrator
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CNA2007100898429A
Other languages
English (en)
Chinese (zh)
Inventor
朴弘植
郑钟铉
洪瑄英
金俸均
申原硕
李炳珍
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Samsung Electronics Co Ltd
Original Assignee
Samsung Electronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samsung Electronics Co Ltd filed Critical Samsung Electronics Co Ltd
Publication of CN101051190A publication Critical patent/CN101051190A/zh
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D46/00—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Environmental & Geological Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
CNA2007100898429A 2006-04-05 2007-04-05 光致抗蚀剂剥离装置、再循环光致抗蚀剂剥离剂的方法 Pending CN101051190A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020060031098A KR20070099827A (ko) 2006-04-05 2006-04-05 Ｐｒ 스트리핑 장치, 이를 이용한 ｐｒ 스트리퍼 재사용방법 및 박막 트랜지스터 어레이 기판의 제조 방법
KR31098/06 2006-04-05

Publications (1)

Publication Number Publication Date
CN101051190A true CN101051190A (zh) 2007-10-10

Family

ID=38016621

Family Applications (1)

Application Number Title Priority Date Filing Date
CNA2007100898429A Pending CN101051190A (zh) 2006-04-05 2007-04-05 光致抗蚀剂剥离装置、再循环光致抗蚀剂剥离剂的方法

Country Status (4)

Country Link
US (1) US20070235132A1 (de)
EP (1) EP1843208A3 (de)
KR (1) KR20070099827A (de)
CN (1) CN101051190A (de)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108054119A (zh) * 2017-12-06 2018-05-18 深圳市华星光电半导体显示技术有限公司 用于剥离工艺的剥离液机台及其工作方法
CN111045301A (zh) * 2019-11-19 2020-04-21 Tcl华星光电技术有限公司 剥离液机台及其工作方法
CN113463426A (zh) * 2021-06-17 2021-10-01 江苏鑫源烟草薄片有限公司 一种剥离剂回收系统

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103055590A (zh) * 2011-10-20 2013-04-24 上海凡清环境工程有限公司 一种过滤系统
US9365063B1 (en) * 2015-03-09 2016-06-14 Xerox Corporation Systems and methods for continuous waste ink filtration in image forming devices

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5089217A (en) * 1990-11-26 1992-02-18 Westinghouse Electric Corp. Clean-up sub-system for chemical decontamination of nuclear reactor primary systems
US5531889A (en) * 1994-03-08 1996-07-02 Atotech Usa, Inc. Method and apparatus for removing resist particles from stripping solutions for printed wireboards
US6074561A (en) * 1995-10-23 2000-06-13 Phoenankh Corp. Apparatus and method for recovering photoresist developers and strippers
JP4028060B2 (ja) * 1998-01-14 2007-12-26 大日本印刷株式会社 レジスト剥離処理装置
US20070017879A1 (en) * 1998-12-03 2007-01-25 Stephen Proulx Filtration cartridge and process for filtering a slurry
US6861371B2 (en) * 2001-11-05 2005-03-01 Tokyo Electron Limited Substrate processing system and substrate processing method
JP4678665B2 (ja) * 2001-11-15 2011-04-27 東京エレクトロン株式会社 基板処理方法および基板処理装置
JP2004327962A (ja) * 2003-04-07 2004-11-18 Matsushita Electric Ind Co Ltd レジストの剥離装置及び剥離方法
TW570293U (en) * 2003-05-26 2004-01-01 Toppoly Optoelectronics Corp Wet etching device
JP3884440B2 (ja) * 2004-03-15 2007-02-21 株式会社東芝 フィルタおよび半導体処理装置
US20060027492A1 (en) * 2004-08-06 2006-02-09 Lin Mao C Filter mechanism
US20070272327A1 (en) * 2006-04-27 2007-11-29 Applied Materials, Inc. Chemical dispense system

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108054119A (zh) * 2017-12-06 2018-05-18 深圳市华星光电半导体显示技术有限公司 用于剥离工艺的剥离液机台及其工作方法
CN111045301A (zh) * 2019-11-19 2020-04-21 Tcl华星光电技术有限公司 剥离液机台及其工作方法
WO2021098002A1 (zh) * 2019-11-19 2021-05-27 Tcl华星光电技术有限公司 剥离液机台及其工作方法
US11747734B2 (en) 2019-11-19 2023-09-05 Tcl China Star Optoelectronics Technology Co., Ltd. Stripping-solution machine and working method thereof
CN113463426A (zh) * 2021-06-17 2021-10-01 江苏鑫源烟草薄片有限公司 一种剥离剂回收系统

Also Published As

Publication number Publication date
KR20070099827A (ko) 2007-10-10
US20070235132A1 (en) 2007-10-11
EP1843208A2 (de) 2007-10-10
EP1843208A3 (de) 2011-09-07

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Open date: 20071010