CN101005196A - Two dimension array integrated module of wavelength selective distribution feedback laser - Google Patents
Two dimension array integrated module of wavelength selective distribution feedback laser Download PDFInfo
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- CN101005196A CN101005196A CN 200610001812 CN200610001812A CN101005196A CN 101005196 A CN101005196 A CN 101005196A CN 200610001812 CN200610001812 CN 200610001812 CN 200610001812 A CN200610001812 A CN 200610001812A CN 101005196 A CN101005196 A CN 101005196A
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Abstract
Using indium phosphide / indium - gallium - arsenic - phosphor material system, the IC module of 2D array of laser includes optical amplifier, Y type coupler, and 2 * 2 distributed feedback laser array connected in sequence. The 2 * 2 distributed feedback laser array prepares four Bragg gratings with different cycles arranged in 2 * 2 matrixes on up waveguide layer. Advantages of the invention are that four selectable wavelengths with wavelength interval as 20nm are provided to meet requirement of channel interval in rarefaction wavelength division multiplex. Comparing with traditional technique for opto-electronic integrative module, the disclosed preparation technique is equable simple, convenience, easy of operation. Moreover, the disclosed integrative module is easy to be integrated to other opto-electronic devices such as modulator, and pattern converter etc.
Description
Technical field
The present invention relates to semiconductor optoelectronic integrated technology field, particularly a kind of two dimension array integrated module of wavelength selective distribution feedback laser.
Background technology
Current optical fiber telecommunications system adopts wavelength-division multiplex technique, and it is metropolitan area network, fiber-to-the-home important multiplex technique that rarefaction wave divides multiplex technique (CWDM).Simple, cost is low to be the basic demand that is used for the photoelectric device of rarefaction wave branch multiplexed communications network.In the standard that ITU-T formulates, the channel multiplexing of rarefaction wave branch multiplexed communications network is the wide 20nm that reaches at interval, require light source to have the wavelength selectivity of 20nm at interval, and cost is low, stable performance.The semiconductor optoelectronic integrated package is because of its photoelectric conversion efficiency height, and volume is little, and cost is low, and is little with optical fiber coupling loss, is widely used in the optical fiber telecommunications system.Distributed feedback laser (DFB) swashs the line width of penetrating spectrum, and dynamically unimodular property is good, is used as the active device of integrated package more.Traditional Distributed Feedback Laser is manufactured with evenly or the Bragg grating of phase shift, is operated in stable single mode state, does not have wavelength selectivity, can not be used alone as the light source of rarefaction wave division multiplexing system.The website of Lasermate group company
Www.lasermate.comWebsite with Thorlabs company
Www.thorlabs.comAnd other company provides the distributed feedback laser assembly that divides the multiplex communication system light source as rarefaction wave.This assembly is made up of discrete distributed feedback laser.Corresponding rarefaction wave divides multiplexing standard channel, the excitation wavelength difference of unit laser, and each is 20nm at interval.The complex manufacturing technology of this laser assembly, cost are higher relatively, and the volume of assembly is bigger.Proposed a kind of single chip integrated 12 dfb laser array in the document 1 (Proceedings of OFC2002, ThGG71,711), this array includes 12 distributed-feedback Prague lasers arranged side by side.The grating of 12 different cycles adopts expensive electron beam scanning exposure to make its complex process cost height.The encapsulating structure of this device adopts mixing integrated, uses external coupler and optical isolator, compares with single chip integrated assembly, and the high volume of cost is big.Propose another single chip integrated 6 dfb laser array in the document 2 (IEEE P.T.L., 11,1999,51), adopted electron beam exposure system to make grating, cost height equally.And the output wavelength of these two kinds of devices only has several nanometers at interval, does not meet rarefaction wave and divides multiplexing channel spacing standard (20nm), is not suitable for rarefaction wave branch multipurpose photo-communication system.
Summary of the invention
The objective of the invention is, overcome the deficiencies in the prior art, divide the requirement of multipurpose photo-communication system at rarefaction wave to light source, provide a kind of channel spacing wide (the ITU-T standard is 20nm), stable performance, manufacture craft is simple, and cost is low, the two dimension array integrated module of wavelength selective distribution feedback laser that cost performance is high.
For achieving the above object, two dimension array integrated module of wavelength selective distribution feedback laser provided by the invention, adopt indium phosphide/InGaAsP material system, it is characterized in that, comprise the image intensifer, Y type coupler and the 2*2 distributed feedback laser array that connect successively;
Described 2*2 distributed feedback laser array from bottom to top comprises indium phosphide substrate resilient coating 1, lower waveguide layer InGaAsP 2, indium gallium arsenic/indium-gallium-arsenic-phosphor multiple quantum well layer 3, corresponding band gap wavelength 1.55um, last ducting layer InGaAsP 4, indium phosphide cap rock 5, indium gallium arsenic contact layer 6 and metal electrode 8, wherein, on last ducting layer, be manufactured with the Bragg grating of four different cycles of 2*2 arranged;
Described Y type coupler from bottom to top comprises indium phosphide substrate resilient coating 1, lower waveguide layer InGaAsP 2, indium gallium arsenic/indium-gallium-arsenic-phosphor multiple quantum well layer 3, corresponding band gap wavelength 1.3um, last ducting layer InGaAsP 4, indium phosphide cap rock 5, indium gallium arsenic contact layer 6, two branches of this Y type coupler output are connected with 2*2 distributed feedback laser array, and input is connected with image intensifer;
Described image intensifer from bottom to top comprises: indium phosphide substrate resilient coating 1, lower waveguide layer InGaAsP 2, indium gallium arsenic/indium-gallium-arsenic-phosphor multiple quantum well layer 3, corresponding band gap wavelength 1.5um, last ducting layer InGaAsP 4, indium phosphide cap rock 5, indium gallium arsenic contact layer 6, metal electrode 8.
In the technique scheme, described 2*2 distributed feedback laser array, its indium phosphide cap rock 5, indium gallium arsenic contact layer 6 is made into two parallel bar shaped ridge waveguides; Wherein, make two metal electrodes 8 on the ridge waveguide, correspond respectively to two Bragg gratings, also make two metal electrodes 8 on another ridge waveguide, correspond respectively to two other Bragg grating, all carry out electricity between two metal electrodes of each ridge waveguide and isolate with silica medium film 7.
In the technique scheme, described Y type coupler, its indium phosphide cap rock 5, the ridge waveguide that indium gallium arsenic contact layer 6 is made into " Y " shape.
In the technique scheme, described image intensifer, its indium phosphide cap rock 5, indium gallium arsenic contact layer 6 is made into the bar shaped ridge waveguide, is connected with the input of Y type coupler; Its metal electrode 8 is produced on this bar shaped ridge waveguide, carries out electricity with silica medium film 7 between metal electrode and the Y type coupler and isolates.
In the technique scheme, the width of described ridge waveguide is 2um.
In the technique scheme, the bar shaped ridge waveguide length of described image intensifer is between 350-500um.
In the technique scheme, the ridge waveguide length of " Y " shape of described Y type coupler is between 250-400um.
In the technique scheme, two bar shaped ridge waveguide length of described 2*2 distributed feedback laser array are all between 550-650um; The interval of two bar shaped ridge waveguide length of described 2*2 distributed feedback laser array is between 100-150um.
The invention provides a kind of have the 2*2 distributed feedback laser array of wavelength selectivity and the integrated package of image intensifer.This assembly ducting layer on waveguiding structure is made the 2*2 matrix Bragg grating with different cycles, and is integrated by Y type coupler and semiconductor optical amplifier.The electrode of answering for different grating pairs is distinguished injection current when threshold current is above, and four optional wavelength can be provided, and the wavelength interval is 20nm, satisfies rarefaction wave and divides multiplexing channel spacing requirement.The manufacture craft of the manufacture craft of this assembly and traditional photoelectricity integrated package is the same simple and convenient, easy operating, and easily and other semiconductor photoelectric device such as modulator, spot-size converter etc. are integrated.
Description of drawings
Fig. 1 is the structure chart of two dimension array integrated module of wavelength selective distribution feedback laser of the present invention;
Fig. 2 is the transverse interface figure of integrated package of the present invention;
Fig. 3 is the top level diagram of integrated package of the present invention.
Embodiment
The invention will be further described below in conjunction with drawings and the specific embodiments.
Material system of the present invention is indium phosphide/InGaAsP system.
Two dimension array integrated module of wavelength selective distribution feedback laser provided by the invention comprises image intensifer, Y type coupler, the 2*2 distributed feedback laser array that connects successively.A partly is a 2*2 distributed feedback laser array among Fig. 1, and B partly is a Y type coupler, and C partly is an image intensifer.Three parts forming assembly of the present invention are described respectively below.
A part 2*2 distributed feedback laser array from bottom to top comprises: indium phosphide substrate resilient coating 1, lower waveguide layer InGaAsP 2, indium gallium arsenic/indium-gallium-arsenic-phosphor multiple quantum well layer 3, corresponding band gap wavelength 1.55um, last ducting layer InGaAsP 4, indium phosphide cap rock 5, indium gallium arsenic contact layer 6 and metal electrode 8.Wherein, on last ducting layer, be manufactured with the Bragg grating of four different cycles of 2*2 arranged.Indium phosphide cap rock 5, indium gallium arsenic contact layer 6 is made into two parallel bar shaped ridge waveguides.Wherein, make two metal electrodes 8 on the ridge waveguide, correspond respectively to two Bragg gratings, also make two metal electrodes 8 on another ridge waveguide, correspond respectively to two other Bragg grating.All carrying out electricity with silica medium film 7 between two metal electrodes of each ridge waveguide isolates.Bar shaped ridge waveguide width 2um wherein, all between 550-650um, the interval between them is between 100-150um for two bar shaped ridge waveguide length.
B part Y type coupler from bottom to top comprises: indium phosphide substrate resilient coating 1, lower waveguide layer InGaAsP 2, indium gallium arsenic/indium-gallium-arsenic-phosphor multiple quantum well layer 3, corresponding band gap wavelength 1.3um, last ducting layer InGaAsP 4, indium phosphide cap rock 5, indium gallium arsenic contact layer 6.Wherein, indium phosphide cap rock 5, the ridge waveguide that indium gallium arsenic contact layer 6 is made into " Y " shape is called Y type coupled waveguide.Two branches of this Y type coupled waveguide output are connected with two bar shaped ridge waveguides of 2*2 distributed feedback laser array respectively, and input is connected with image intensifer.The ridge waveguide width of " Y " shape is 2um, and length is between 250-400um.
C part image intensifer from bottom to top comprises: indium phosphide substrate resilient coating 1, lower waveguide layer InGaAsP 2, indium gallium arsenic/indium-gallium-arsenic-phosphor multiple quantum well layer 3, corresponding band gap wavelength 1.5um, last ducting layer InGaAsP 4, indium phosphide cap rock 5, indium gallium arsenic contact layer 6, metal electrode 8.Wherein, indium phosphide cap rock 5, indium gallium arsenic contact layer 6 is made into the bar shaped ridge waveguide, is connected with the input of Y type coupler.Metal electrode 8 is produced on this bar shaped ridge waveguide, carries out electricity with silica medium film 7 between metal electrode and the Y type coupler and isolates.Wherein, bar shaped ridge waveguide length is between 350-500um.
In the present embodiment, whole length component is 1480um.Wherein active part comprises distributed feedback laser, and semiconductor optical amplifier, passive part are Y type couplers.Distributed feedback laser and image intensifer are the ridge waveguide strip structure, the wide 2um of ridge, every section long 300um of grating in the distributed feedback laser array, the long 500um of image intensifer.The long 350um of Y type coupler, two branches are spaced apart 125um, duct width 2um.Between two lasers of each bar shaped ridge waveguide of 2*2 distributed feedback laser array the 50um isolation channel is arranged all, also be shaped on the isolation channel of 50um between Y type coupler and the image intensifer.Isolation channel be manufactured with two steps: at first corrode indium gallium arsenic contact layer 6, then at groove internal heating oxidation growthing silica deielectric-coating 7, the electricity of finishing between the each several part is isolated.
The waveguiding structure of whole assembly is finished by twice material epitaxy growth.Indium phosphide substrate resilient coating 1, lower waveguide layer InGaAsP 2, indium gallium arsenic/indium-gallium-arsenic-phosphor multiple quantum well layer 3, last ducting layer InGaAsP 4 are finished by the epitaxial growth first time (metal organic chemical vapor deposition).(this method is described in detail in another patent application " manufacture method of same semiconductor chip different cycles holographic grating " of the applicant to adopt improved holographic exposure method, the application number of this patent application is 200410088728.0, date of application is on November 1st, 04) behind the Bragg grating of four different cycles making the 2*2 arranged on the last ducting layer, secondary epitaxy growth indium phosphide cap rock 5 and indium gallium arsenic contact layer 6.Then adopt photoetching and etching to make ridge waveguide and Y type coupled waveguide, behind the thermal oxide growth silica medium film 7, leave electrode window through ray.Vacuum sputtering electrode layer 8, photoetching are finished the making of electrode pattern.At the process substrate thinning, after the technical processs such as backplate, entire device completes.
The Bragg grating of different cycles in the 2*2 array adopts improved holographic exposure method to be produced on the ducting layer InGaAsP 4, as accompanying drawing 2, shown in Figure 3.Wherein P1 is the cycle 235.2nm of first grating, corresponding bragg wavelength 1.51um, P2 is the cycle 238.3nm of second grating, corresponding bragg wavelength 1.53um, P3 is the cycle 241.4nm of the 3rd grating, corresponding bragg wavelength 1.55um, P4 is the cycle 244.5nm of the 4th grating, corresponding bragg wavelength 1.57um.The arrangement mode of the grating of four different cycles adopts the mode shown in the accompanying drawing 3, and wherein in two branch-waveguides, the grating of longer wavelength correspondence all is put in the back segment of array, and the grating of shorter wavelength correspondence is put in the leading portion of array, directly and the waveguide of Y type join.The wavelength interval that grating pair is answered before and after each branch-waveguide is 40nm.The wavelength interval that the grating pair of two parallel waveguide correspondence positions parallel to each other is answered is 20nm.Take this arrangement mode can reduce crosstalking between four Bragg gratings, guarantee the unimodular property of four excitation wavelengths.
The manufacture craft of this assembly is along the manufacture craft of holding traditional distributed feedback laser, and use equipment is simple, and is easy to operate, and cost of manufacture is low.Simultaneously, manufacture craft and semiconductor technology compatibility can be easily and semiconductor modulator, and spot-size converter etc. are integrated, are applicable in the Networks of Fiber Communications.
Claims (8)
1, a kind of two dimension array integrated module of wavelength selective distribution feedback laser adopts indium phosphide/InGaAsP material system to make, and comprises the distributed feedback laser array, it is characterized in that, also comprises the image intensifer, the Y type coupler that connect successively; Described distributed feedback laser array is a 2*2 distributed feedback laser array, and its input is connected with the output of Y type coupler;
Described 2*2 distributed feedback laser array from bottom to top comprises indium phosphide substrate resilient coating (1), lower waveguide layer InGaAsP (2), indium gallium arsenic/indium-gallium-arsenic-phosphor multiple quantum well layer (3), corresponding band gap wavelength 1.55um, last ducting layer InGaAsP (4), indium phosphide cap rock (5), indium gallium arsenic contact layer (6) and metal electrode (8), wherein, on last ducting layer, be manufactured with the Bragg grating of four different cycles of 2*2 arranged;
Described Y type coupler from bottom to top comprises indium phosphide substrate resilient coating (1), lower waveguide layer InGaAsP (2), indium gallium arsenic/indium-gallium-arsenic-phosphor multiple quantum well layer (3), corresponding band gap wavelength 1.3um, last ducting layer InGaAsP (4), indium phosphide cap rock (5), indium gallium arsenic contact layer (6), two branches of this Y type coupler output are connected with 2*2 distributed feedback laser array, and input is connected with image intensifer;
Described image intensifer from bottom to top comprises: indium phosphide substrate resilient coating (1), lower waveguide layer InGaAsP (2), indium gallium arsenic/indium-gallium-arsenic-phosphor multiple quantum well layer (3), corresponding band gap wavelength 1.5um, last ducting layer InGaAsP (4), indium phosphide cap rock (5), indium gallium arsenic contact layer (6), metal electrode (8).
2, by the described two dimension array integrated module of wavelength selective distribution feedback laser of claim 1, it is characterized in that the indium phosphide cap rock (5) of described 2*2 distributed feedback laser array, indium gallium arsenic contact layer (6) are made into two parallel bar shaped ridge waveguides; Wherein, make two metal electrodes (8) on the ridge waveguide, correspond respectively to two Bragg gratings, also make two metal electrodes (8) on another ridge waveguide, correspond respectively to two other Bragg grating, all use silica medium film (7) to carry out electricity between two metal electrodes of each ridge waveguide and isolate.
3, by the described two dimension array integrated module of wavelength selective distribution feedback laser of claim 1, it is characterized in that the indium phosphide cap rock (5) of described Y type coupler, the ridge waveguide that indium gallium arsenic contact layer (6) is made into " Y " shape.
4, by the described two dimension array integrated module of wavelength selective distribution feedback laser of claim 1, it is characterized in that, the indium phosphide cap rock (5) of described image intensifer, indium gallium arsenic contact layer (6) is made into the bar shaped ridge waveguide, is connected with the input of Y type coupler; The metal electrode of described image intensifer (8) is produced on this bar shaped ridge waveguide, carries out electricity with silica medium film (7) between metal electrode and the Y type coupler and isolates.
5, by claim 2 or 4 described two dimension array integrated module of wavelength selective distribution feedback laser, it is characterized in that the width of described ridge waveguide is 2um.
6, by the described two dimension array integrated module of wavelength selective distribution feedback laser of claim 4, it is characterized in that the bar shaped ridge waveguide length of described image intensifer is between 350-500um.
7, by the described two dimension array integrated module of wavelength selective distribution feedback laser of claim 3, it is characterized in that the ridge waveguide length of " Y " shape of described Y type coupler is between 250-400um.
8, by the described two dimension array integrated module of wavelength selective distribution feedback laser of claim 2, it is characterized in that two bar shaped ridge waveguide length of described 2*2 distributed feedback laser array are all between 550-650um; The interval of two bar shaped ridge waveguide length of described 2*2 distributed feedback laser array is between 100-150um.
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101938083A (en) * | 2010-07-14 | 2011-01-05 | 中国科学院半导体研究所 | Manufacture method of bi-distributed feedback laser double-amplifier based on gamma waveguide |
| CN102725925A (en) * | 2011-12-30 | 2012-10-10 | 华为技术有限公司 | Tunable laser, optical network device and optical network system |
| CN105826814A (en) * | 2016-05-19 | 2016-08-03 | 中国科学院半导体研究所 | Method of preparing indium phosphide-based narrow-ridge waveguide semiconductor laser |
| WO2017152401A1 (en) * | 2016-03-09 | 2017-09-14 | 华为技术有限公司 | Optical amplifier |
| CN111326950A (en) * | 2020-03-03 | 2020-06-23 | 中国科学院半导体研究所 | Dual-wavelength tunable semiconductor laser based on electrode grating |
Families Citing this family (1)
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| JP6213103B2 (en) * | 2013-09-27 | 2017-10-18 | 三菱電機株式会社 | Semiconductor optical device and optical module |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| US5536085A (en) * | 1995-03-30 | 1996-07-16 | Northern Telecom Limited | Multi-wavelength gain-coupled distributed feedback laser array with fine tunability |
| SE507376C2 (en) * | 1996-09-04 | 1998-05-18 | Ericsson Telefon Ab L M | Wavelength tunable laser device |
| JP2001339117A (en) * | 2000-03-22 | 2001-12-07 | Nec Corp | Modulator-integrated wavelength selective light source and its control method |
| CN1333500C (en) * | 2005-07-27 | 2007-08-22 | 清华大学 | Multi-sectional-distribution feedback semiconductor laser |
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Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101938083A (en) * | 2010-07-14 | 2011-01-05 | 中国科学院半导体研究所 | Manufacture method of bi-distributed feedback laser double-amplifier based on gamma waveguide |
| CN102725925A (en) * | 2011-12-30 | 2012-10-10 | 华为技术有限公司 | Tunable laser, optical network device and optical network system |
| WO2013097200A1 (en) * | 2011-12-30 | 2013-07-04 | 华为技术有限公司 | Adjustable laser, optical network device and optical network system |
| WO2017152401A1 (en) * | 2016-03-09 | 2017-09-14 | 华为技术有限公司 | Optical amplifier |
| CN108701968A (en) * | 2016-03-09 | 2018-10-23 | 华为技术有限公司 | A kind of image intensifer |
| CN108701968B (en) * | 2016-03-09 | 2021-03-23 | 华为技术有限公司 | Optical amplifier |
| CN105826814A (en) * | 2016-05-19 | 2016-08-03 | 中国科学院半导体研究所 | Method of preparing indium phosphide-based narrow-ridge waveguide semiconductor laser |
| CN111326950A (en) * | 2020-03-03 | 2020-06-23 | 中国科学院半导体研究所 | Dual-wavelength tunable semiconductor laser based on electrode grating |
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