CN100541115C - 外观检查装置和方法 - Google Patents
外观检查装置和方法 Download PDFInfo
- Publication number
- CN100541115C CN100541115C CNB2006800014370A CN200680001437A CN100541115C CN 100541115 C CN100541115 C CN 100541115C CN B2006800014370 A CNB2006800014370 A CN B2006800014370A CN 200680001437 A CN200680001437 A CN 200680001437A CN 100541115 C CN100541115 C CN 100541115C
- Authority
- CN
- China
- Prior art keywords
- mentioned
- focal point
- rotating mirror
- polygonal rotating
- scanning direction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/89—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
- G01N21/8901—Optical details; Scanning details
- G01N21/8903—Optical details; Scanning details using a multiple detector array
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/30—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Textile Engineering (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP116869/2005 | 2005-04-14 | ||
JP2005116869 | 2005-04-14 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101080608A CN101080608A (zh) | 2007-11-28 |
CN100541115C true CN100541115C (zh) | 2009-09-16 |
Family
ID=37115039
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB2006800014370A Expired - Fee Related CN100541115C (zh) | 2005-04-14 | 2006-04-12 | 外观检查装置和方法 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP4874103B2 (ja) |
KR (1) | KR101204585B1 (ja) |
CN (1) | CN100541115C (ja) |
DE (1) | DE112006000841T5 (ja) |
WO (1) | WO2006112315A1 (ja) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5146636B2 (ja) * | 2007-01-31 | 2013-02-20 | 株式会社ブイ・テクノロジー | 高さ測定装置 |
CN101349550B (zh) * | 2008-08-26 | 2010-06-09 | 浙江大学 | 在线橡胶栓外形质量检查机 |
DE102011083421A1 (de) * | 2011-09-26 | 2013-03-28 | Siemens Aktiengesellschaft | Verfahren und Vorrichtung zum Vermessen homogen reflektierender Oberflächen |
CA2995228A1 (en) * | 2015-08-21 | 2017-03-02 | Adcole Corporation | Optical profiler and methods of use thereof |
JP6806139B2 (ja) * | 2016-03-30 | 2021-01-06 | 株式会社ニコン | ビーム走査装置およびパターン描画装置 |
CN105783778B (zh) * | 2016-04-27 | 2018-04-17 | 中国科学院云南天文台 | 基于激光扫描法的非接触光学镜面检测系统及其检测方法 |
CN106705881A (zh) * | 2016-12-12 | 2017-05-24 | 哈尔滨工业大学 | 基于共聚焦显微原理的大口径光学元件母线轮廓测量方法 |
JP6829992B2 (ja) * | 2016-12-28 | 2021-02-17 | 株式会社キーエンス | 光走査高さ測定装置 |
CN106839978B (zh) * | 2016-12-29 | 2019-04-19 | 贵州虹轴轴承有限公司 | 一种轴承套圈外壁加工精度检测装置 |
CN106767468B (zh) * | 2016-12-29 | 2019-03-01 | 贵州虹轴轴承有限公司 | 一种轴承套圈外壁精度检测装置 |
CN109443243A (zh) * | 2018-12-19 | 2019-03-08 | 孙志军 | 一种测量物体形状的设备和测量方法 |
CN110186391A (zh) * | 2019-05-22 | 2019-08-30 | 浙江大学 | 一种三维模型梯度扫描方法 |
CA3155008A1 (en) * | 2019-09-18 | 2021-03-25 | DWFritz Automation, Inc. | Non-contact optical measurement devices and exchangeable optical probes |
CN113251949B (zh) * | 2021-06-18 | 2021-11-30 | 三代光学科技(天津)有限公司 | 一种微透镜阵列面形的单点光学测量路径生成方法 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4689491A (en) * | 1985-04-19 | 1987-08-25 | Datasonics Corp. | Semiconductor wafer scanning system |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS51122462A (en) | 1975-03-31 | 1976-10-26 | Canon Kk | Measuring apparatus |
JPS5662219A (en) * | 1979-10-26 | 1981-05-28 | Shinko Electric Co Ltd | Mirror for laser beam scanning |
JPH1137723A (ja) | 1997-07-23 | 1999-02-12 | Fujitsu Ltd | 高さ検査装置 |
JP2958456B1 (ja) * | 1998-06-25 | 1999-10-06 | 防衛庁技術研究本部長 | 走行車両の距離測定装置 |
-
2006
- 2006-04-12 DE DE112006000841T patent/DE112006000841T5/de not_active Withdrawn
- 2006-04-12 CN CNB2006800014370A patent/CN100541115C/zh not_active Expired - Fee Related
- 2006-04-12 KR KR1020077013254A patent/KR101204585B1/ko not_active IP Right Cessation
- 2006-04-12 WO PCT/JP2006/307722 patent/WO2006112315A1/ja active Application Filing
- 2006-04-12 JP JP2006528335A patent/JP4874103B2/ja not_active Expired - Fee Related
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4689491A (en) * | 1985-04-19 | 1987-08-25 | Datasonics Corp. | Semiconductor wafer scanning system |
Also Published As
Publication number | Publication date |
---|---|
WO2006112315A1 (ja) | 2006-10-26 |
KR20070120086A (ko) | 2007-12-21 |
JP4874103B2 (ja) | 2012-02-15 |
DE112006000841T5 (de) | 2008-02-28 |
CN101080608A (zh) | 2007-11-28 |
KR101204585B1 (ko) | 2012-11-23 |
JPWO2006112315A1 (ja) | 2008-12-11 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C17 | Cessation of patent right | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20090916 Termination date: 20140412 |