CN100535590C - 基板测定装置 - Google Patents
基板测定装置 Download PDFInfo
- Publication number
- CN100535590C CN100535590C CNB2006100772445A CN200610077244A CN100535590C CN 100535590 C CN100535590 C CN 100535590C CN B2006100772445 A CNB2006100772445 A CN B2006100772445A CN 200610077244 A CN200610077244 A CN 200610077244A CN 100535590 C CN100535590 C CN 100535590C
- Authority
- CN
- China
- Prior art keywords
- objective table
- mentioned
- table portion
- substrate
- support
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 210000002469 basement membrane Anatomy 0.000 title claims description 31
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 claims abstract description 34
- 239000000758 substrate Substances 0.000 claims description 78
- 238000010521 absorption reaction Methods 0.000 claims description 11
- 230000000881 depressing effect Effects 0.000 abstract 1
- 239000002184 metal Substances 0.000 description 12
- 238000010586 diagram Methods 0.000 description 6
- 229910000831 Steel Inorganic materials 0.000 description 5
- 239000004973 liquid crystal related substance Substances 0.000 description 5
- 239000010959 steel Substances 0.000 description 5
- 230000005540 biological transmission Effects 0.000 description 3
- 239000011521 glass Substances 0.000 description 2
- 230000003760 hair shine Effects 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- 230000008602 contraction Effects 0.000 description 1
- 230000003467 diminishing effect Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8806—Specially adapted optical and illumination features
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68778—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by supporting substrates others than wafers, e.g. chips
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N2021/9513—Liquid crystal panels
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Biochemistry (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Health & Medical Sciences (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Analytical Chemistry (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Length Measuring Devices With Unspecified Measuring Means (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- A Measuring Device Byusing Mechanical Method (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005156507 | 2005-05-30 | ||
JP2005156507A JP2006329895A (ja) | 2005-05-30 | 2005-05-30 | 基板測定装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1873373A CN1873373A (zh) | 2006-12-06 |
CN100535590C true CN100535590C (zh) | 2009-09-02 |
Family
ID=37483910
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB2006100772445A Expired - Fee Related CN100535590C (zh) | 2005-05-30 | 2006-04-28 | 基板测定装置 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP2006329895A (ko) |
KR (1) | KR100730450B1 (ko) |
CN (1) | CN100535590C (ko) |
TW (1) | TWI285728B (ko) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102997795B (zh) * | 2012-12-03 | 2015-10-21 | 京东方科技集团股份有限公司 | 一种摩擦装置和整机设备 |
CN105717154A (zh) * | 2016-05-05 | 2016-06-29 | 东旭科技集团有限公司 | 用于测量板材收缩率的装置和方法 |
KR102390357B1 (ko) * | 2016-06-23 | 2022-04-22 | 니폰 덴키 가라스 가부시키가이샤 | 유리 기판 왜곡 측정 방법 및 유리 기판 왜곡 측정 장치 |
JP6889216B2 (ja) * | 2017-10-16 | 2021-06-18 | ファナック株式会社 | 作業システム |
JP7153231B2 (ja) * | 2018-12-21 | 2022-10-14 | 日本電気硝子株式会社 | ガラス板の撓み測定装置及びガラス板の製造方法 |
CN109813237A (zh) * | 2019-01-28 | 2019-05-28 | 广东拓斯达科技股份有限公司 | 玻璃厚度检测装置 |
EP4060671A4 (en) * | 2019-11-12 | 2023-01-04 | Panasonic Intellectual Property Management Co., Ltd. | POSITIONING DEVICE |
KR102262532B1 (ko) * | 2021-02-05 | 2021-06-07 | 박덕식 | 철도차량 하부장비 검수장치 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58187710U (ja) * | 1982-06-08 | 1983-12-13 | 東芝機械株式会社 | 刷版の絵柄面積率測定装置 |
JP3221823B2 (ja) * | 1995-11-24 | 2001-10-22 | キヤノン株式会社 | 投影露光装置およびこれを用いた露光方法ならびに半導体製造方法 |
JPH11211615A (ja) * | 1998-01-21 | 1999-08-06 | Micronics Japan Co Ltd | 表示パネル用基板の検査装置 |
JP2001358204A (ja) * | 2000-06-15 | 2001-12-26 | Tokyo Electron Ltd | 検査ステージ |
JP2003014649A (ja) * | 2001-06-27 | 2003-01-15 | Hitachi Kokusai Electric Inc | 板状物体検査装置 |
KR100479904B1 (ko) * | 2002-06-29 | 2005-03-30 | 삼성테크윈 주식회사 | 부품 검사 장치 |
KR100538003B1 (ko) * | 2003-04-30 | 2005-12-20 | 주식회사 이오테크닉스 | 레이저 시스템의 x-y 스테이지의 이동오차 보정방법 및그 장치 |
-
2005
- 2005-05-30 JP JP2005156507A patent/JP2006329895A/ja not_active Abandoned
-
2006
- 2006-04-10 TW TW095112661A patent/TWI285728B/zh not_active IP Right Cessation
- 2006-04-28 CN CNB2006100772445A patent/CN100535590C/zh not_active Expired - Fee Related
- 2006-05-01 KR KR1020060039305A patent/KR100730450B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR100730450B1 (ko) | 2007-06-19 |
CN1873373A (zh) | 2006-12-06 |
TWI285728B (en) | 2007-08-21 |
JP2006329895A (ja) | 2006-12-07 |
TW200702628A (en) | 2007-01-16 |
KR20060124563A (ko) | 2006-12-05 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C17 | Cessation of patent right | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20090902 Termination date: 20110428 |