CN101657892B - 以处理级台耦接机构实施的样本检查级台 - Google Patents
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Abstract
一种以处理级台耦接机构(429)实施的样本检查级台(400)提供以下性能:以最大的效率在处理平台(10)线上进行后处理样本检查。沉重的检查装备(408)被安装于一个与处理平台(22)分开的样本检查级台上。在较佳实例中,处理级台回应于施加的推动力而移动,且在样本上执行基于激光的处理操作。虽然正在进行激光处理,但是样本检查级台仍旧停留于其收容位置。当是要进行后处理检查的时间时,级台的耦接与解耦机构将样本检查级台与样本处理级台耦接在一起,而将样本检查级运送到及运送离开样本位置。
Description
相关申请案
本发明为2007年2月20日提出申请的美国专利申请案第11/676,937号的部分连续申请案,且主张2007年2月20日提出申请的美国临时专利申请案第60/890,807号的利益。
技术领域
本发明内容关于一种样本处理系统,且特别是关于达成样本处理与检查时的操作效率。
背景技术
建构成用于使用在半导体晶片等级的加工处理的晶片运送系统一般包括一级台,此级台具有一个紧固晶片以便加工的夹头。有时候,此级台是静止的,而有时候它是可移动的。一些应用情形需要使级台在有旋转或没有旋转的情况下于笛卡儿座标系统的一维、二维或三维座标中线性地移动。假如总加工时间的很大部分的时间是耗费在对准及运送晶片的话,则级台运动的速度可能会支配整个晶片加工平台的生产量。
一些系统具有挠性,以将处理与检查装置移动至晶片上及将晶片移动至装置。如此可以消除晶片对齐步骤,由此节省时间。对于包括光学加工处理的应用来说,可以将一个移动式光学组件安装于晶片表面上方,由此将所需的晶片运送距离减小到最低程度。固持要被加工的晶片或样本的夹头可以被安装至用于沿着主轴移动的主轴级台、用于沿着短轴移动的短轴级台、或在主轴与短轴下方的静止位置之中。主轴级台可以支撑短轴级台,或者它们可以彼此独立。
随着电子电路的尺寸变小,此种光学系统的级台设计变得更为关键。一项级台设计的考量是由于晶片夹头与光学组件的振动与热稳定性所引起的加工品质的冲击。在其中激光光束受到连续调整的情形中,支撑激光组件的现有结构太过挠性,而无法维持所需的精密程度。而且,随着电路尺寸的变小,微粒的污染也变得更加重要。
在半导体晶片制造中,许多晶片处理操作之后接着就是检查,以便确保在将晶片继续移动至下一个处理步骤之前操作是成功的。可以通过利用分开的一个装备而实施检查,此装备通常是强力的光学显微镜或电子显微镜。或者,检查装备可以直接内建于处理系统的平台中,消除与将晶片运送至另外工作站有关的高架式运送工具。不必要地运送沉重的处理或检查装置也是不希望的,这是因为当质量很小时,移动中的结构的精确性与稳定性是最佳的。此外,散热作用会随着马达及有效负载质量(payload mass)而增加。
发明内容
本发明内容关于一种激光处理系统,其中,一个定位系统被设计成能够支撑接受一项或多项处理操作的样本。例如,在一实例中,此定位系统用于“刻划与切块”在半导体晶片上产生图案的完成电子装置。晶片刻划必须使激光光束横贯介于在硅晶片上形成图案的积体电路晶片之间的边界,且沿着边界切除掉上方的介电与金属层。晶片切块必须使激光光束横贯介于在硅晶片上形成图案的积体电路晶片之间的边界,且将相邻的晶片彼此分开。
此定位系统较佳实例的特点在于一种刚性的石板基板,其提供一个无震动的平台,在此平台上安装处理装备与级台。此种稳定的平台亦提供一个吸引基座,用于整合后处理的检查装备。
在较佳实例中实施一个“分轴式级台”结构,其支撑着激光光学组件及工件,该工件具有供激光光束入射于其上来进行激光处理的表面。此多级式定位系统能够在高速与高加速度下以振动与热稳定方式运送材料。分轴的设计沿着位于分开、平行平面中的二个垂直轴线解偶(decouple)驱动的级台运动。在较佳实例中,在水平平面中的运动在相对彼此正交地移动的一个样本级台(主轴或下方级台)与一个扫描光学组件级台(短轴或上方级台)之间被分开。
尺寸稳定的基板或板片被用来当作下方级台与上方级台的底座。厚实且结构坚硬的基板隔离且稳定激光光学组件及样本的运动、吸收振动且使得加速度与减速度更加平顺,这是因为此支撑结构本来就很坚硬。基板也通过如同热沉般地作用而提供热稳定性。而且,因为系统被设计成很小巧的结构,其是由较少的材料构成,且因此当受到加热时较不容易膨胀。基板被精确地切割(“研光”),使得其上级台表面与下级台表面的一些部位是平坦的且彼此平行。较佳地,板材与级台是由具有类似热膨胀系数的材料制成,由此使系统能够有利地以协调方式对温度变化起反应。
在较佳实例中,导引着一个承载固持样本夹头的下级台的下导引轨道组件被耦接至基板的扁平下方表面。导引着一个承载激光光束焦点区域子系统的上方级台的上方导引轨道组件被耦接至基板的扁平上方表面。承载晶片的样本级台以及承载光学元件的处理级台沿着低摩擦或无磨擦的导引轨条滑移。沿着导轨组件的相邻轨条而定位的线性马达控制上方级台与下方级台的运动。激光光束焦点区域控制子系统被支撑于下方级台上方,且包括定位在刚性空气轴承套筒上的可垂直调整的光学组件,该空气轴承套筒被支撑结构安装于上方级台。基板的中间一个椭圆形狭缝切除部分会使下方的样本暴露于激光光束下,且允许激光光学组件垂直运动通过基板。否则的话,除了受到激光加工的局部区域之外,样本受到基板的保护,使其免于接触到在高处的运动所产生的微粒的影响。
当完成样本的激光处理时,一般在装有相机的高放大率的显微镜之下检查结果。线上检查(on-board inspection)能够使制造与处理研发活动的效率达到最大程度。而且,将因为很重的变焦透镜而制成很厚重的检查设备支撑在支撑着重量较轻的处理装备的相同刚性基板方面有明显稳定性优点。取代将沉重的检查装备连同光学组件安装于处理级台上,该检查装备被安装于第三、分开的、非马达式或被动式样本检查级台上。虽然正在进行激光处理,样本检查级台仍旧停放在其收容位置(home position),坐落在导引轨条的一端处。当是要进行后处理检查的时候,配备有级台耦接与解耦机构的处理级台被用以将样本检查级台运送到及运送离开晶片位置。
从以下随附图所进行的较佳实例的详细说明,可以更加清楚本发明的其它观点及优点。
附图说明
图1是解耦、多级台式定位系统的等角图。
图2是图1定位系统的部分分解等角图,其显示当此系统组合好时,上方及下方级台被安装于例如石板的尺寸稳定的基板。
图3是图1定位系统的等角图,其显示支撑着扫描透镜的上方级台以及上级台驱动元件。
图4是图1定位系统的等角图,其显示支撑着样本固持夹头的下方级台及下方级台驱动元件。
图5是样本检查级台后端的局部等角图,该样本检查级台停在基板石板上方表面上的收容位置。
图6是结合样本检查级台与样本处理级台的耦接机构的放大局部等角图。
图7是单独在图5所示的收容位置处的样本检查级台的顶部表面的局部等角图。
图8是耦接至样本处理级台的样本检查级台的等角图。
图9是被耦接至样本处理级台的样本检查级台的顶部表面的等角图,其中样本检查级台被显示出具有其位于适当位置中的显微镜与相机系统,而样本处理级台被显示出具有位于适当位置中的激光光学组件。
具体实施方式
图1与图2显示一个解耦、多级的定位系统10,在较佳实例中,此定位系统支撑着一个激光加工系统的零件,此激光光束传播通过该激光加工系统而入射在一目标样本上。定位系统10包括一个尺寸稳定的基板12,此基板是由石板制成,最好是由花岗石、或陶瓷材料、铸铁、或例如AnocastTM的聚合物复合材料板片所形成的。基板12具有第一或上方扁平主要表面14及具有一个阶梯状凹穴18的第二或下方扁平主要表面16。主要表面14与16包括表面部位,这些表面部位是彼此平行的平面且被调整以呈现出在大约十微米公差范围内的平坦性与平行。
上方主要表面14的一个表面部位及第一导轨组件20耦接,用以沿着第一轴线导引一个激光光学组件级台(stage)22的运动。下方主要表面16的一个表面部位及第二导轨组件24耦接,用以沿着横向于第一轴线的第二轴线导引一个样本级台26的运动。光学组件级台22支撑一个激光光束焦点区域控制子系统28,此子系统包括一个于基板12的下方主要表面16下方向下悬挂的扫描透镜30。样本级台26支撑一个样本固持夹头32。级台22与26的导引移动能够使扫描透镜30相对于夹头32所固持的样本(未显示)表面上的激光光束加工位置而移动。
在较佳实例中,基板12被放置在适当位置,使得主要表面14与16界定出隔开的水平平面,且导轨组件20与24被定位成使得第一轴线与第二轴线彼此垂直,由此界定出各自的Y轴与X轴。此分轴结构可解耦(decouple)沿着X轴与Y轴的运动,通过所允许的较少自由度简化激光光束与夹头32的定位控制。
图3详细地显示光学组件级台22,其与图2所示的第一导轨组件20一起操作。第一导轨组件20包括两个固定于上方主要表面14的支架部位的隔开的导引轨条40,及两个被支撑于光学组件级台22的底部表面44上的U形导引块42。每个导引块42系装配于对应的其中一条轨条40上,而且反应于施加的推动力而沿着此轨条滑动。图2所示的第一导轨组件20的每对导轨40-导引块42是一个滚动元件轴承组件。一个用于光学组件级台22的马达驱动器包括一线性马达46,此线性马达46被安装于上方主要表面14上且沿着每个导引轨条40的全长安装。线性马达46施加推动力来推动其对应的导引块42,用于沿着其对应的导引轨条40产生滑动。每个线性马达46包括一个U通道磁铁轨道48,固持沿着导引轨条40的全长所配置的分隔开的直线阵列多个磁铁50。定位于此直线阵列的磁铁50之间的一个压入器线圈组件52连接至光学组件级台22的底部表面44,且构成用以移动光学组件级台22的线性马达46的移动构件。适合的线性马达46是能从宾州匹兹堡航空技术法人公司获得的型号为MTH480的线性马达。
固定至光学组件级台22的底部表面44且被定位成邻接不同导引块42的一对编码器头部60包含多个位置感测器,其测量光学组件级台22的偏航角(yaw angle)及行进的距离。将位置感测器放置在接近导引轨条40、导引块42及驱动各级台22与26的线性马达46处,能确保具有最小共振效果的有效封闭回路式反馈控制。一对挡止构件62反应于限制开关而限制导引块42的行进距离,限制开关包括在编码器头部60之内而由接附至基板12的磁铁(未显示)所启动。一对减震器(dashpot)64抑制并停止光学组件级台22的运动,以防止它过度移动而脱离导引轨条40。
在导引轨条40之间且沿着其全长的形成在基板12中的一个椭圆狭缝66提供一个开口,当光学组件级台22沿着导引轨条40移动时,扫描透镜30可以在此开口内行进。形成在基板12中的阶梯状凹穴18区域中的一对通孔68可以提供操作人员从上方表面14到编码器头部60的维修入口,由此维持其对齐状况。
安装至图3所示的包含激光光束控制子系统28的处理装备包括:一空气轴承组件202、一透镜压入器组件210、以及一轭组件212。形成用于处理装备的支撑结构、且因此主要显示于图1、2、3、8与9中、的轭组件212的元件包括:一声音线圈桥接件236、侧边构件238、直立柱240、轭侧板300以及一轭安装架310。处理装备因此被支撑的看得见的元件包括一个编码器328与一个光束偏向装置346。较佳光学处理装备的详细说明揭示于共同属的美国专利申请案第11/676937号,本发明为该美国专利申请案的接续案。
图4详细显示与图2的第二导轨组件24以操作方式结合的样本级台26。第二导轨组件24包括导引轨条、U形导引块、线性马达、U通道磁铁轨道、磁铁、压入器线圈组件及编码器,这些元件均对应于且通过上文针对第一导轨组件20所使用的相同元件符号。线性马达46及第二导轨组件24的元件及第二导轨组件24所支撑的元件被安装于一个样本级台床72的表面70上。
级台22、26及马达46的机械配置导致级台22与26的俯仰(pitch)及横摇(roll)减少,且增进高速运动的精确性。将马达46对称放置在级台22与26的相反两侧上可增进偏离角度的控制。沿着级台22与26的侧边放置马达46可将重要元件与位置感测器的热干乱降低到最小的程度,这一点与将马达放置在级台底下相反。
第二导轨组件24与支撑着夹头32的样本级台26被装配且固定于阶梯状凹穴18之中。样本级台床72的表面70被固定成紧靠着下方主要表面16的表面部位74而邻接阶梯状凹穴18的较宽的下方部位,而夹头32被定位在下方主要表面16的阶梯状凹穴18最内侧部位下方,且在其下方反应于线性马达46所施加的推动力而移动,而线性马达使样本级台26沿着第二导轨组件24移动。一对挡止构件76反应于限制开关而限制导引块42的行进距离,限制开关包括在编码器头部60之内而由接附至基板12的磁铁(未显示)所启动。一对减震器78抑制并停止样本级台26的运动,以防止它过度移动脱离导引轨条40。
激光光学组件级台22具有一容纳有控制子系统28的开口200,该控制子系统具有含扫描透镜30的空气轴承组件202。当激光光束大体上沿着光束轴206、该光束轴206是扫描透镜30的光学轴、传播,且通过扫描透镜30,用于入射在一个被支撑于样本级台26上的目标样本的工作表面上时,控制子系统28控制由扫描透镜30所形成的激光光束焦点区域的轴向位置。
以下的说明针对图5至图9所示的样本检查级台与级台耦接设备。连同其级台的检查装备是一个光学次组件,其可以、但并非必定要、被包含于整个晶片处理系统内。图5显示较佳样本检查级台400的后端,检查装备与三个耦接装置安装于此后端。样本检查级台400停靠于其收容位置(home position),此原点位置位于其沿着导引轨条40的行进终点、位于基板12的边缘。样本检查级台400包括一个整体的铝制滑架404,此滑架具有形成支撑结构的四个支柱406,用以稳定住被运送的检查装备408。检查装备408包括一显微镜410及一安装于显微镜圆柱414上端的专业相机412。在此实例中,显微镜410包括一个6.5倍的超变焦透镜415及两个物镜416,这些物镜具有马达带动的变焦透镜与焦点调整控制元件(图6)。适合的超变焦透镜415及适合的物镜416分别可以从美国纽约州Rochester的Navitar股份有限公司所制造的零件编号1-62638与1-60228取得。适合的数位式显微镜相机412可以是加拿大卑诗省温哥华市Point Grey研究中心所制成的型号第FLEA-HICOL-CS。
三个导引汽缸块被装附至样本检查级台400上,而且它们包括两个定位于样本检查级台400任一侧上的导引汽缸块418,及一个位于样本检查级台400后部的导引汽缸块420。位于后部的导引汽缸块420通过一个V形沟槽式安装架422而将样本检查级台400锁定于其收容位置,此安装架422以螺栓固定至基板12表面上。位于样本检查级台400侧边上的导引汽缸块418将检查级台400装附至一个样本处理与运送级台上,在此实例中此样本处理与运送级台是光学组件级台22(图8)。适合的导引汽缸块418与420为例如美国密西根州Kalamazoo的Koganei股份有限公司所制造的零件型号SGDAG-2X20ZE 155A1。每个导引汽缸块418与420内放置有一个中央气动汽缸424与两个装配于导引轴衬组件内的导引杆425。气动汽缸424与导引杆425如同一个单元沿着Z轴伸出及缩入外壳。气动汽缸424被接附至一个下方启动板426,其底侧装配有一个转接器428。
图6显示导引汽缸块418的放大图,每个导引汽缸块如同一个耦接装置429的元件般地作用,此耦接装置可释放地将检查级台400耦接至光学组件级台22上。每个耦接装置429都运用一个运动安装架,以确保可重复的定位。转接器428将启动板426结合至一个半球形的联接器430,当汽缸424下降时,此半球形联接器紧贴地装配于V形沟槽432之中。当一个沿着图中座标系统所定义的Y轴延伸的旗标436截断沿着X轴传播的光束(未显示)时,一个光学侦测器434感测到垂直的汽缸位置。光束从一个安装于光学侦测器434前方内侧的光源438传播到一个安装于光学侦测器434后方内侧的感测器440。光束被旗标436所截断表示样本检查级台400被耦接至光学组件级台22。延伸自V形沟槽构件444的凸缘442以螺栓连接至光学组件级台22,且由此当样本检查级台400与光学组件级台22相耦接时,导致样本检查级台400回应于光学组件级台22的运动而移动。当完成耦接时,与光学组件级台22相连的U形导引块42被定位成邻接与样本检查级台400相连的U形导引块42,使得两个级台能一起沿着固定式导引轨条40滑移。一个以螺栓连接至转接器428对面的级台400的L形托架446用作一个用于导引汽缸块418的安装表面。
图7显示一个提供检查装备组件408垂直行进的机构。显微镜410的特点在于内部的LED同轴式照明,如此得以使用相机412。为了散发能量,LED须要大型散热器,所示的散热器被安装于显微镜圆柱414前方。显微镜圆柱414的后面被装配至一个桨状托架450,此托架又被接附至一个线性马达所驱动的交叉滚筒式级台452,此级台系例如为美国奥勒冈州Tangent的Primatics股份有限公司所制造的零件型号PRC43AL0025C D3 H2 L1E7。交叉滚筒式级台452沿着Z轴上升与下降显微镜410。此Z轴移动是由压缩弹簧454抵消掉,这些弹簧(图中仅显示一个)容纳于一个具有多个狭缝457的压缩弹簧壳体456内,U形弹簧棒458的自由端可以插入狭缝457之中以限制压缩弹簧壳体的运动。压缩弹簧454通过朝上推抵着接附于交叉滚筒式级台452的U形弹簧棒458而抵抗运动。抵消掉交叉滚筒式级台452的质量有助于定位并建立起用于交叉滚筒式级台452的停置位置,且由此防止在电力故障的事件中显微镜410撞击到检查级台400。
一个安装至交叉滚筒式级台452顶端上的装具连接器460以其一端容纳缆线终端器462。缆线终端器462指示出电源及将检查装备408的插头馈送到装具连接器460的资料传输线路所在处。
图8显示耦接至光学组件级台22的样本检查级台400,光学组件级台22通过一个矩形切口464容纳检查装备408。图9显示类似于图8的视图,其中激光光束焦点区域控制子系统28位于适当位置中。
对于熟知此项技术者来说,很明显地在不背离本发明原理的前提下,可以对上述实例的细节进行许多变化。因此,本发明的范围应该由申请专利范围界定。
Claims (8)
1.一种使用激光为基础的系统来处理及检查样本的方法,该方法包含:
提供一样本处理级台,用于在处理与检查期间在上面安装有样本的一基板上的运动,该样本处理级台承载有激光光束传播路径导向光学元件,所述光学元件可回应于一施加的推动力而在基板上移动;
提供一样本检查级台,用以在基板上的运动,该样本检查级台承载有光学检查装备,该光学检查设备的特征在于具有很大的质量且具有当静止停靠时的收容位置;
提供一耦接装置,用以将样本检查级台与样本处理级台可释放地耦接于彼此;
移动该样本处理级台,用以将激光光束相对于该样本定位而处理该样本,且在此之后,定位该耦接装置,用以将样本检查级台与样本处理级台耦接于彼此;
将耦接的样本处理级台与样本检查级台一前一后地移动,用以将光学检查装备相对于该样本定位来检查该样本,且在此之后,停靠在处于收容位置的样本检查级台上;以及
解除样本处理级台与样本检查级台的耦接,且在此之后,移动该样本处理级台远离停靠的样本检查级台。
2.根据权利要求1所述的方法,其中,该耦接装置是一个包含有滚珠与V形沟槽的运动安装架。
3.根据权利要求1所述的方法,其中,该基板包含一石板。
4.根据权利要求3所述的方法,其中,该石板是由花岗岩所形成。
5.一种用于处理并检查样本的设备,其包含:
一样本处理级台,用于在处理与检查期间在上面安装有样本的一基板上移动,该样本处理级台承载有激光光束传播路径导向光学元件,所述光学元件可回应于一施加的推动力而在该基板上移动;
一样本检查级台,用于在基板上的移动,该样本检查级台承载有特征在于具有很大的质量的光学检查装备;及
一耦接装置,用以将样本检查级台与样本处理级台可释放地耦接于彼此。
6.根据权利要求5所述的设备,其中,该耦接装置是一个含有滚珠与V形沟槽的运动安装架。
7.根据权利要求5所述的设备,其中,该基板包含一石板。
8.根据权利要求7所述的设备,其中,该石板是由花岗岩所形成。
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WO2008103611A2 (en) | 2008-08-28 |
KR101496951B1 (ko) | 2015-03-02 |
KR101429133B1 (ko) | 2014-08-12 |
TW201513956A (zh) | 2015-04-16 |
WO2008103611A3 (en) | 2011-02-24 |
TWI471108B (zh) | 2015-02-01 |
US20080196631A1 (en) | 2008-08-21 |
JP5687294B2 (ja) | 2015-03-18 |
KR20090127875A (ko) | 2009-12-14 |
CN102066038B (zh) | 2013-09-25 |
JP2010528451A (ja) | 2010-08-19 |
TW200847973A (en) | 2008-12-16 |
JP2013139055A (ja) | 2013-07-18 |
JP5586963B2 (ja) | 2014-09-10 |
US7760331B2 (en) | 2010-07-20 |
CN101657892A (zh) | 2010-02-24 |
CN102066038A (zh) | 2011-05-18 |
DE112008000428T5 (de) | 2010-01-28 |
KR20140041945A (ko) | 2014-04-04 |
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