CN100483258C - 曝光图案形成方法 - Google Patents

曝光图案形成方法 Download PDF

Info

Publication number
CN100483258C
CN100483258C CNB2005800131153A CN200580013115A CN100483258C CN 100483258 C CN100483258 C CN 100483258C CN B2005800131153 A CNB2005800131153 A CN B2005800131153A CN 200580013115 A CN200580013115 A CN 200580013115A CN 100483258 C CN100483258 C CN 100483258C
Authority
CN
China
Prior art keywords
pattern
exposed
exposure
laser beam
filming apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CNB2005800131153A
Other languages
English (en)
Chinese (zh)
Other versions
CN1947064A (zh
Inventor
伊藤三好
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
V Technology Co Ltd
Original Assignee
Integrated Solutions Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Integrated Solutions Co Ltd filed Critical Integrated Solutions Co Ltd
Publication of CN1947064A publication Critical patent/CN1947064A/zh
Application granted granted Critical
Publication of CN100483258C publication Critical patent/CN100483258C/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7007—Alignment other than original with workpiece
    • G03F9/7011—Pre-exposure scan; original with original holder alignment; Prealignment, i.e. workpiece with workpiece holder
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7007—Alignment other than original with workpiece
    • G03F9/7015—Reference, i.e. alignment of original or workpiece with respect to a reference not on the original or workpiece
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Laser Beam Printer (AREA)
  • Mechanical Optical Scanning Systems (AREA)
CNB2005800131153A 2004-04-28 2005-04-28 曝光图案形成方法 Active CN100483258C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP134441/2004 2004-04-28
JP2004134441A JP4253707B2 (ja) 2004-04-28 2004-04-28 露光パターン形成方法

Publications (2)

Publication Number Publication Date
CN1947064A CN1947064A (zh) 2007-04-11
CN100483258C true CN100483258C (zh) 2009-04-29

Family

ID=35241830

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB2005800131153A Active CN100483258C (zh) 2004-04-28 2005-04-28 曝光图案形成方法

Country Status (5)

Country Link
JP (1) JP4253707B2 (ja)
KR (1) KR101094468B1 (ja)
CN (1) CN100483258C (ja)
TW (1) TWI380134B (ja)
WO (1) WO2005106591A1 (ja)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5344730B2 (ja) * 2006-05-22 2013-11-20 株式会社ブイ・テクノロジー 露光装置
JP5319175B2 (ja) * 2008-06-17 2013-10-16 日立造船株式会社 パターン描画方法及び装置
WO2011090057A1 (ja) * 2010-01-21 2011-07-28 シャープ株式会社 基板、基板に対する露光方法、光配向処理方法
JP5538049B2 (ja) * 2010-04-22 2014-07-02 日東電工株式会社 フォトマスクと基材との位置合わせ方法および配線回路基板の製造方法
JP5704315B2 (ja) * 2011-01-07 2015-04-22 株式会社ブイ・テクノロジー 露光装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6010623A (ja) * 1983-06-29 1985-01-19 Fujitsu Ltd ホトリピ−タ
JPS62124999A (ja) * 1985-11-27 1987-06-06 株式会社ニコン 自動作図装置
JP3046697B2 (ja) * 1993-11-08 2000-05-29 シャープ株式会社 露光装置
JPH09171106A (ja) * 1995-10-19 1997-06-30 Fuji Photo Film Co Ltd カラーフィルターの作製方法
JP2004012903A (ja) * 2002-06-07 2004-01-15 Fuji Photo Film Co Ltd 露光装置

Also Published As

Publication number Publication date
CN1947064A (zh) 2007-04-11
TW200606595A (en) 2006-02-16
JP2005316167A (ja) 2005-11-10
WO2005106591A1 (ja) 2005-11-10
TWI380134B (en) 2012-12-21
JP4253707B2 (ja) 2009-04-15
KR20070001251A (ko) 2007-01-03
KR101094468B1 (ko) 2011-12-19

Similar Documents

Publication Publication Date Title
CN100517009C (zh) 液晶显示装置用基板的制造方法
TWI394007B (zh) 曝光裝置
CN100483258C (zh) 曝光图案形成方法
CN103415810B (zh) 曝光装置
US9329504B2 (en) Method of aligning an exposure apparatus, method of exposing a photoresist film using the same and exposure apparatus for performing the method of exposing a photoresist film
US10733719B2 (en) Wafer inspection apparatus and wafer inspection method using the same
JP2008191303A (ja) 描画装置及び方法
CN101178544A (zh) 对准单元及使用该对准单元的图像记录装置
JP4887165B2 (ja) 描画装置及び方法
CN118215572A (zh) 用于具有多图像投影的增材制造系统的校准系统和方法
CN1947069B (zh) 曝光装置
CN101840162B (zh) 曝光装置及图形形成方法
KR101098729B1 (ko) 노광 장치 및 패턴 형성 방법
CN1885167B (zh) 曝光装置及图形形成方法
JP2004294770A (ja) 露光方法及び露光システム
JP4613098B2 (ja) 露光装置
TWI386762B (zh) 曝光裝置及圖形形成方法
JPH08222511A (ja) アラインメント調整方法
WO2005106595A1 (ja) 露光装置及びパターン形成方法
CN115729051A (zh) 绘制装置以及绘制方法
JP2005326477A (ja) 露光装置及びパターン形成方法
JP2013165091A (ja) 描画装置、テンプレート作成装置、および、テンプレート作成方法
JPS62198123A (ja) 露光装置

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
ASS Succession or assignment of patent right

Owner name: CO., LTD. V TECHNOLOGY

Free format text: FORMER OWNER: INTEGRATED SOLUTIONS CO., LTD.

Effective date: 20090327

C41 Transfer of patent application or patent right or utility model
TR01 Transfer of patent right

Effective date of registration: 20090327

Address after: Kanagawa County, Yokohama, Japan

Patentee after: Technology Co. Ltd V.

Address before: Tokyo, Japan

Patentee before: Integrated Solutions Co., Ltd.