CN100457982C - Anode unit for continuous electroplating of belt poor conductor - Google Patents

Anode unit for continuous electroplating of belt poor conductor Download PDF

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Publication number
CN100457982C
CN100457982C CNB2004100440968A CN200410044096A CN100457982C CN 100457982 C CN100457982 C CN 100457982C CN B2004100440968 A CNB2004100440968 A CN B2004100440968A CN 200410044096 A CN200410044096 A CN 200410044096A CN 100457982 C CN100457982 C CN 100457982C
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cavity
anode
rho
cover plate
resistivity
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CN1637173A (en
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王殿龙
戴长松
姜兆华
胡信国
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Harbin Institute of Technology
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Harbin Institute of Technology
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Abstract

The anode device for continuous electroplating of belt poor conductor consists of at least one anode unit. The anode unit consists of one through cavity, one upper insulating cover plate and one lower insulating cover plate. The through cavity is formed with the first anode plate, the first insulating baffle, the second anode plate and the second insulating baffle connected successively. The upper insulating cover plate is connected to the upper port of the through cavity, the lower insulating cover plate to the lower port, and both the upper insulating cover plate and the lower insulating cover plate have slot with symmetrical plane coinciding with that of the through cavity. The through cavity has flared longitudinal profile passing through two anode plates. Owing to the special shape of anode to control the current density for electrically depositing metal, the single electroplating bath may have maximum anode length, and the continuous electroplating production line may have least electroplating baths.

Description

Band shape is good conductor of electricity continuous electroplating anode assembly not
Technical field:
The present invention relates to a kind of anode assembly, be specifically related to a kind of bad strip surface plated metal of electroconductibility or anode assembly of alloy of being used for.
Background technology:
Along with the continuous development that novel material is used, the bad strip surface of electroconductibility metallizes more and more universal, and wherein the electro-plating method equipment in the aqueous solution is simple, and cost is low, and is convenient to serialization production.For example, composite metallic material can be electroplated another kind of metal preparation in a kind of metal foil surface, and the Cu/ Invar alloy/Cu clad material of acquisition is used for Electronic Packaging; For another example, continuous high speed electro-galvanizing, tin and the alloy thereof of thin steel band are used for automobile, household electrical appliances, food product pack industry, alleviate product weight, cut down the consumption of energy, and at present, the thickness of thin steel band has been reduced to 0.10mm; And the nonmetal band of conductionization processing, as fabric etc., can be by the method preparation of continuous electro-deposition.Because a little less than the tinsel conductive capability, and thin steel band continuous high speed need transmit very big electric current when electroplating, and as negative electrode, can produce bigger volts lost in the continuous electroplating process, makes the cathode current density skewness, electrodeposit metals of poor quality.Therefore, the selection of anode material, shape are important problems, and the quality of product and production efficiency depend on anode design to a great extent.
Summary of the invention:
The present invention is in order to solve electric current distribution problem of non-uniform in the bad band continuous electroplating process of electroconductibility, not good conductor of electricity continuous electroplating anode assembly of a kind of band shape that is used to improve strap electroplating metal quality and production efficiency is provided, it can make the cathode current density of metal electrodeposition be evenly distributed, and realizes the control of optimum current density.The present invention is made up of an anode unit 1 at least, anode unit 1 is made up of cavity 2, last insulation cover plate 3, following insulation cover plate 4, cavity 2 is surrounded by first anode plate 5, first insulation barrier 7, second anode plate 6, the 8 mutual head and the tail connections of second insulation barrier successively, first anode plate 5 is identical with second anode plate 6 structures, and first baffle plate 7 is identical with second insulation barrier, 8 structures; Last insulation cover plate 3 is connected on the upper port 2-1 of cavity 2, following insulation cover plate 4 is connected on the lower port 2-2 of cavity 2, last insulation cover plate 3 and following insulation cover plate 4 all have bar seam 9, the plane of symmetry of two bar seams 9 and the plane of symmetry of cavity 2 coincide, the longitudinal section 15 of cavity 2 is tubaeform, and longitudinal section 15 is vertical through first anode plate 5 and second anode plate 6.Heterotypic positive pole device of the present invention can be used for the banded non-metallic material of surface conduction processing and the continuous electroplating metal or alloy of tinsel and the continuous high speed of thin steel band and wire cloth and electroplates.Adopt the heterotypic positive pole device of the present invention's design, can make the whole plating district inner cathode current density uniform distribution of the bad band continuous electroplating of electroconductibility, guarantee that quilt plating band runs to any position in the plating district, can both galvanic deposit under optimum current density.Heterotypic positive pole device of the present invention has following characteristics: good, the compact crystallization of coating uniformity that (1) obtains has good solidity to corrosion and mechanical property; (2) owing to the current density of having controlled metal electrodeposition by special anode shape, the anode length of single coating bath just can be designed into to greatest extent, realizes the speed-raising of continuously plating product line under the condition that does not increase coating bath quantity, enhances productivity; (3) adopt the accurately heterotypic positive pole of design, can reduce to be plated band and positive interpolar distance, reduce the volts lost of solution, reach the purpose that cuts down the consumption of energy.
Description of drawings:
Fig. 1 is the structural representation of anode assembly of the present invention, and Fig. 2 is the A-A sectional view of Fig. 1, and Fig. 3 is the B-B sectional view of Fig. 2, and Fig. 4 is the anode device structure synoptic diagram of embodiment four.
Embodiment:
Embodiment one: referring to Fig. 1~Fig. 3, the anode assembly of present embodiment is made up of an anode unit 1 at least, anode unit 1 is made up of cavity 2, last insulation cover plate 3, following insulation cover plate 4, cavity 2 is surrounded by first anode plate 5, first insulation barrier 7, second anode plate 6, the 8 mutual head and the tail connections of second insulation barrier successively, first anode plate 5 is identical with second anode plate 6 structures, and first insulation barrier 7 is identical with second insulation barrier, 8 structures; Last insulation cover plate 3 is connected on the upper port 2-1 of cavity 2, following insulation cover plate 4 is connected on the lower port 2-2 of cavity 2, last insulation cover plate 3 and following insulation cover plate 4 all have bar seam 9, the plane of symmetry of two bar seams 9 and the plane of symmetry of cavity 2 coincide, the longitudinal section 15 of cavity 2 is tubaeform, and longitudinal section 15 is vertical through first anode plate 5 and second anode plate 6.For the tinsel continuous electroplating, the length L of described cavity 2 is drawn by following formula:
L = ( ρ L m 2 d ρ 2 [ D ( 0 ) - D ( L ) ] [ 1 - d ρ 2 δ ρ 1 m ln ( 1 + ρ 1 m d ρ 2 δ ) ] ) 1 / 2 , The form parameter in the longitudinal section 15 of cavity 2 is drawn by following formula: D ( x ) = D ( 0 ) - 2 d ρ 2 L 2 ρ L m [ x L + d ρ 2 δ ρ 1 m ln ( 1 - x L ( d ρ 2 δ ρ 1 m + 1 ) ) ] , Wherein: δ is by the plating thickness of strip, and D (0) is that the electric current of anode assembly imports end negative and positive interpolar distance, ρ 1For being plated the resistivity of band, ρ 2Be the resistivity of plated metal, ρ LBe the resistivity of electroplate liquid, d is the density of plated metal, and m is the amount of unit surface plated metal, and L is an anode length.For the thin metal strip continuous electroplating, the length L of described cavity 2 is drawn by following formula: L = ρ L δ ρ 1 [ D ( 0 ) - D ( L ) ] , The calculation formula of the form parameter in the longitudinal section 15 of cavity 2 is: D ( x ) = D ( 0 ) - ρ 1 ρ L δ ( 2 xL - x 2 ) , Wherein: δ is by the plating thickness of strip, and D (0) is that the electric current of anode assembly imports end negative and positive interpolar distance, and D (L) is a far-end negative and positive interpolar distance, ρ 1For being plated the resistivity of band, ρ LResistivity for electroplate liquid.
Embodiment two: referring to Fig. 4, what present embodiment and embodiment one were different is, increase in the anode unit 1 cavity 10 is arranged, cavity 10 is identical with cavity 2 structures, the lower port 2-2 of cavity 2 is connected with the upper port 11 same radians of cavity 10, and the plane of symmetry of cavity 2 and cavity 10 coincides.Other compositions are identical with embodiment one with annexation.
Embodiment three: referring to Fig. 1~3, present embodiment is being example at banded copper foil surface continuous electro-deposition nickel, band shape not good conductor of electricity continuous electroplating anode assembly is made up of an anode unit 1, band 12 enters in the cavity 2 by the bar seam 9 on the following insulation cover plate 4, derive from the bar seam 9 on the last insulation cover plate 3 by negative electrode conductive rollers 13, wherein: copper thickness δ=20 μ m, the electric current of anode assembly imports end negative and positive interpolar distance D (0)=30mm, far-end negative and positive interpolar distance D (L)=10mm, the electricalresistivity of copper Cu=1.63 * 10 -8Ω m, the electricalresistivity of nickel Ni=20 * 10 -8Ω m, the electricalresistivity of electroplate liquid L=021 Ω m, the density d of nickel=8.9 * 10 3Kg/m 3, the amount m=89 of unit surface electronickelling * 10 -3Kg/m 2(thickness 10 μ m) are drawn by following formula according to the length L of cavity 2: L = ( ρ L m 2 d ρ Ni [ D ( 0 ) - D ( L ) ] [ 1 - d ρ Ni δ ρ Cu m ln ( 1 + ρ Cu m d ρ Ni δ ) ] ) 1 / 2 , Determine that length is L=2.3m.Form parameter according to the longitudinal section 15 of cavity 2 is drawn by following formula: D ( x ) = D ( 0 ) - 2 d ρ Ni L 2 ρ L m [ x L + d ρ Ni δ ρ Cu m ln ( 1 - x L ( d ρ Ni δ ρ Cu m + 1 ) ) ] , Determine that the concrete size in the anodic longitudinal section of banded copper foil surface continuous electro-deposition nickel lists in table 1.
Table 1
x/mm 0 230 460 690 920 1150 1380 1610 1840 2070 2300
D(x)/mm 30 26.3 22.9 20.0 17.4 15.2 13.4 12.0 11.0 10.4 10
Embodiment four: referring to Fig. 4, present embodiment is being example at thin steel band continuous high speed electro-galvanizing, band shape not good conductor of electricity continuous electroplating anode assembly is made up of ten anode units 1, anode unit 1 is by cavity 2, cavity 10, last insulation cover plate 3, following insulation cover plate 4 is formed, cavity 2 is by first anode plate 5, second anode plate 6, first insulation barrier 7, second insulation barrier, 8 spaces connect from beginning to end and surround, cavity 10 is identical with cavity 2 structures, the lower port 2-2 of cavity 2 is connected with the upper port 11 same radians of second cavity 10, the plane of symmetry of cavity 2 and cavity 10 coincides, first anode plate 5 is identical with second anode plate 6 structures, and first insulation barrier 7 is identical with second insulation barrier, 8 structures; Last insulation cover plate 3 is connected on the upper port 2-1 of cavity 2, following insulation cover plate 4 is connected on the lower port 14 of cavity 10, last insulation cover plate 3 and following insulation cover plate 4 all have bar seam 9, the plane of symmetry of two bar seams 9 and the plane of symmetry of cavity 2 coincide, the longitudinal section 15 of cavity 2 is tubaeform, longitudinal section 15 is vertical through first anode plate 5 and second anode plate 6, band 12 enters in the cavity 10 by the bar seam 9 on the following insulation cover plate 4, derive from the bar seam 9 on the last insulation cover plate 3 by negative electrode conductive rollers 13 through cavity 2 backs, wherein: thickness of strips δ=0.15mm, each anode unit electric current imports negative and positive interpolar distance D (the 0)=30mm of end, far-end negative and positive interpolar distance D (L)=10mm, the electricalresistivity of soft steel Fe=9.9 * 10 -8Ω m, the electricalresistivity of high speed electrodeposition zinc solution L=0.0675 Ω m is drawn by following formula according to the length L of cavity 2: L = ρ L δ ρ Fe [ D ( 0 ) - D ( L ) ] , Calculating every two ends, to advance the length of electric cavity 2 be 2L=2.86m.Shape according to the longitudinal section 15 of cavity 2 is drawn by following formula: D ( x ) = D ( 0 ) - ρ Fe ρ L δ ( 2 xL - x 2 ) , Zinc-plated anodic longitudinal section 15 sizes of the steel strip surface continuous electric that calculates are listed in table 2.
Table 2
x/mm 0 100 150 200 300 400 500 600 750 1000 1430
D(x)/mm 30 27.3 26.0 24.8 22.5 20.4 18.5 16.7 14.5 11.8 10.0
Current density j=120A/dm according to steel band continuous high speed electro-galvanizing 2, electrochemical equivalent g=3.388 * 10 of current efficiency η=92%, zinc -7Kg/C -1, the amount m=70 of unit surface electro-galvanizing * 10 -3Kg/m 2The calculation formula of (thickness 10 μ m) and production line travelling speed υ = 4 ngηjL m Calculate: use 10 identical shaped anode assembly series connection, the travelling speed of steel band continuous high speed electro-galvanizing is 183m/min.

Claims (7)

1, band shape good conductor of electricity continuous electroplating anode assembly not, it is made up of an anode unit (1) at least, anode unit (1) is made up of cavity (2), last insulation cover plate (3), following insulation cover plate (4), cavity (2) is surrounded by first anode plate (5), second anode plate (6), first insulation barrier (7), the mutual head and the tail connection of second insulation barrier (8), first anode plate (5) is identical with second anode plate (6) structure, and first insulation barrier (7) is identical with second insulation barrier (8) structure; Last insulation cover plate (3) is connected on the upper port (2-1) of cavity (2), following insulation cover plate (4) is connected on the lower port (2-2) of cavity (2), last insulation cover plate (3) and following insulation cover plate (4) all have bar seam (9), the plane of symmetry of two bar seams (9) and the plane of symmetry of cavity (2) coincide, the longitudinal section (15) that it is characterized in that cavity (2) is for tubaeform, and longitudinal section (15) vertically pass through first anode plate (5) and second anode plate (6).
2, band shape according to claim 1 good conductor of electricity continuous electroplating anode assembly not is characterized in that the length (L) of described cavity (2) is drawn by following formula:
L = ( ρ L m 2 d ρ 2 [ D ( 0 ) - D ( L ) ] [ 1 - dρ 2 δ ρ 1 m ln ( 1 + ρ 1 m d ρ 2 δ ) ] ) 1 / 2 , Wherein: δ is by the plating thickness of strip, and D (0) is that the electric current of anode assembly imports end negative and positive interpolar distance, and D (L) is a far-end negative and positive interpolar distance, ρ 1For being plated the resistivity of band, ρ 2Be the resistivity of plated metal, ρ LBe the resistivity of electroplate liquid, d is the density of plated metal, and m is the amount of unit surface plated metal.
3, band shape according to claim 1 good conductor of electricity continuous electroplating anode assembly not is characterized in that longitudinal section (15) form parameter of described cavity (2) is drawn by following formula:
D ( x ) = D ( 0 ) - 2 d ρ 2 L 2 ρ L m [ x L + dρ 2 δ ρ 1 m ln ( 1 - x L ( dρ 2 δ ρ 1 m + 1 ) ) ] , Wherein: δ is by the plating thickness of strip, and D (0) is that the electric current of anode assembly imports end negative and positive interpolar distance, ρ 1For being plated the resistivity of band, ρ 2Be the resistivity of plated metal, ρ LBe the resistivity of electroplate liquid, d is the density of plated metal, and m is the amount of unit surface plated metal, and L is an anode length.
4, band shape according to claim 1 good conductor of electricity continuous electroplating anode assembly not is characterized in that the length (L) of described cavity (2) is drawn by following formula: L = ρ L δ ρ 1 [ D ( 0 ) - D ( L ) ] , Wherein: δ is by the plating thickness of strip, and D (0) is that the electric current of anode assembly imports end negative and positive interpolar distance, and D (L) is a far-end negative and positive interpolar distance, ρ 1For being plated the resistivity of band, ρ LResistivity for electroplate liquid.
5, band shape according to claim 1 good conductor of electricity continuous electroplating anode assembly not is characterized in that longitudinal section (15) form parameter of described cavity (2) is drawn by following formula:
D ( x ) = D ( 0 ) - ρ 1 ρ L δ ( 2 xL - x 2 ) , Wherein: δ is by the plating thickness of strip, and D (0) is that the electric current of anode assembly imports end negative and positive interpolar distance, ρ 1For being plated the resistivity of band, ρ LBe the resistivity of electroplate liquid, L is an anode length.
6, band shape according to claim 1 good conductor of electricity continuous electroplating anode assembly not, it is characterized in that in anode unit (1), increasing a cavity (10) is arranged, cavity (10) is identical with cavity (2) structure, the lower port (2-2) of cavity (2) is connected with the same radian of upper port (11) of cavity (10), and the plane of symmetry of cavity (2) and cavity (10) coincides.
7, according to claim 1 to 6, band shape is good conductor of electricity continuous electroplating anode assembly not, both can vertically place, but also horizontal positioned.
CNB2004100440968A 2004-12-01 2004-12-01 Anode unit for continuous electroplating of belt poor conductor Expired - Fee Related CN100457982C (en)

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Publication number Priority date Publication date Assignee Title
TWI384094B (en) * 2008-02-01 2013-02-01 Zhen Ding Technology Co Ltd Anode device for electroplating and electroplating device with the same
CN108048886B (en) * 2017-12-18 2023-06-13 湖北大学 Integral electroplating bath for continuous foam metal
CN111763962B (en) * 2020-06-19 2021-01-22 广东嘉元科技股份有限公司 Copper foil thickness uniformity treatment equipment, post-treatment production line and raw foil-post-treatment integrated machine

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1061055A (en) * 1990-10-30 1992-05-13 古尔德有限公司 Tinsel is carried out the surface-treated method and apparatus
CN1083131A (en) * 1992-04-01 1994-03-02 古尔德有限公司 The drum cathode and the production method thereof that are used for the production tinsel
EP0596816A1 (en) * 1992-11-03 1994-05-11 PECHINEY RECHERCHE (Groupement d'Intérêt Economique géré par l'ordonnance du 23 Septembre 1967) Electrode for electrophoretic coating
JPH0971900A (en) * 1995-09-04 1997-03-18 Suzuki Motor Corp Anode rod for electroplating
JPH09316696A (en) * 1996-05-22 1997-12-09 Toyota Motor Corp Electroplating anode and plating method

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1061055A (en) * 1990-10-30 1992-05-13 古尔德有限公司 Tinsel is carried out the surface-treated method and apparatus
CN1083131A (en) * 1992-04-01 1994-03-02 古尔德有限公司 The drum cathode and the production method thereof that are used for the production tinsel
EP0596816A1 (en) * 1992-11-03 1994-05-11 PECHINEY RECHERCHE (Groupement d'Intérêt Economique géré par l'ordonnance du 23 Septembre 1967) Electrode for electrophoretic coating
JPH0971900A (en) * 1995-09-04 1997-03-18 Suzuki Motor Corp Anode rod for electroplating
JPH09316696A (en) * 1996-05-22 1997-12-09 Toyota Motor Corp Electroplating anode and plating method

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
多孔金属连续电沉积数学模型. 王殿龙
多孔金属连续电沉积数学模型. 王殿龙;戴长松等.化工学报,第55卷第7期. 2004 *
戴长松等.化工学报,第55卷第7期. 2004

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Application publication date: 20050713

Assignee: Wuzhou Sanhe New Material Technology Co., Ltd.

Assignor: Harbin Institute of Technology

Contract record no.: 2009450000111

Denomination of invention: Anode unit for continuous electroplating of belt poor conductor

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