CN111763962B - Copper foil thickness uniformity treatment equipment, post-treatment production line and raw foil-post-treatment integrated machine - Google Patents

Copper foil thickness uniformity treatment equipment, post-treatment production line and raw foil-post-treatment integrated machine Download PDF

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CN111763962B
CN111763962B CN202010567321.5A CN202010567321A CN111763962B CN 111763962 B CN111763962 B CN 111763962B CN 202010567321 A CN202010567321 A CN 202010567321A CN 111763962 B CN111763962 B CN 111763962B
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copper foil
anode plate
baffle
anode
plate assembly
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CN111763962A (en
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王爱军
李建国
杨剑文
杨雨平
吴国宏
陈正辉
李志华
张任
张健
夏劲权
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Guangdong Fine Yuan Science Technology Co Ltd
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Guangdong Fine Yuan Science Technology Co Ltd
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    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming
    • C25D1/04—Wires; Strips; Foils
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/12—Process control or regulation
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated
    • C25D7/06—Wires; Strips; Foils
    • C25D7/0614—Strips or foils
    • C25D7/0621—In horizontal cells
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated
    • C25D7/06—Wires; Strips; Foils
    • C25D7/0614—Strips or foils
    • C25D7/0642—Anodes
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated
    • C25D7/06—Wires; Strips; Foils
    • C25D7/0614—Strips or foils
    • C25D7/0692—Regulating the thickness of the coating
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Automation & Control Theory (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Electrolytic Production Of Metals (AREA)

Abstract

The invention discloses a copper foil thickness uniformity processing device, a post-processing production line and a raw foil-post-processing integrated machine; belongs to the technical field of electrolytic copper foil production; the technical key points are as follows: according to the advancing direction of the copper foil, the method comprises the following steps: the device comprises a copper foil thickness measuring device, a first processing groove and a second processing groove; the copper foil thickness measuring device comprises N laser online thickness meters arranged along the width of the copper foil; the anode plate assemblies of the first treatment tank and the second treatment tank are alternately arranged in a mode of metal plates and insulating plates, and the following effects can be achieved: independent current density can be used for each metal plate, so that two sides of the copper foil can be thickened. By adopting the copper foil thickness uniformity processing equipment, the post-processing production line and the raw foil-post-processing integrated machine, the copper foil with high quality and uniform thickness can be provided, and the requirements of customers on the high-performance lithium electrolytic copper foil are met.

Description

Copper foil thickness uniformity treatment equipment, post-treatment production line and raw foil-post-treatment integrated machine
Technical Field
The invention relates to the field of electrolytic copper foil production, in particular to copper foil thickness uniformity treatment equipment, a post-treatment production line and a raw foil-post-treatment integrated machine.
Background
DB-44-T-837-2010 electrolytic copper foil for lithium ion batteries requires that the thickness of the copper foil is not uniform and is not more than 2 percent, and the electrolytic copper foil is mainly considered from the requirements of coating a negative electrode active material, normal charge and discharge of a lithium battery and the like.
The existing research routes start from the foil generation process of the copper foil and improve the thickness nonuniformity of the copper foil. Through the foil generation process, the thickness nonuniformity of the copper foil can be controlled to be about 2-5%.
However, as lithium battery customers have higher and higher requirements for the quality of delivered copper foil (part of customers require that the non-uniformity of the copper foil thickness is less than 0.5%), the solution of the copper foil raw foil process is difficult.
Therefore, it is necessary to solve the unevenness of the copper foil thickness from a new technical route.
Disclosure of Invention
The invention aims to provide a copper foil thickness uniformity processing device aiming at the defects of the prior art.
Another object of the present invention is to provide a post-processing line that addresses the above-mentioned deficiencies of the prior art.
It is a further object of the present invention to address the above-mentioned deficiencies of the prior art by providing a green foil-aftertreatment combination machine.
A copper foil thickness uniformity processing apparatus includes, in accordance with a proceeding direction of a copper foil: the device comprises a copper foil thickness measuring device, a first processing groove and a second processing groove; or, according to the advancing direction of the copper foil, comprises: the device comprises a copper foil thickness measuring device, a second processing tank and a first processing tank;
the copper foil thickness measuring device comprises N laser online thickness gauges arranged along the width of the copper foil, and the directions of the N laser online thickness gauges are vertical to the advancing direction of the copper foil; the copper foil is divided into N parts along the width; arranging 1 laser on-line thickness gauge in the middle of each part;
wherein, first treatment trough includes: a first processing tank body;
the first treatment tank also comprises a first anode plate assembly and/or a second anode plate assembly; the first anode plate component corresponds to the S surface of the copper foil, and the second anode plate component corresponds to the M surface of the copper foil;
the first anode plate assembly comprises N sub-plates, and the N sub-plates correspond to the widths of N parts of the copper foil; counting from left to right, the even number plates of the N daughter boards are metal plates and are electrified, and the odd number plates are insulating plates; further comprising: a plurality of first baffles; the first baffle corresponds to the insulating plate in position, the first baffle is arranged on one side of the copper foil facing the first anode plate assembly, and a gap is kept between the first baffle and the copper foil; the first baffle plate is connected with the corresponding insulating plate of the first anode plate assembly through a connecting rod;
the second anode plate assembly has the same structure as the first anode plate assembly, namely the second anode plate assembly also comprises N sub-plates, and the N sub-plates correspond to the widths of the N parts of the copper foil; counting from left to right, wherein even plates of the N sub-plates are metal plates and are electrified; further comprising: a second baffle;
the metal plate of the second anode plate assembly corresponds to the metal plate of the first anode plate assembly, so that from left to right, the two surfaces of the even-numbered part of the copper foil are subjected to equal-thickness treatment, and the thickness of the odd-numbered part is not increased; the second baffle corresponds to the position of the insulating plate of the second anode plate assembly, the second baffle is arranged on one side of the copper foil facing the second anode plate assembly, and a gap is kept between the second baffle and the copper foil; the second baffle plate is connected with the corresponding insulating plate of the second anode plate assembly through a connecting rod;
a second processing tank comprising: a second processing tank body;
the second treatment tank also comprises a third anode plate assembly and/or a fourth anode plate assembly; the third anode plate component corresponds to the S surface of the copper foil, and the fourth anode plate component corresponds to the M surface of the copper foil;
the third anode plate assembly comprises N daughter plates, and the N daughter plates correspond to the widths of N parts of the copper foil; from left to right, the odd plates of the third anode plate assembly are metal plates and are electrified, and the even plates are insulating plates; further comprising: a third baffle plate; the third baffle corresponds to the position of the insulating plate of the third anode plate assembly, the third baffle is arranged on one side of the copper foil facing the third anode plate assembly, and a gap is kept between the third baffle and the copper foil; the third baffle plate is connected with the insulating plate of the third anode plate assembly through a connecting rod;
the fourth anode plate assembly and the third anode plate assembly have the same structure.
Further, the metal plate of the fourth anode plate assembly corresponds to the metal plate of the third anode plate assembly, so that from left to right, double surfaces of odd parts of the copper foil are subjected to equal-thickness treatment; while the even-numbered portions have no thickness increase;
the fourth baffle corresponds with the position of the insulating plate of the fourth anode plate assembly, the fourth baffle is arranged on one side, facing the fourth anode plate assembly, of the copper foil, and a gap is kept between the fourth baffle and the copper foil.
Further, the positions of the third baffle and the fourth baffle are as follows: the height of the solution reaches the position of the submerged roller; that is, the widths of the third and fourth baffles are the same as the widths of the insulating plate of the third anode plate assembly and the insulating plate of the fourth anode plate assembly, respectively, and the length of the third baffle is greater than the length of the insulating plate of the third anode plate assembly.
Further, the positions of the first baffle and the second baffle are as follows: the height of the solution reaches the position of the submerged roller; that is, the widths of the first and second baffles are the same as the widths of the insulating plate of the first anode plate assembly and the insulating plate of the second anode plate assembly, respectively, and the length of the first baffle is greater than the length of the insulating plate of the first anode plate assembly.
Further, first anode plate subassembly, second anode plate subassembly all adopt the mode of "metal sheet-insulation board" alternative arrangement, can realize: each metal plate can adopt independent current density, and, the cooperation sets up first baffle, second baffle respectively in one side of the insulating board of first anode plate subassembly, the corresponding copper foil of insulating board of second anode plate subassembly, thereby makes: the two sides of the even number part of the copper foil are thickened;
the third anode plate component and the fourth anode plate component are alternately arranged in a mode of metal plates and insulating plates, and the following effects can be achieved: each metal plate can adopt independent current density, and, in cooperation, one side of the corresponding copper foil of insulation board of third anode plate subassembly, insulation board of fourth anode plate subassembly sets up third baffle, fourth baffle respectively, thereby makes: both sides of the odd-numbered portion of the copper foil are thickened.
A copper foil thickness uniformity processing apparatus includes, in accordance with a proceeding direction of a copper foil: the device comprises a copper foil thickness measuring device and y processing tanks, wherein y is more than or equal to 3;
the copper foil thickness measuring device comprises N laser online thickness gauges arranged along the width of the copper foil, and the directions of the N laser online thickness gauges are vertical to the advancing direction of the copper foil; the copper foil is divided into N parts along the width; arranging 1 laser on-line thickness gauge in the middle of each part;
each treatment tank includes: a treatment tank body;
each treatment tank also comprises an S-surface anode assembly and/or an M-surface anode plate assembly; the S-surface anode assembly corresponds to the S surface of the copper foil, and the M-surface anode assembly corresponds to the M surface of the copper foil; for each treatment tank, the structure of the S-surface anode assembly is the same as that of the M-surface anode assembly;
the S-surface anode assembly comprises a metal sub-plate and an insulator sub-plate, and the number of the metal sub-plate and the insulator sub-plate is N; the width of metal daughter board, the insulator board corresponds with the width of N parts of copper foil, S face anode assembly still includes: a baffle plate; the baffle plate corresponds to the insulator plate and is arranged on the surface of the copper foil; each baffle is connected with the corresponding insulator plate through a connecting rod;
the metal sub-plates in the S-surface anode assembly and/or the M-surface anode plate assembly are mutually divided, namely at least 1 insulator sub-plate is arranged between every two adjacent 2 metal sub-plates;
the copper foil parts corresponding to the metal sub-plates in any 2 treatment tanks are not overlapped;
the sum of the copper foil portions corresponding to the metal daughter boards in all the treatment grooves is equal to the width of the copper foil.
A post-treatment production line sequentially comprises the following components in the advancing direction of copper foil: the device comprises an unwinding roller, the copper foil thickness uniformity treatment equipment, a rinsing bath, a drying device and a winding roller.
A raw foil-post-processing integrated machine sequentially comprises the following components according to the advancing direction of a copper foil: the device comprises a foil generating machine, the copper foil thickness uniformity treatment equipment, a rinsing bath, a drying device and a winding roller.
A copper foil thickness uniformity treatment process comprises the steps of dividing the width of a copper foil into N parts, arranging 1 laser online thickness gauge at the position of the copper foil of each part, and obtaining the thickness of the copper foil of each part through the laser online thickness gauges;
and then, after passing through the treatment tank, electroplating is respectively carried out on two sides and/or one side of the N parts of the copper foil, namely, the N parts of the copper foil are respectively subjected to weight increasing treatment, so that the copper foil with uniform thickness can be obtained.
Further, when electroplating is performed on both sides and/or one side of the copper foil, different current densities are used to achieve different weight gains when electroplating is performed on the N parts of the copper foil.
Further, the plating treatment is performed by passing through the first treatment tank and the second treatment tank, respectively:
firstly, performing weight increasing treatment on even parts of the N parts through a first treatment tank;
then, weight increasing treatment is carried out on odd parts of the N parts through a second treatment groove, so that copper foils with the same thickness are obtained;
alternatively, the first and second electrodes may be,
firstly, performing weight increasing treatment on odd parts of the N parts through a second treatment tank;
then, the copper foil is subjected to weight increasing treatment on even-numbered portions of the N portions through a first treatment bath, thereby obtaining copper foils having the same thickness.
The application has the advantages that:
(1) the basic idea of the application is as follows: "different current densities are applied to N portions of the copper foil to achieve different weight gains when electroplating is performed on both sides and/or one side of the copper foil.
(2) The application provides the structural design of copper foil thickness uniformity processing equipment, namely, when electroplating is carried out in electroplating equipment in the prior art, the purpose (none of which can be achieved) can not be achieved by adopting different current densities for N parts of the copper foil and adopting the design of a metal plate-an insulating plate and a baffle.
(3) The copper foil thickness uniformity treatment equipment can be used for a post-treatment production line and can also be used for a raw foil-post-treatment integrated machine.
(4) The application also provides a copper foil thickness uniformity treatment process (application of another technical method), and particularly, the scheme of the application is not limited to two treatment grooves, but is also suitable for the situation of y treatment grooves. For the case of y processing tanks, the equipment and process design is as follows:
y processing grooves are arranged, and metal plates in the y processing grooves respectively correspond to yk +1, yk +2 and yk +3 … … yk + y; (k ═ 0,1 … …);
when the copper foil passes through the y treatment tanks, the copper foil is independently electroplated on both sides/one side of the copper foil, thereby realizing the treatment of uniformity of the thickness of the copper foil.
In particular, for y processing baths, there is y! The way is that; and the above-mentioned y! Such a method is possible and is also included in the scope of protection of the present application.
(5) The application provides two copper foil thickness uniformity treatment processes:
the first treatment process comprises the following steps:
firstly, searching the maximum average copper foil thickness for the copper foil in the first Vt stage, and then respectively calculating the difference value between the average copper foil thickness of each part and the maximum average copper foil thickness;
secondly, when the copper foil of the first Vt stage enters the first processing groove and the second processing groove respectively, determining the current density of the metal plate in the first processing groove and the second processing groove according to the difference value between the average thickness of the copper foil of each part and the maximum average thickness of the copper foil;
secondly, firstly, for the copper foil of the second Vt stage, finding the maximum average thickness of the copper foil, and then respectively calculating the difference value between the average thickness of the copper foil of each part and the maximum average thickness of the copper foil;
secondly, when the copper foil of the second Vt stage enters the first processing groove and the second processing groove respectively, determining the current density of the metal plate in the first processing groove and the second processing groove according to the difference value between the average thickness of the copper foil of each part and the maximum average thickness of the copper foil;
……。
that is, the copper foils have the same thickness in width, and the difference in thickness is only in the difference in the length direction of the copper foils.
The second treatment process comprises the following steps:
in the case of foil production, the copper foil is divided into N parts along the width (preferably, the copper foil is equally divided into N parts); arranging 1 laser on-line thickness gauge 2-2-1 in the middle of each part, wherein the laser on-line thickness gauge 2-2-1 is arranged every t0Measuring the data for 1 time every time to obtain the average thickness of the copper foil within t time, namely obtaining the average thickness of N parts within vt length (wherein the advancing speed of the copper foil is v);
firstly, searching the maximum average thickness of the copper foil for the whole copper foil wound by a winding roller, and then respectively calculating the difference value between the average thickness of the copper foil of N parts of the 1 st Vt stage and the maximum average thickness of the copper foil;
calculating the difference value between the average thickness of the copper foils of the N parts of the 2 nd Vt section and the maximum average thickness of the copper foils;
calculating the difference value between the average thickness of the copper foils of the N parts of the 3 rd Vt segment and the maximum average thickness of the copper foils;
……
calculating the difference value between the average thickness of the copper foils of the N parts of the x-th Vt segment and the maximum average thickness of the copper foils;
then, when the copper foil of the x-th Vt-band enters the first processing bath and the second processing bath, the current density of the metal plate in the first processing bath and the second processing bath is determined according to the difference between the average thickness of the copper foil of the N-th part of the x-th Vt-band and the maximum average thickness of the copper foil.
(6) When the copper foil is increased in weight on one side to achieve the same weight, the following means: through all treatment baths, the weight of the S-plane (or M-plane) was increased, instead of: the weight of the S surface is increased through the first treatment groove; and the weight of the M surface is increased through a second treatment groove.
Drawings
The invention will be further described in detail with reference to examples of embodiments shown in the drawings to which, however, the invention is not restricted.
Fig. 1 is a layout diagram of a post-treatment line including a copper foil thickness uniformity processing apparatus 2 (baffle not shown) of example 1.
FIG. 2a is a schematic view showing the design of the first treating tank 2-2 of example 1.
FIG. 2b is a schematic view showing the design of the second treating tank 2-3 in example 1.
FIG. 3 is a distribution diagram of the laser on-line thickness gauge 2-2-1 of example 1 along the width of the copper foil.
Fig. 4 is a schematic distribution diagram of the metal plate and the insulating plate of the first anode plate assembly.
Fig. 5 is a layout view of a post-treatment line including a copper foil thickness uniformity processing apparatus 2 (schematic baffle plate) of example 1.
Fig. 6 is a schematic view of the connection of the insulating plate 2-2-2-2 and the first baffle 2-2-3.
Fig. 7 is a schematic view of a copper foil having a length vt of 1 segment along the length direction.
Fig. 8 is a layout diagram of a post-treatment line including a copper foil thickness uniformity processing apparatus 2 (baffle not shown) of example 2.
The reference numerals in fig. 1-8 are illustrated as follows:
an unwinding roller 1 and a winding roller 3; a copper foil thickness uniformity processing device 2 comprises a copper foil thickness measuring device 2-1, a first processing tank 2-2 and a second processing tank 2-3;
the device comprises a laser on-line thickness gauge 2-2-1, a first treatment tank body 2-2-1, a first anode plate component 2-2-2, a second anode plate component 2-2-3 and a first submerged roller 2-2-4;
the metal plate 2-2-2-1, the insulating plate 2-2-2-2 and the first baffle 2-2-2-3;
a second treatment tank body 2-3-1, a third anode plate component 2-3-2, a fourth anode plate component 2-3-3 and a second liquid lower roller 2-3-4.
Detailed Description
Example 1: a copper foil thickness uniformity processing apparatus 2 includes, in accordance with the advancing direction of a copper foil: a copper foil thickness measuring device 2-1, a first processing tank 2-2 and a second processing tank 2-3;
the copper foil thickness measuring device 2-1 comprises a plurality of laser online thickness gauges 2-2-1 arranged along the width of the copper foil;
the copper foil is divided into N parts along the width (preferably, the copper foil is equally divided into N parts); arranging 1 laser online thickness measuring instrument 2-2-1 in the middle of each part (it should be noted that the division is only for convenience of description, namely the position of the online thickness measuring instrument 2-2-1 is not to divide the copper foil into N parts, namely the processed copper foil is still a whole on the width);
the first treatment tank 2-2 includes: a first treatment tank body 2-2-1, a first anode plate component 2-2-2, a second anode plate component 2-2-3 and a first submerged roller 2-2-4; the first anode plate assembly 2-2-2 and the second anode plate assembly 2-2-3 correspond to two sides (namely an S side and an M side) of the copper foil respectively; as shown in fig. 2, the first anode plate assembly 2-2-2 and the second anode plate assembly 2-2-3 are disposed on the side wall of the first treating tank body,
the first anode plate assembly 2-2-2 comprises N sub-plates corresponding to the widths of N parts of the copper foil; counting from left to right, the even number plates of the first anode plate assembly 2-2-2 are metal plates 2-2-2-1 and are electrified, and the odd number plates are insulating plates 2-2-2-2; further comprising: a plurality of first baffles 2-2-2-3; the first baffle corresponds to the insulating plate in position, the first baffle is arranged on one side of the copper foil facing the first anode plate assembly, and a gap (the gap is less than 1cm) is kept between the first baffle and the copper foil;
the first baffle plates 2-2-2-3 are connected with the corresponding insulating plates 2-2-2 through connecting rods (namely the number of the first baffle plates 2-2-3 is the same as that of the insulating plates of the first anode plate assembly 2-2-2);
the second anode plate assembly 2-2-3 has the same structure as the first anode plate assembly 2-2-2, i.e. the second anode plate assembly 2-2-3 also comprises N sub-plates, also comprising: the insulating plate, the metal plate and the second baffle plate;
the metal plate of the second anode plate component 2-2-3 corresponds to the metal plate of the first anode plate component 2-2-2, so that from left to right, the double surfaces of the even parts of the copper foil are processed with equal thickness, and the odd parts are not increased in thickness;
the second baffle plate corresponds to the insulating plate of the second anode plate assembly 2-2-3, the second baffle plate is arranged on one side of the copper foil facing the second anode plate assembly, and a gap (the gap is less than 1cm) is kept between the second baffle plate and the copper foil (the positions of the first baffle plate and the second baffle plate are from the height of the solution to the position of the submerged roller, namely, the widths of the first baffle plate and the second baffle plate are respectively the same as the widths of the insulating plate of the first anode plate assembly 2-2-2 and the insulating plate of the second anode plate assembly 2-2-3, and the length of the first baffle plate is larger than the length of the insulating plate of the first anode plate assembly 2-2-2).
The first anode plate component 2-2-2 and the second anode plate component 2-2-3 are alternately arranged in a mode of metal plates and insulating plates, and the following effects can be achieved: each metal plate can adopt independent current density to, the cooperation sets up the baffle in one side of the corresponding copper foil of insulation board, thereby makes: both sides of the even-numbered portion of the copper foil are thickened.
The second treatment tank 2-3 includes: a second treatment tank body 2-3-1, a third anode plate component 2-3-2, a fourth anode plate component 2-3-3 and a second liquid lower roller 2-3-4; the third anode plate component 2-3-2 and the fourth anode plate component 2-3-3 correspond to two sides (namely an S side and an M side) of the copper foil respectively; as shown in fig. 2, the third anode plate assembly 2-3-2 and the fourth anode plate assembly 2-3-3 are arranged on the side wall of the second treating tank body,
the third anode plate assembly 2-3-2 comprises N sub-plates, the N sub-plates corresponding to the widths of the N parts of the copper foil;
from left to right, the odd plates of the third anode plate assembly 2-3-2 are metal plates and are electrified, and the even plates are insulating plates;
further comprising: a third baffle plate; the third baffle corresponds to the position of the insulating plate of the third anode plate assembly 2-3-2, the third baffle is arranged on one side of the copper foil facing the third anode plate assembly, and a gap (the gap is less than 1cm) is kept between the third baffle and the copper foil; the third baffle plate is connected with the insulating plate of the third anode plate component 2-3-2 through a connecting rod;
the fourth anode plate assembly 2-3-3 has the same structure as the third anode plate assembly 2-3-2, that is, the fourth anode plate assembly 2-3-3 includes N sub-plates, which also includes: the insulating plate, the metal plate and the fourth baffle plate;
the metal plate of the fourth anode plate assembly 2-3-3 corresponds to the metal plate of the third anode plate assembly 2-3-2, so that the double surfaces of the odd-numbered parts of the copper foil are subjected to equal-thickness treatment from left to right; while the even-numbered portions have no thickness increase;
the fourth baffle corresponds to the insulating plate of the fourth anode plate assembly 2-3-3, the fourth baffle is arranged on one side of the copper foil facing the fourth anode plate assembly 2-3-3, and a gap (the gap is less than 1cm) is kept between the fourth baffle and the copper foil (the positions of the third baffle and the fourth baffle are from the height of the solution to the position of the liquid lower roller, namely, the widths of the third baffle and the fourth baffle are respectively the same as the widths of the insulating plate of the third anode plate assembly and the insulating plate of the fourth anode plate assembly, and the length of the third baffle is larger than the length of the insulating plate of the third anode plate assembly).
The third anode plate component and the fourth anode plate component are alternately arranged in a mode of metal plates and insulating plates, and the following effects can be achieved: each metal plate can adopt independent current density to, the cooperation sets up the baffle in one side of the corresponding copper foil of insulation board, thereby makes: both sides of the odd-numbered portion of the copper foil are thickened.
Correspondingly, the copper foil thickness uniformity treatment process comprises the steps of dividing the width of a copper foil into N parts (preferably, equally dividing the copper foil into N parts), arranging 1 laser online thickness meter 2-2-1 at each part, and obtaining the thickness of the copper foil along the width through the laser online thickness meter 2-2-1;
then, the copper foil is subjected to plating on both sides and/or one side of the copper foil through the treatment bath, and the N portions of the copper foil are subjected to weight increasing treatment and then to other processes (for example, after being subjected to uniformity treatment, roughening, curing, and oxidation preventing treatment), whereby a copper foil having a uniform thickness can be obtained.
Firstly, performing weight increasing treatment on even parts of the N parts through a first treatment tank;
then, the copper foil is subjected to weight increasing treatment on odd-numbered parts of the N parts through a second treatment tank, so that copper foils with the same thickness are obtained.
The principle of the copper foil thickness uniformity treatment process is as follows:
the copper foil is divided into N portions along the width, and according to the long-term experience of the applicant, the thickness of the N portions along the advancing direction of the copper foil does not substantially vary, and the main thickness unevenness of the copper foil is reflected in the unevenness in the width direction.
Laser on-line thickness gauge 2-2-1 every t0The average thickness of the copper foil within t time can be obtained by measuring data 1 time by time, namely the average thickness of N parts within vt length (wherein the advance speed of the copper foil is v).
The time for the copper foil to pass through the first treatment tank is t1The time of passing through the second treatment tank is also t1；t>10t1。
When the copper foil is subjected to a foil thickness uniformity treatment process, the metal plates in the first treatment groove and the second treatment groove can select different current densities, so that the copper foil is equal in thickness on the N parts.
As shown in fig. 7, the specific steps are as follows:
firstly, searching the maximum average copper foil thickness for the copper foil in the first Vt stage, and then respectively calculating the difference value between the average copper foil thickness of each part and the maximum average copper foil thickness;
secondly, when the copper foil of the first Vt stage enters the first processing groove and the second processing groove respectively, determining the current density of the metal plate in the first processing groove and the second processing groove according to the difference value between the average thickness of the copper foil of each part and the maximum average thickness of the copper foil;
secondly, firstly, for the copper foil of the second Vt stage, finding the maximum average thickness of the copper foil, and then respectively calculating the difference value between the average thickness of the copper foil of each part and the maximum average thickness of the copper foil;
secondly, when the copper foil of the second Vt stage enters the first processing groove and the second processing groove respectively, determining the current density of the metal plate in the first processing groove and the second processing groove according to the difference value between the average thickness of the copper foil of each part and the maximum average thickness of the copper foil;
……。
that is, the copper foils have the same thickness in width, and the difference in thickness is only in the difference in the length direction of the copper foils.
It should be noted that: the above process also enables the copper foil to be treated unevenly in the longitudinal direction.
The method comprises the following steps:
in the case of foil production, the copper foil is divided into N parts along the width (preferably, the copper foil is equally divided into N parts); arranging 1 laser on-line thickness gauge 2-2-1 in the middle of each part, wherein the laser on-line thickness gauge 2-2-1 is arranged every t0Measuring the data for 1 time every time to obtain the average thickness of the copper foil within t time, namely obtaining the average thickness of N parts within vt length (wherein the advancing speed of the copper foil is v);
firstly, searching the maximum average thickness of the copper foil for the whole copper foil wound by a winding roller, and then respectively calculating the difference value between the average thickness of the copper foil of N parts of the 1 st Vt stage and the maximum average thickness of the copper foil;
calculating the difference value between the average thickness of the copper foils of the N parts of the 2 nd Vt section and the maximum average thickness of the copper foils;
calculating the difference value between the average thickness of the copper foils of the N parts of the 3 rd Vt segment and the maximum average thickness of the copper foils;
……
calculating the difference value between the average thickness of the copper foils of the N parts of the x-th Vt segment and the maximum average thickness of the copper foils;
then, when the copper foil of the x-th Vt-band enters the first processing bath and the second processing bath, the current density of the metal plate in the first processing bath and the second processing bath is determined according to the difference between the average thickness of the copper foil of the N-th part of the x-th Vt-band and the maximum average thickness of the copper foil.
Example 2, as shown in fig. 8, the first treatment tank was provided with 2 first anode plate assemblies, 2 second anode plate assemblies; the second treatment tank is provided with 2 third anode plate assemblies and 2 fourth anode plate assemblies.
In example 3, the copper foil of example 1 was divided into N portions and treated separately. Specifically, the processing is performed in odd-even numbers.
The width of each of the N portions of the copper foil is 33mm or less.
The protocol of example 3 is: y processing grooves are arranged, and metal plates in the y processing grooves respectively correspond to yk +1, yk +2 and yk +3 … … yk + y; (k is 0,1 … …).
For example: the sequence of the 1 st treatment tank in the width direction of the copper foil is as follows: processing part of yk + 1;
the sequence of the 2 nd processing groove in the width direction of the copper foil is as follows: processing the yk +2 part;
……
the sequence of the y-th treatment tank in the width direction of the copper foil is as follows: the yk + y fraction is processed.
When y is 3, 3 processing tanks are arranged;
the sequence of the 1 st treatment tank in the width direction of the copper foil is as follows: 1, 4,7 … … (the sequence may be expressed as: 3k + 1);
the sequence of the 2 nd processing groove in the width direction of the copper foil is as follows: 2, 5,8 … … (the sequence may be expressed as: 3k + 2);
the sequence of the 3 rd treatment tank in the width direction of the copper foil is as follows: 3, 6,9 … … (the sequence may be expressed as: 3k + 3);
it should be noted that:
when y is 3, 3 processing tanks are arranged;
the sequence of the 1 st treatment tank in the width direction of the copper foil is as follows: 3, 6,9 … … (the sequence may be expressed as: 3k + 3);
the sequence of the 2 nd processing groove in the width direction of the copper foil is as follows: 2, 5,8 … … (the sequence may be expressed as: 3k + 2);
the sequence of the 3 rd treatment tank in the width direction of the copper foil is as follows: 1, 4,7 … … (the sequence may be expressed as: 3k + 1);
it is also possible that for 3 treatment baths, there are 6 ways of treating the copper foil.
For y processing tanks, there is y! The way is that; and the above-mentioned y! Such a method is possible and is also included in the scope of protection of the present application.
It should be noted that: the solutions in the treatment tank in the present application are all sulfuric acid-copper sulfate solutions, that is, the thickness uniformity treatment is still realized by increasing the weight of copper (but not other metals).
It should be noted that: the solutions in the y treatment tanks were: the Cu2+ content is 66-70g/L, the H2SO4 content is 95-105g/L, and the temperature is 44-46 ℃;
the time for the copper foil to pass through each treatment tank is 2-3 s; the linear velocity of the copper foil is 20 m/min; when the weight gain is L (unit: g), the current density is: 1583x (i.e., 1583 XL) A/m2(the data above are for single-sided thickening).
The above-mentioned embodiments are only for convenience of description, and are not intended to limit the present invention in any way, and those skilled in the art will understand that the technical features of the present invention can be modified or changed by other equivalent embodiments without departing from the scope of the present invention.

Claims (8)

1. A copper foil thickness uniformity processing apparatus, according to the advancing direction of a copper foil, comprising: the device comprises a copper foil thickness measuring device, a first processing groove and a second processing groove; or, according to the advancing direction of the copper foil, comprises: the device comprises a copper foil thickness measuring device, a second processing tank and a first processing tank;
the copper foil thickness measuring device comprises N laser online thickness gauges arranged along the width of the copper foil, and the directions of the N laser online thickness gauges are vertical to the advancing direction of the copper foil; the copper foil is divided into N parts along the width; arranging 1 laser on-line thickness gauge in the middle of each part;
wherein, first treatment trough includes: a first processing tank body;
the first treatment tank also comprises a first anode plate assembly and/or a second anode plate assembly; the first anode plate component corresponds to the S surface of the copper foil, and the second anode plate component corresponds to the M surface of the copper foil;
the first anode plate assembly comprises N sub-plates, and the N sub-plates correspond to the widths of N parts of the copper foil; counting from left to right, the even number plates of the N daughter boards are metal plates and are electrified, and the odd number plates are insulating plates; further comprising: a plurality of first baffles; the first baffle corresponds to the insulating plate in position, the first baffle is arranged on one side of the copper foil facing the first anode plate assembly, and a gap is kept between the first baffle and the copper foil; the first baffle plate is connected with the corresponding insulating plate of the first anode plate assembly through a connecting rod;
the second anode plate assembly has the same structure as the first anode plate assembly, namely the second anode plate assembly also comprises N sub-plates, and the N sub-plates correspond to the widths of the N parts of the copper foil; counting from left to right, wherein even plates of the N sub-plates are metal plates and are electrified; further comprising: a second baffle;
the metal plate of the second anode plate assembly corresponds to the metal plate of the first anode plate assembly, so that from left to right, the two surfaces of the even-numbered part of the copper foil are subjected to equal-thickness treatment, and the thickness of the odd-numbered part is not increased; the second baffle corresponds to the position of the insulating plate of the second anode plate assembly, the second baffle is arranged on one side of the copper foil facing the second anode plate assembly, and a gap is kept between the second baffle and the copper foil; the second baffle plate is connected with the corresponding insulating plate of the second anode plate assembly through a connecting rod;
a second processing tank comprising: a second processing tank body;
the second treatment tank also comprises a third anode plate assembly and/or a fourth anode plate assembly; the third anode plate component corresponds to the S surface of the copper foil, and the fourth anode plate component corresponds to the M surface of the copper foil;
the third anode plate assembly comprises N daughter plates, and the N daughter plates correspond to the widths of N parts of the copper foil; from left to right, the odd plates of the third anode plate assembly are metal plates and are electrified, and the even plates are insulating plates; further comprising: a third baffle plate; the third baffle corresponds to the position of the insulating plate of the third anode plate assembly, the third baffle is arranged on one side of the copper foil facing the third anode plate assembly, and a gap is kept between the third baffle and the copper foil; the third baffle plate is connected with the insulating plate of the third anode plate assembly through a connecting rod;
the fourth anode plate assembly and the third anode plate assembly have the same structure.
2. The copper foil thickness uniformity processing apparatus of claim 1, wherein the metal plate of the fourth anode plate assembly corresponds to the metal plate of the third anode plate assembly such that both sides of the odd-numbered portions of the copper foil are equally thick from left to right; while the even-numbered portions have no thickness increase;
the fourth baffle corresponds with the position of the insulating plate of the fourth anode plate assembly, the fourth baffle is arranged on one side, facing the fourth anode plate assembly, of the copper foil, and a gap is kept between the fourth baffle and the copper foil.
3. The copper foil thickness uniformity processing apparatus of claim 2, wherein the third and fourth baffles are positioned: the height of the solution reaches the position of the submerged roller; the widths of the third baffle and the fourth baffle are respectively the same as the widths of the insulating plate of the third anode plate assembly and the insulating plate of the fourth anode plate assembly, and the length of the third baffle is larger than that of the insulating plate of the third anode plate assembly.
4. The copper foil thickness uniformity processing apparatus of claim 1 or 3, wherein the first and second baffles are positioned: the height of the solution reaches the position of the submerged roller; the widths of the first baffle and the second baffle are respectively the same as the widths of the insulating plate of the first anode plate assembly and the insulating plate of the second anode plate assembly, and the length of the first baffle is larger than that of the insulating plate of the first anode plate assembly.
5. The copper foil thickness uniformity processing device of claim 2, wherein the first anode plate assembly and the second anode plate assembly are alternately arranged in a metal plate-insulating plate manner, so that the following can be realized: each metal plate can adopt independent current density, and, the cooperation sets up first baffle, second baffle respectively in one side of the insulating board of first anode plate subassembly, the corresponding copper foil of insulating board of second anode plate subassembly, thereby makes: the two sides of the even number part of the copper foil are thickened;
the third anode plate component and the fourth anode plate component are alternately arranged in a mode of metal plates and insulating plates, and the following effects can be achieved: each metal plate can adopt independent current density, and, in cooperation, one side of the corresponding copper foil of insulation board of third anode plate subassembly, insulation board of fourth anode plate subassembly sets up third baffle, fourth baffle respectively, thereby makes: both sides of the odd-numbered portion of the copper foil are thickened.
6. A copper foil thickness uniformity processing apparatus, according to the advancing direction of a copper foil, comprising: the device comprises a copper foil thickness measuring device and y processing tanks, wherein y is more than or equal to 3;
the copper foil thickness measuring device comprises N laser online thickness gauges arranged along the width of the copper foil, and the directions of the N laser online thickness gauges are vertical to the advancing direction of the copper foil; the copper foil is divided into N parts along the width; arranging 1 laser on-line thickness gauge in the middle of each part;
each treatment tank includes: a treatment tank body;
each treatment tank also comprises an S-surface anode assembly and/or an M-surface anode plate assembly; the S-surface anode assembly corresponds to the S surface of the copper foil, and the M-surface anode assembly corresponds to the M surface of the copper foil; for each treatment tank, the structure of the S-surface anode assembly is the same as that of the M-surface anode assembly;
the S-surface anode assembly comprises a metal sub-plate and an insulator sub-plate, and the number of the metal sub-plate and the insulator sub-plate is N; the width of metal daughter board, the insulator board corresponds with the width of N parts of copper foil, S face anode assembly still includes: a baffle plate; the baffle plate corresponds to the insulator plate and is arranged on the surface of the copper foil; each baffle is connected with the corresponding insulator plate through a connecting rod;
the metal sub-plates in the S-surface anode assembly and/or the M-surface anode plate assembly are mutually divided, namely at least 1 insulator sub-plate is arranged between every two adjacent 2 metal sub-plates;
the copper foil parts corresponding to the metal sub-plates in any 2 treatment tanks are not overlapped;
the sum of the copper foil portions corresponding to the metal daughter boards in all the treatment grooves is equal to the width of the copper foil.
7. A post-treatment production line is characterized by comprising the following components in sequence according to the advancing direction of a copper foil: an unwinding roller, the copper foil thickness uniformity treatment device as claimed in claim 1 or 6, a rinsing bath, a drying device and a winding roller.
8. A raw foil-post-processing integrated machine is characterized by comprising the following components in sequence according to the advancing direction of a copper foil: the device comprises a foil generating machine, the copper foil thickness uniformity treatment equipment as claimed in claim 1 or 6, a rinsing bath, a drying device and a winding roll.
CN202010567321.5A 2020-06-19 2020-06-19 Copper foil thickness uniformity treatment equipment, post-treatment production line and raw foil-post-treatment integrated machine Active CN111763962B (en)

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JP2010236037A (en) * 2009-03-31 2010-10-21 Hitachi Cable Ltd Plating method of copper foil and plating apparatus therefor
CN207608646U (en) * 2017-11-14 2018-07-13 灵宝华鑫铜箔有限责任公司 Post-treatment solution slot
CN208761820U (en) * 2018-09-28 2019-04-19 惠州联合铜箔电子材料有限公司 A kind of cutting on-line thickness measurement device
CN110926403A (en) * 2019-11-28 2020-03-27 九江德福科技股份有限公司 Cathode roller roughness testing method

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10357174B3 (en) * 2003-12-06 2005-02-03 Vipem Hackert Gmbh Continuous deposition of adherent coatings on e.g. smooth copper foil comprises passing foil through bath containing copper ions and applying double pulses consisting of short, steep pulse followed by longer, flatter pulse
CN1637173A (en) * 2004-12-01 2005-07-13 哈尔滨工业大学 Anode unit for continuous electroplating of belt poor conductor
JP2010236037A (en) * 2009-03-31 2010-10-21 Hitachi Cable Ltd Plating method of copper foil and plating apparatus therefor
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