CN100453698C - Pretreatment method for electroless plating material and method for producing member having plated coating - Google Patents
Pretreatment method for electroless plating material and method for producing member having plated coating Download PDFInfo
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- CN100453698C CN100453698C CNB2003801010640A CN200380101064A CN100453698C CN 100453698 C CN100453698 C CN 100453698C CN B2003801010640 A CNB2003801010640 A CN B2003801010640A CN 200380101064 A CN200380101064 A CN 200380101064A CN 100453698 C CN100453698 C CN 100453698C
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- solution
- resin material
- ozone
- electroless plating
- coating
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- 239000000463 material Substances 0.000 title claims abstract description 129
- 239000011248 coating agent Substances 0.000 title claims abstract description 63
- 238000000576 coating method Methods 0.000 title claims abstract description 63
- 238000007772 electroless plating Methods 0.000 title claims description 37
- 238000004519 manufacturing process Methods 0.000 title claims description 10
- 238000002203 pretreatment Methods 0.000 title description 3
- 239000011347 resin Substances 0.000 claims abstract description 117
- 229920005989 resin Polymers 0.000 claims abstract description 117
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 claims abstract description 64
- 238000000034 method Methods 0.000 claims description 105
- 230000001678 irradiating effect Effects 0.000 claims description 28
- 238000000746 purification Methods 0.000 claims description 17
- 239000002904 solvent Substances 0.000 claims description 13
- 238000009713 electroplating Methods 0.000 claims description 11
- 239000002798 polar solvent Substances 0.000 claims description 11
- 239000003945 anionic surfactant Substances 0.000 claims description 9
- 239000012528 membrane Substances 0.000 claims description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 14
- 238000007788 roughening Methods 0.000 abstract description 10
- 230000004913 activation Effects 0.000 abstract description 7
- 239000000853 adhesive Substances 0.000 abstract description 6
- 230000001070 adhesive effect Effects 0.000 abstract description 6
- 230000015572 biosynthetic process Effects 0.000 abstract description 2
- 239000000243 solution Substances 0.000 description 63
- 239000002585 base Substances 0.000 description 20
- 239000013543 active substance Substances 0.000 description 14
- 125000000524 functional group Chemical group 0.000 description 12
- 230000000694 effects Effects 0.000 description 10
- 239000000203 mixture Substances 0.000 description 9
- 239000004743 Polypropylene Substances 0.000 description 8
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 8
- 229920001155 polypropylene Polymers 0.000 description 8
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 7
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- 238000001179 sorption measurement Methods 0.000 description 6
- 239000010453 quartz Substances 0.000 description 5
- 239000004094 surface-active agent Substances 0.000 description 5
- 229910018104 Ni-P Inorganic materials 0.000 description 4
- 229910018536 Ni—P Inorganic materials 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 229910014033 C-OH Inorganic materials 0.000 description 3
- 229910014570 C—OH Inorganic materials 0.000 description 3
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 150000005690 diesters Chemical class 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 3
- 229910052753 mercury Inorganic materials 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910017604 nitric acid Inorganic materials 0.000 description 3
- KDLHZDBZIXYQEI-UHFFFAOYSA-N palladium Substances [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- -1 polypropylene Polymers 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 238000007670 refining Methods 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 2
- 241000282326 Felis catus Species 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 230000002950 deficient Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 2
- 125000001165 hydrophobic group Chemical group 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 230000007935 neutral effect Effects 0.000 description 2
- 229920000098 polyolefin Polymers 0.000 description 2
- 230000000630 rising effect Effects 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- CMCBDXRRFKYBDG-UHFFFAOYSA-N 1-dodecoxydodecane Chemical compound CCCCCCCCCCCCOCCCCCCCCCCCC CMCBDXRRFKYBDG-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- RYSDLKUUJXZIFX-UHFFFAOYSA-N [K].C(CCCCCCCCCCCCCCCCC)OS(O)(=O)=O Chemical compound [K].C(CCCCCCCCCCCCCCCCC)OS(O)(=O)=O RYSDLKUUJXZIFX-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 239000005456 alcohol based solvent Substances 0.000 description 1
- 230000001476 alcoholic effect Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 229910000365 copper sulfate Inorganic materials 0.000 description 1
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- FMWAXKQEIXRUTI-UHFFFAOYSA-N dodecyl hydrogen sulfate;sodium Chemical compound [Na].CCCCCCCCCCCCOS(O)(=O)=O FMWAXKQEIXRUTI-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229920000840 ethylene tetrafluoroethylene copolymer Polymers 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 231100001261 hazardous Toxicity 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- GNOIPBMMFNIUFM-UHFFFAOYSA-N hexamethylphosphoric triamide Chemical compound CN(C)P(=O)(N(C)C)N(C)C GNOIPBMMFNIUFM-UHFFFAOYSA-N 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- KVLWVMFPAVOFSG-UHFFFAOYSA-N octadecyl hydrogen sulfate;sodium Chemical compound [Na].CCCCCCCCCCCCCCCCCCOS(O)(=O)=O KVLWVMFPAVOFSG-UHFFFAOYSA-N 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920000259 polyoxyethylene lauryl ether Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000009790 rate-determining step (RDS) Methods 0.000 description 1
- 229920003987 resole Polymers 0.000 description 1
- 150000003384 small molecules Chemical class 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 1
Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1646—Characteristics of the product obtained
- C23C18/165—Multilayered product
- C23C18/1653—Two or more layers with at least one layer obtained by electroless plating and one layer obtained by electroplating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/04—Pretreatment of the material to be coated
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1229—Composition of the substrate
- C23C18/1233—Organic substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/2006—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/2006—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30
- C23C18/2026—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30 by radiant energy
- C23C18/204—Radiation, e.g. UV, laser
Landscapes
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Thermal Sciences (AREA)
- Inorganic Chemistry (AREA)
- Chemically Coating (AREA)
- Electroplating Methods And Accessories (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Abstract
A resin material is brought into contact with a first solution containing ozone, and at the same time, ultraviolet rays are irradiated. The activation due to the treatment with ozone water and the activation due to the treatment with ultraviolet rays are synergistically operated to enable the formation of a plated coating having excellent adhesive strength by a short treatment. In addition, even by a long treatment, the adhesive strength can be restrained from lowering. Consequently, a plated coating having excellent adhesion can be formed without roughening the surface of the resin material by a short pretreatment.
Description
Technical field
The present invention relates to a kind of pretreatment process that improves coating adhesion.This coating is to form by the electroless plating film is carried out on the surface of resin material.The invention still further relates to the method that is used to make element with this coating.
Background technology
Known electroless plating film is a kind of method that makes resin material have electroconductibility and metalluster.This electroless plating film be in a kind of chemical reducing solution metal ion and in the method for material surface metal refining coating, and by this method, also can for example form metallic coating on the resin at isolator, this is with the electro-plating method of metal refining coating is different by using electric energy to carry out electrolysis.In addition, can form the enterprising electroplating of resin material of metallic coating by the electroless plating film, thereby enlarge the purposes of resin material.Owing to these reasons, the electroless plating film be widely used as making be used for various fields for example the resin material of motor vehicle zeroth order, household electrical appliance etc. have the method for metalluster and/or electroconductibility.
Yet, use the film formed coating of electroless plating to have following problem: need to spend considerable time with the formation coating, and coating to be also insufficient for the sticking power of resin material.In order to address these problems, before the electroless plating film, implement the process that chemical milling makes its surface roughening usually.
For example, the open case spy of Japanese unexamined patent publication No. opens flat 1-092377 and discloses and use ozone gas to anticipate resin material, the resin material of handling is carried out the method for electroless plating film then.According to the disclosure case, the unsaturated link(age) in the resin material is cut off and is converted into small molecules by ozone gas, and therefore, the molecule with different chemical composition coexists as on the surface of resin material, and smoothness has been lost on the resin material surface thus, and the surface is roughened.Therefore, enter the surface of roughening firmly, thereby prevent that coating from peeling off from above easily through the film formed coating of electroless plating.
In addition, the open case spy of Japanese unexamined patent publication No. opens flat 8-092752 and discloses and a kind ofly make polyolefine roughening as resin material in advance, make the polyolefinic method that the polyolefine of this roughening contacts with ozone water, use comprises this roughening of solution-treated of cats product then by etching.
In above-mentioned methods involving, use the so-called anchor effect that causes by the surface roughening of resin material to improve the sticking power of coating.Yet, use these methods, the surface smoothness of resin material has reduced.Therefore, in order to obtain to make resin material have the metalluster of good appearance, coating must be thicker, and this causes increasing the defective in man-hour.
In addition, in the method for the surface roughening that makes resin material by etching, must use Hazardous substancess such as chromic acid, sulfuric acid, and therefore in the processing of gained liquid debris etc., go wrong.And this method can not solve the problem of the surface smoothness decline of resin material.
In these cases, the open case spy of Japanese unexamined patent publication No. opens flat 10-088361 and the open case spy of Japanese unexamined patent publication No. and opens flat 8-253869 and disclose and use the uviolizing resin material and use the electroless plating film to handle the method for the resin material that obtains.By uviolizing, the surface of resin material obtains activation, and the active group on the activatory resin material with as the active metal particles Chemical bond of plated material, thereby form coating with good adhesion.
Then, the method for uviolizing needs the surface of lot of energy with the activated resin material, and therefore resin material occurred because the situation that the caloradiance of light source is degraded.
In addition, only handle or the method for uviolizing for example is difficult to activate polypropylene (PP) or comprises elastomerics and the resin material of the polymer alloy of PP by ozone gas.In addition, clear the adhesion strength of coating just descends when the treatment time is long or too short, and still, the boundary in this treatment time is unclear, to such an extent as to be difficult to determine this treatment time.And, realize that the required treatment time of enough adhesion strengths of coating is generally longer, and production efficiency is low.Therefore, need to shorten the treatment time.
These problems in view of methods involving have proposed the present invention, and the objective of the invention is to obtain a kind of shorter pre-treatment of the surface roughening by need not to make resin material and can form the method for the coating with excellent adhesive attraction.
The pretreatment process that the present invention is used for the electroless plating mould material is characterised in that: be implemented in resin material and comprise ozone solution-uv irradiating treating processes of using this resin material of uviolizing under the first solution state of contact of ozone.
The preferred alkaline purification process of further implementing to make second solution that comprises basic component to contact with the resin material that the process ozone solution-the uv irradiating treating processes is handled.And preferably in second solution, also comprise at least a of anion surfactant and nonionogenic tenside.And preferred first solution comprises the solvent of being made up of the organic or inorganic polar solvent.
In addition, the method that manufacturing of the present invention has the element of coating is characterised in that: comprised resin material with comprise ozone solution-uv irradiating treating processes of using this plated material of uviolizing under the first solution state of contact of ozone and to carry out the electroless plating membrane process of electroless plating film through the resin material after ozone solution-uv irradiating treating processes.
Preferably between ozone solution-uv irradiating treating processes and electroless plating membrane process, further comprise the alkaline purification process that second solution that comprises basic component is contacted with resin material.In addition, preferably in second solution, also comprise at least a of anion surfactant and nonionogenic tenside.And preferred first solution comprises the solvent of being made up of the organic or inorganic polar solvent.In addition, preferably include the resin material of further process electroless plating membrane method being handled and carry out electroplating processes.
Brief Description Of Drawings
Fig. 1 is the synoptic diagram of supposition operation of the present invention.
Fig. 2 is the synoptic diagram of the ozone solution-uv irradiating treating processes in first kind of embodiment of explanation.
Fig. 3 is the synoptic diagram of the ozone solution-uv irradiating treating processes in second kind of embodiment of explanation.
Implement best mode of the present invention
At the pretreatment process that is used for the electroless plating mould material of the present invention, be implemented in resin material and comprise ozone solution-uv irradiating treating processes of using this resin material of uviolizing under the first solution state of contact of ozone.By using this resin material of uviolizing under the first solution state of contact of ozone with comprising at resin material, by the formed ozone of oxygen that produces from first solution by uviolizing and the operation of oxyradical activated resin material surface, by connecting the operation that solvent in first solution and the active group on the resin material activating surface form polar group, thereby be dispersed into the operation that suppresses in first solution the pyrolytic damage of resin material by the excessive heat that resin material is produced because of uviolizing, these operate synergy, even if also can greatly improve the activity on resin material surface through managing, thereby can form coating with excellent adhesive attraction than weakness.In addition, though be for example PP, comprise under the situation of resin material etc. of polymer alloy of elastomerics and PP, also can form coating with excellent adhesive attraction.
Can use thermoplastic resin, for example ABS, AS, AAS, PS, EVA, PMMA, PBT, PET, PPS, PA, POM, PC, PP, PE, the polymer alloy that comprises elastomerics and PP, MODIFIED PP O, PTFE, ETFE etc., or heat reactive resin, for example resol, Resins, epoxy etc.Its structure there is no particular restriction.
Ozone concn in first solution has great influence to the resin material surface active, can observe activation effect when concentration increases to about 10ppm, and when concentration be 100ppm or when higher, activation effect is increased sharply and makes the treatment time shorter.And when concentration was low, resin material can go bad before activation, thereby preferred higher ozone concn.
Usually, water is as the solvent of first solution, but preferably uses the organic or inorganic polar solvent as solvent.Use this solvent, can further shorten the treatment time.The example of organic polar solvent comprises for example alcohol of methyl alcohol, ethanol or Virahol etc., N, the organic acid of N-dimethylformaldehyde, N,N-dimethylacetamide, methyl-sulphoxide, N-Methyl pyrrolidone, hexamethylphosphoramide, for example formic acid, acetate etc. or the mixture of these solvents and water and alcoholic solvent.The example of inorganic polar solvent comprises mineral acid, for example nitric acid, hydrochloric acid, hydrofluoric acid etc.
The ultraviolet wavelength of preferred irradiation is 310nm or littler, more preferably 260nm or littler wavelength, further preferred 150 to about 200nm wavelength region.And the amount of preferred uviolizing is 50mJ/cm
2Or it is more.Can use the light source as this uviolizing such as Cooper-Hewitt lamp, high pressure mercury vapour lamp, excimer laser, grid discharge lamp, microwave electrodeless discharge lamp.
For resin material is contacted with first solution that comprises ozone, adopt first spray solution to the method on the surface of resin material, resin material is immersed in method in first solution etc.With first spray solution is compared to the situation on the resin material, adopt resin material is immersed in method in first solution, ozone is difficult to discharge from first solution, thereby dipping method is preferred.In order to carry out uviolizing, preferred irradiation is immersed in the resin material in first solution that comprises ozone.By this method, can suppress because the distortion of the resin material that the ultraviolet light source thermal conductance of emitting causes and rotten, and can prevent the shortcoming of the sticking power reduction of coating when the long-time irradiation of ultraviolet ray.
For with uviolizing to the resin material that is immersed in first solution, ultraviolet source can be put into first solution and carry out uv irradiating, perhaps the upside from first liquid level of solution carries out uv irradiating.And by being the container that first solution is made the material (for example vitreous silica) with ultraviolet ray property transmitted, can carry out uv irradiating from the outside of the container of first solution.
When using the uviolizing resin material after first solution contacts, preferred short irradiation ultraviolet ray, for example 1 minute or still less.If passed through the long period after contacting with first solution, will be difficult to realize ozone and ultraviolet synergy, and adopt short irradiation to handle the sticking power that may reduce coating.
Basically, rising along with treatment temp in ozone solution-uv irradiating treating processes, speed of response improves, but rising along with treatment temp, the solubleness of the ozone in first solution reduces, and, under being higher than 40 ℃ temperature with first solution in the concentration of ozone bring up to 100ppm or higher, must be forced into above a normal atmosphere handling atmosphere, thereby equipment becomes big.Therefore, do not become big if do not wish equipment, approximately room temperature has been exactly enough good treatment temp.
Depend on the resinous type of resin material the duration of contact of first solution and resin material in ozone solution-uv irradiating treating processes, but be preferably 4 to 20 minutes.Less than 4 minutes the time, even if also be difficult to realize the effect of ozonize when ozone concn is 100ppm, and during greater than 20 minutes, resin material takes place rotten.
In addition, depend on the resinous type of resin material in the irradiation time of ozone solution-uv irradiating treating processes middle-ultraviolet lamp, but be preferably 4 to 15 minutes.Less than 4 minutes the time, be difficult to realize the effect of uviolizing, and during greater than 15 minutes, resin material may go bad, or the coating adhesion strength may be because hot the reduction.
In the pretreatment process of electroless plating mould material according to the present invention, the alkaline purification process that second solution that comprises basic component is contacted with resin material.Described basic component has the function at molecular level dissolving resin material surface, thereby fragile layer is removed from the surface of resin material, and a large amount of functional groups is displayed on the surface of resin material.Thereby the sticking power of coating is further enhanced.
Can use and to use sodium hydroxide, potassium hydroxide, lithium hydroxide etc. at molecular level dissolving resin material surface to remove the basic component of fragile layer.
Preferred second solution also comprises at least a of anion surfactant and nonionogenic tenside.
It has been generally acknowledged that, because ozone solution-uv irradiating treating processes, have on the surface of resin material that C=O of functional group and C-OH's is at least a.Therefore, shown in Fig. 1 (A), (B), it has been generally acknowledged that in the alkaline purification process that the hydrophobic group of tensio-active agent 1 is adsorbed in the above-mentioned functional group that appears at the resin material surface.In addition, because basic material has been removed fragile layer, tensio-active agent 1 also is adsorbed in the new functional group of appearance.
Then, in the electroless plating membrane process, the resin material that is adsorbed with tensio-active agent is contacted with catalyzer.Shown in Fig. 1 (C), it has been generally acknowledged that on the hydrophilic group of the tensio-active agent 1 that this causes catalyzer 2 to be adsorbed to being adsorbed in the above-mentioned functional group.
And, it is generally acknowledged that carry out the electroless plating film by the resin material to the catalyzer that is adsorbed with q.s, tensio-active agent discharges from functional group, and melts combine is on C-O group and/or C=O group.Therefore, can form coating with excellent adhesive attraction.
Use its hydrophobic group to be adsorbed onto tensio-active agent on C=O of functional group and C-OH at least a easily, and use at least a of anion surfactant and nonionogenic tenside.In the situation of using cats product and neutral surface active agent, can not form coating, perhaps be difficult to realize above-mentioned effect.The example of anion surfactant comprises sulfuric acid ten diester sodium, sulfuric acid ten diester potassium, sulfuric acid octadecyl ester sodium, sulfuric acid octadecyl ester potassium etc.The example of nonionogenic tenside comprises polyoxyethylene lauryl ether, polyoxyethylene glycol lauryl ether etc.
The conduct of preferred use polar solvent comprises the solvent of second solution of tensio-active agent and basic component, and can use water as the representative example of polar solvent.In some cases, can use alcohol-based solvent or water-alcohol mixture solvent.In addition, in order after ozone solution-uv irradiating treating processes, second solution to be contacted with resin material, can adopt resin material is immersed in method in second solution, sprays the method or the additive method of second solution in the method for resin material surface-coated second solution, at resin surface.
Preferably the surfactant concentrations in second solution is adjusted to 0.01 to 10g/L.When surfactant concentrations during less than 0.01g/L, the sticking power of coating reduces, and when surfactant concentrations during greater than 10g/L, keep in touch on the surface of tensio-active agent and resin material, and excessive tensio-active agent combines with one another, and residual is impurity, thereby has reduced the sticking power of coating.In this case, can after pre-treatment, make the water clear resin material to remove excessive surface active agent.
In addition, the preferred second solution neutral and alkali component concentrations is 12 or more (pH values).Even when the pH value less than 12 the time, also can realize above-mentioned effect, but the amount of above-mentioned functional group that appears at the resin material surface is less, thereby need takes a long time and form coating with pre-determined thickness.
The duration of contact of second solution and resin material, there is no particular restriction, but preferably at room temperature contact 1 minute or the longer time.If duration of contact is too short, may diminishes and reduced the sticking power of coating to such an extent as to be adsorbed on the amount of the tensio-active agent on functional group surface.Yet, if duration of contact is oversize, in addition above to have among C=O of functional group and the C-OH an at least a layer also dissolved, make that the electroless plating film is difficult to carry out.Be enough good about 1 to 5 minute duration of contact.Preferred this treatment temp is high as much as possible, and when temperature raise, duration of contact can be shorter, but room temperature to about 60 ℃ temperature range is enough good.
In the alkaline purification process, can use the aqueous solution that only comprises basic component to handle adsorption surface promoting agent afterwards, but the situation of fragile layer may appear forming once more before tensio-active agent is adsorbed, therefore, implement the alkaline purification process under the state that preferably at least a and basic component coexist each other in anion surfactant and nonionogenic tenside.
In addition, preferably after ozone solution-uv irradiating treating processes, carry out the alkaline purification process, but in some cases, ozone solution-uv irradiating treating processes and alkaline purification process can be carried out simultaneously.In this case, the mixing solutions for preparing first solution and second solution, and resin material is immersed in the mixture solution of preparation, and carry out uviolizing, perhaps be sprayed onto the lip-deep while of resin material or after the mixture solution of preparation is sprayed onto the surface of resin material, carry out uviolizing at the mixture solution of preparation.In this case, lip-deep ozone of resin material and ultraviolet reaction are rate-determining step, so the treatment time is to determine according to the concentration or the ultraviolet intensity of ozone in the mixture solution.
Can after the alkaline purification process, clean the process that basic component is removed in coating enforcement by water.Be clear that because tensio-active agent firmly is adsorbed in the functional group, so tensio-active agent can not only clean by water and remove, and continues to be adsorbed in the functional group.Therefore, even if before the electroless plating membrane process, pass through considerable time, can not lose its effect through the pretreated resin material of the inventive method yet.
Can use and be used for for example Pd of catalyzer that conventional electroless plating film handles
2+As catalyzer.For catalyzer being adsorbed onto on the resin material surface, can according to the similar fashion that contacts above-mentioned second solution, the solution that wherein is dissolved with catalyst ion is contacted with the surface that is attached material.And for example the condition of duration of contact, temperature etc. can with ordinary method in identical.
There is no particular restriction for the condition of electroless plating film, the kind of metal refining etc.Can implement electroless plating film of the present invention with the similar mode of conventional electroless plating film.
And preferred further enforcement carried out galvanized electroplating process to the resin material after the electroless plating membrane process.Adopt this method, can be so that resin material has metalluster and electric conductivity.Can also significantly improve its outward appearance.
Adopt electroless plating mould material pretreatment process of the present invention and manufacturing to have the method for the element of coating, can handle by the short period of time and form coating with excellent adhesion intensity.In addition, even, also can suppress the reduction of adhesion strength, and therefore can reduce the tolerance range in treatment time, thereby increase work efficiency by long time treatment.Therefore in addition, do not require roughening carried out on the surface of resin material, adopt less thickness just can form coating, and therefore do not need chromic acid and so on high-grade metalluster, thus facility treatment of wastes produced.
Embodiment
Hereinafter, specify the present invention with reference to several embodiments and Comparative Examples.
(embodiment 1)
＜ozone solution-uv irradiating treating processes 〉
As shown in Figure 2, the ozone water solution 3 that will comprise the ozone of 80ppm is put into transparent quartz container 4, the resin base material 5 that ABS is constituted is immersed in this ozone water solution, and uses the uviolizing transparent quartz container of being sent by the high pressure mercury vapour lamp 6 that is placed on the 1kW outside the transparent quartz container 44.Ultraviolet irradiation time is 1 minute, 3 minutes, 5 minutes and 7 minutes and 10 minutes 5 grades, and through after the irradiation of the scheduled time, resin base material 5 is taken out from transparent quartz container 4.
＜alkaline purification process 〉
Then, with the amount of being dissolved with is that the NaOH of 50g/L and the amount of being dissolved with are that the mixture aqueous solution of the sulfuric acid dodecyl ester sodium of 1g/L is heated to 60 ℃, and will be immersed in the mixture aqueous solution of this heating 2 minutes through each resin base material after ozone solution-uv irradiating treating processes, thereby anion surfactant (sulfuric acid ten diester sodium) will be adsorbed on each resin base material.
Each resin base material that is adsorbed with tensio-active agent is taken out, and after making water cleaning and drying, be immersed in the catalyst solution, and be heated to 50 ℃, carried out 3 minutes.Wherein said catalyst solution is to be dissolved in the 3N aqueous hydrochloric acid by the tin chloride with the Palladous chloride of 0.1 weight % and 5 weight % to prepare.Be immersed in the 1N aqueous hydrochloric acid 3 minutes then with the activation palladium.By this method, be adsorbed with the resin base material of catalyzer separately.
Then, the obtain resin base material that is adsorbed with catalyzer separately is immersed in the Ni-P chemistry plating bath that remains on 40 ℃, to deposit Ni-P coating 10 minutes.The thickness of sedimentary Ni-P coating is 0.5 μ m in each resin base material.Then, by using copper electroplating bath based on copper sulfate at the thick copper coating of the surface deposition 100 μ m of Ni-P coating.
After forming coating, that each resin base material is following dry 2 hours at 70 ℃.Then, cutting institute's coating that obtains is forming the otch that has 1 centimetre width respectively and reach each resin base material deeply, and the use tension tester is measured the adhesion strength of the coating of each resin base material.Measuring result is as shown in table 1.
(embodiment 2)
According to carrying out ozone solution-uv irradiating treating processes with embodiment 1 similar mode, difference is, as shown in Figure 3, the ozone water solution 3 that will comprise 80ppm ozone is put into stainless steel vessel 7, to be immersed in wherein by resin base material 5 and the high pressure mercury vapour lamp 6 that ABS constitutes, use uviolizing resin base material 5.Then, according to implementing alkaline purification process, catalyzer adsorption process and electroplating process, on resin base material, forming coating, and measure the adhesion strength of the coating of each resin base material with embodiment 1 similar mode.Measuring result is as shown in table 1.
(embodiment 3)
According to carrying out ozone solution-uv irradiating treating processes with embodiment 1 similar mode, difference is to use the nitric acid that comprises 80ppm ozone to replace comprising the ozone water solution of 80ppm ozone.Then, according to implementing alkaline purification process, catalyzer adsorption process and electroplating process, thereby form coating similarly, and measure the adhesion strength of the coating of each resin base material with embodiment 1 with embodiment 1 similar mode.Measuring result is as shown in table 1.
(embodiment 4)
According to carrying out ozone solution-uv irradiating treating processes with embodiment 1 similar mode, difference is to use the ethanol that comprises 80ppm ozone to replace comprising the ozone water solution of 80ppm ozone.Then, according to implementing alkaline purification process, catalyzer adsorption process and electroplating process, thereby form coating similarly, and measure the adhesion strength of the coating of each resin base material with embodiment 1 with embodiment 1 similar mode.Measuring result is as shown in table 1.
(Comparative Examples 1)
Carry out the only uviolizing treating processes of irradiation ultraviolet radiation in air by the method that is similar to embodiment 1, difference is that the resin base material 5 that will be made of ABS puts into the empty transparent quartz container 4 that does not comprise solution.Then, according to implementing alkaline purification process, catalyzer adsorption process and electroplating process, thereby form coating similarly, and measure the adhesion strength of the coating of each resin base material 5 with embodiment 1 with embodiment 1 similar mode.Measuring result is as shown in table 1.
(comparative example 2)
Only carry out the ozonize process handled with ozone solution by the method that is similar to embodiment 1, difference is not carry out uviolizing.Then, according to implementing alkaline purification process, catalyzer adsorption process and electroplating process, thereby form coating similarly, and measure the adhesion strength of the coating of each resin base material with embodiment 1 with embodiment 1 similar mode.Measuring result is as shown in table 1.
＜estimate
Obviously, compare with 2 with Comparative Examples 1, the method for embodiment of the present invention can form the coating with high-adhesion, and obviously these results are because the effect of ozonize and UV treatment.And, mutually comparison process 5 minutes and the adhesion strength of the coating that forms, even if total adhesion strength of Comparative Examples 1 and 2 does not reach the adhesion strength of each embodiment yet, therefore, these results clearly illustrate that the synergistic effect that has realized ozonize and UV treatment.
And, it is evident that equally in Comparative Examples 1, long-time uviolizing causes adhesion strength to reduce, and in embodiments, has overcome this defective.
In addition, obviously, compare with embodiment 1, embodiment 3 and 4 shows higher adhesion strength, and can by use nitric acid or ethanol as the solvent of ozone solution to shorten the treatment time.
Claims (9)
1. pretreatment process that is used for the electroless plating mould material, use the ozone solution-uv irradiating treating processes of the described resin material of uviolizing under the first solution state of contact that it is characterized in that being implemented in resin material and comprising ozone, the concentration of ozone is 10ppm, 80ppm in wherein said first solution, perhaps is 100ppm or higher.
2. the pretreatment process that is used for the electroless plating mould material as claimed in claim 1 wherein further implements to make the alkaline purification process that contacts with second solution that comprises alkaline components through the described resin material after described ozone solution-uv irradiating treating processes.
3. the pretreatment process that is used for the electroless plating mould material as claimed in claim 2, wherein said second solution also comprises at least a of anion surfactant and nonionogenic tenside.
4. as the described pretreatment process that is used for the electroless plating mould material of one of claim 1 to 3, wherein said first solution comprises a kind of as solvent of organic polar solvent and inorganic polar solvent.
5. a manufacturing has the method for the element of coating, it is characterized in that this method is included in resin material and comprises ozone solution-uv irradiating treating processes of using the described resin material of uviolizing under the first solution state of contact of ozone, with the electroless plating membrane process that the described resin material after process described ozone solution-uv irradiating treating processes is carried out the electroless plating film, the concentration of ozone is 10ppm, 80ppm in wherein said first solution, perhaps is 100ppm or higher.
6. manufacturing as claimed in claim 5 has the method for the element of coating, wherein further is included in the alkaline purification process that between described ozone solution-uv irradiating treating processes and the described electroless plating membrane process described resin material is contacted with second solution that comprises basic component.
7. manufacturing as claimed in claim 6 has the method for the element of coating, and wherein said second solution also comprises at least a of anion surfactant and nonionogenic tenside.
8. described manufacturing has the method for the element of coating as one of claim 5 to 7, and wherein said first solution comprises a kind of as solvent of organic polar solvent and inorganic polar solvent.
9. manufacturing as claimed in claim 5 has the method for the element of coating, and it further comprises carrying out galvanized electroplating process through the described resin material after the described electroless plating membrane process.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002298067A JP4135459B2 (en) | 2002-10-10 | 2002-10-10 | Method for pretreatment of electroless plating material and method for manufacturing plating coated member |
| JP298067/2002 | 2002-10-10 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1703534A CN1703534A (en) | 2005-11-30 |
| CN100453698C true CN100453698C (en) | 2009-01-21 |
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| CNB2003801010640A Expired - Fee Related CN100453698C (en) | 2002-10-10 | 2003-10-09 | Pretreatment method for electroless plating material and method for producing member having plated coating |
Country Status (10)
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|---|---|
| US (1) | US8052858B2 (en) |
| EP (1) | EP1558786B1 (en) |
| JP (1) | JP4135459B2 (en) |
| KR (1) | KR100697051B1 (en) |
| CN (1) | CN100453698C (en) |
| BR (1) | BR0314570B1 (en) |
| DE (1) | DE60312025T2 (en) |
| ES (1) | ES2279148T3 (en) |
| MX (1) | MXPA05003831A (en) |
| WO (1) | WO2004033754A2 (en) |
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| US10619265B2 (en) | 2016-03-03 | 2020-04-14 | Ebara Corporation | Plating apparatus and plating method |
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| JP4917841B2 (en) * | 2006-06-09 | 2012-04-18 | ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． | Electroless plating method on resin surface |
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| JP4918123B2 (en) * | 2009-09-17 | 2012-04-18 | トヨタ自動車株式会社 | Method for producing electroless plating material |
| JP4930804B2 (en) * | 2009-09-17 | 2012-05-16 | トヨタ自動車株式会社 | Method for producing electroless plating material |
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| JP2011112596A (en) * | 2009-11-30 | 2011-06-09 | Toyota Motor Corp | Method of manufacturing molded product for use in radar device beam path and the same |
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| CN102400115B (en) * | 2011-10-20 | 2014-04-02 | 复旦大学 | Preparation method of flexible copper electrode pattern in micron level wire width |
| JP5997213B2 (en) * | 2013-08-09 | 2016-09-28 | キヤノン・コンポーネンツ株式会社 | Plating method |
| JP5770917B1 (en) * | 2014-04-04 | 2015-08-26 | キヤノン・コンポーネンツ株式会社 | Method for producing article with plating film |
| JP6130331B2 (en) * | 2014-06-17 | 2017-05-17 | キヤノン・コンポーネンツ株式会社 | Manufacturing method of resin product with metal film |
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| JP2016121387A (en) * | 2014-12-25 | 2016-07-07 | キヤノン・コンポーネンツ株式会社 | Production method of resin product with plating film |
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| US10619265B2 (en) | 2016-03-03 | 2020-04-14 | Ebara Corporation | Plating apparatus and plating method |
| TWI698555B (en) * | 2016-03-03 | 2020-07-11 | 日商荏原製作所股份有限公司 | Plating device and plating method |
| US10889911B2 (en) | 2016-03-03 | 2021-01-12 | Ebara Corporation | Plating apparatus and plating method |
Also Published As
| Publication number | Publication date |
|---|---|
| ES2279148T3 (en) | 2007-08-16 |
| JP2004131807A (en) | 2004-04-30 |
| US20060108232A1 (en) | 2006-05-25 |
| JP4135459B2 (en) | 2008-08-20 |
| KR20050065585A (en) | 2005-06-29 |
| CN1703534A (en) | 2005-11-30 |
| WO2004033754A2 (en) | 2004-04-22 |
| KR100697051B1 (en) | 2007-03-20 |
| DE60312025D1 (en) | 2007-04-05 |
| BR0314570B1 (en) | 2012-05-15 |
| BR0314570A (en) | 2005-08-09 |
| EP1558786A2 (en) | 2005-08-03 |
| MXPA05003831A (en) | 2005-06-22 |
| US8052858B2 (en) | 2011-11-08 |
| WO2004033754A3 (en) | 2004-07-15 |
| EP1558786B1 (en) | 2007-02-21 |
| DE60312025T2 (en) | 2007-12-13 |
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