CN100447295C - 在其中实现一种需要控制一个腔室内气体环境的作业的设施 - Google Patents

在其中实现一种需要控制一个腔室内气体环境的作业的设施 Download PDF

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Publication number
CN100447295C
CN100447295C CNB018189644A CN01818964A CN100447295C CN 100447295 C CN100447295 C CN 100447295C CN B018189644 A CNB018189644 A CN B018189644A CN 01818964 A CN01818964 A CN 01818964A CN 100447295 C CN100447295 C CN 100447295C
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CN
China
Prior art keywords
chamber
facility
gas
described chamber
surface treatment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
CNB018189644A
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English (en)
Chinese (zh)
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CN1636079A (zh
Inventor
帕纳约蒂斯·科科利奥
弗朗索瓦·克雷
沃尔夫冈·德林
弗兰克·弗尔斯特
让-路易·热洛
贝恩德·马腾斯
斯特凡娜·梅朗
埃卡德·普林茨
让-伊夫·托内利耶
阿兰·维莱姆特
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Liquid Air Co ltd George Lord Utilization And Research
Sow Tacco Rona And Plummer Co ltd
Softal Electronic Erik Blumenfeld GmbH and Co KG
Original Assignee
Softal Electronic Erik Blumenfeld GmbH and Co KG
LAir Liquide SA pour lEtude et lExploitation des Procedes Georges Claude
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Softal Electronic Erik Blumenfeld GmbH and Co KG, LAir Liquide SA pour lEtude et lExploitation des Procedes Georges Claude filed Critical Softal Electronic Erik Blumenfeld GmbH and Co KG
Publication of CN1636079A publication Critical patent/CN1636079A/zh
Application granted granted Critical
Publication of CN100447295C publication Critical patent/CN100447295C/zh
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45519—Inert gas curtains
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00—Control of flow
    • G05D7/06—Control of flow characterised by the use of electric means
    • G05D7/0617—Control of flow characterised by the use of electric means specially adapted for fluid materials
    • G05D7/0629—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means
    • G05D7/0676—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on flow sources

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Automation & Control Theory (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Chemical Vapour Deposition (AREA)
  • Prevention Of Fouling (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Devices For Use In Laboratory Experiments (AREA)
  • Ventilation (AREA)
  • Sampling And Sample Adjustment (AREA)
CNB018189644A 2000-11-16 2001-11-06 在其中实现一种需要控制一个腔室内气体环境的作业的设施 Expired - Lifetime CN100447295C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR0014793A FR2816726B1 (fr) 2000-11-16 2000-11-16 Installation dans laquelle est realisee une operation necessitant un controle de l'atmosphere a l'interieur d'une enceinte
FR00/14793 2000-11-16

Publications (2)

Publication Number Publication Date
CN1636079A CN1636079A (zh) 2005-07-06
CN100447295C true CN100447295C (zh) 2008-12-31

Family

ID=8856545

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB018189644A Expired - Lifetime CN100447295C (zh) 2000-11-16 2001-11-06 在其中实现一种需要控制一个腔室内气体环境的作业的设施

Country Status (9)

Country Link
US (1) US6458330B1 (https=)
EP (1) EP1348039B1 (https=)
JP (1) JP4025196B2 (https=)
CN (1) CN100447295C (https=)
AU (2) AU2002223753B2 (https=)
BR (1) BR0115420B1 (https=)
DK (1) DK1348039T3 (https=)
FR (1) FR2816726B1 (https=)
WO (1) WO2002040738A2 (https=)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2855322B1 (fr) * 2003-05-21 2005-07-01 Air Liquide Dispositif de traitement de surface par zone d'un article
FR2865418B1 (fr) * 2004-01-28 2006-03-03 Air Liquide Equipement de reticulation ultraviolette sous atmosphere controlee
US9255330B2 (en) 2010-07-09 2016-02-09 Vito Nv Method and device for atmospheric pressure plasma treatment
FR2978775B1 (fr) 2011-08-03 2014-02-14 Air Liquide Procede de preparation de surfaces d'aluminium par traitement par plasma atmospherique pour le depot de revetements sans promoteurs d'adherence
DE102012213095A1 (de) * 2012-07-25 2014-01-30 Roth & Rau Ag Gasseparation
CN104191578A (zh) * 2014-08-28 2014-12-10 京东方光科技有限公司 一种注塑机及应用该注塑机的注塑方法
EP3054032B1 (en) 2015-02-09 2017-08-23 Coating Plasma Industrie Installation for film deposition onto and/or modification of the surface of a moving substrate
FR3035122B1 (fr) 2015-04-20 2017-04-28 Coating Plasma Ind Procede de traitement de surface d'un film en mouvement et installation pour la mise en oeuvre de ce procede
KR102441291B1 (ko) 2016-10-27 2022-09-08 코팅 플라스마 이노베이션 제어된 분위기에서 이동하는 기판의 표면을 처리하는 설비 및 그의 크기를 규정하는 방법
JP2018143985A (ja) * 2017-03-07 2018-09-20 コニカミノルタ株式会社 活性エネルギー線照射装置
JP7687557B2 (ja) * 2021-08-10 2025-06-03 日本エア・リキード合同会社 紫外線硬化装置及び紫外線硬化方法
DE102022126294A1 (de) * 2022-10-11 2024-04-11 Maschinenfabrik Kaspar Walter Gmbh & Co Kg Vorrichtung und Verfahren zum Härten einer Polymerschicht auf einem zylindrischen Körper

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0622474A1 (fr) * 1993-04-29 1994-11-02 L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude Procédé pour créer un dépôt d'oxyde de silicium sur un substrat solide en défilement
US6143080A (en) * 1999-02-02 2000-11-07 Silicon Valley Group Thermal Systems Llc Wafer processing reactor having a gas flow control system and method

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4209357A (en) * 1979-05-18 1980-06-24 Tegal Corporation Plasma reactor apparatus
US5356718A (en) * 1993-02-16 1994-10-18 Ppg Industries, Inc. Coating apparatus, method of coating glass, compounds and compositions for coating glasss and coated glass substrates
JPH09232296A (ja) * 1996-02-23 1997-09-05 Mitsubishi Electric Corp 半導体装置の製造装置および製造方法
US5851293A (en) * 1996-03-29 1998-12-22 Atmi Ecosys Corporation Flow-stabilized wet scrubber system for treatment of process gases from semiconductor manufacturing operations

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0622474A1 (fr) * 1993-04-29 1994-11-02 L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude Procédé pour créer un dépôt d'oxyde de silicium sur un substrat solide en défilement
US6143080A (en) * 1999-02-02 2000-11-07 Silicon Valley Group Thermal Systems Llc Wafer processing reactor having a gas flow control system and method

Also Published As

Publication number Publication date
AU2002223753B2 (en) 2006-09-28
FR2816726B1 (fr) 2006-06-23
AU2375302A (en) 2002-05-27
WO2002040738A3 (fr) 2002-07-11
DK1348039T3 (da) 2013-03-25
WO2002040738A2 (fr) 2002-05-23
EP1348039A2 (fr) 2003-10-01
CN1636079A (zh) 2005-07-06
FR2816726A1 (fr) 2002-05-17
US20020057999A1 (en) 2002-05-16
BR0115420B1 (pt) 2011-07-26
US6458330B1 (en) 2002-10-01
JP4025196B2 (ja) 2007-12-19
JP2004514062A (ja) 2004-05-13
BR0115420A (pt) 2003-10-21
EP1348039B1 (fr) 2013-01-02

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C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
C41 Transfer of patent application or patent right or utility model
C56 Change in the name or address of the patentee
CP01 Change in the name or title of a patent holder

Address after: Paris France

Patentee after: Liquid air Co.,Ltd. George Lord utilization and research

Patentee after: Softal Electronic Erik Blumenfeld GmbH & Co.

Address before: Paris France

Patentee before: L'AIR LIQUIDE, SOCIETE ANONYME A DIRECTOIRE ET CONSEIL DE SURVEILLANCE POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE

Patentee before: Softal Electronic Erik Blumenfeld GmbH & Co.

TR01 Transfer of patent right

Effective date of registration: 20160520

Address after: hamburg

Patentee after: Sow Tacco Rona and Plummer Co.,Ltd.

Address before: Paris France

Patentee before: Liquid air Co.,Ltd. George Lord utilization and research

Patentee before: Sow Tacco Rona and Plummer Co.,Ltd.

Effective date of registration: 20160520

Address after: Paris France

Patentee after: Liquid air Co.,Ltd. George Lord utilization and research

Patentee after: Sow Tacco Rona and Plummer Co.,Ltd.

Address before: Paris France

Patentee before: Liquid air Co.,Ltd. George Lord utilization and research

Patentee before: Softal Electronic Erik Blumenfeld GmbH & Co.

CX01 Expiry of patent term

Granted publication date: 20081231

CX01 Expiry of patent term