DK1348039T3 - Installation hvor der udføres en operation der kræver kontrol af atmosfæren inde i et kammer - Google Patents

Installation hvor der udføres en operation der kræver kontrol af atmosfæren inde i et kammer

Info

Publication number
DK1348039T3
DK1348039T3 DK01996636.5T DK01996636T DK1348039T3 DK 1348039 T3 DK1348039 T3 DK 1348039T3 DK 01996636 T DK01996636 T DK 01996636T DK 1348039 T3 DK1348039 T3 DK 1348039T3
Authority
DK
Denmark
Prior art keywords
atmosphere
room
operate
installation
operation requiring
Prior art date
Application number
DK01996636.5T
Other languages
Danish (da)
English (en)
Inventor
Panayotis Cocolios
Francois Coeuret
Wolfgang Doering
Franck Foerster
Jean-Louis Gelot
Bernd Martens
Stephane Melen
Eckard Prinz
Jean-Yves Thonnelier
Alain Villermet
Original Assignee
Air Liquide
Softal Electronic Erik Blumenfeld Gmbh & Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Air Liquide, Softal Electronic Erik Blumenfeld Gmbh & Co filed Critical Air Liquide
Application granted granted Critical
Publication of DK1348039T3 publication Critical patent/DK1348039T3/da

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45519—Inert gas curtains
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00—Control of flow
    • G05D7/06—Control of flow characterised by the use of electric means
    • G05D7/0617—Control of flow characterised by the use of electric means specially adapted for fluid materials
    • G05D7/0629—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means
    • G05D7/0676—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on flow sources

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Automation & Control Theory (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Chemical Vapour Deposition (AREA)
  • Prevention Of Fouling (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Devices For Use In Laboratory Experiments (AREA)
  • Ventilation (AREA)
  • Sampling And Sample Adjustment (AREA)
DK01996636.5T 2000-11-16 2001-11-06 Installation hvor der udføres en operation der kræver kontrol af atmosfæren inde i et kammer DK1348039T3 (da)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR0014793A FR2816726B1 (fr) 2000-11-16 2000-11-16 Installation dans laquelle est realisee une operation necessitant un controle de l'atmosphere a l'interieur d'une enceinte
PCT/FR2001/003421 WO2002040738A2 (fr) 2000-11-16 2001-11-06 Installation dans laquelle est realisee une operation necessitant un contrôle de l'atmosphere a l'interieur d'une enceinte

Publications (1)

Publication Number Publication Date
DK1348039T3 true DK1348039T3 (da) 2013-03-25

Family

ID=8856545

Family Applications (1)

Application Number Title Priority Date Filing Date
DK01996636.5T DK1348039T3 (da) 2000-11-16 2001-11-06 Installation hvor der udføres en operation der kræver kontrol af atmosfæren inde i et kammer

Country Status (9)

Country Link
US (1) US6458330B1 (https=)
EP (1) EP1348039B1 (https=)
JP (1) JP4025196B2 (https=)
CN (1) CN100447295C (https=)
AU (2) AU2002223753B2 (https=)
BR (1) BR0115420B1 (https=)
DK (1) DK1348039T3 (https=)
FR (1) FR2816726B1 (https=)
WO (1) WO2002040738A2 (https=)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2855322B1 (fr) * 2003-05-21 2005-07-01 Air Liquide Dispositif de traitement de surface par zone d'un article
FR2865418B1 (fr) * 2004-01-28 2006-03-03 Air Liquide Equipement de reticulation ultraviolette sous atmosphere controlee
US9255330B2 (en) 2010-07-09 2016-02-09 Vito Nv Method and device for atmospheric pressure plasma treatment
FR2978775B1 (fr) 2011-08-03 2014-02-14 Air Liquide Procede de preparation de surfaces d'aluminium par traitement par plasma atmospherique pour le depot de revetements sans promoteurs d'adherence
DE102012213095A1 (de) * 2012-07-25 2014-01-30 Roth & Rau Ag Gasseparation
CN104191578A (zh) * 2014-08-28 2014-12-10 京东方光科技有限公司 一种注塑机及应用该注塑机的注塑方法
EP3054032B1 (en) 2015-02-09 2017-08-23 Coating Plasma Industrie Installation for film deposition onto and/or modification of the surface of a moving substrate
FR3035122B1 (fr) 2015-04-20 2017-04-28 Coating Plasma Ind Procede de traitement de surface d'un film en mouvement et installation pour la mise en oeuvre de ce procede
KR102441291B1 (ko) 2016-10-27 2022-09-08 코팅 플라스마 이노베이션 제어된 분위기에서 이동하는 기판의 표면을 처리하는 설비 및 그의 크기를 규정하는 방법
JP2018143985A (ja) * 2017-03-07 2018-09-20 コニカミノルタ株式会社 活性エネルギー線照射装置
JP7687557B2 (ja) * 2021-08-10 2025-06-03 日本エア・リキード合同会社 紫外線硬化装置及び紫外線硬化方法
DE102022126294A1 (de) * 2022-10-11 2024-04-11 Maschinenfabrik Kaspar Walter Gmbh & Co Kg Vorrichtung und Verfahren zum Härten einer Polymerschicht auf einem zylindrischen Körper

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4209357A (en) * 1979-05-18 1980-06-24 Tegal Corporation Plasma reactor apparatus
US5356718A (en) * 1993-02-16 1994-10-18 Ppg Industries, Inc. Coating apparatus, method of coating glass, compounds and compositions for coating glasss and coated glass substrates
FR2704558B1 (fr) * 1993-04-29 1995-06-23 Air Liquide Procede et dispositif pour creer un depot d'oxyde de silicium sur un substrat solide en defilement.
JPH09232296A (ja) * 1996-02-23 1997-09-05 Mitsubishi Electric Corp 半導体装置の製造装置および製造方法
US5851293A (en) * 1996-03-29 1998-12-22 Atmi Ecosys Corporation Flow-stabilized wet scrubber system for treatment of process gases from semiconductor manufacturing operations
US6143080A (en) * 1999-02-02 2000-11-07 Silicon Valley Group Thermal Systems Llc Wafer processing reactor having a gas flow control system and method

Also Published As

Publication number Publication date
AU2002223753B2 (en) 2006-09-28
FR2816726B1 (fr) 2006-06-23
AU2375302A (en) 2002-05-27
CN100447295C (zh) 2008-12-31
WO2002040738A3 (fr) 2002-07-11
WO2002040738A2 (fr) 2002-05-23
EP1348039A2 (fr) 2003-10-01
CN1636079A (zh) 2005-07-06
FR2816726A1 (fr) 2002-05-17
US20020057999A1 (en) 2002-05-16
BR0115420B1 (pt) 2011-07-26
US6458330B1 (en) 2002-10-01
JP4025196B2 (ja) 2007-12-19
JP2004514062A (ja) 2004-05-13
BR0115420A (pt) 2003-10-21
EP1348039B1 (fr) 2013-01-02

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