AU2002223753B2 - Installation wherein is performed an operation requiring control of atmosphere inside a chamber - Google Patents
Installation wherein is performed an operation requiring control of atmosphere inside a chamber Download PDFInfo
- Publication number
- AU2002223753B2 AU2002223753B2 AU2002223753A AU2002223753A AU2002223753B2 AU 2002223753 B2 AU2002223753 B2 AU 2002223753B2 AU 2002223753 A AU2002223753 A AU 2002223753A AU 2002223753 A AU2002223753 A AU 2002223753A AU 2002223753 B2 AU2002223753 B2 AU 2002223753B2
- Authority
- AU
- Australia
- Prior art keywords
- chamber
- installation according
- gas
- forming
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- 238000009434 installation Methods 0.000 title claims description 59
- 239000000758 substrate Substances 0.000 claims description 74
- 239000007789 gas Substances 0.000 claims description 54
- 239000008246 gaseous mixture Substances 0.000 claims description 43
- 238000000605 extraction Methods 0.000 claims description 39
- 239000011261 inert gas Substances 0.000 claims description 33
- 238000002347 injection Methods 0.000 claims description 24
- 239000007924 injection Substances 0.000 claims description 24
- 238000004381 surface treatment Methods 0.000 claims description 23
- 230000001105 regulatory effect Effects 0.000 claims description 19
- 238000011282 treatment Methods 0.000 claims description 19
- 238000007599 discharging Methods 0.000 claims description 18
- 238000011144 upstream manufacturing Methods 0.000 claims description 12
- 238000005192 partition Methods 0.000 claims description 9
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 8
- 239000001301 oxygen Substances 0.000 claims description 8
- 229910052760 oxygen Inorganic materials 0.000 claims description 8
- 230000001276 controlling effect Effects 0.000 claims description 4
- 238000003848 UV Light-Curing Methods 0.000 claims description 2
- 239000011248 coating agent Substances 0.000 claims description 2
- 238000000576 coating method Methods 0.000 claims description 2
- 238000004132 cross linking Methods 0.000 claims description 2
- 238000010894 electron beam technology Methods 0.000 claims description 2
- 230000005855 radiation Effects 0.000 claims description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 74
- 229910052757 nitrogen Inorganic materials 0.000 description 38
- 239000000203 mixture Substances 0.000 description 9
- 239000002184 metal Substances 0.000 description 7
- 230000005540 biological transmission Effects 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- -1 silicon hydrocarbon Chemical class 0.000 description 4
- 239000004743 Polypropylene Substances 0.000 description 3
- 229920001155 polypropylene Polymers 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 150000002829 nitrogen Chemical class 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- 229920006254 polymer film Polymers 0.000 description 2
- 229920000098 polyolefin Polymers 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- OBNDGIHQAIXEAO-UHFFFAOYSA-N [O].[Si] Chemical compound [O].[Si] OBNDGIHQAIXEAO-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000003463 adsorbent Substances 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 238000004513 sizing Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
- 238000009423 ventilation Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45519—Inert gas curtains
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45563—Gas nozzles
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
- C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D7/00—Control of flow
- G05D7/06—Control of flow characterised by the use of electric means
- G05D7/0617—Control of flow characterised by the use of electric means specially adapted for fluid materials
- G05D7/0629—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means
- G05D7/0676—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on flow sources
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Automation & Control Theory (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Chemical Vapour Deposition (AREA)
- Prevention Of Fouling (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Devices For Use In Laboratory Experiments (AREA)
- Ventilation (AREA)
- Sampling And Sample Adjustment (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR0014793A FR2816726B1 (fr) | 2000-11-16 | 2000-11-16 | Installation dans laquelle est realisee une operation necessitant un controle de l'atmosphere a l'interieur d'une enceinte |
| FR00/14793 | 2000-11-16 | ||
| PCT/FR2001/003421 WO2002040738A2 (fr) | 2000-11-16 | 2001-11-06 | Installation dans laquelle est realisee une operation necessitant un contrôle de l'atmosphere a l'interieur d'une enceinte |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| AU2002223753A1 AU2002223753A1 (en) | 2002-08-01 |
| AU2002223753B2 true AU2002223753B2 (en) | 2006-09-28 |
Family
ID=8856545
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AU2002223753A Ceased AU2002223753B2 (en) | 2000-11-16 | 2001-11-06 | Installation wherein is performed an operation requiring control of atmosphere inside a chamber |
| AU2375302A Pending AU2375302A (en) | 2000-11-16 | 2001-11-06 | Installation wherein is performed an operation requiring control of atmosphere inside a chamber |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AU2375302A Pending AU2375302A (en) | 2000-11-16 | 2001-11-06 | Installation wherein is performed an operation requiring control of atmosphere inside a chamber |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US6458330B1 (https=) |
| EP (1) | EP1348039B1 (https=) |
| JP (1) | JP4025196B2 (https=) |
| CN (1) | CN100447295C (https=) |
| AU (2) | AU2002223753B2 (https=) |
| BR (1) | BR0115420B1 (https=) |
| DK (1) | DK1348039T3 (https=) |
| FR (1) | FR2816726B1 (https=) |
| WO (1) | WO2002040738A2 (https=) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2855322B1 (fr) * | 2003-05-21 | 2005-07-01 | Air Liquide | Dispositif de traitement de surface par zone d'un article |
| FR2865418B1 (fr) * | 2004-01-28 | 2006-03-03 | Air Liquide | Equipement de reticulation ultraviolette sous atmosphere controlee |
| US9255330B2 (en) | 2010-07-09 | 2016-02-09 | Vito Nv | Method and device for atmospheric pressure plasma treatment |
| FR2978775B1 (fr) | 2011-08-03 | 2014-02-14 | Air Liquide | Procede de preparation de surfaces d'aluminium par traitement par plasma atmospherique pour le depot de revetements sans promoteurs d'adherence |
| DE102012213095A1 (de) * | 2012-07-25 | 2014-01-30 | Roth & Rau Ag | Gasseparation |
| CN104191578A (zh) * | 2014-08-28 | 2014-12-10 | 京东方光科技有限公司 | 一种注塑机及应用该注塑机的注塑方法 |
| EP3054032B1 (en) | 2015-02-09 | 2017-08-23 | Coating Plasma Industrie | Installation for film deposition onto and/or modification of the surface of a moving substrate |
| FR3035122B1 (fr) | 2015-04-20 | 2017-04-28 | Coating Plasma Ind | Procede de traitement de surface d'un film en mouvement et installation pour la mise en oeuvre de ce procede |
| KR102441291B1 (ko) | 2016-10-27 | 2022-09-08 | 코팅 플라스마 이노베이션 | 제어된 분위기에서 이동하는 기판의 표면을 처리하는 설비 및 그의 크기를 규정하는 방법 |
| JP2018143985A (ja) * | 2017-03-07 | 2018-09-20 | コニカミノルタ株式会社 | 活性エネルギー線照射装置 |
| JP7687557B2 (ja) * | 2021-08-10 | 2025-06-03 | 日本エア・リキード合同会社 | 紫外線硬化装置及び紫外線硬化方法 |
| DE102022126294A1 (de) * | 2022-10-11 | 2024-04-11 | Maschinenfabrik Kaspar Walter Gmbh & Co Kg | Vorrichtung und Verfahren zum Härten einer Polymerschicht auf einem zylindrischen Körper |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6143080A (en) * | 1999-02-02 | 2000-11-07 | Silicon Valley Group Thermal Systems Llc | Wafer processing reactor having a gas flow control system and method |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4209357A (en) * | 1979-05-18 | 1980-06-24 | Tegal Corporation | Plasma reactor apparatus |
| US5356718A (en) * | 1993-02-16 | 1994-10-18 | Ppg Industries, Inc. | Coating apparatus, method of coating glass, compounds and compositions for coating glasss and coated glass substrates |
| FR2704558B1 (fr) * | 1993-04-29 | 1995-06-23 | Air Liquide | Procede et dispositif pour creer un depot d'oxyde de silicium sur un substrat solide en defilement. |
| JPH09232296A (ja) * | 1996-02-23 | 1997-09-05 | Mitsubishi Electric Corp | 半導体装置の製造装置および製造方法 |
| US5851293A (en) * | 1996-03-29 | 1998-12-22 | Atmi Ecosys Corporation | Flow-stabilized wet scrubber system for treatment of process gases from semiconductor manufacturing operations |
-
2000
- 2000-11-16 FR FR0014793A patent/FR2816726B1/fr not_active Expired - Fee Related
- 2000-12-18 US US09/738,314 patent/US6458330B1/en not_active Expired - Lifetime
-
2001
- 2001-11-06 AU AU2002223753A patent/AU2002223753B2/en not_active Ceased
- 2001-11-06 JP JP2002543046A patent/JP4025196B2/ja not_active Expired - Fee Related
- 2001-11-06 CN CNB018189644A patent/CN100447295C/zh not_active Expired - Lifetime
- 2001-11-06 BR BRPI0115420-6A patent/BR0115420B1/pt not_active IP Right Cessation
- 2001-11-06 WO PCT/FR2001/003421 patent/WO2002040738A2/fr not_active Ceased
- 2001-11-06 DK DK01996636.5T patent/DK1348039T3/da active
- 2001-11-06 AU AU2375302A patent/AU2375302A/xx active Pending
- 2001-11-06 EP EP01996636A patent/EP1348039B1/fr not_active Expired - Lifetime
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6143080A (en) * | 1999-02-02 | 2000-11-07 | Silicon Valley Group Thermal Systems Llc | Wafer processing reactor having a gas flow control system and method |
Also Published As
| Publication number | Publication date |
|---|---|
| FR2816726B1 (fr) | 2006-06-23 |
| AU2375302A (en) | 2002-05-27 |
| CN100447295C (zh) | 2008-12-31 |
| WO2002040738A3 (fr) | 2002-07-11 |
| DK1348039T3 (da) | 2013-03-25 |
| WO2002040738A2 (fr) | 2002-05-23 |
| EP1348039A2 (fr) | 2003-10-01 |
| CN1636079A (zh) | 2005-07-06 |
| FR2816726A1 (fr) | 2002-05-17 |
| US20020057999A1 (en) | 2002-05-16 |
| BR0115420B1 (pt) | 2011-07-26 |
| US6458330B1 (en) | 2002-10-01 |
| JP4025196B2 (ja) | 2007-12-19 |
| JP2004514062A (ja) | 2004-05-13 |
| BR0115420A (pt) | 2003-10-21 |
| EP1348039B1 (fr) | 2013-01-02 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PC1 | Assignment before grant (sect. 113) |
Owner name: L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'E Free format text: FORMER APPLICANT(S): L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE; SOFTAL ELECTRONIC ERIK BLUMENFIELD GMBH & CO. |
|
| FGA | Letters patent sealed or granted (standard patent) | ||
| MK14 | Patent ceased section 143(a) (annual fees not paid) or expired |