CN100445416C - 用于使一个金属连铸坯浸入熔液覆层的方法和装置 - Google Patents
用于使一个金属连铸坯浸入熔液覆层的方法和装置 Download PDFInfo
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Abstract
本发明涉及一种用于使一个金属连铸坯(1)、尤其是一个钢带浸入熔液覆层的方法，其中所述金属连铸坯(1)至少分段式地垂直地以给定的输送速度(v)穿过一个容纳熔融的覆层金属(2)的容器(3)。为了影响覆层过程的质量按照本发明建议，所述金属连铸坯(1)在熔融的覆层金属(2)中的停留时间通过控制或调节熔融的覆层金属(2)在容器(3)中的液面位置高度(h)给定。此外本发明还涉及一种用于一种金属连铸坯浸入熔液覆层的装置。
Description
技术领域
本发明涉及一种用于使一个金属连铸坯、尤其是一个钢带浸入熔液覆层的方法，其中所述金属连铸坯至少分段式地垂直地以给定的输送速度穿过一个容纳熔融的覆层金属的容器。本发明还涉及一个用于使一个金属连铸坯浸入熔液覆层的装置。
背景技术
传统的用于金属带的金属浸入覆层设备具有一个维护庞大的部分，即根据覆层配有位于其中的装备。要被覆层的金属带表面必须在覆层前清洁氧化残留物并且为了与覆层材料连接而激活。为此带表面在覆层前在一个还原气氛的热处理过程中进行处理。因为氧化层事先化学地或腐蚀地去除，通过还原的热处理过程这样激活表面，使得在热处理后呈现纯金属的表面。
但是通过激活带表面使这个带表面对于周围空气氧的亲和力提高。为了避免空气氧在覆层过程之前又可能位于带表面上，将金属带在一个浸入管中从上面插进覆层池。因为覆层金属以液体形式存在并且想利用重力与吹风装置一起来调整覆层厚度，但是下面的处理过程提供了一个带接触直到覆层完全固化，必须使钢带根据覆层的需要在垂直方向上偏转。这通过一个在液体金属中移动的辊子实现。由于液体的覆层金属这个辊子处于强烈的磨损并且是停机的原因并由此中断生产运行。
由于所期望的覆层金属的微小层厚可能在微米范围变化，因此对于带表面提出了高的要求。这意味着，输送金属带的辊子表面也必须是高质量的。在这些表面上的缺陷通常导致对金属带表面的损伤。这是使设备经常停机的另一原因。
为了避免这种随着在液体的覆层金属中移动的辊子产生的问题，已经给出附件，使用一个向下敞开的覆层容器，它在其底部具有一个导引通道用于向上垂直输送金属带并且为了封闭使用一个电磁的密封。在此涉及一种电磁感应器，它们通过回顶的、抽吸的或收缩的电磁交变场或漂移场工作，它们向下封闭覆层容器。
例如由EP 0 673 444 B1已知一个这样的解决方案。按照WO96/03533的解决方案或者按照JP 5086446也使用一个用于向下封闭覆层容器的电磁密封。
由DE 42 08 578 A1同样已知一个具有电磁密封的一个浸入熔液覆层设备。为了与金属连铸坯的通流速度无关地控制金属连铸坯在覆层金属中的停留时间在这里规定，在金属连铸坯移动期间熔融液体的覆层材料保持一个指向金属连铸坯表面的运动并且在切断空气的条件下滚动。
所有上述解决方案在此都适合于，在覆层容器中基本保持一个给定的覆层金属的液面高度。通常将金属连铸坯通过覆层池的移动速度作为对于浸入熔液覆层的形式和质量有重要影响的参数来考虑。此外根据在DE 42 08 578 A1中公开的解决方案大多没有可能有效地对浸入熔液覆层过程施加影响。即，金属连铸坯在覆层介质中的停留时间在已知的浸入熔液覆层方法中大多动态地通过金属连铸坯穿过覆层容器的速度进行改变，因为覆层池的液面只能特别缓慢地通过金属连铸坯上的覆层出料减少。因此覆层池的液面也不能作为调整质量特征的动态调整参数。
发明内容
因此本发明的目的是，实现一种用于一个金属连铸坯浸入熔液覆层的方法和一种相应的装置，通过这种方法和装置能够有效地影响浸入熔液覆层的参数，而无需改变金属连铸坯通过熔融的覆层金属的移动速度。
按照本发明关于方法方面的特征是，所述金属连铸坯穿过容器的输送速度尽可能地保持恒定并且所述金属连铸坯在熔融的覆层金属中的停留时间通过控制或调节熔融的覆层金属在容器中的液面位置高度给定，其中所述金属连铸坯仅垂直地通过熔融的覆层金属并穿过一个前置于容器的导引通道并且为了使覆层金属抑制在容器里面在导引通道处通过至少两个设置在金属连铸坯两侧的感应器产生一个电磁场。
本发明的方案适合于，为了有针对性地影响那些影响浸入熔液覆层过程质量的参数，要考虑熔融的覆层金属在覆层容器中的液面位置高度。通过这种工作方式能够对覆层质量施加影响，而不必改变金属连铸坯通过覆层装置的输送速度。
在此使用公知的具有电磁底部封闭的CVGL方法(连续垂直电镀线)。
按照本发明的用于使一个金属连铸坯浸入熔液覆层的装置，在该装置中金属连铸坯至少分段式地垂直通过容纳熔融的覆层金属的容器，其特征在于用于根据金属连铸坯在熔融的覆层金属中的给定的停留时间控制或调节熔融的覆层金属在容器中的液面位置高度的机构，其中所述机构具有用于检测熔融的覆层金属在容器中的液面位置的检测机构和用于影响液面位置的机构，它们与一个控制或调节装置连接，并且所述装置具有一个前置于容器的导引通道以及至少两个在导引通道处设置在金属连铸坯两侧的感应器用于产生使覆层金属抑制在容器中的电磁场具有根据金属连铸坯在熔融的覆层金属中的给定停留时间控制或调节熔融的覆层金属在容器中的液面位置高度的机构。
此外可以规定，所述用于影响熔融的覆层金属的液面位置的机构具有一个用于使熔融的覆层金属从容器中排到一个预储容器中的排出口以及一个用于将熔融的覆层金属从预储容器输送到容器的泵。在此所述预储容器最好设置在容器下部。
为了尽可能有效地和快速地影响熔融的覆层金属在容器中的液面位置已经证实，所述容器的容积比预储容器的容积小数倍；在此尤其规定，所述容器的容积为预储容器容积的5至20％。
附图说明
在附图中示出本发明的一个实施例。唯一的附图简示出一个浸入熔液覆层装置，它具有一个穿过该装置导引的金属连铸坯。
具体实施方式
所述装置具有一个容器3，它以熔融的覆层金属2充满。这种覆层金属例如可以是锌或铝。要被覆层的钢带形式的金属连铸坯1在输送方向R上垂直向上地以一个给定的且在过程中保持恒定的输送速度v通过容器3。
在此要指出，原则上也可以使金属连铸坯1从上向下通过容器3。
为了使金属连铸坯穿过容器3使这个容器在底部敞开；一个导引通道4位于这里。为了使熔融的覆层金属2不会通过导引通道4向下流出，两个产生一个磁场的电磁感应器5位于金属连铸坯1的两侧，该磁场在液体金属中引起体积作用力，它反作用于覆层金属2的重力并因此向下密封导引通道4。
对于感应器5涉及两个对置的交变场感应器或漂移场感应器，它们在2Hz至10kHz的频率范围中运行并且建立一个垂直于输送方向R的电磁横向场。对于单相系统(交变场感应器)的优选频率范围位于2kHz至10kHz之间，对于多相系统(例如漂移场感应器)该频率范围在2Hz至2kHz之间。
对于所建议的浸入熔液覆层装置通过适当的机构有效地对容器3中的熔融的覆层金属2的液面位置h施加影响并且这种影响针对过程的参数并因此影响覆层的质量。
为此机构6用于控制或调节液面位置的高度h，其中从附图可以看出，所述液面位置h在一个最小液面位置hmin与一个最大液面位置hmax之间的宽界限中变化。
通过液面位置在容器3中的实际高度h以及金属连铸坯1的输送速度v得到金属连铸坯1在覆层金属2中的停留时间；由此再得到对于浸入熔液覆层过程重要的影响参数。
所述用于控制或调节液面位置高度h的机构6首先由一个检测机构7组成，通过它可以检测实际的液面位置h。由检测机构7检测的数值传导到一个控制或调节装置10。该装置也获得所期望的金属连铸坯1在覆层金属2中的停留时间的数值。所述控制或调节装置10可以对用于影响液面位置h的机构8，9施加影响，即对一个排出口8施加影响，通过它熔融的覆层金属2可以从容器3中排出，以及对一个转速调节泵9施加影响，通过它可以将覆层金属2泵进容器3。通过相应地影响覆层金属2流入容器3以及从容器3中排出的影响措施可以通过控制或调节装置10可控或可调节地保持所期望或所必须的液面位置h。
特别有利的是，为此在容器3下面设置一个预储容器11。如同在实施例中可以看到的那样，一个管道12使排出口8与预储容器11连接。以相同的方式存在一个管道13，在其中设置泵，通过它可以将覆层金属2从预储容器11泵入容器3。
所述覆层池液面通过排出口8和泵9动态地进行调整或调节。由此能够使液面位置h作为用于覆层金属连铸坯1的质量调节的调整参数。
通过一个有针对性地改变覆层池液面h通过由此引起的金属连铸坯1在恒定的输送速度v时在覆层金属2中的停留时间的变化调节或微调在覆层装置覆层后所呈现的金属连铸坯1的质量特征。
附图标记清单
1金属连铸坯(钢带)
2覆层金属
3容器
4导引通道
5感应器
6用于控制或调节液面位置高度的机构
7用于测量液面位置的检测机构
8用于影响液面位置的机构，排出
9用于影响液面位置的机构，泵
10控制或调节装置
11管道
12管道
v输送速度
t停留时间
h熔融的覆层金属在容器中的液面位置
hmin最低液面位置
hmax最高液面位置
R输送方向
Claims (6)
1.一种用于使一个金属连铸坯(1)浸入熔液覆层的方法，其中所述金属连铸坯(1)至少分段式地垂直地以给定的输送速度(v)穿过一个容纳熔融的覆层金属(2)的容器(3)，其特征在于，所述金属连铸坯(1)穿过容器(3)的输送速度(v)尽可能地保持恒定并且所述金属连铸坯(1)在熔融的覆层金属(2)中的停留时间(t)通过控制或调节熔融的覆层金属(2)在容器(3)中的液面位置高度(h)给定，其中所述金属连铸坯(1)仅垂直地通过熔融的覆层金属(2)并穿过一个前置于容器(3)的导引通道(4)，并且为了使覆层金属(2)抑制在容器(3)里面在导引通道(4)处通过至少两个设置在金属连铸坯(1)两侧的感应器(5)产生一个电磁场。
2.一种用于使一个金属连铸坯(1)浸入熔液覆层的装置，在该装置中所述金属连铸坯(1)至少分段式地垂直地穿过一个容纳熔融的覆层金属(2)的容器(3)，其特征在于，设有机构(6)，该机构根据金属连铸坯(1)在熔融的覆层金属(2)中的给定的停留时间(t)控制或调节熔融的覆层金属(2)在容器(3)中的液面位置高度(h)，其中所述机构(6)具有用于检测熔融的覆层金属(2)在容器(3)中的液面位置(h)的检测机构(7)和用于影响液面位置(h)的机构(8，9)，它们与一个控制或调节装置(10)连接，并且所述装置具有一个前置于容器(3)的导引通道(4)以及至少两个在导引通道(4)处设置在金属连铸坯(1)两侧的感应器(5)用于产生使覆层金属(2)抑制在容器(3)中的电磁场。
3.如权利要求2所述的装置，其特征在于，所述用于影响熔融的覆层金属(2)的液面位置(h)的机构(8，9)具有一个使熔融的覆层金属(2)从容器(3)排到一个预储容器(11)的排出口(8)以及一个用于使熔融的覆层金属(2)从预储容器(11)输送到容器(3)的泵(9)。
4.如权利要求3所述的装置，其特征在于，所述预储容器(11)设置在容器(3)下部。
5.如权利要求3或4所述的装置，其特征在于，所述容器(3)的容积比预储容器(11)的容积小数倍。
6.如权利要求5所述的装置，其特征在于，所述容器(3)的容积为预储容器(11)容积的5至20％。
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10254306A DE10254306A1 (de) | 2002-11-21 | 2002-11-21 | Verfahren und Vorrichtung zur Schmelztauchbeschichtung eines Metallstranges |
| DE10254306.2 | 2002-11-21 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1729309A CN1729309A (zh) | 2006-02-01 |
| CN100445416C true CN100445416C (zh) | 2008-12-24 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB2003801037520A Expired - Fee Related CN100445416C (zh) | 2002-11-21 | 2003-10-06 | 用于使一个金属连铸坯浸入熔液覆层的方法和装置 |
Country Status (17)
| Country | Link |
|---|---|
| US (1) | US20060153992A1 (zh) |
| EP (1) | EP1563113B1 (zh) |
| JP (1) | JP4485955B2 (zh) |
| KR (1) | KR101090094B1 (zh) |
| CN (1) | CN100445416C (zh) |
| AT (1) | ATE387518T1 (zh) |
| AU (1) | AU2003276069B2 (zh) |
| BR (1) | BR0316515B1 (zh) |
| CA (1) | CA2506389C (zh) |
| DE (2) | DE10254306A1 (zh) |
| ES (1) | ES2298625T3 (zh) |
| MX (1) | MXPA05005311A (zh) |
| MY (1) | MY139905A (zh) |
| PL (1) | PL212670B1 (zh) |
| RU (1) | RU2338809C2 (zh) |
| TW (1) | TWI334451B (zh) |
| WO (1) | WO2004046412A2 (zh) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| RU2344197C2 (ru) * | 2003-02-27 | 2009-01-20 | Смс Демаг Акциенгезелльшафт | Способ и устройство для нанесения покрытий погружением в расплав на металлические ленты, в частности на стальные ленты |
| DE102005012296A1 (de) * | 2005-03-17 | 2006-09-21 | Sms Demag Ag | Verfahren und Vorrichtung zum Entzundern eines Metallbandes |
| MY157670A (en) * | 2006-08-30 | 2016-07-15 | Bluescope Steel Ltd | Metal-coated steel strip |
| RU2488644C2 (ru) * | 2011-10-25 | 2013-07-27 | Александр Александрович Кулаковский | Устройство для нанесения покрытия на протяженное изделие |
| AT520084B1 (de) * | 2017-10-03 | 2019-01-15 | Primetals Technologies Austria GmbH | Verfahren zum Betrieb einer Gieß-Walz-Verbundanlage und Gieß-Walz-Verbundanlage |
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| US4577588A (en) * | 1983-08-29 | 1986-03-25 | Compagnie Generale D'electricite | Device for process-type deposition of polycrystalline silicon on carbon film |
| US4762687A (en) * | 1985-12-23 | 1988-08-09 | Societe Nationale Elf Aquitaine | Means for forming a melt of a semiconductor material in order to make a crystalline element grow therein |
| US5665437A (en) * | 1992-12-08 | 1997-09-09 | Mannesmann Aktiengesellschaft | Process and device for coating the surface of strip material |
| EP0803586A1 (en) * | 1995-11-10 | 1997-10-29 | Mitsubishi Jukogyo Kabushiki Kaisha | Method and apparatus for holding molten metal |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA2225537C (en) * | 1996-12-27 | 2001-05-15 | Mitsubishi Heavy Industries, Ltd. | Hot dip coating apparatus and method |
| DE19758140A1 (de) * | 1997-12-19 | 1999-07-08 | Mannesmann Ag | Verfahren zum Erzeugen von Metallprodukten aus Verbundwerkstoff |
| DE10146791A1 (de) * | 2001-09-20 | 2003-04-10 | Sms Demag Ag | Verfahren und Vorrichtung zum Beschichten der Oberfläche von strangförmigem metallischem Gut |
| DE10160949A1 (de) * | 2001-12-12 | 2003-06-26 | Sms Demag Ag | System und Verfahren zum Beschichten der Oberfläche eines Metallbandes |
-
2002
- 2002-11-21 DE DE10254306A patent/DE10254306A1/de not_active Withdrawn
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2003
- 2003-10-03 TW TW092127409A patent/TWI334451B/zh not_active IP Right Cessation
- 2003-10-06 KR KR1020057008836A patent/KR101090094B1/ko not_active IP Right Cessation
- 2003-10-06 JP JP2004552472A patent/JP4485955B2/ja not_active Expired - Fee Related
- 2003-10-06 AU AU2003276069A patent/AU2003276069B2/en not_active Ceased
- 2003-10-06 DE DE50309275T patent/DE50309275D1/de not_active Expired - Lifetime
- 2003-10-06 US US10/535,772 patent/US20060153992A1/en not_active Abandoned
- 2003-10-06 MX MXPA05005311A patent/MXPA05005311A/es active IP Right Grant
- 2003-10-06 EP EP03811347A patent/EP1563113B1/de not_active Expired - Lifetime
- 2003-10-06 ES ES03811347T patent/ES2298625T3/es not_active Expired - Lifetime
- 2003-10-06 WO PCT/EP2003/011080 patent/WO2004046412A2/de active IP Right Grant
- 2003-10-06 RU RU2005119289/02A patent/RU2338809C2/ru not_active IP Right Cessation
- 2003-10-06 BR BRPI0316515-9A patent/BR0316515B1/pt not_active IP Right Cessation
- 2003-10-06 CA CA2506389A patent/CA2506389C/en not_active Expired - Fee Related
- 2003-10-06 PL PL375258A patent/PL212670B1/pl not_active IP Right Cessation
- 2003-10-06 AT AT03811347T patent/ATE387518T1/de active
- 2003-10-06 CN CNB2003801037520A patent/CN100445416C/zh not_active Expired - Fee Related
- 2003-11-19 MY MYPI20034438A patent/MY139905A/en unknown
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4577588A (en) * | 1983-08-29 | 1986-03-25 | Compagnie Generale D'electricite | Device for process-type deposition of polycrystalline silicon on carbon film |
| US4762687A (en) * | 1985-12-23 | 1988-08-09 | Societe Nationale Elf Aquitaine | Means for forming a melt of a semiconductor material in order to make a crystalline element grow therein |
| US5665437A (en) * | 1992-12-08 | 1997-09-09 | Mannesmann Aktiengesellschaft | Process and device for coating the surface of strip material |
| EP0803586A1 (en) * | 1995-11-10 | 1997-10-29 | Mitsubishi Jukogyo Kabushiki Kaisha | Method and apparatus for holding molten metal |
Also Published As
| Publication number | Publication date |
|---|---|
| JP4485955B2 (ja) | 2010-06-23 |
| AU2003276069B2 (en) | 2009-01-29 |
| US20060153992A1 (en) | 2006-07-13 |
| DE10254306A1 (de) | 2004-06-03 |
| KR101090094B1 (ko) | 2011-12-07 |
| CA2506389C (en) | 2011-09-13 |
| PL375258A1 (en) | 2005-11-28 |
| BR0316515A (pt) | 2005-10-04 |
| CN1729309A (zh) | 2006-02-01 |
| PL212670B1 (pl) | 2012-11-30 |
| EP1563113A2 (de) | 2005-08-17 |
| TW200408725A (en) | 2004-06-01 |
| CA2506389A1 (en) | 2004-06-03 |
| WO2004046412A2 (de) | 2004-06-03 |
| AU2003276069A1 (en) | 2004-06-15 |
| BR0316515B1 (pt) | 2012-11-27 |
| ATE387518T1 (de) | 2008-03-15 |
| MXPA05005311A (es) | 2005-08-16 |
| JP2006508240A (ja) | 2006-03-09 |
| TWI334451B (en) | 2010-12-11 |
| MY139905A (en) | 2009-11-30 |
| DE50309275D1 (de) | 2008-04-10 |
| EP1563113B1 (de) | 2008-02-27 |
| WO2004046412A3 (de) | 2004-07-29 |
| RU2338809C2 (ru) | 2008-11-20 |
| RU2005119289A (ru) | 2006-02-10 |
| ES2298625T3 (es) | 2008-05-16 |
| KR20050085016A (ko) | 2005-08-29 |
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