CN100397157C - 阵列基板及平面显示装置 - Google Patents
阵列基板及平面显示装置 Download PDFInfo
- Publication number
- CN100397157C CN100397157C CNB2004100898783A CN200410089878A CN100397157C CN 100397157 C CN100397157 C CN 100397157C CN B2004100898783 A CNB2004100898783 A CN B2004100898783A CN 200410089878 A CN200410089878 A CN 200410089878A CN 100397157 C CN100397157 C CN 100397157C
- Authority
- CN
- China
- Prior art keywords
- gate electrode
- pixels
- array substrate
- pixel
- electrode wiring
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Images
Classifications
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136204—Arrangements to prevent high voltage or static electricity failures
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
- H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
- H10D86/441—Interconnections, e.g. scanning lines
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
- H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
- H10D86/60—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs wherein the TFTs are in active matrices
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Mathematical Physics (AREA)
- Liquid Crystal (AREA)
- Thin Film Transistor (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003367276A JP4319517B2 (ja) | 2003-10-28 | 2003-10-28 | アレイ基板および平面表示装置 |
| JP2003367276 | 2003-10-28 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1612004A CN1612004A (zh) | 2005-05-04 |
| CN100397157C true CN100397157C (zh) | 2008-06-25 |
Family
ID=34645329
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB2004100898783A Expired - Lifetime CN100397157C (zh) | 2003-10-28 | 2004-10-28 | 阵列基板及平面显示装置 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US7564511B2 (enExample) |
| JP (1) | JP4319517B2 (enExample) |
| KR (1) | KR100777850B1 (enExample) |
| CN (1) | CN100397157C (enExample) |
| SG (1) | SG111282A1 (enExample) |
| TW (1) | TW200527053A (enExample) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5514418B2 (ja) * | 2008-09-05 | 2014-06-04 | 株式会社ジャパンディスプレイ | 液晶表示装置 |
| CN103217843B (zh) * | 2013-03-25 | 2016-02-17 | 京东方科技集团股份有限公司 | 阵列基板及其制造方法和液晶面板 |
| JP2015072434A (ja) * | 2013-10-04 | 2015-04-16 | 株式会社ジャパンディスプレイ | 液晶表示装置 |
| CN105185740B (zh) * | 2015-06-26 | 2019-01-15 | 京东方科技集团股份有限公司 | 一种阵列基板及其制备方法、显示面板和显示装置 |
| JP6947550B2 (ja) * | 2017-06-27 | 2021-10-13 | 株式会社ジャパンディスプレイ | 表示装置 |
| CN111554730B (zh) * | 2020-06-09 | 2022-12-02 | 云谷(固安)科技有限公司 | 一种显示面板及显示装置 |
| CN114578624B (zh) * | 2021-12-29 | 2023-01-17 | 滁州惠科光电科技有限公司 | 阵列基板及显示面板 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5227901A (en) * | 1991-03-20 | 1993-07-13 | Kabushiki Kaisha Toshiba | Liquid crystal display device |
| US5781253A (en) * | 1995-10-31 | 1998-07-14 | International Business Machines Corporation | Liquid crystal display having electrostatic discharge protection and method for manufacturing the same |
| CN1388404A (zh) * | 1995-10-03 | 2003-01-01 | 精工爱普生株式会社 | 有源矩阵基板及其制造方法 |
| US6515720B1 (en) * | 1998-07-14 | 2003-02-04 | Kabushiki Kaisha Toshiba | Active matrix liquid crystal display device |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3116295B2 (ja) * | 1993-05-25 | 2000-12-11 | 松下電器産業株式会社 | アクティブマトリクス基板の製造方法 |
| JP3006584B2 (ja) * | 1998-05-14 | 2000-02-07 | 日本電気株式会社 | 薄膜トランジスタアレイ |
| KR100695303B1 (ko) * | 2000-10-31 | 2007-03-14 | 삼성전자주식회사 | 제어 신호부 및 그 제조 방법과 이를 포함하는 액정 표시장치 및 그 제조 방법 |
| TW588179B (en) * | 2001-07-25 | 2004-05-21 | Hannstar Display Corp | Substrate structure for thin film transistor array |
| JP2003110019A (ja) | 2001-10-01 | 2003-04-11 | Ricoh Co Ltd | 半導体装置 |
| JP4082493B2 (ja) * | 2002-06-06 | 2008-04-30 | 株式会社 日立ディスプレイズ | 液晶表示装置 |
| JP2004054069A (ja) * | 2002-07-23 | 2004-02-19 | Advanced Display Inc | 表示装置及び表示装置の断線修復方法 |
| JP3791517B2 (ja) * | 2002-10-31 | 2006-06-28 | セイコーエプソン株式会社 | 電気光学装置及び電子機器 |
-
2003
- 2003-10-28 JP JP2003367276A patent/JP4319517B2/ja not_active Expired - Lifetime
-
2004
- 2004-10-21 US US10/968,961 patent/US7564511B2/en not_active Expired - Lifetime
- 2004-10-22 SG SG200406349A patent/SG111282A1/en unknown
- 2004-10-27 KR KR1020040086220A patent/KR100777850B1/ko not_active Expired - Fee Related
- 2004-10-28 TW TW093132823A patent/TW200527053A/zh not_active IP Right Cessation
- 2004-10-28 CN CNB2004100898783A patent/CN100397157C/zh not_active Expired - Lifetime
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5227901A (en) * | 1991-03-20 | 1993-07-13 | Kabushiki Kaisha Toshiba | Liquid crystal display device |
| CN1388404A (zh) * | 1995-10-03 | 2003-01-01 | 精工爱普生株式会社 | 有源矩阵基板及其制造方法 |
| US5781253A (en) * | 1995-10-31 | 1998-07-14 | International Business Machines Corporation | Liquid crystal display having electrostatic discharge protection and method for manufacturing the same |
| US6515720B1 (en) * | 1998-07-14 | 2003-02-04 | Kabushiki Kaisha Toshiba | Active matrix liquid crystal display device |
Also Published As
| Publication number | Publication date |
|---|---|
| SG111282A1 (en) | 2005-05-30 |
| KR20050040763A (ko) | 2005-05-03 |
| TWI294052B (enExample) | 2008-03-01 |
| JP2005134446A (ja) | 2005-05-26 |
| JP4319517B2 (ja) | 2009-08-26 |
| TW200527053A (en) | 2005-08-16 |
| US20050140570A1 (en) | 2005-06-30 |
| CN1612004A (zh) | 2005-05-04 |
| US7564511B2 (en) | 2009-07-21 |
| KR100777850B1 (ko) | 2007-11-21 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C56 | Change in the name or address of the patentee |
Owner name: TOSHIBA MOBILE DISPLAY CO., LTD. Free format text: FORMER NAME: TOSHIBA MATSUSHITA DISPLAY TECHNOLOGY LTD. Owner name: JAPAN DISPLAY MIDDLE INC. Free format text: FORMER NAME: TOSHIBA MOBILE DISPLAY CO., LTD. |
|
| CP01 | Change in the name or title of a patent holder |
Address after: Saitama Prefecture, Japan Patentee after: JAPAN DISPLAY Inc. Address before: Saitama Prefecture, Japan Patentee before: Toshiba Mobile Display Co.,Ltd. |
|
| CP03 | Change of name, title or address |
Address after: Saitama Prefecture, Japan Patentee after: Toshiba Mobile Display Co.,Ltd. Address before: Tokyo, Japan Patentee before: TOSHIBA MATSUSHITA DISPLAY TECHNOLOGY Co.,Ltd. |
|
| CX01 | Expiry of patent term | ||
| CX01 | Expiry of patent term |
Granted publication date: 20080625 |