CN100387921C - 用于等离子体显示板的烘焙系统及该系统的布局方法 - Google Patents
用于等离子体显示板的烘焙系统及该系统的布局方法 Download PDFInfo
- Publication number
- CN100387921C CN100387921C CNB031367674A CN03136767A CN100387921C CN 100387921 C CN100387921 C CN 100387921C CN B031367674 A CNB031367674 A CN B031367674A CN 03136767 A CN03136767 A CN 03136767A CN 100387921 C CN100387921 C CN 100387921C
- Authority
- CN
- China
- Prior art keywords
- plasma display
- display panel
- enameling furnace
- clean room
- glass substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000000034 method Methods 0.000 title claims abstract description 30
- 239000000758 substrate Substances 0.000 claims abstract description 56
- 239000011521 glass Substances 0.000 claims abstract description 47
- 238000004534 enameling Methods 0.000 claims description 45
- 230000032258 transport Effects 0.000 claims description 14
- 230000007246 mechanism Effects 0.000 claims description 7
- 238000010586 diagram Methods 0.000 description 9
- 238000010438 heat treatment Methods 0.000 description 7
- 230000008569 process Effects 0.000 description 6
- 239000000428 dust Substances 0.000 description 4
- 239000000843 powder Substances 0.000 description 3
- 238000005299 abrasion Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- 238000002438 flame photometric detection Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 238000005452 bending Methods 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/24—Manufacture or joining of vessels, leading-in conductors or bases
- H01J9/26—Sealing together parts of vessels
- H01J9/265—Sealing together parts of vessels specially adapted for gas-discharge tubes or lamps
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2217/00—Gas-filled discharge tubes
- H01J2217/38—Cold-cathode tubes
- H01J2217/49—Display panels, e.g. not making use of alternating current
- H01J2217/491—Display panels, e.g. not making use of alternating current characterised by problems peculiar to plasma displays
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Manufacture Of Electron Tubes, Discharge Lamp Vessels, Lead-In Wires, And The Like (AREA)
- Gas-Filled Discharge Tubes (AREA)
- Tunnel Furnaces (AREA)
Abstract
Description
Claims (4)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002128082A JP2003322472A (ja) | 2002-04-30 | 2002-04-30 | プラズマディスプレイパネル用焼成炉の配置方法 |
JP128082/2002 | 2002-04-30 | ||
JP128082/02 | 2002-04-30 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1455217A CN1455217A (zh) | 2003-11-12 |
CN100387921C true CN100387921C (zh) | 2008-05-14 |
Family
ID=29267668
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB031367674A Expired - Fee Related CN100387921C (zh) | 2002-04-30 | 2003-04-29 | 用于等离子体显示板的烘焙系统及该系统的布局方法 |
Country Status (3)
Country | Link |
---|---|
US (1) | US6998578B2 (zh) |
JP (1) | JP2003322472A (zh) |
CN (1) | CN100387921C (zh) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005156016A (ja) * | 2003-11-26 | 2005-06-16 | Matsushita Electric Ind Co Ltd | プラズマディスプレイパネルの焼成装置 |
CN101719442B (zh) * | 2009-04-21 | 2012-05-30 | 四川虹欧显示器件有限公司 | 用于等离子显示屏的烧结装置 |
DE102009038341A1 (de) * | 2009-08-21 | 2011-04-21 | Von Ardenne Anlagentechnik Gmbh | Heizeinrichtung für eine Substratbehandlungseinrichtung und Substratbehandlungseinrichtung |
US20120225204A1 (en) * | 2011-03-01 | 2012-09-06 | Applied Materials, Inc. | Apparatus and Process for Atomic Layer Deposition |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06347175A (ja) * | 1993-06-08 | 1994-12-20 | Murata Mfg Co Ltd | 炉体開口部のガスシール構造 |
JPH10162743A (ja) * | 1996-12-03 | 1998-06-19 | Fujitsu Ltd | プラズマディスプレイパネル及び保護膜の形成方法 |
US6018144A (en) * | 1995-11-13 | 2000-01-25 | Radiant Technology Corporation | Method of conveying moieties through an IR conveyor furnace with controlled temperature profile for large area processing multichip modules |
JP2000026131A (ja) * | 1998-07-09 | 2000-01-25 | Dainippon Printing Co Ltd | 焼成処理装置 |
JP2000081283A (ja) * | 1998-09-07 | 2000-03-21 | Dainippon Printing Co Ltd | 焼成炉 |
US6204483B1 (en) * | 1998-07-01 | 2001-03-20 | Intevac, Inc. | Heating assembly for rapid thermal processing system |
-
2002
- 2002-04-30 JP JP2002128082A patent/JP2003322472A/ja active Pending
-
2003
- 2003-04-24 US US10/421,729 patent/US6998578B2/en not_active Expired - Fee Related
- 2003-04-29 CN CNB031367674A patent/CN100387921C/zh not_active Expired - Fee Related
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06347175A (ja) * | 1993-06-08 | 1994-12-20 | Murata Mfg Co Ltd | 炉体開口部のガスシール構造 |
US6018144A (en) * | 1995-11-13 | 2000-01-25 | Radiant Technology Corporation | Method of conveying moieties through an IR conveyor furnace with controlled temperature profile for large area processing multichip modules |
JPH10162743A (ja) * | 1996-12-03 | 1998-06-19 | Fujitsu Ltd | プラズマディスプレイパネル及び保護膜の形成方法 |
US6204483B1 (en) * | 1998-07-01 | 2001-03-20 | Intevac, Inc. | Heating assembly for rapid thermal processing system |
JP2000026131A (ja) * | 1998-07-09 | 2000-01-25 | Dainippon Printing Co Ltd | 焼成処理装置 |
JP2000081283A (ja) * | 1998-09-07 | 2000-03-21 | Dainippon Printing Co Ltd | 焼成炉 |
Also Published As
Publication number | Publication date |
---|---|
US6998578B2 (en) | 2006-02-14 |
JP2003322472A (ja) | 2003-11-14 |
CN1455217A (zh) | 2003-11-12 |
US20030232562A1 (en) | 2003-12-18 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
ASS | Succession or assignment of patent right |
Owner name: PANASONIC ELECTRIC EQUIPMENT INDUSTRIAL CO.,LTD. Free format text: FORMER OWNER: NGK INSULATORS LTD.; APPLICANT Effective date: 20070601 |
|
C41 | Transfer of patent application or patent right or utility model | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20070601 Address after: Japan Osaka kamato City Applicant after: Matsushita Electric Industrial Co., Ltd. Address before: Aichi Applicant before: NGK Insulators Co., Ltd. Co-applicant before: Matsushita Electric Industrial Co., Ltd. |
|
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C17 | Cessation of patent right | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20080514 Termination date: 20130429 |