CN100352067C - 蓝宝石衬底减薄方法 - Google Patents
蓝宝石衬底减薄方法 Download PDFInfo
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- CN100352067C CN100352067C CNB031469361A CN03146936A CN100352067C CN 100352067 C CN100352067 C CN 100352067C CN B031469361 A CNB031469361 A CN B031469361A CN 03146936 A CN03146936 A CN 03146936A CN 100352067 C CN100352067 C CN 100352067C
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- Prior art keywords
- substrate
- bonding die
- organic solvent
- dewax
- polishing
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- Mechanical Treatment Of Semiconductor (AREA)
Abstract
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Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CNB031469361A CN100352067C (zh) | 2003-09-23 | 2003-09-23 | 蓝宝石衬底减薄方法 |
Applications Claiming Priority (1)
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CNB031469361A CN100352067C (zh) | 2003-09-23 | 2003-09-23 | 蓝宝石衬底减薄方法 |
Publications (2)
Publication Number | Publication Date |
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CN1601766A CN1601766A (zh) | 2005-03-30 |
CN100352067C true CN100352067C (zh) | 2007-11-28 |
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CNB031469361A Expired - Fee Related CN100352067C (zh) | 2003-09-23 | 2003-09-23 | 蓝宝石衬底减薄方法 |
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CN (1) | CN100352067C (zh) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103078015A (zh) * | 2011-10-26 | 2013-05-01 | 大连美明外延片科技有限公司 | 一种发光二极管的研磨下蜡方法 |
CN102437169B (zh) * | 2011-11-25 | 2013-12-25 | 格科微电子(上海)有限公司 | 图像传感器的制造方法 |
CN105081893B (zh) * | 2015-05-13 | 2018-11-06 | 北京通美晶体技术有限公司 | 一种超薄Ge单晶衬底材料及其制备方法 |
CN106002498B (zh) * | 2016-08-01 | 2018-04-06 | 中国电子科技集团公司第四十六研究所 | 一种有机dast晶体的表面研磨工艺方法 |
CN107910246A (zh) * | 2017-11-10 | 2018-04-13 | 北京鼎泰芯源科技发展有限公司 | 用于磷化铟晶片的下盘方法 |
CN107877270B (zh) * | 2017-11-10 | 2020-03-17 | 中国电子科技集团公司第四十一研究所 | 一种用于介质基片片内均匀减薄的方法 |
CN109807695A (zh) * | 2019-03-29 | 2019-05-28 | 苏州恒嘉晶体材料有限公司 | 一种蓝宝石衬底片抛光方法 |
CN112967990B (zh) * | 2020-11-23 | 2023-02-24 | 重庆康佳光电技术研究院有限公司 | 芯片处理方法、led芯片及显示装置 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5191738A (en) * | 1989-06-16 | 1993-03-09 | Shin-Etsu Handotai Co., Ltd. | Method of polishing semiconductor wafer |
JPH0992632A (ja) * | 1995-09-22 | 1997-04-04 | Nippon Steel Corp | 化学機械研磨方法 |
US6309276B1 (en) * | 2000-02-01 | 2001-10-30 | Applied Materials, Inc. | Endpoint monitoring with polishing rate change |
CN1351383A (zh) * | 2000-10-26 | 2002-05-29 | 方大集团股份有限公司 | 氮化镓基蓝光发光二极管芯片的制造方法 |
US6398625B1 (en) * | 1993-11-16 | 2002-06-04 | Applied Materials, Inc. | Apparatus and method of polishing with slurry delivery through a polishing pad |
-
2003
- 2003-09-23 CN CNB031469361A patent/CN100352067C/zh not_active Expired - Fee Related
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5191738A (en) * | 1989-06-16 | 1993-03-09 | Shin-Etsu Handotai Co., Ltd. | Method of polishing semiconductor wafer |
US6398625B1 (en) * | 1993-11-16 | 2002-06-04 | Applied Materials, Inc. | Apparatus and method of polishing with slurry delivery through a polishing pad |
JPH0992632A (ja) * | 1995-09-22 | 1997-04-04 | Nippon Steel Corp | 化学機械研磨方法 |
US6309276B1 (en) * | 2000-02-01 | 2001-10-30 | Applied Materials, Inc. | Endpoint monitoring with polishing rate change |
CN1351383A (zh) * | 2000-10-26 | 2002-05-29 | 方大集团股份有限公司 | 氮化镓基蓝光发光二极管芯片的制造方法 |
Non-Patent Citations (1)
Title |
---|
液晶与显示 张书明,杨辉,段俐宏,王海,李秉成,王胜国,吴启保,章裕中,胡德进,张双益,44.47,氮化镓基蓝、绿光LED中游工艺技术产业化研究 2003 * |
Also Published As
Publication number | Publication date |
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CN1601766A (zh) | 2005-03-30 |
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ASS | Succession or assignment of patent right |
Owner name: SHENYANG FANGDA SEMICONDUCTOR LIGHTING CO., LTD. Free format text: FORMER OWNER: SHENZHEN FANGDA GUOKE PHOTOELECTRIC TECHNOLOGY CO., LTD. Effective date: 20110908 |
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Free format text: CORRECT: ADDRESS; FROM: 518055 SHENZHEN, GUANGDONG PROVINCE TO: 110168 SHENYANG, LIAONING PROVINCE |
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Effective date of registration: 20110908 Address after: 110168 Shenyang Hunnan New District Wende Street No. 6 Patentee after: Shenzhen Fangda Guoke Optoelectronic Technology Co., Ltd. Address before: 518055 Guangdong city of Shenzhen province Nanshan District Xili, Longjing Fangda Patentee before: Shenzhen Fangda Guoke Optical Electronic Technology Co., Ltd. |
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CF01 | Termination of patent right due to non-payment of annual fee |