CH701980A2 - Process for obtaining a yellow gold alloy deposit by electroplating without the use of toxic metals. - Google Patents
Process for obtaining a yellow gold alloy deposit by electroplating without the use of toxic metals. Download PDFInfo
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- CH701980A2 CH701980A2 CH01586/09A CH15862009A CH701980A2 CH 701980 A2 CH701980 A2 CH 701980A2 CH 01586/09 A CH01586/09 A CH 01586/09A CH 15862009 A CH15862009 A CH 15862009A CH 701980 A2 CH701980 A2 CH 701980A2
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- CH
- Switzerland
- Prior art keywords
- bath
- copper
- gold
- silver
- cyanide
- Prior art date
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- 238000000034 method Methods 0.000 title claims abstract description 26
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 13
- 239000002184 metal Substances 0.000 title claims abstract description 13
- 229910045601 alloy Inorganic materials 0.000 title claims abstract description 9
- 239000000956 alloy Substances 0.000 title claims abstract description 9
- 239000010930 yellow gold Substances 0.000 title claims abstract description 5
- 229910001097 yellow gold Inorganic materials 0.000 title claims abstract description 5
- 150000002739 metals Chemical class 0.000 title claims description 5
- 238000009713 electroplating Methods 0.000 title claims description 3
- 231100000331 toxic Toxicity 0.000 title description 3
- 230000002588 toxic effect Effects 0.000 title description 3
- 239000010949 copper Substances 0.000 claims abstract description 25
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 24
- 229910052802 copper Inorganic materials 0.000 claims abstract description 24
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 claims abstract description 17
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims abstract description 16
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims abstract description 15
- 239000010931 gold Substances 0.000 claims abstract description 15
- 229910052737 gold Inorganic materials 0.000 claims abstract description 15
- 229910052709 silver Inorganic materials 0.000 claims abstract description 14
- 239000004332 silver Substances 0.000 claims abstract description 14
- 229910001020 Au alloy Inorganic materials 0.000 claims abstract description 10
- 238000000151 deposition Methods 0.000 claims abstract description 10
- 239000003353 gold alloy Substances 0.000 claims abstract description 10
- 239000000080 wetting agent Substances 0.000 claims abstract description 8
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 claims abstract description 4
- 150000001412 amines Chemical class 0.000 claims abstract description 4
- 239000008139 complexing agent Substances 0.000 claims abstract description 4
- 150000002902 organometallic compounds Chemical class 0.000 claims abstract description 4
- 239000011591 potassium Substances 0.000 claims abstract description 4
- 229910052700 potassium Inorganic materials 0.000 claims abstract description 4
- 150000001875 compounds Chemical class 0.000 claims description 4
- OCUCCJIRFHNWBP-IYEMJOQQSA-L Copper gluconate Chemical class [Cu+2].OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C([O-])=O.OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C([O-])=O OCUCCJIRFHNWBP-IYEMJOQQSA-L 0.000 claims description 2
- 229910019142 PO4 Inorganic materials 0.000 claims description 2
- ABLZXFCXXLZCGV-UHFFFAOYSA-N Phosphorous acid Chemical class OP(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 claims description 2
- 239000003513 alkali Substances 0.000 claims description 2
- 238000005275 alloying Methods 0.000 claims description 2
- 150000004649 carbonic acid derivatives Chemical class 0.000 claims description 2
- 150000001860 citric acid derivatives Chemical class 0.000 claims description 2
- MOTZDAYCYVMXPC-UHFFFAOYSA-N dodecyl hydrogen sulfate Chemical compound CCCCCCCCCCCCOS(O)(=O)=O MOTZDAYCYVMXPC-UHFFFAOYSA-N 0.000 claims description 2
- 229940043264 dodecyl sulfate Drugs 0.000 claims description 2
- NYUQKKWCYPVQGE-UHFFFAOYSA-N dodecyl(dimethyl)azanium;propane-1-sulfonate Chemical compound CCCS([O-])(=O)=O.CCCCCCCCCCCC[NH+](C)C NYUQKKWCYPVQGE-UHFFFAOYSA-N 0.000 claims description 2
- 235000021317 phosphate Nutrition 0.000 claims description 2
- 150000003013 phosphoric acid derivatives Chemical class 0.000 claims description 2
- 150000003839 salts Chemical class 0.000 claims description 2
- 150000003467 sulfuric acid derivatives Chemical class 0.000 claims description 2
- 150000003892 tartrate salts Chemical class 0.000 claims description 2
- 230000008021 deposition Effects 0.000 abstract description 6
- 229910002065 alloy metal Inorganic materials 0.000 abstract 2
- 239000003795 chemical substances by application Substances 0.000 abstract 2
- 230000002999 depolarising effect Effects 0.000 abstract 2
- 229910052793 cadmium Inorganic materials 0.000 description 7
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 7
- 238000005868 electrolysis reaction Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000009736 wetting Methods 0.000 description 3
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- 229910052733 gallium Inorganic materials 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 229910052711 selenium Inorganic materials 0.000 description 2
- 239000011669 selenium Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 238000005494 tarnishing Methods 0.000 description 2
- 229910052714 tellurium Inorganic materials 0.000 description 2
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- IPZMTZLUAIKVKD-UHFFFAOYSA-N 1-pyridin-1-ium-1-ylpropane-1-sulfonate Chemical compound CCC(S([O-])(=O)=O)[N+]1=CC=CC=C1 IPZMTZLUAIKVKD-UHFFFAOYSA-N 0.000 description 1
- RVBUGGBMJDPOST-UHFFFAOYSA-N 2-thiobarbituric acid Chemical compound O=C1CC(=O)NC(=S)N1 RVBUGGBMJDPOST-UHFFFAOYSA-N 0.000 description 1
- 241000499489 Castor canadensis Species 0.000 description 1
- 229910017770 Cu—Ag Inorganic materials 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- PDQAZBWRQCGBEV-UHFFFAOYSA-N Ethylenethiourea Chemical compound S=C1NCCN1 PDQAZBWRQCGBEV-UHFFFAOYSA-N 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- 235000011779 Menyanthes trifoliata Nutrition 0.000 description 1
- 150000001204 N-oxides Chemical class 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical class [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 229910021626 Tin(II) chloride Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- 229910052790 beryllium Inorganic materials 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 229910052752 metalloid Inorganic materials 0.000 description 1
- 150000002738 metalloids Chemical class 0.000 description 1
- WREDNSAXDZCLCP-UHFFFAOYSA-N methanedithioic acid Chemical compound SC=S WREDNSAXDZCLCP-UHFFFAOYSA-N 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- -1 polypropylene Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 229910052573 porcelain Inorganic materials 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 1
- NJRXVEJTAYWCQJ-UHFFFAOYSA-N thiomalic acid Chemical compound OC(=O)CC(S)C(O)=O NJRXVEJTAYWCQJ-UHFFFAOYSA-N 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/62—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of gold
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Abstract
Description
Domaine de l’inventionField of the invention
[0001] L’invention se rapporte à dépôt électrolytique sous forme d’un alliage d’or en couche épaisse ainsi que son procédé de fabrication. The invention relates to electrolytic deposition in the form of a gold alloy thick layer and its manufacturing process.
Arrière plan de l’inventionBackground of the invention
[0002] Dans le domaine décoratif du placage, on connaît des procédés pour la production de dépôts électrolytiques d’or, de couleur jaune, dont le titre est supérieur ou égal à 9 carats, ductile à une épaisseur de 10 microns, et de grande résistance au ternissement. Ces dépôts sont obtenus par une électrolyse dans un bain galvanique alcalin contenant, en plus de l’or et du cuivre, du cadmium à raison de 0,1 à 3 g.l<-><1>. In the decorative field of plating, there are known processes for the production of electrolytic gold deposits, yellow in color, whose title is greater than or equal to 9 carats, ductile to a thickness of 10 microns, and large tarnish resistance. These deposits are obtained by electrolysis in an alkaline galvanic bath containing, in addition to gold and copper, cadmium in a proportion of 0.1 to 3 g.l <-> <1>.
[0003] Les dépôts obtenus par ces procédés connus présentent cependant des teneurs en cadmium comprises entre 1 et 10%. Le cadmium facilite le dépôt de couches épaisses, c’est-à-dire entre 1 et 800 microns et permet d’obtenir un alliage de couleur jaune en diminuant la quantité de cuivre contenue dans l’alliage; toutefois le cadmium est extrêmement toxique et interdit dans certains pays. Deposits obtained by these known methods, however, have cadmium contents of between 1 and 10%. Cadmium facilitates the deposition of thick layers, that is to say between 1 and 800 microns and makes it possible to obtain a yellow-colored alloy by decreasing the quantity of copper contained in the alloy; however, cadmium is extremely toxic and banned in some countries.
[0004] On connaît aussi des alliages d’or de 18 carats sans cadmium, contenant du cuivre et du zinc. Cependant, ces dépôts sont de teinte trop rose (titre trop riche en cuivre). Enfin, ces dépôts ont une mauvaise résistance à la corrosion ce qui implique un ternissement rapide. There are also known alloys of 18-carat gold without cadmium, containing copper and zinc. However, these deposits are too pink (title too rich in copper). Finally, these deposits have a poor resistance to corrosion which implies a rapid tarnishing.
Résumé de l’inventionSummary of the invention
[0005] Le but de la présente invention est de pallier tout ou partie les inconvénients cités précédemment un procédé de fabrication permettant le dépôt en couche épaisse d’un alliage d’or de couleur jaune n’ayant ni de zinc ni de cadmium comme constituants principaux. The object of the present invention is to overcome all or part of the disadvantages mentioned above a manufacturing process for the deposition in thick layer of a yellow gold alloy having neither zinc nor cadmium as constituents key.
[0006] A cet effet, l’invention se rapporte à un procédé de dépôt galvanoplastique d’un alliage d’or sur une électrode plongée dans un bain comportant de l’or métal sous forme d’aurocyanure alcalin, des composés organométalliques, un mouillant, un complexant, du cyanure libre caractérisé en ce que les métaux d’alliage sont du cuivre sous forme de cyanure double de cuivre et potassium, et de l’argent sous forme cyanure permettant de déposer sur l’électrode un alliage d’or du type jaune miroir brillant. For this purpose, the invention relates to a method of electroplating a gold alloy on an electrode immersed in a bath comprising gold metal in the form of alkali aurocyanide, organometallic compounds, a wetting, a complexing agent, free cyanide characterized in that the alloying metals are copper in the form of copper and potassium double cyanide, and silver in cyanide form for depositing on the electrode a gold alloy bright yellow mirror type.
[0007] Conformément à d’autres caractéristiques avantageuses de l’invention: le bain comporte de 1 à 10 g.l<-><1> d’or métal sous forme d’aurocyanure alcalin; le bain comporte de 30 à 80 g.l<-><1> de cuivre métal sous forme de cyanure double alcalin; le bain comporte de 10 mg.l<-><1> à 1 g.l<-><1>d’argent métal sous forme complexé; le bain comporte de 15 à 35 g.l<-><1> de cyanure libre; le mouillant comporte une concentration comprise entre 0,05 et 10 ml.l<-><1>; le mouillant est choisi parmi les types polyoxyalcoilenique, étherphosphate, lauryl sulfate, diaméthydodécylamine-N-oxide, diméthyldodécyl ammonium propane sulfonate; le bain comporte une aminé de concentration comprise entre 0,01 et 5 ml.l<-><1>; le bain comporte un dépolarisant de concentration comprise entre 0,1 mg.l<-><1> à 20 mg.l<-><1>; le bain comporte des sels conducteurs du type phosphates, carbonates, citrates, sulfates, tartrates, gluconates et/ou phosphonates; la température du bain est maintenue entre 50 et 80 °C; le pH du bain est maintenu entre 8 et 12; le procédé est réalisé à une densité de courant comprise entre 0,05 et1,5A.dm<-><2>; le bain respecte une proportion de 9,08% d’or, de 90,85% de cuivre et de 0,07% d’argent.According to other advantageous features of the invention: the bath comprises from 1 to 10 g of metal in the form of alkaline aurocyanide; the bath comprises from 30 to 80 g.l <-> <1> of copper metal in the form of double alkaline cyanide; the bath comprises from 10 mg. to 1 g.l <-> <1> of silver metal in complexed form; the bath comprises from 15 to 35 g of free cyanide; the wetting agent has a concentration of between 0.05 and 10 ml.l <-> <1>; the wetting agent is chosen from the polyoxyalcoilene, etherphosphate, lauryl sulfate, diamethydodecylamine-N-oxide and dimethyldodecylammonium propane sulfonate types; the bath comprises an amine with a concentration of between 0.01 and 5 ml.l <-> <1>; the bath comprises a depolarizer with a concentration of between 0.1 mg.l <-> <1> to 20 mg.l <-> <1>; the bath comprises conducting salts of phosphates, carbonates, citrates, sulphates, tartrates, gluconates and / or phosphonates; the temperature of the bath is maintained between 50 and 80 ° C; the pH of the bath is maintained between 8 and 12; the process is carried out at a current density of between 0.05 and 1.5A.dm <-> <2>; the bath has a proportion of 9.08% gold, 90.85% copper and 0.07% silver.
[0008] L’invention se rapporte également à un dépôt électrolytique sous forme d’un alliage d’or obtenu à partir d’un procédé conforme à l’une des revendications précédentes dont l’épaisseur est comprise entre 1 et 800 microns et qui comporte du cuivre caractérisé en ce qu’il comprend de l’argent comme troisième composé principal permettant d’obtenir une teinte brillante 3N, préférentiellement selon une proportion de 75% d’or, de 21% de cuivre et de 4% d’argent. The invention also relates to an electrolytic deposit in the form of a gold alloy obtained from a process according to one of the preceding claims whose thickness is between 1 and 800 microns and which comprises copper characterized in that it comprises silver as the third main compound making it possible to obtain a brilliant 3N hue, preferably in a proportion of 75% of gold, 21% of copper and 4% of silver .
Description détaillée des modes de réalisation préférésDetailed Description of the Preferred Embodiments
[0009] L’invention concerne un dépôt électrolytique d’un alliage d’or de teinte 3N qui, de manière surprenante, comporte des composés principaux Au-Cu-Ag dont les proportions ne sont pas connues pour obtenir la teinte 3N, c’est-à-dire jaune brillant. The invention relates to an electrolytic deposition of a 3N gold alloy which, surprisingly, comprises principal compounds Au-Cu-Ag whose proportions are not known to obtain the 3N hue, c ' that is, bright yellow.
[0010] Dans un exemple de dépôt ci-dessus, on a un alliage d’or, exempt de métaux ou métalloïdes toxiques, en particulier exempt de cadmium, de teinte 3N jaune, d’une épaisseur de 200 microns, de brillance excellente et ayant une très grande résistance à l’usure et au ternissement. In an example of deposit above, there is a gold alloy, free of toxic metals or metalloids, especially free of cadmium, 3N yellow color, a thickness of 200 microns, excellent gloss and having a very high resistance to wear and tarnishing.
[0011] Ce dépôt est obtenu par une électrolyse dans un bain électrolytique du type: Au: 5,5 g.l<-><1> Cu: 55 g.l<-><1> Ag: 40 mg.l<-><1> KCN: 26 g.l<-><1> pH: 10,5 Température: 65°C Densité de Courant: 0,3 A.dm<-><2> Mouillant: 0,05 ml.l<-><1> NN-Diméthyldodecyl N-Oxide Iminodiacétique: 20 g.l<-><1> Ethylènediamine: 0.5 ml.l<-><1> Gallium, sélénium ou tellure: 10 mg.l<-><1>This deposit is obtained by electrolysis in an electrolytic bath of the type: At: 5.5 g.l <-> <1> Cu: 55 g.l <-> <1> Ag: 40 mg.l <-> <1> KCN: 26 g.l <-> <1> pH: 10.5 Temperature: 65 ° C Current Density: 0.3 A.dm <-> <2> Wetting: 0.05 ml.l <-> <1> NN-Dimethyldodecyl N-Oxide Iminodiacetics: 20 g.l <-> <1> Ethylenediamine: 0.5 ml.l <-> <1> Gallium, selenium or tellurium: 10 mg.l <-> <1>
[0012] L’électrolyse est de préférence suivie d’un traitement thermique à une température comprise entre 200 et 450 degrés Celsius pendant 1 à 30 minutes afin d’obtenir un dépôt de qualité optimale. The electrolysis is preferably followed by a heat treatment at a temperature between 200 and 450 degrees Celsius for 1 to 30 minutes to obtain an optimal quality deposit.
[0013] Ces conditions permettent d’obtenir un rendement cathodique de 98 mg.A.min<-><1> avec une vitesse de déposition d’environ 10 µm par heure dans le cas de l’exemple. These conditions allow to obtain a cathodic efficiency of 98 mg.A.min <-> <1> with a deposition rate of about 10 microns per hour in the case of the example.
[0014] Ainsi, de manière étonnante, le bain selon l’invention permet d’obtenir un dépôt sensiblement selon une proportion de 75% d’or, de 21% de cuivre et de 4% d’argent correspondant à un dépôt de teinte 3N à 18 carats qui est une proportion très différente des dépôts électrolytiques habituels pour cette teinte qui sont plutôt des dépôts selon sensiblement 75% d’or, 12,5% de cuivre et 12,5% d’argent. Thus, surprisingly, the bath according to the invention makes it possible to obtain a deposit substantially in a proportion of 75% of gold, 21% of copper and 4% of silver corresponding to a deposit of hue. 3N at 18 carats which is a very different proportion of the usual electrolytic deposits for this shade which are rather deposits according to approximately 75% of gold, 12.5% of copper and 12.5% of silver.
[0015] Le bain peut contenir en outre un brillanteur. Celui-ci est, de préférence, un dérivé du butynediol, un pyridinio-propanesulfonate ou un mélange des deux, un sel d’étain, de l’huile de castor sulfonées, du méthylimidozole, de l’acide dithiocarboxylique tels que du thiourée, de l’acide thiobarbiturique, de l’imidazolidinthione ou de l’acide thiomalique. The bath may further contain a brightener. This is preferably a butynediol derivative, a pyridinio-propanesulfonate or a mixture of both, a tin salt, sulfonated beaver oil, methylimidozole, dithiocarboxylic acid such as thiourea, thiobarbituric acid, imidazolidinthione or thiomalic acid.
[0016] Dans ces exemples, le bain électrolytique, contenu dans une cuve en polypropylène ou en PVC avec revêtement calorifuge. Le chauffage du bain est réalisé grâce à des thermo-plongeurs en quartz, en PTFE, en porcelaine ou en acier inoxydable stabilisé. Une bonne agitation cathodique ainsi qu’une circulation de l’électrolyte doit être maintenue. Les anodes sont en titane platiné, en acier inoxydable, en ruthénium, en iridium ou alliages de ces deux derniers. In these examples, the electrolytic bath, contained in a polypropylene tank or PVC with heat-insulating coating. Bath heating is achieved by thermo-plungers in quartz, PTFE, porcelain or stabilized stainless steel. Good cathodic stirring as well as a flow of the electrolyte must be maintained. The anodes are platinized titanium, stainless steel, ruthenium, iridium or alloys of the latter two.
[0017] Bien entendu, la présente invention ne se limite pas à l’exemple illustré mais est susceptible de diverses variantes et modifications qui apparaîtront à l’homme de l’art. En particulier, le bain peut contenir les métaux suivants Zr, Se, Te, Sb, Sn, Ga, As, Sr, Be, Bi en quantité négligeable. Of course, the present invention is not limited to the example shown but is susceptible to various variations and modifications that will occur to those skilled in the art. In particular, the bath may contain the following metals Zr, Se, Te, Sb, Sn, Ga, As, Sr, Be, Bi in negligible quantity.
[0018] De plus, le mouillant peut être de tout type susceptible de mouiller en milieu cyanure alcalin. In addition, the wetting agent may be of any type capable of wetting in alkaline cyanide medium.
Claims (16)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH001586/2009A CH701980B1 (en) | 2009-10-15 | 2009-10-15 | Process for obtaining a deposit of yellow gold alloy by electroplating without the use of toxic metals. |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH001586/2009A CH701980B1 (en) | 2009-10-15 | 2009-10-15 | Process for obtaining a deposit of yellow gold alloy by electroplating without the use of toxic metals. |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CH701980A2 true CH701980A2 (en) | 2011-04-15 |
| CH701980B1 CH701980B1 (en) | 2024-07-31 |
Family
ID=43857943
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CH001586/2009A CH701980B1 (en) | 2009-10-15 | 2009-10-15 | Process for obtaining a deposit of yellow gold alloy by electroplating without the use of toxic metals. |
Country Status (1)
| Country | Link |
|---|---|
| CH (1) | CH701980B1 (en) |
-
2009
- 2009-10-15 CH CH001586/2009A patent/CH701980B1/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| CH701980B1 (en) | 2024-07-31 |
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