CH662131A5 - Schwarzes ornament. - Google Patents
Schwarzes ornament. Download PDFInfo
- Publication number
- CH662131A5 CH662131A5 CH4673/84A CH467384A CH662131A5 CH 662131 A5 CH662131 A5 CH 662131A5 CH 4673/84 A CH4673/84 A CH 4673/84A CH 467384 A CH467384 A CH 467384A CH 662131 A5 CH662131 A5 CH 662131A5
- Authority
- CH
- Switzerland
- Prior art keywords
- black
- silicon carbide
- substrate
- less
- ornament
- Prior art date
Links
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 27
- 229910010271 silicon carbide Inorganic materials 0.000 claims description 26
- 239000000758 substrate Substances 0.000 claims description 24
- 239000007789 gas Substances 0.000 claims description 23
- 239000010409 thin film Substances 0.000 claims description 23
- 239000000376 reactant Substances 0.000 claims description 15
- 239000010408 film Substances 0.000 claims description 12
- 238000000034 method Methods 0.000 claims description 12
- 230000003746 surface roughness Effects 0.000 claims description 12
- 239000000203 mixture Substances 0.000 claims description 9
- 229930195733 hydrocarbon Natural products 0.000 claims description 6
- 150000002430 hydrocarbons Chemical class 0.000 claims description 6
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 claims description 5
- 239000001257 hydrogen Substances 0.000 claims description 5
- 229910052739 hydrogen Inorganic materials 0.000 claims description 5
- 150000003377 silicon compounds Chemical class 0.000 claims description 5
- 239000005049 silicon tetrachloride Substances 0.000 claims description 5
- 239000004215 Carbon black (E152) Substances 0.000 claims description 4
- 125000004432 carbon atom Chemical group C* 0.000 claims description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 3
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 claims description 3
- 241000665112 Zonitoides nitidus Species 0.000 claims description 2
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims 1
- 230000000052 comparative effect Effects 0.000 description 16
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 8
- 239000011248 coating agent Substances 0.000 description 7
- 238000000576 coating method Methods 0.000 description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 4
- 229910052786 argon Inorganic materials 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 238000007733 ion plating Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 4
- 239000000956 alloy Substances 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 229910010293 ceramic material Inorganic materials 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 239000010936 titanium Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- 229910004028 SiCU Inorganic materials 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 230000000295 complement effect Effects 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000010891 electric arc Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000003760 hair shine Effects 0.000 description 1
- 239000002932 luster Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 230000007306 turnover Effects 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B44—DECORATIVE ARTS
- B44F—SPECIAL DESIGNS OR PICTURES
- B44F1/00—Designs or pictures characterised by special or unusual light effects
- B44F1/08—Designs or pictures characterised by special or unusual light effects characterised by colour effects
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/32—Carbides
- C23C16/325—Silicon carbide
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Eyeglasses (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58180392A JPS6075577A (ja) | 1983-09-30 | 1983-09-30 | 黒色装飾品 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CH662131A5 true CH662131A5 (de) | 1987-09-15 |
Family
ID=16082430
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CH4673/84A CH662131A5 (de) | 1983-09-30 | 1984-09-28 | Schwarzes ornament. |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US4634635A (enExample) |
| JP (1) | JPS6075577A (enExample) |
| CH (1) | CH662131A5 (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3906405A1 (de) * | 1989-03-01 | 1990-09-06 | Leybold Ag | Verfahren zur herstellung eines schichtwiderstands |
| DE3942325A1 (de) * | 1989-12-21 | 1991-06-27 | Rosemount Gmbh & Co | Belag fuer die oberflaeche einer analysenkuevette und verfahren zur herstellung des belags |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0211579B1 (en) * | 1985-08-02 | 1990-03-28 | Ngk Insulators, Ltd. | Method of making a silicon nitride sintered member |
| JPS6272583A (ja) * | 1985-09-26 | 1987-04-03 | 日本碍子株式会社 | 高温構造部材用炭化珪素焼結部材 |
| JPS62197370A (ja) * | 1986-02-20 | 1987-09-01 | 日本碍子株式会社 | 窒化珪素焼結体 |
| CH673071B5 (enExample) * | 1988-06-24 | 1990-08-15 | Asulab Sa | |
| JPH0832591B2 (ja) * | 1989-10-11 | 1996-03-29 | 日本ピラー工業株式会社 | 複合材 |
| JPH03153876A (ja) * | 1989-11-10 | 1991-07-01 | Shin Etsu Chem Co Ltd | 炭化珪素質部材 |
| GB2267291B (en) * | 1992-05-27 | 1995-02-01 | Northern Telecom Ltd | Plasma deposition process |
| US6607080B2 (en) * | 1993-04-30 | 2003-08-19 | Varco I/P, Inc. | Screen assembly for vibratory separators |
| DE202004002637U1 (de) * | 2004-02-19 | 2004-09-23 | Saint-Gobain Industriekeramik Rödental GmbH | Lichtreflektierendes Dekorationselement |
| DE102004043871A1 (de) * | 2004-09-10 | 2006-03-30 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur Herstellung eines strahlungsabsorbierenden optischen Elements und strahlungsabsorbierendes optisches Element |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5388675A (en) * | 1976-12-28 | 1978-08-04 | Seiko Epson Corp | Exterior parts for portable watch |
| US4252862A (en) * | 1977-06-10 | 1981-02-24 | Nobuo Nishida | Externally ornamental golden colored part |
| US4288495A (en) * | 1978-05-19 | 1981-09-08 | Ford Motor Company | Article coated with beta silicon carbide and silicon |
| US4310481A (en) * | 1980-07-23 | 1982-01-12 | Dow Corning Corporation | High yield silicon carbide pre-ceramic polymers |
| JPS6033190B2 (ja) * | 1981-03-20 | 1985-08-01 | 三菱マテリアル株式会社 | 金属基体表面に密着性のすぐれた炭化けい素被膜を形成する方法 |
| JPS58141377A (ja) * | 1982-02-16 | 1983-08-22 | Seiko Epson Corp | プラズマコ−テイング法 |
-
1983
- 1983-09-30 JP JP58180392A patent/JPS6075577A/ja active Granted
-
1984
- 1984-09-27 US US06/655,223 patent/US4634635A/en not_active Expired - Fee Related
- 1984-09-28 CH CH4673/84A patent/CH662131A5/de not_active IP Right Cessation
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3906405A1 (de) * | 1989-03-01 | 1990-09-06 | Leybold Ag | Verfahren zur herstellung eines schichtwiderstands |
| DE3942325A1 (de) * | 1989-12-21 | 1991-06-27 | Rosemount Gmbh & Co | Belag fuer die oberflaeche einer analysenkuevette und verfahren zur herstellung des belags |
Also Published As
| Publication number | Publication date |
|---|---|
| US4634635A (en) | 1987-01-06 |
| JPS6075577A (ja) | 1985-04-27 |
| JPH0450386B2 (enExample) | 1992-08-14 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PL | Patent ceased |