CH643598A5 - Vakuumaufdampfanlage mit einer ventilkammer, einer bedampfungskammer und einer verdampferkammer. - Google Patents
Vakuumaufdampfanlage mit einer ventilkammer, einer bedampfungskammer und einer verdampferkammer. Download PDFInfo
- Publication number
- CH643598A5 CH643598A5 CH460080A CH460080A CH643598A5 CH 643598 A5 CH643598 A5 CH 643598A5 CH 460080 A CH460080 A CH 460080A CH 460080 A CH460080 A CH 460080A CH 643598 A5 CH643598 A5 CH 643598A5
- Authority
- CH
- Switzerland
- Prior art keywords
- chamber
- valve
- evaporator
- vacuum
- evaporation system
- Prior art date
Links
- 238000007738 vacuum evaporation Methods 0.000 title claims description 9
- 238000004326 stimulated echo acquisition mode for imaging Methods 0.000 title 1
- 230000001681 protective effect Effects 0.000 claims description 14
- 238000007740 vapor deposition Methods 0.000 claims description 10
- 239000000758 substrate Substances 0.000 description 7
- 238000009834 vaporization Methods 0.000 description 7
- 230000008016 vaporization Effects 0.000 description 7
- 238000001704 evaporation Methods 0.000 description 5
- 230000008020 evaporation Effects 0.000 description 5
- 238000007789 sealing Methods 0.000 description 4
- 238000010894 electron beam technology Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000003892 spreading Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000005019 vapor deposition process Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S414/00—Material or article handling
- Y10S414/135—Associated with semiconductor wafer handling
- Y10S414/139—Associated with semiconductor wafer handling including wafer charging or discharging means for vacuum chamber
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19792940064 DE2940064A1 (de) | 1979-10-03 | 1979-10-03 | Vakuumaufdampfanlage mir einer ventilkammer, einer bedampfungskammer und einer verdampferkammer |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CH643598A5 true CH643598A5 (de) | 1984-06-15 |
Family
ID=6082573
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CH460080A CH643598A5 (de) | 1979-10-03 | 1980-06-16 | Vakuumaufdampfanlage mit einer ventilkammer, einer bedampfungskammer und einer verdampferkammer. |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US4338883A (OSRAM) |
| JP (1) | JPS5658966A (OSRAM) |
| CH (1) | CH643598A5 (OSRAM) |
| DE (1) | DE2940064A1 (OSRAM) |
| FR (1) | FR2466513A1 (OSRAM) |
| GB (1) | GB2062690B (OSRAM) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4418646A (en) * | 1982-03-29 | 1983-12-06 | Eaton Corporation | Load lock valve |
| US4464342A (en) * | 1982-05-14 | 1984-08-07 | At&T Bell Laboratories | Molecular beam epitaxy apparatus for handling phosphorus |
| US4478174A (en) * | 1983-02-25 | 1984-10-23 | Canadian Patents & Development Limited | Vacuum coating vessel with movable shutter plate |
| FR2549857B1 (fr) * | 1983-07-26 | 1985-10-04 | Allovon Michel | Dispositif d'evaporation sous vide |
| US4607593A (en) * | 1983-12-23 | 1986-08-26 | U.S. Philips Corporation | Apparatus for processing articles in a controlled environment |
| US4592926A (en) * | 1984-05-21 | 1986-06-03 | Machine Technology, Inc. | Processing apparatus and method |
| CH663037A5 (de) * | 1985-02-05 | 1987-11-13 | Balzers Hochvakuum | Dampfquelle fuer vakuumbeschichtungsanlagen. |
| US4966519A (en) * | 1985-10-24 | 1990-10-30 | Texas Instruments Incorporated | Integrated circuit processing system |
| US4923584A (en) * | 1988-10-31 | 1990-05-08 | Eaton Corporation | Sealing apparatus for a vacuum processing system |
| US5002010A (en) * | 1989-10-18 | 1991-03-26 | Varian Associates, Inc. | Vacuum vessel |
| JP2644912B2 (ja) * | 1990-08-29 | 1997-08-25 | 株式会社日立製作所 | 真空処理装置及びその運転方法 |
| JPH0936198A (ja) * | 1995-07-19 | 1997-02-07 | Hitachi Ltd | 真空処理装置およびそれを用いた半導体製造ライン |
| US6103069A (en) * | 1997-03-31 | 2000-08-15 | Applied Materials, Inc. | Chamber design with isolation valve to preserve vacuum during maintenance |
| WO2013074345A1 (en) | 2011-11-18 | 2013-05-23 | First Solar, Inc. | Vapor transport deposition method and system for material co-deposition |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3206322A (en) * | 1960-10-31 | 1965-09-14 | Morgan John Robert | Vacuum deposition means and methods for manufacture of electronic components |
| US3524426A (en) * | 1968-02-29 | 1970-08-18 | Libbey Owens Ford Glass Co | Apparatus for coating by thermal evaporation |
| US3649339A (en) * | 1969-09-05 | 1972-03-14 | Eugene C Smith | Apparatus and method for securing a high vacuum for particle coating process |
| US3656454A (en) * | 1970-11-23 | 1972-04-18 | Air Reduction | Vacuum coating apparatus |
| US3641973A (en) * | 1970-11-25 | 1972-02-15 | Air Reduction | Vacuum coating apparatus |
| CH540349A (de) * | 1971-03-15 | 1973-08-15 | Balzers Patent Beteilig Ag | Vakuumanlage mit zwei getrennt evakuierbaren Kammern zum Behandeln von Gut |
| DE2330710A1 (de) * | 1973-06-16 | 1975-01-09 | Leybold Heraeus Gmbh & Co Kg | Vakuumaufdampfvorrichtung mit mehreren kammern |
| CH573985A5 (OSRAM) * | 1973-11-22 | 1976-03-31 | Balzers Patent Beteilig Ag | |
| US3921572A (en) * | 1974-02-25 | 1975-11-25 | Ibm | Vacuum coating apparatus |
-
1979
- 1979-10-03 DE DE19792940064 patent/DE2940064A1/de not_active Withdrawn
-
1980
- 1980-06-16 CH CH460080A patent/CH643598A5/de not_active IP Right Cessation
- 1980-08-25 US US06/181,456 patent/US4338883A/en not_active Expired - Lifetime
- 1980-09-22 GB GB8030547A patent/GB2062690B/en not_active Expired
- 1980-10-01 JP JP13590280A patent/JPS5658966A/ja active Pending
- 1980-10-02 FR FR8021160A patent/FR2466513A1/fr active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5658966A (en) | 1981-05-22 |
| DE2940064A1 (de) | 1981-04-16 |
| US4338883A (en) | 1982-07-13 |
| GB2062690A (en) | 1981-05-28 |
| FR2466513A1 (fr) | 1981-04-10 |
| GB2062690B (en) | 1984-05-02 |
| FR2466513B1 (OSRAM) | 1984-04-27 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PL | Patent ceased | ||
| PL | Patent ceased |