FR2466513A1 - Installation de depot de materiaux vaporises sous vide, possedant une chambre a soupape et des chambres de depot et d'evaporation - Google Patents

Installation de depot de materiaux vaporises sous vide, possedant une chambre a soupape et des chambres de depot et d'evaporation Download PDF

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Publication number
FR2466513A1
FR2466513A1 FR8021160A FR8021160A FR2466513A1 FR 2466513 A1 FR2466513 A1 FR 2466513A1 FR 8021160 A FR8021160 A FR 8021160A FR 8021160 A FR8021160 A FR 8021160A FR 2466513 A1 FR2466513 A1 FR 2466513A1
Authority
FR
France
Prior art keywords
chamber
valve
evaporation
valve chamber
vacuum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR8021160A
Other languages
English (en)
French (fr)
Other versions
FR2466513B1 (OSRAM
Inventor
Peter Mahler
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Balzers und Leybold Deutschland Holding AG
Original Assignee
Leybold Heraeus GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Leybold Heraeus GmbH filed Critical Leybold Heraeus GmbH
Publication of FR2466513A1 publication Critical patent/FR2466513A1/fr
Application granted granted Critical
Publication of FR2466513B1 publication Critical patent/FR2466513B1/fr
Granted legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y10S414/139—Associated with semiconductor wafer handling including wafer charging or discharging means for vacuum chamber

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
FR8021160A 1979-10-03 1980-10-02 Installation de depot de materiaux vaporises sous vide, possedant une chambre a soupape et des chambres de depot et d'evaporation Granted FR2466513A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19792940064 DE2940064A1 (de) 1979-10-03 1979-10-03 Vakuumaufdampfanlage mir einer ventilkammer, einer bedampfungskammer und einer verdampferkammer

Publications (2)

Publication Number Publication Date
FR2466513A1 true FR2466513A1 (fr) 1981-04-10
FR2466513B1 FR2466513B1 (OSRAM) 1984-04-27

Family

ID=6082573

Family Applications (1)

Application Number Title Priority Date Filing Date
FR8021160A Granted FR2466513A1 (fr) 1979-10-03 1980-10-02 Installation de depot de materiaux vaporises sous vide, possedant une chambre a soupape et des chambres de depot et d'evaporation

Country Status (6)

Country Link
US (1) US4338883A (OSRAM)
JP (1) JPS5658966A (OSRAM)
CH (1) CH643598A5 (OSRAM)
DE (1) DE2940064A1 (OSRAM)
FR (1) FR2466513A1 (OSRAM)
GB (1) GB2062690B (OSRAM)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2549857A1 (fr) * 1983-07-26 1985-02-01 Allovon Michel Dispositif d'evaporation sous vide
FR2576918A1 (fr) * 1985-02-05 1986-08-08 Balzers Hochvakuum Source de vapeur pour installations de revetement sous vide

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4418646A (en) * 1982-03-29 1983-12-06 Eaton Corporation Load lock valve
US4464342A (en) * 1982-05-14 1984-08-07 At&T Bell Laboratories Molecular beam epitaxy apparatus for handling phosphorus
US4478174A (en) * 1983-02-25 1984-10-23 Canadian Patents & Development Limited Vacuum coating vessel with movable shutter plate
US4607593A (en) * 1983-12-23 1986-08-26 U.S. Philips Corporation Apparatus for processing articles in a controlled environment
US4592926A (en) * 1984-05-21 1986-06-03 Machine Technology, Inc. Processing apparatus and method
US4966519A (en) * 1985-10-24 1990-10-30 Texas Instruments Incorporated Integrated circuit processing system
US4923584A (en) * 1988-10-31 1990-05-08 Eaton Corporation Sealing apparatus for a vacuum processing system
US5002010A (en) * 1989-10-18 1991-03-26 Varian Associates, Inc. Vacuum vessel
JP2644912B2 (ja) * 1990-08-29 1997-08-25 株式会社日立製作所 真空処理装置及びその運転方法
JPH0936198A (ja) * 1995-07-19 1997-02-07 Hitachi Ltd 真空処理装置およびそれを用いた半導体製造ライン
US6103069A (en) * 1997-03-31 2000-08-15 Applied Materials, Inc. Chamber design with isolation valve to preserve vacuum during maintenance
WO2013074345A1 (en) 2011-11-18 2013-05-23 First Solar, Inc. Vapor transport deposition method and system for material co-deposition

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3206322A (en) * 1960-10-31 1965-09-14 Morgan John Robert Vacuum deposition means and methods for manufacture of electronic components
FR2002902A1 (OSRAM) * 1968-02-29 1969-10-31 Libbey Owens Ford Glass Co
US3649339A (en) * 1969-09-05 1972-03-14 Eugene C Smith Apparatus and method for securing a high vacuum for particle coating process
DE2330710A1 (de) * 1973-06-16 1975-01-09 Leybold Heraeus Gmbh & Co Kg Vakuumaufdampfvorrichtung mit mehreren kammern
FR2262126A1 (OSRAM) * 1974-02-25 1975-09-19 Ibm

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3656454A (en) * 1970-11-23 1972-04-18 Air Reduction Vacuum coating apparatus
US3641973A (en) * 1970-11-25 1972-02-15 Air Reduction Vacuum coating apparatus
CH540349A (de) * 1971-03-15 1973-08-15 Balzers Patent Beteilig Ag Vakuumanlage mit zwei getrennt evakuierbaren Kammern zum Behandeln von Gut
CH573985A5 (OSRAM) * 1973-11-22 1976-03-31 Balzers Patent Beteilig Ag

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3206322A (en) * 1960-10-31 1965-09-14 Morgan John Robert Vacuum deposition means and methods for manufacture of electronic components
FR2002902A1 (OSRAM) * 1968-02-29 1969-10-31 Libbey Owens Ford Glass Co
US3649339A (en) * 1969-09-05 1972-03-14 Eugene C Smith Apparatus and method for securing a high vacuum for particle coating process
DE2330710A1 (de) * 1973-06-16 1975-01-09 Leybold Heraeus Gmbh & Co Kg Vakuumaufdampfvorrichtung mit mehreren kammern
FR2262126A1 (OSRAM) * 1974-02-25 1975-09-19 Ibm

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2549857A1 (fr) * 1983-07-26 1985-02-01 Allovon Michel Dispositif d'evaporation sous vide
EP0133121A3 (en) * 1983-07-26 1985-03-13 Michel Allovon Apparatus for vaccuum evaporation
US4607152A (en) * 1983-07-26 1986-08-19 Michel Allovon Vacuum evaporation device
FR2576918A1 (fr) * 1985-02-05 1986-08-08 Balzers Hochvakuum Source de vapeur pour installations de revetement sous vide

Also Published As

Publication number Publication date
JPS5658966A (en) 1981-05-22
CH643598A5 (de) 1984-06-15
DE2940064A1 (de) 1981-04-16
US4338883A (en) 1982-07-13
GB2062690A (en) 1981-05-28
GB2062690B (en) 1984-05-02
FR2466513B1 (OSRAM) 1984-04-27

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