CH632892GA3 - - Google Patents

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Publication number
CH632892GA3
CH632892GA3 CH662180A CH662180A CH632892GA3 CH 632892G A3 CH632892G A3 CH 632892GA3 CH 662180 A CH662180 A CH 662180A CH 662180 A CH662180 A CH 662180A CH 632892G A3 CH632892G A3 CH 632892GA3
Authority
CH
Switzerland
Prior art keywords
substrate
refractive index
glasses
vessel
polydiethylene
Prior art date
Application number
CH662180A
Other languages
German (de)
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to CH662180A priority Critical patent/CH632892GA3/de
Priority to DE19813131583 priority patent/DE3131583A1/de
Priority to US06/296,806 priority patent/US4485124A/en
Publication of CH632892GA3 publication Critical patent/CH632892GA3/de

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14Metallic material, boron or silicon
    • C23C14/20Metallic material, boron or silicon on organic substrates
    • C23C14/205Metallic material, boron or silicon on organic substrates by cathodic sputtering
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29DPRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D11/00Producing optical elements, e.g. lenses or prisms
    • B29D11/00865Applying coatings; tinting; colouring
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54Controlling or regulating the coating process
    • C23C14/541Heating or cooling of the substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Ophthalmology & Optometry (AREA)
  • Physical Vapour Deposition (AREA)
  • Laminated Bodies (AREA)
  • Surface Treatment Of Optical Elements (AREA)
CH662180A 1980-09-03 1980-09-03 CH632892GA3 (es)

Priority Applications (3)

Application Number Priority Date Filing Date Title
CH662180A CH632892GA3 (es) 1980-09-03 1980-09-03
DE19813131583 DE3131583A1 (de) 1980-09-03 1981-08-10 Verfahren und einrichtung zum aufdampfen von verguetungsschichten auf durchsichtige substrate, insbesondere optische objekte
US06/296,806 US4485124A (en) 1980-09-03 1981-08-27 Evaporation of blooming layers onto optical substrates

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH662180A CH632892GA3 (es) 1980-09-03 1980-09-03

Publications (1)

Publication Number Publication Date
CH632892GA3 true CH632892GA3 (es) 1982-11-15

Family

ID=4312459

Family Applications (1)

Application Number Title Priority Date Filing Date
CH662180A CH632892GA3 (es) 1980-09-03 1980-09-03

Country Status (3)

Country Link
US (1) US4485124A (es)
CH (1) CH632892GA3 (es)
DE (1) DE3131583A1 (es)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH668430A5 (de) * 1986-07-31 1988-12-30 Satis Vacuum Ag Vakuum-beschichtungsanlage fuer optische substrate.
US4815962A (en) * 1987-12-11 1989-03-28 Polaroid Corporation Process for coating synthetic optical substrates
DE10320384B3 (de) * 2003-05-06 2005-02-10 Leybold Optics Gmbh Vakuumbeschichtungsanlage
DE10324928A1 (de) 2003-06-03 2005-07-14 Leybold Optics Gmbh Vakuumbeschichtungsanlage
DE102005010005A1 (de) * 2005-03-04 2006-12-28 Nunner, Dieter Vorrichtung und Verfahren zur Beschichtung von Kleinteilen
WO2011030926A1 (ja) * 2009-09-11 2011-03-17 株式会社iMott 保護膜およびそれを作製する方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2658417A1 (de) * 1976-12-23 1978-06-29 Leybold Heraeus Gmbh & Co Kg Verfahren zur herstellung von antireflexschichten auf polydiaethylenglycoldiallylcarbonat, nach dem verfahren hergestellter optischer koerper und verwendung des optischen koerpers

Also Published As

Publication number Publication date
DE3131583A1 (de) 1982-07-08
US4485124A (en) 1984-11-27

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