JPS57155501A - Formation of surface protective film of optical element - Google Patents
Formation of surface protective film of optical elementInfo
- Publication number
- JPS57155501A JPS57155501A JP56041052A JP4105281A JPS57155501A JP S57155501 A JPS57155501 A JP S57155501A JP 56041052 A JP56041052 A JP 56041052A JP 4105281 A JP4105281 A JP 4105281A JP S57155501 A JPS57155501 A JP S57155501A
- Authority
- JP
- Japan
- Prior art keywords
- optical element
- film
- protective film
- surface protective
- ethanol
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/14—Protective coatings, e.g. hard coatings
-
- G02B1/105—
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Optical Elements Other Than Lenses (AREA)
- Surface Treatment Of Optical Elements (AREA)
Abstract
PURPOSE:To form an optical element having a durable surface protective film causing no deterioration in the optical properties by applying a treating soln. contg. a silicon compound as a principal component to the surface of the light receiving part of the base material of an optical element. CONSTITUTION:A thin Al film 3 is formed on a glass substrate 2 by ordinary vacuum deposition. The resulting reflecting mirror body 4 composed of the substrate 4 and the Al film 3 is set on a spinner, and while rotating the body 4, a small amount of a soln. of a substance forming silicon dioxide such as about 5% silanol in ethanol is dropped on the surface of the body 4. After well evaporating the ethanol, the body 4 is put in a furnace and heated at 300 deg.C for about 1hr to obtain a silicon dioxide film 1 having 80-500nm thickness.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56041052A JPS57155501A (en) | 1981-03-20 | 1981-03-20 | Formation of surface protective film of optical element |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56041052A JPS57155501A (en) | 1981-03-20 | 1981-03-20 | Formation of surface protective film of optical element |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57155501A true JPS57155501A (en) | 1982-09-25 |
JPS6134121B2 JPS6134121B2 (en) | 1986-08-06 |
Family
ID=12597628
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56041052A Granted JPS57155501A (en) | 1981-03-20 | 1981-03-20 | Formation of surface protective film of optical element |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57155501A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN100385258C (en) * | 2004-07-22 | 2008-04-30 | 哈尔滨工业大学 | Radiation hardening optical protection film |
CN100385257C (en) * | 2004-07-22 | 2008-04-30 | 哈尔滨工业大学 | Radiation hardening self-cleaning nano-optical protection film |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS53147A (en) * | 1976-06-23 | 1978-01-05 | Matsushita Electric Ind Co Ltd | Preparation of hologram recording media |
-
1981
- 1981-03-20 JP JP56041052A patent/JPS57155501A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS53147A (en) * | 1976-06-23 | 1978-01-05 | Matsushita Electric Ind Co Ltd | Preparation of hologram recording media |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN100385258C (en) * | 2004-07-22 | 2008-04-30 | 哈尔滨工业大学 | Radiation hardening optical protection film |
CN100385257C (en) * | 2004-07-22 | 2008-04-30 | 哈尔滨工业大学 | Radiation hardening self-cleaning nano-optical protection film |
Also Published As
Publication number | Publication date |
---|---|
JPS6134121B2 (en) | 1986-08-06 |
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