CH612998A5 - - Google Patents

Info

Publication number
CH612998A5
CH612998A5 CH323676A CH323676A CH612998A5 CH 612998 A5 CH612998 A5 CH 612998A5 CH 323676 A CH323676 A CH 323676A CH 323676 A CH323676 A CH 323676A CH 612998 A5 CH612998 A5 CH 612998A5
Authority
CH
Switzerland
Application number
CH323676A
Inventor
Herbert Von Hartel
Original Assignee
Coulter Systems Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Coulter Systems Corp filed Critical Coulter Systems Corp
Publication of CH612998A5 publication Critical patent/CH612998A5/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/228—Gas flow assisted PVD deposition
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
CH323676A 1975-03-20 1976-03-16 CH612998A5 (xx)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/560,352 US3976555A (en) 1975-03-20 1975-03-20 Method and apparatus for supplying background gas in a sputtering chamber

Publications (1)

Publication Number Publication Date
CH612998A5 true CH612998A5 (xx) 1979-08-31

Family

ID=24237439

Family Applications (1)

Application Number Title Priority Date Filing Date
CH323676A CH612998A5 (xx) 1975-03-20 1976-03-16

Country Status (10)

Country Link
US (1) US3976555A (xx)
JP (1) JPS5912744B2 (xx)
BE (1) BE839598A (xx)
CA (1) CA1066663A (xx)
CH (1) CH612998A5 (xx)
DE (1) DE2610444C2 (xx)
FR (1) FR2304683A1 (xx)
GB (1) GB1541039A (xx)
IT (1) IT1058018B (xx)
NL (1) NL7602706A (xx)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2527184C3 (de) * 1975-06-18 1981-07-02 Philips Patentverwaltung Gmbh, 2000 Hamburg Vorrichtung zur Herstellung von Targets für Kathodenzerstäubung
AU507748B2 (en) * 1976-06-10 1980-02-28 University Of Sydney, The Reactive sputtering
US4298444A (en) * 1978-10-11 1981-11-03 Heat Mirror Associates Method for multilayer thin film deposition
US4204942A (en) * 1978-10-11 1980-05-27 Heat Mirror Associates Apparatus for multilayer thin film deposition
US4270999A (en) * 1979-09-28 1981-06-02 International Business Machines Corporation Method and apparatus for gas feed control in a dry etching process
US4294678A (en) * 1979-11-28 1981-10-13 Coulter Systems Corporation Apparatus and method for preventing contamination of sputtering targets
US4309261A (en) * 1980-07-03 1982-01-05 University Of Sydney Method of and apparatus for reactively sputtering a graded surface coating onto a substrate
JPS57111031A (en) * 1980-12-27 1982-07-10 Clarion Co Ltd Sputtering device
CA1155798A (en) * 1981-03-30 1983-10-25 Shmuel Maniv Reactive deposition method and apparatus
DE3129327C2 (de) * 1981-07-24 1985-09-12 Flachglas AG, 8510 Fürth Vorrichtung zum Aufbringen dünner Schichten durch Kathodenzerstäubung
US4491509A (en) * 1984-03-09 1985-01-01 At&T Technologies, Inc. Methods of and apparatus for sputtering material onto a substrate
DE3735162A1 (de) * 1986-10-17 1988-04-28 Hitachi Ltd Aufdampfvorrichtung
US5219668A (en) * 1986-10-31 1993-06-15 N.V. Bekaert S.A. Process and apparatus for the treatment of coated, elongated substrate, as well as substrates thus treated and articles of polymeric material reinforced with these substrates
NL8602759A (nl) * 1986-10-31 1988-05-16 Bekaert Sa Nv Werkwijze en inrichting voor het behandelen van een langwerpig substraat, dat van een deklaag voorzien is; alsmede volgens die werkwijze behandelde substraten en met deze substraten versterkte voorwerpen uit polymeermateriaal.
US4885070A (en) * 1988-02-12 1989-12-05 Leybold Aktiengesellschaft Method and apparatus for the application of materials
US4849087A (en) * 1988-02-11 1989-07-18 Southwall Technologies Apparatus for obtaining transverse uniformity during thin film deposition on extended substrate
US5252194A (en) * 1990-01-26 1993-10-12 Varian Associates, Inc. Rotating sputtering apparatus for selected erosion
US5656138A (en) * 1991-06-18 1997-08-12 The Optical Corporation Of America Very high vacuum magnetron sputtering method and apparatus for precision optical coatings
US6258217B1 (en) 1999-09-29 2001-07-10 Plasma-Therm, Inc. Rotating magnet array and sputter source
US6898043B2 (en) * 2002-05-20 2005-05-24 Seagate Technology Llc Dual stage enclosure for servo track writer utilizing low-density gas
SE527180C2 (sv) * 2003-08-12 2006-01-17 Sandvik Intellectual Property Rakel- eller schaberblad med nötningsbeständigt skikt samt metod för tillverkning därav
US7141145B2 (en) * 2003-10-02 2006-11-28 Seagate Technology Llc Gas injection for uniform composition reactively sputter-deposited thin films
US20070224350A1 (en) * 2006-03-21 2007-09-27 Sandvik Intellectual Property Ab Edge coating in continuous deposition line
EP2762609B1 (en) * 2013-01-31 2019-04-17 Applied Materials, Inc. Apparatus and method for depositing at least two layers on a substrate
CN110592546B (zh) * 2019-10-21 2024-08-27 湖南玉丰真空科学技术有限公司 一种磁控溅射真空镀膜机工艺气体布气装置

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3418229A (en) * 1965-06-30 1968-12-24 Weston Instruments Inc Method of forming films of compounds having at least two anions by cathode sputtering
GB1365492A (en) * 1971-02-05 1974-09-04 Triplex Safety Glass Co Metal oxide films
FR2132033B1 (xx) * 1971-04-02 1975-10-24 Delog Detag Flachglas Ag
US3856654A (en) * 1971-08-26 1974-12-24 Western Electric Co Apparatus for feeding and coating masses of workpieces in a controlled atmosphere
GB1419496A (en) * 1971-12-29 1975-12-31 Lucas Industries Ltd Sputtering apparatus
US3855612A (en) * 1972-01-03 1974-12-17 Signetics Corp Schottky barrier diode semiconductor structure and method
US3748253A (en) * 1972-01-24 1973-07-24 Gte Automatic Electric Lab Inc Apparatus with labyrinth heat exchanger for the sputtering depositionof thin films
US3793167A (en) * 1972-06-01 1974-02-19 Globe Amerada Glass Co Apparatus for manufacturing metal-coated glass
GB1443827A (en) * 1973-04-27 1976-07-28 Triplex Safety Glass Co Reactive sputtering apparatus and cathode units therefor

Also Published As

Publication number Publication date
BE839598A (nl) 1976-09-16
DE2610444A1 (de) 1976-10-07
CA1066663A (en) 1979-11-20
NL7602706A (nl) 1976-09-22
JPS51139580A (en) 1976-12-01
US3976555A (en) 1976-08-24
FR2304683A1 (fr) 1976-10-15
IT1058018B (it) 1982-04-10
GB1541039A (en) 1979-02-21
DE2610444C2 (de) 1983-03-31
FR2304683B1 (xx) 1980-07-18
JPS5912744B2 (ja) 1984-03-26

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Legal Events

Date Code Title Description
PUE Assignment

Owner name: STORK COLORPROOFING B.V.

PL Patent ceased