GB1419496A - Sputtering apparatus - Google Patents

Sputtering apparatus

Info

Publication number
GB1419496A
GB1419496A GB6050271A GB6050271A GB1419496A GB 1419496 A GB1419496 A GB 1419496A GB 6050271 A GB6050271 A GB 6050271A GB 6050271 A GB6050271 A GB 6050271A GB 1419496 A GB1419496 A GB 1419496A
Authority
GB
United Kingdom
Prior art keywords
sputtering apparatus
dec
cathode
gas
spark
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB6050271A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ZF International UK Ltd
Original Assignee
Lucas Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lucas Industries Ltd filed Critical Lucas Industries Ltd
Priority to GB6050271A priority Critical patent/GB1419496A/en
Priority to FR7246310A priority patent/FR2170571A5/fr
Priority to DE2263738A priority patent/DE2263738A1/en
Priority to IT55085/72A priority patent/IT974361B/en
Priority to JP47130360A priority patent/JPS4873381A/ja
Priority to US00319389A priority patent/US3827966A/en
Publication of GB1419496A publication Critical patent/GB1419496A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)

Abstract

1419496 Sputtering apparatus LUCAS INDUSTRIES Ltd 15 Dec 1972 [29 Dec 1971] 60502/71 Heading C7F In a sputtering apparatus an even distribution of gas, e.g. argon, around the cathode 34 is obtained by supplying the gas through an annular conduit 44 having radial holes 45. A plasma field is initiated by a spark-plug 48. The cathode is cooled by fluid from a pipe 37a.
GB6050271A 1971-12-29 1971-12-29 Sputtering apparatus Expired GB1419496A (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
GB6050271A GB1419496A (en) 1971-12-29 1971-12-29 Sputtering apparatus
FR7246310A FR2170571A5 (en) 1971-12-29 1972-12-27
DE2263738A DE2263738A1 (en) 1971-12-29 1972-12-28 ATOMIZING DEVICE
IT55085/72A IT974361B (en) 1971-12-29 1972-12-28 POLVERIZATION APPARATUS FOR COATING OBJECTS
JP47130360A JPS4873381A (en) 1971-12-29 1972-12-28
US00319389A US3827966A (en) 1971-12-29 1972-12-29 Sputtering apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB6050271A GB1419496A (en) 1971-12-29 1971-12-29 Sputtering apparatus

Publications (1)

Publication Number Publication Date
GB1419496A true GB1419496A (en) 1975-12-31

Family

ID=10485693

Family Applications (1)

Application Number Title Priority Date Filing Date
GB6050271A Expired GB1419496A (en) 1971-12-29 1971-12-29 Sputtering apparatus

Country Status (6)

Country Link
US (1) US3827966A (en)
JP (1) JPS4873381A (en)
DE (1) DE2263738A1 (en)
FR (1) FR2170571A5 (en)
GB (1) GB1419496A (en)
IT (1) IT974361B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4491509A (en) * 1984-03-09 1985-01-01 At&T Technologies, Inc. Methods of and apparatus for sputtering material onto a substrate

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3981791A (en) * 1975-03-10 1976-09-21 Signetics Corporation Vacuum sputtering apparatus
US3976555A (en) * 1975-03-20 1976-08-24 Coulter Information Systems, Inc. Method and apparatus for supplying background gas in a sputtering chamber
JPS5291650A (en) * 1976-01-29 1977-08-02 Toshiba Corp Continuous gas plasma etching apparatus
US4252595A (en) * 1976-01-29 1981-02-24 Tokyo Shibaura Electric Co., Ltd. Etching apparatus using a plasma
US4141808A (en) * 1978-04-17 1979-02-27 Eastman Kodak Company Manganese carbonyl-sulfonyl chloride photoinitiators for radiation polymerizable unsaturated compounds
US4294678A (en) * 1979-11-28 1981-10-13 Coulter Systems Corporation Apparatus and method for preventing contamination of sputtering targets
EP0162842A1 (en) * 1983-12-01 1985-12-04 Shatterproof Glass Corporation Gas distribution system for sputtering cathodes
US4845041A (en) * 1985-11-20 1989-07-04 Analyte Corporation Atomic-absorption sputtering chamber and system

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4491509A (en) * 1984-03-09 1985-01-01 At&T Technologies, Inc. Methods of and apparatus for sputtering material onto a substrate

Also Published As

Publication number Publication date
IT974361B (en) 1974-06-20
FR2170571A5 (en) 1973-09-14
US3827966A (en) 1974-08-06
JPS4873381A (en) 1973-10-03
DE2263738A1 (en) 1973-07-12

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee