CH579828A5 - - Google Patents
Info
- Publication number
- CH579828A5 CH579828A5 CH1547274A CH1547274A CH579828A5 CH 579828 A5 CH579828 A5 CH 579828A5 CH 1547274 A CH1547274 A CH 1547274A CH 1547274 A CH1547274 A CH 1547274A CH 579828 A5 CH579828 A5 CH 579828A5
- Authority
- CH
- Switzerland
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/535—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including internal interconnections, e.g. cross-under constructions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Insulated Gate Type Field-Effect Transistor (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB5439273A GB1447675A (en) | 1973-11-23 | 1973-11-23 | Semiconductor devices |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CH579828A5 true CH579828A5 (it) | 1976-09-15 |
Family
ID=10470867
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CH1547274A CH579828A5 (it) | 1973-11-23 | 1974-11-20 |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US3964092A (it) |
| JP (1) | JPS5651503B2 (it) |
| CA (1) | CA1015463A (it) |
| CH (1) | CH579828A5 (it) |
| DE (1) | DE2453279C3 (it) |
| FR (1) | FR2252654B1 (it) |
| GB (1) | GB1447675A (it) |
| IT (1) | IT1024876B (it) |
| NL (1) | NL178462C (it) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4013489A (en) * | 1976-02-10 | 1977-03-22 | Intel Corporation | Process for forming a low resistance interconnect in MOS N-channel silicon gate integrated circuit |
| NL7700420A (nl) * | 1977-01-17 | 1978-07-19 | Philips Nv | Halfgeleiderinrichting en werkwijze ter ver- vaardiging daarvan. |
| JPS5917852B2 (ja) * | 1977-02-07 | 1984-04-24 | 日本電気株式会社 | 半導体装置 |
| JPS54110068U (it) * | 1978-01-20 | 1979-08-02 | ||
| US4219925A (en) * | 1978-09-01 | 1980-09-02 | Teletype Corporation | Method of manufacturing a device in a silicon wafer |
| JPS55123147A (en) * | 1979-03-15 | 1980-09-22 | Nec Corp | Semiconductor device |
| JPS568846A (en) * | 1979-07-03 | 1981-01-29 | Nec Corp | Semiconductor integrated circuit |
| JPS56126969A (en) * | 1980-03-11 | 1981-10-05 | Toshiba Corp | Integrated circuit device |
| JPS6124429Y2 (it) * | 1980-03-26 | 1986-07-22 | ||
| JPS61144041A (ja) * | 1984-12-18 | 1986-07-01 | Yokogawa Electric Corp | 半導体装置 |
| US4778775A (en) * | 1985-08-26 | 1988-10-18 | Intel Corporation | Buried interconnect for silicon on insulator structure |
| US4712126A (en) * | 1986-03-17 | 1987-12-08 | Rca Corporation | Low resistance tunnel |
| US4885627A (en) * | 1988-10-18 | 1989-12-05 | International Business Machines Corporation | Method and structure for reducing resistance in integrated circuits |
| GB2245418A (en) * | 1990-06-20 | 1992-01-02 | Koninkl Philips Electronics Nv | A semiconductor device and a method of manufacturing such a device |
| JP3892650B2 (ja) * | 2000-07-25 | 2007-03-14 | 株式会社日立製作所 | 液晶表示装置 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3189973A (en) * | 1961-11-27 | 1965-06-22 | Bell Telephone Labor Inc | Method of fabricating a semiconductor device |
| US3823348A (en) * | 1966-03-31 | 1974-07-09 | Ibm | Monolithic integrated structure including fabrication and package therefor |
| NL6606912A (it) * | 1966-05-19 | 1967-11-20 | ||
| US3443175A (en) * | 1967-03-22 | 1969-05-06 | Rca Corp | Pn-junction semiconductor with polycrystalline layer on one region |
| US3475234A (en) * | 1967-03-27 | 1969-10-28 | Bell Telephone Labor Inc | Method for making mis structures |
| US3365707A (en) * | 1967-06-23 | 1968-01-23 | Rca Corp | Lsi array and standard cells |
| DE1812790A1 (de) * | 1968-12-05 | 1970-06-11 | Itt Ind Gmbh Deutsche | Verfahren zum Herstellen eines niederohmigen Widerstandes oder einer elektrischen Verbindung in einer monolithischen Festkoerperschaltung |
| US3659162A (en) * | 1968-12-27 | 1972-04-25 | Nippon Electric Co | Semiconductor integrated circuit device having improved wiring layer structure |
| BE792001A (fr) * | 1971-11-29 | 1973-03-16 | Western Electric Co | Structures a circuits integres a croisements |
-
1973
- 1973-11-23 GB GB5439273A patent/GB1447675A/en not_active Expired
-
1974
- 1974-11-09 DE DE2453279A patent/DE2453279C3/de not_active Expired
- 1974-11-11 US US05/522,583 patent/US3964092A/en not_active Expired - Lifetime
- 1974-11-15 CA CA213,889A patent/CA1015463A/en not_active Expired
- 1974-11-19 NL NLAANVRAGE7415030,A patent/NL178462C/xx not_active IP Right Cessation
- 1974-11-20 CH CH1547274A patent/CH579828A5/xx not_active IP Right Cessation
- 1974-11-20 IT IT70396/74A patent/IT1024876B/it active
- 1974-11-21 JP JP13324574A patent/JPS5651503B2/ja not_active Expired
- 1974-11-25 FR FR7438549A patent/FR2252654B1/fr not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| DE2453279C3 (de) | 1984-04-26 |
| JPS5651503B2 (it) | 1981-12-05 |
| GB1447675A (en) | 1976-08-25 |
| JPS5085285A (it) | 1975-07-09 |
| US3964092A (en) | 1976-06-15 |
| CA1015463A (en) | 1977-08-09 |
| IT1024876B (it) | 1978-07-20 |
| DE2453279A1 (de) | 1975-05-28 |
| NL178462B (nl) | 1985-10-16 |
| DE2453279B2 (de) | 1980-08-14 |
| NL178462C (nl) | 1986-03-17 |
| FR2252654B1 (it) | 1979-02-23 |
| NL7415030A (nl) | 1975-05-27 |
| FR2252654A1 (it) | 1975-06-20 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PL | Patent ceased |