CH528149A - Halbleiterbauelement mit heterogenem Übergang und Verfahren zu seiner Herstellung - Google Patents
Halbleiterbauelement mit heterogenem Übergang und Verfahren zu seiner HerstellungInfo
- Publication number
- CH528149A CH528149A CH1295670A CH1295670A CH528149A CH 528149 A CH528149 A CH 528149A CH 1295670 A CH1295670 A CH 1295670A CH 1295670 A CH1295670 A CH 1295670A CH 528149 A CH528149 A CH 528149A
- Authority
- CH
- Switzerland
- Prior art keywords
- manufacture
- semiconductor device
- heterogeneous transition
- heterogeneous
- transition
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
- 230000007704 transition Effects 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/06—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising selenium or tellurium in uncombined form other than as impurities in semiconductor bodies of other materials
- H01L21/10—Preliminary treatment of the selenium or tellurium, its application to the foundation plate, or the subsequent treatment of the combination
- H01L21/108—Provision of discrete insulating layers, i.e. non-genetic barrier layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02367—Substrates
- H01L21/0237—Materials
- H01L21/02422—Non-crystalline insulating materials, e.g. glass, polymers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02436—Intermediate layers between substrates and deposited layers
- H01L21/02439—Materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02436—Intermediate layers between substrates and deposited layers
- H01L21/02439—Materials
- H01L21/02491—Conductive materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02436—Intermediate layers between substrates and deposited layers
- H01L21/02494—Structure
- H01L21/02496—Layer structure
- H01L21/02502—Layer structure consisting of two layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02551—Group 12/16 materials
- H01L21/0256—Selenides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/02631—Physical deposition at reduced pressure, e.g. MBE, sputtering, evaporation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02656—Special treatments
- H01L21/02664—Aftertreatments
- H01L21/02667—Crystallisation or recrystallisation of non-monocrystalline semiconductor materials, e.g. regrowth
- H01L21/02672—Crystallisation or recrystallisation of non-monocrystalline semiconductor materials, e.g. regrowth using crystallisation enhancing elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/06—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising selenium or tellurium in uncombined form other than as impurities in semiconductor bodies of other materials
- H01L21/10—Preliminary treatment of the selenium or tellurium, its application to the foundation plate, or the subsequent treatment of the combination
- H01L21/101—Application of the selenium or tellurium to the foundation plate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US85416369A | 1969-08-29 | 1969-08-29 |
Publications (1)
Publication Number | Publication Date |
---|---|
CH528149A true CH528149A (de) | 1972-09-15 |
Family
ID=25317906
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CH1295670A CH528149A (de) | 1969-08-29 | 1970-08-28 | Halbleiterbauelement mit heterogenem Übergang und Verfahren zu seiner Herstellung |
Country Status (7)
Country | Link |
---|---|
US (1) | US3622712A (de) |
BE (1) | BE753246A (de) |
CH (1) | CH528149A (de) |
DE (1) | DE2042883A1 (de) |
FR (1) | FR2059740B1 (de) |
GB (1) | GB1315316A (de) |
NL (1) | NL7012787A (de) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3911162A (en) * | 1972-04-17 | 1975-10-07 | Xerox Corp | System for vapor deposition of thin films |
US3990095A (en) * | 1975-09-15 | 1976-11-02 | Rca Corporation | Selenium rectifier having hexagonal polycrystalline selenium layer |
US4064522A (en) * | 1976-02-04 | 1977-12-20 | Exxon Research & Engineering Co. | High efficiency selenium heterojunction solar cells |
US4213798A (en) * | 1979-04-27 | 1980-07-22 | Rca Corporation | Tellurium schottky barrier contact for amorphous silicon solar cells |
US4440803A (en) * | 1979-11-01 | 1984-04-03 | Xerox Corporation | Process for preparing arsenic-selenium photoreceptors |
JPS56108286A (en) * | 1979-11-01 | 1981-08-27 | Xerox Corp | Method of manufacturing photoreceptor |
US5179035A (en) * | 1989-09-15 | 1993-01-12 | U.S. Philips Corporation | Method of fabricating two-terminal non-linear devices |
US6275137B1 (en) | 2000-02-08 | 2001-08-14 | Boston Microsystems, Inc. | Semiconductor piezoresistor |
US9134265B2 (en) * | 2009-11-05 | 2015-09-15 | Kake Educational Institution | Gas sensitive material comprising microcrystalline selenium and gas sensor using same |
US9264833B2 (en) * | 2013-03-14 | 2016-02-16 | Taiwan Semiconductor Manufacturing Company, Ltd. | Structure and method for integrated microphone |
US10651408B2 (en) * | 2017-02-14 | 2020-05-12 | International Business Machines Corporation | Selenium-fullerene heterojunction solar cell |
CN115101610A (zh) * | 2022-07-22 | 2022-09-23 | 中国科学院化学研究所 | 一种硒薄膜/碲薄膜室内光伏器件及其制备方法 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL204119A (de) * | 1939-01-22 | |||
US3409464A (en) * | 1964-04-29 | 1968-11-05 | Clevite Corp | Piezoelectric materials |
US3427410A (en) * | 1964-10-08 | 1969-02-11 | Electro Voice | Electromechanical transducer |
GB1115933A (en) * | 1965-08-27 | 1968-06-06 | Noranda Mines Ltd | Single crystal selenium rectifier |
FR1490483A (fr) * | 1965-12-17 | 1967-08-04 | Thomson Houston Comp Francaise | Système de filtre électrique à bande passante étroite utilisant un cristal |
US3624465A (en) * | 1968-06-26 | 1971-11-30 | Rca Corp | Heterojunction semiconductor transducer having a region which is piezoelectric |
-
1969
- 1969-08-29 US US854163A patent/US3622712A/en not_active Expired - Lifetime
-
1970
- 1970-07-09 BE BE753246D patent/BE753246A/xx unknown
- 1970-08-21 GB GB4037970A patent/GB1315316A/en not_active Expired
- 1970-08-27 FR FR7031293A patent/FR2059740B1/fr not_active Expired
- 1970-08-28 CH CH1295670A patent/CH528149A/de not_active IP Right Cessation
- 1970-08-28 NL NL7012787A patent/NL7012787A/xx unknown
- 1970-08-28 DE DE19702042883 patent/DE2042883A1/de active Pending
Also Published As
Publication number | Publication date |
---|---|
FR2059740A1 (de) | 1971-06-04 |
DE2042883A1 (de) | 1971-03-11 |
US3622712A (en) | 1971-11-23 |
BE753246A (fr) | 1970-12-16 |
FR2059740B1 (de) | 1974-09-06 |
NL7012787A (de) | 1971-03-02 |
GB1315316A (en) | 1973-05-02 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
AT315916B (de) | Halbleiterbauelement und Verfahren zu seiner Herstellung | |
CH528152A (de) | Halbleiteranordnung und Verfahren zu deren Herstellung | |
CH472461A (de) | Thermoplastisches Gebilde und Verfahren zu seiner Herstellung | |
CH535493A (de) | Scheibenförmiges Halbleiterbauelement und Verfahren zu seiner Herstellung | |
CH504100A (de) | Halbleiterbauelement und Verfahren zu dessen Herstellung | |
AT305709B (de) | Keilriemen und Verfahren zu seiner Herstellung | |
CH480032A (de) | Kleidungsstück mit Armblättern und Verfahren zu seiner Herstellung | |
CH510330A (de) | Halbleiteranordnung und Verfahren zu ihrer Herstellung | |
CH528149A (de) | Halbleiterbauelement mit heterogenem Übergang und Verfahren zu seiner Herstellung | |
CH517376A (de) | Halbleitereinrichtung und Verfahren zu deren Herstellung | |
CH514236A (de) | Halbleitervorrichtung und Verfahren zur Herstellung derselben | |
AT281122B (de) | Halbleitervorrichtung und Verfahren zur Herstellung derselben | |
CH555267A (de) | Paket und verfahren zu seiner herstellung. | |
CH489913A (de) | Feldeffekttransistor und Verfahren zu seiner Herstellung | |
CH528819A (de) | Halbleiterbauelement und Verfahren zu seiner Herstellung | |
CH499877A (de) | Halbleiterbauelement und Verfahren zu dessen Herstellung | |
CH474156A (de) | Halbleitervorrichtung und Verfahren zu ihrer Herstellung | |
AT316894B (de) | Halbleitervorrichtung und Verfahren zur Herstellung derselben | |
DE1929296B2 (de) | Elektromagnetischer wandler und verfahren zu seiner herstellung | |
CH522288A (de) | Halbleitereinheit und Verfahren zur Herstellung derselben | |
CH474157A (de) | Halbleitervorrichtung und Verfahren zu ihrer Herstellung | |
CH489550A (de) | Poröses Polyvinylharz und Verfahren zu seiner Herstellung | |
CH495629A (de) | Halbleiteranordnung und Verfahren zu deren Herstellung | |
CH510331A (de) | Halbleitervorrichtung und Verfahren zu deren Herstellung | |
CH444966A (de) | Kondensator mit Halbleiterelektrode und Verfahren zu seiner Herstellung |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PL | Patent ceased |