CH498775A - Procédé de préparation d'un composé complexe du ruthénium - Google Patents

Procédé de préparation d'un composé complexe du ruthénium

Info

Publication number
CH498775A
CH498775A CH1484868A CH1484868A CH498775A CH 498775 A CH498775 A CH 498775A CH 1484868 A CH1484868 A CH 1484868A CH 1484868 A CH1484868 A CH 1484868A CH 498775 A CH498775 A CH 498775A
Authority
CH
Switzerland
Prior art keywords
preparing
ruthenium compound
complex ruthenium
complex
compound
Prior art date
Application number
CH1484868A
Other languages
English (en)
Inventor
Satyanarayan Reddy Gadhireddy
Taimsalu Parn
Original Assignee
Int Nickel Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Int Nickel Ltd filed Critical Int Nickel Ltd
Publication of CH498775A publication Critical patent/CH498775A/fr

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B21/00Nitrogen; Compounds thereof
    • C01B21/082Compounds containing nitrogen and non-metals and optionally metals
    • C01B21/083Compounds containing nitrogen and non-metals and optionally metals containing one or more halogen atoms
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01GCOMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G55/00Compounds of ruthenium, rhodium, palladium, osmium, iridium, or platinum
    • C01G55/002Compounds containing, besides ruthenium, rhodium, palladium, osmium, iridium, or platinum, two or more other elements, with the exception of oxygen or hydrogen
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/50Electroplating: Baths therefor from solutions of platinum group metals
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00Crystal-structural characteristics
    • C01P2002/70Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data
    • C01P2002/72Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data by d-values or two theta-values, e.g. as X-ray diagram
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00Crystal-structural characteristics
    • C01P2002/70Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data
    • C01P2002/74Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data by peak-intensities or a ratio thereof only
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00Crystal-structural characteristics
    • C01P2002/80Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70
    • C01P2002/82Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70 by IR- or Raman-data
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00Particle morphology
    • C01P2004/80Particles consisting of a mixture of two or more inorganic phases
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/40Electric properties
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/42Magnetic properties
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/80Compositional purity
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/80Compositional purity
    • C01P2006/82Compositional purity water content

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
CH1484868A 1967-10-18 1968-10-04 Procédé de préparation d'un composé complexe du ruthénium CH498775A (fr)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GB4747767 1967-10-18
GB20908/68A GB1244309A (en) 1967-10-18 1967-10-18 Electrodeposition of ruthenium
GB5642867 1967-12-12

Publications (1)

Publication Number Publication Date
CH498775A true CH498775A (fr) 1970-11-15

Family

ID=27257929

Family Applications (2)

Application Number Title Priority Date Filing Date
CH1464270A CH505208A (fr) 1967-10-18 1968-10-04 Procédé pour le dépôt électrolytique du ruthénium
CH1484868A CH498775A (fr) 1967-10-18 1968-10-04 Procédé de préparation d'un composé complexe du ruthénium

Family Applications Before (1)

Application Number Title Priority Date Filing Date
CH1464270A CH505208A (fr) 1967-10-18 1968-10-04 Procédé pour le dépôt électrolytique du ruthénium

Country Status (9)

Country Link
US (1) US3576724A (fr)
JP (1) JPS4927960B1 (fr)
BE (1) BE722559A (fr)
CH (2) CH505208A (fr)
DE (1) DE1803524A1 (fr)
FR (1) FR1602538A (fr)
GB (1) GB1244309A (fr)
NL (1) NL6814650A (fr)
SE (1) SE354877B (fr)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1407592A (en) * 1971-12-17 1975-09-24 Int Nickel Ltd Electrodeposition of ruthenium
GB1520140A (en) * 1976-06-08 1978-08-02 Inco Europ Ltd Electrodeposition of ruthenium
US4082624A (en) * 1976-12-03 1978-04-04 Bell Telephone Laboratories, Incorporated Articles electrodeposited with ruthenium and processes of producing such articles
US4297178A (en) * 1979-04-10 1981-10-27 The International Nickel Company, Inc. Ruthenium electroplating and baths and compositions therefor
JPS5775191A (en) * 1980-10-18 1982-05-11 Kurita Water Ind Ltd Air diffuser
US5693427A (en) * 1995-12-22 1997-12-02 Baldwin Hardware Corporation Article with protective coating thereon
US5783313A (en) * 1995-12-22 1998-07-21 Baldwin Hardware Corporation Coated Article
DE19741990C1 (de) * 1997-09-24 1999-04-29 Degussa Elektrolyt zur galvanischen Abscheidung von spannungsarmen, rißfesten Rutheniumschichten, Verfahren zur Herstellung und Verwendung
DE502007002036D1 (de) * 2007-03-28 2009-12-31 Umicore Galvanotechnik Gmbh Elektolyt und Verfahren zur Abscheidung von dekoraium
DE102011105207B4 (de) 2011-06-17 2015-09-10 Umicore Galvanotechnik Gmbh Elektrolyt und seine Verwendung zur Abscheidung von Schwarz-Ruthenium-Überzügen und so erhaltene Überzüge und Artikel
RU2538492C1 (ru) * 2013-08-06 2015-01-10 Александр Владимирович Ермаков Способ изготовления катодной обкладки танталового объемно-пористого конденсатора
CN107021464B (zh) * 2017-06-07 2019-10-15 王晓波 一种[μ-氮-双(四氯一水合钌)]酸钾的合成方法以及电子元器件表面镀钌的方法
AT523922B1 (de) 2020-09-08 2022-01-15 Iwg Ing W Garhoefer Ges M B H Elektrolytbad für Palladium-Ruthenium-Beschichtungen
CN113106507B (zh) * 2021-04-15 2022-03-08 电子科技大学 一种用于微纳沟槽和盲孔填充的电镀钌镀液及配制方法
CN116874042B (zh) * 2023-08-28 2024-05-07 中铁建发展集团有限公司 钌/污泥基生物炭/泡沫镍阴极材料制备方法及其产品与应用

Also Published As

Publication number Publication date
JPS4927960B1 (fr) 1974-07-22
NL6814650A (fr) 1969-04-22
SE354877B (fr) 1973-03-26
FR1602538A (fr) 1970-12-21
GB1244309A (en) 1971-08-25
CH505208A (fr) 1971-03-31
US3576724A (en) 1971-04-27
DE1803524A1 (de) 1969-05-22
BE722559A (fr) 1969-04-18

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Legal Events

Date Code Title Description
PL Patent ceased