CH495629A - Halbleiteranordnung und Verfahren zu deren Herstellung - Google Patents

Halbleiteranordnung und Verfahren zu deren Herstellung

Info

Publication number
CH495629A
CH495629A CH1514268A CH1514268A CH495629A CH 495629 A CH495629 A CH 495629A CH 1514268 A CH1514268 A CH 1514268A CH 1514268 A CH1514268 A CH 1514268A CH 495629 A CH495629 A CH 495629A
Authority
CH
Switzerland
Prior art keywords
production
semiconductor device
semiconductor
Prior art date
Application number
CH1514268A
Other languages
German (de)
English (en)
Inventor
Marius Brown Dale
Ernest Engeler William
Original Assignee
Gen Electric
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gen Electric filed Critical Gen Electric
Publication of CH495629A publication Critical patent/CH495629A/de

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/40Electrodes ; Multistep manufacturing processes therefor
    • H01L29/402Field plates
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • H01L27/08Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind
    • H01L27/085Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only
    • H01L27/088Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate
    • H01L27/092Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate complementary MIS field-effect transistors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/70Bipolar devices
    • H01L29/72Transistor-type devices, i.e. able to continuously respond to applied control signals
    • H01L29/73Bipolar junction transistors
    • H01L29/732Vertical transistors
    • H01L29/7322Vertical transistors having emitter-base and base-collector junctions leaving at the same surface of the body, e.g. planar transistor

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Ceramic Engineering (AREA)
  • Bipolar Transistors (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Formation Of Insulating Films (AREA)
CH1514268A 1967-10-13 1968-10-10 Halbleiteranordnung und Verfahren zu deren Herstellung CH495629A (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US67522667A 1967-10-13 1967-10-13

Publications (1)

Publication Number Publication Date
CH495629A true CH495629A (de) 1970-08-31

Family

ID=24709564

Family Applications (1)

Application Number Title Priority Date Filing Date
CH1514268A CH495629A (de) 1967-10-13 1968-10-10 Halbleiteranordnung und Verfahren zu deren Herstellung

Country Status (8)

Country Link
JP (1) JPS4841391B1 (xx)
BR (1) BR6802913D0 (xx)
CH (1) CH495629A (xx)
DE (2) DE1803026C3 (xx)
FR (1) FR1587469A (xx)
GB (1) GB1245765A (xx)
NL (1) NL6814111A (xx)
SE (1) SE352775B (xx)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4036958A1 (de) * 1989-11-22 1991-05-23 Mitsubishi Electric Corp Struktur zur vermeidung von feldkonzentrationen in einem halbleiterbauelement und herstellungsverfahren dafuer
US5204545A (en) * 1989-11-22 1993-04-20 Mitsubishi Denki Kabushiki Kaisha Structure for preventing field concentration in semiconductor device and method of forming the same

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1944280B2 (de) * 1969-09-01 1971-06-09 Monolitisch integrierte festkoerperschaltung aus feldeffekttransistoren
FR2420209A1 (fr) * 1978-03-14 1979-10-12 Thomson Csf Structure de circuit integre fonctionnant a haute tension
DE3333242C2 (de) * 1982-09-13 1995-08-17 Nat Semiconductor Corp Monolithisch integrierter Halbleiterschaltkreis
US5606195A (en) * 1995-12-26 1997-02-25 Hughes Electronics High-voltage bipolar transistor utilizing field-terminated bond-pad electrodes

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL293292A (xx) * 1962-06-11
US3446995A (en) * 1964-05-27 1969-05-27 Ibm Semiconductor circuits,devices and methods of improving electrical characteristics of latter
CA956038A (en) * 1964-08-20 1974-10-08 Roy W. Stiegler (Jr.) Semiconductor devices with field electrodes

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4036958A1 (de) * 1989-11-22 1991-05-23 Mitsubishi Electric Corp Struktur zur vermeidung von feldkonzentrationen in einem halbleiterbauelement und herstellungsverfahren dafuer
US5204545A (en) * 1989-11-22 1993-04-20 Mitsubishi Denki Kabushiki Kaisha Structure for preventing field concentration in semiconductor device and method of forming the same

Also Published As

Publication number Publication date
SE352775B (xx) 1973-01-08
DE1803026B2 (de) 1973-09-20
FR1587469A (xx) 1970-03-20
DE6802215U (de) 1972-04-06
NL6814111A (xx) 1969-04-15
DE1803026A1 (de) 1971-02-11
GB1245765A (en) 1971-09-08
DE1803026C3 (de) 1981-09-10
BR6802913D0 (pt) 1973-01-04
JPS4841391B1 (xx) 1973-12-06

Similar Documents

Publication Publication Date Title
AT259014B (de) Halbleitereinrichtung und Verfahren zu deren Herstellung
CH528152A (de) Halbleiteranordnung und Verfahren zu deren Herstellung
CH499118A (de) Lichtpolarisationsvorrichtung und Verfahren zu deren Herstellung
AT285633B (de) Elektrode und Verfahren zu deren Herstellung
AT315916B (de) Halbleiterbauelement und Verfahren zu seiner Herstellung
CH442535A (de) Monolithische Halbleitervorrichtung und Verfahren zu deren Herstellung
CH504100A (de) Halbleiterbauelement und Verfahren zu dessen Herstellung
CH498627A (de) Salbengrundlage und Verfahren zu deren Herstellung
CH517359A (de) Halbleiterelement und Verfahren zu dessen Herstellung
CH510330A (de) Halbleiteranordnung und Verfahren zu ihrer Herstellung
AT251650B (de) Zusammengesetzte Halbleiteranordnung und Verfahren zu ihrer Herstellung
CH517376A (de) Halbleitereinrichtung und Verfahren zu deren Herstellung
AT281122B (de) Halbleitervorrichtung und Verfahren zur Herstellung derselben
AT275606B (de) Halbleitervorrichtung mit einem Feldeffekttransistor und Verfahren zu ihrer Herstellung
CH499877A (de) Halbleiterbauelement und Verfahren zu dessen Herstellung
CH402189A (de) Halbleitervorrichtung und Verfahren zu ihrer Herstellung
CH363416A (de) Halbleitereinrichtung und Verfahren zu deren Herstellung
CH474157A (de) Halbleitervorrichtung und Verfahren zu ihrer Herstellung
CH495629A (de) Halbleiteranordnung und Verfahren zu deren Herstellung
CH541880A (de) Dünnschicht-Halbleitervorrichtung und Verfahren zu deren Herstellung
AT275404B (de) Packung und Verfahren zu deren Herstellung
CH477839A (de) Tragtasche sowie Verfahren und Vorrichtung zu deren Herstellung
CH516872A (de) Druckempfindliche Halbleitervorrichtung und Verfahren zu ihrer Herstellung
CH510331A (de) Halbleitervorrichtung und Verfahren zu deren Herstellung
CH474860A (de) Halbleitervorrichtung und Verfahren zu ihrer Herstellung

Legal Events

Date Code Title Description
PL Patent ceased