CA980350A - Process for the photopolymerisation of ethylenically unsaturated compounds - Google Patents

Process for the photopolymerisation of ethylenically unsaturated compounds

Info

Publication number
CA980350A
CA980350A CA187,233A CA187233A CA980350A CA 980350 A CA980350 A CA 980350A CA 187233 A CA187233 A CA 187233A CA 980350 A CA980350 A CA 980350A
Authority
CA
Canada
Prior art keywords
photopolymerisation
ethylenically unsaturated
unsaturated compounds
compounds
ethylenically
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA187,233A
Other languages
English (en)
Other versions
CA187233S (en
Inventor
Hans-Peter Schlunke
Niklaus Baumann
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Novartis AG
Original Assignee
Ciba Geigy AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Geigy AG filed Critical Ciba Geigy AG
Application granted granted Critical
Publication of CA980350A publication Critical patent/CA980350A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D241/00—Heterocyclic compounds containing 1,4-diazine or hydrogenated 1,4-diazine rings
    • C07D241/36—Heterocyclic compounds containing 1,4-diazine or hydrogenated 1,4-diazine rings condensed with carbocyclic rings or ring systems
    • C07D241/38—Heterocyclic compounds containing 1,4-diazine or hydrogenated 1,4-diazine rings condensed with carbocyclic rings or ring systems with only hydrogen or carbon atoms directly attached to the ring nitrogen atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D241/00—Heterocyclic compounds containing 1,4-diazine or hydrogenated 1,4-diazine rings
    • C07D241/36—Heterocyclic compounds containing 1,4-diazine or hydrogenated 1,4-diazine rings condensed with carbocyclic rings or ring systems
    • C07D241/38—Heterocyclic compounds containing 1,4-diazine or hydrogenated 1,4-diazine rings condensed with carbocyclic rings or ring systems with only hydrogen or carbon atoms directly attached to the ring nitrogen atoms
    • C07D241/40—Benzopyrazines
    • C07D241/42—Benzopyrazines with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to carbon atoms of the hetero ring
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D471/00—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, at least one ring being a six-membered ring with one nitrogen atom, not provided for by groups C07D451/00 - C07D463/00
    • C07D471/02—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, at least one ring being a six-membered ring with one nitrogen atom, not provided for by groups C07D451/00 - C07D463/00 in which the condensed system contains two hetero rings
    • C07D471/04—Ortho-condensed systems
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D491/00—Heterocyclic compounds containing in the condensed ring system both one or more rings having oxygen atoms as the only ring hetero atoms and one or more rings having nitrogen atoms as the only ring hetero atoms, not provided for by groups C07D451/00 - C07D459/00, C07D463/00, C07D477/00 or C07D489/00
    • C07D491/02—Heterocyclic compounds containing in the condensed ring system both one or more rings having oxygen atoms as the only ring hetero atoms and one or more rings having nitrogen atoms as the only ring hetero atoms, not provided for by groups C07D451/00 - C07D459/00, C07D463/00, C07D477/00 or C07D489/00 in which the condensed system contains two hetero rings
    • C07D491/04—Ortho-condensed systems
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D495/00—Heterocyclic compounds containing in the condensed system at least one hetero ring having sulfur atoms as the only ring hetero atoms
    • C07D495/02—Heterocyclic compounds containing in the condensed system at least one hetero ring having sulfur atoms as the only ring hetero atoms in which the condensed system contains two hetero rings
    • C07D495/04—Ortho-condensed systems
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
CA187,233A 1972-12-05 1973-12-03 Process for the photopolymerisation of ethylenically unsaturated compounds Expired CA980350A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH1765872A CH573448A5 (de) 1972-12-05 1972-12-05

Publications (1)

Publication Number Publication Date
CA980350A true CA980350A (en) 1975-12-23

Family

ID=4427103

Family Applications (1)

Application Number Title Priority Date Filing Date
CA187,233A Expired CA980350A (en) 1972-12-05 1973-12-03 Process for the photopolymerisation of ethylenically unsaturated compounds

Country Status (8)

Country Link
JP (2) JPS5928205B2 (de)
BE (1) BE808179A (de)
CA (1) CA980350A (de)
CH (1) CH573448A5 (de)
DE (1) DE2360350A1 (de)
FR (2) FR2217355B1 (de)
GB (1) GB1436589A (de)
NL (1) NL7315878A (de)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH621545A5 (de) * 1976-05-24 1981-02-13 Ciba Geigy Ag
JPS6026122B2 (ja) * 1977-01-20 1985-06-21 富士写真フイルム株式会社 光重合性組成物
DE10029929A1 (de) * 2000-06-17 2001-12-20 Henkel Kgaa Mittel zum Färben von keratinhaltigen Faser
JP4291638B2 (ja) 2003-07-29 2009-07-08 富士フイルム株式会社 アルカリ可溶性ポリマー及びそれを用いた平版印刷版原版
JP5089866B2 (ja) 2004-09-10 2012-12-05 富士フイルム株式会社 平版印刷方法
JP4538350B2 (ja) 2005-03-18 2010-09-08 富士フイルム株式会社 感光性組成物および画像記録材料並びに画像記録方法
JP4777226B2 (ja) 2006-12-07 2011-09-21 富士フイルム株式会社 画像記録材料、及び新規化合物
JP4860525B2 (ja) 2007-03-27 2012-01-25 富士フイルム株式会社 硬化性組成物及び平版印刷版原版
EP2048539A1 (de) 2007-09-06 2009-04-15 FUJIFILM Corporation Verarbeitetes Pigment, pigmentverstreute Zusammensetzung, farbige, lichtempfindliche Zusammensetzung, Farbfilter, Flüssigkristallanzeigeelement und Festbildaufnahmeelement
JP2009091555A (ja) 2007-09-18 2009-04-30 Fujifilm Corp 硬化性組成物、画像形成材料及び平版印刷版原版
US9442372B2 (en) 2007-09-26 2016-09-13 Fujifilm Corporation Pigment dispersion composition, photocurable composition and color filter
ATE475906T1 (de) 2007-09-28 2010-08-15 Fujifilm Corp Negatives lichtempfindliches material und negativer planographischer druckplattenvorläufer
JP4890408B2 (ja) 2007-09-28 2012-03-07 富士フイルム株式会社 重合性組成物及びそれを用いた平版印刷版原版、アルカリ可溶性ポリウレタン樹脂、並びに、ジオール化合物の製造方法
KR101671249B1 (ko) 2008-03-17 2016-11-01 후지필름 가부시키가이샤 착색 감광성 조성물, 컬러필터, 액정표시소자, 및 고체촬상소자
US7923197B2 (en) 2008-03-25 2011-04-12 Fujifilm Corporation Lithographic printing plate precursor
JP5554106B2 (ja) 2009-03-31 2014-07-23 富士フイルム株式会社 着色硬化性組成物、カラーフィルタの製造方法、カラーフィルタ、固体撮像素子、および液晶表示装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1085868A (fr) * 1952-05-30 1955-02-08 Ciba Geigy Procédé de préparation de nouveaux composés de la quinoxaline
US3573922A (en) * 1965-04-23 1971-04-06 Hughes Aircraft Co Photopolymerizable composition and process
DE2039861C3 (de) * 1970-08-11 1973-12-13 Kalle Ag, 6202 Wiesbaden-Biebrich Photopolymensierbare Kopier masse

Also Published As

Publication number Publication date
FR2221453B1 (de) 1978-09-08
JPS5924147B2 (ja) 1984-06-07
JPS5928205B2 (ja) 1984-07-11
DE2360350A1 (de) 1974-06-06
NL7315878A (de) 1974-06-07
CH573448A5 (de) 1976-03-15
FR2221453A1 (de) 1974-10-11
JPS4987780A (de) 1974-08-22
FR2217355B1 (de) 1977-06-10
GB1436589A (en) 1976-05-19
BE808179A (fr) 1974-06-04
FR2217355A1 (de) 1974-09-06
JPS4986383A (de) 1974-08-19

Similar Documents

Publication Publication Date Title
CA996956A (en) Process for the production of aromatic compounds
CA980350A (en) Process for the photopolymerisation of ethylenically unsaturated compounds
CA1016937A (en) Process for the manufacture of oxo compounds
CA936878A (en) Process for the disproportionation of ethylenically unsaturated compounds
CA999870A (en) Process for the manufacture of triacetone-amine
CA981507A (en) Process for hardening photoresist
CA990719A (en) Process for the manufacture of 2-aryl-v-triazole
CA1023733A (en) Process for the manufacture of nuclear-sulphonated compounds
CA1001616A (en) Process for the manufacture of aminoazetidinones
CA1005949A (en) Process for the polymerization of unsaturated compounds
AU5640073A (en) Unsaturated thiol compounds
CA979445A (en) Process for the manufacture of 2-aryl-v-triazoles
CA1034581A (en) Process for the manufacture of 2-aryl-vic-triazoles
CA1010860A (en) Process for the manufacture of new anhydrofuranose derivatives
CA1022170A (en) Process for the manufacture of new triazolo-benzodiazepines
CA1007248A (en) Method for the methylation-hydroxylation of certain aromatic unsaturated compounds
AU479501B2 (en) Process for the manufacture of oxo compounds
CA893693A (en) Process for the manufacture of new halogenpregnadienes
AU455077B2 (en) Process for the preparation of unsaturated carbonyl compounds
CA899909A (en) Process for the manufacture of cycloalkenones
CA902051A (en) Process for the manufacture of 1-bromo-4-acylaminoanthraquinones
CA901586A (en) Process for the manufacture of 4-acyloxy-azetidine-2-ones
CA904200A (en) Process for the manufacture of nitrosodisulfonates
CA894264A (en) Process for the manufacture of diacyloxyalkenes
CA907061A (en) Process for the manufacture of alk-2-enones