CH573448A5 - - Google Patents

Info

Publication number
CH573448A5
CH573448A5 CH1765872A CH1765872A CH573448A5 CH 573448 A5 CH573448 A5 CH 573448A5 CH 1765872 A CH1765872 A CH 1765872A CH 1765872 A CH1765872 A CH 1765872A CH 573448 A5 CH573448 A5 CH 573448A5
Authority
CH
Switzerland
Application number
CH1765872A
Original Assignee
Ciba Geigy Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Geigy Ag filed Critical Ciba Geigy Ag
Priority to CH1765872A priority Critical patent/CH573448A5/xx
Priority to NL7315878A priority patent/NL7315878A/xx
Priority to FR7342221A priority patent/FR2217355B1/fr
Priority to US05/420,176 priority patent/US4001017A/en
Priority to GB1841975A priority patent/GB1436590A/en
Priority to CA187,233A priority patent/CA980350A/en
Priority to GB5592573A priority patent/GB1436589A/en
Priority to IT5405473A priority patent/IT997924B/it
Priority to BE138476A priority patent/BE808179A/xx
Priority to DE19732360350 priority patent/DE2360350A1/de
Priority to JP13545473A priority patent/JPS5928205B2/ja
Priority to JP48135455A priority patent/JPS5924147B2/ja
Priority to FR7413181A priority patent/FR2221453B1/fr
Publication of CH573448A5 publication Critical patent/CH573448A5/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D241/00—Heterocyclic compounds containing 1,4-diazine or hydrogenated 1,4-diazine rings
    • C07D241/36—Heterocyclic compounds containing 1,4-diazine or hydrogenated 1,4-diazine rings condensed with carbocyclic rings or ring systems
    • C07D241/38—Heterocyclic compounds containing 1,4-diazine or hydrogenated 1,4-diazine rings condensed with carbocyclic rings or ring systems with only hydrogen or carbon atoms directly attached to the ring nitrogen atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D241/00—Heterocyclic compounds containing 1,4-diazine or hydrogenated 1,4-diazine rings
    • C07D241/36—Heterocyclic compounds containing 1,4-diazine or hydrogenated 1,4-diazine rings condensed with carbocyclic rings or ring systems
    • C07D241/38—Heterocyclic compounds containing 1,4-diazine or hydrogenated 1,4-diazine rings condensed with carbocyclic rings or ring systems with only hydrogen or carbon atoms directly attached to the ring nitrogen atoms
    • C07D241/40—Benzopyrazines
    • C07D241/42—Benzopyrazines with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to carbon atoms of the hetero ring
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D471/00—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, at least one ring being a six-membered ring with one nitrogen atom, not provided for by groups C07D451/00 - C07D463/00
    • C07D471/02—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, at least one ring being a six-membered ring with one nitrogen atom, not provided for by groups C07D451/00 - C07D463/00 in which the condensed system contains two hetero rings
    • C07D471/04—Ortho-condensed systems
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D491/00—Heterocyclic compounds containing in the condensed ring system both one or more rings having oxygen atoms as the only ring hetero atoms and one or more rings having nitrogen atoms as the only ring hetero atoms, not provided for by groups C07D451/00 - C07D459/00, C07D463/00, C07D477/00 or C07D489/00
    • C07D491/02—Heterocyclic compounds containing in the condensed ring system both one or more rings having oxygen atoms as the only ring hetero atoms and one or more rings having nitrogen atoms as the only ring hetero atoms, not provided for by groups C07D451/00 - C07D459/00, C07D463/00, C07D477/00 or C07D489/00 in which the condensed system contains two hetero rings
    • C07D491/04—Ortho-condensed systems
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D495/00—Heterocyclic compounds containing in the condensed system at least one hetero ring having sulfur atoms as the only ring hetero atoms
    • C07D495/02—Heterocyclic compounds containing in the condensed system at least one hetero ring having sulfur atoms as the only ring hetero atoms in which the condensed system contains two hetero rings
    • C07D495/04—Ortho-condensed systems
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
CH1765872A 1972-12-05 1972-12-05 CH573448A5 (de)

Priority Applications (13)

Application Number Priority Date Filing Date Title
CH1765872A CH573448A5 (de) 1972-12-05 1972-12-05
NL7315878A NL7315878A (de) 1972-12-05 1973-11-20
FR7342221A FR2217355B1 (de) 1972-12-05 1973-11-27
US05/420,176 US4001017A (en) 1972-12-05 1973-11-29 Process for the photopolymerization of ethylenically unsaturated compounds
GB1841975A GB1436590A (en) 1972-12-05 1973-12-03 Quinoxalium salts
CA187,233A CA980350A (en) 1972-12-05 1973-12-03 Process for the photopolymerisation of ethylenically unsaturated compounds
GB5592573A GB1436589A (en) 1972-12-05 1973-12-03 Process for the photopolymerisation of ethylenically unsaturate compounds
IT5405473A IT997924B (it) 1972-12-05 1973-12-03 Procedimento e composizioni per fotopolimerizzare composti a legame etilenico insaturo
BE138476A BE808179A (fr) 1972-12-05 1973-12-04 Procede de photopolymerisation de composes non satures ethyleniques
DE19732360350 DE2360350A1 (de) 1972-12-05 1973-12-04 Verfahren zur photopolymerisation aethylenisch ungesaettigter verbindungen
JP13545473A JPS5928205B2 (ja) 1972-12-05 1973-12-05 エチレン状不飽和化合物の光重合法
JP48135455A JPS5924147B2 (ja) 1972-12-05 1973-12-05 新規キノキサリニウム塩の製法
FR7413181A FR2221453B1 (de) 1972-12-05 1974-04-16

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH1765872A CH573448A5 (de) 1972-12-05 1972-12-05

Publications (1)

Publication Number Publication Date
CH573448A5 true CH573448A5 (de) 1976-03-15

Family

ID=4427103

Family Applications (1)

Application Number Title Priority Date Filing Date
CH1765872A CH573448A5 (de) 1972-12-05 1972-12-05

Country Status (8)

Country Link
JP (2) JPS5928205B2 (de)
BE (1) BE808179A (de)
CA (1) CA980350A (de)
CH (1) CH573448A5 (de)
DE (1) DE2360350A1 (de)
FR (2) FR2217355B1 (de)
GB (1) GB1436589A (de)
NL (1) NL7315878A (de)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH621545A5 (de) * 1976-05-24 1981-02-13 Ciba Geigy Ag
JPS6026122B2 (ja) * 1977-01-20 1985-06-21 富士写真フイルム株式会社 光重合性組成物
DE10029929A1 (de) * 2000-06-17 2001-12-20 Henkel Kgaa Mittel zum Färben von keratinhaltigen Faser
JP4291638B2 (ja) 2003-07-29 2009-07-08 富士フイルム株式会社 アルカリ可溶性ポリマー及びそれを用いた平版印刷版原版
JP5089866B2 (ja) 2004-09-10 2012-12-05 富士フイルム株式会社 平版印刷方法
JP4538350B2 (ja) 2005-03-18 2010-09-08 富士フイルム株式会社 感光性組成物および画像記録材料並びに画像記録方法
JP4777226B2 (ja) 2006-12-07 2011-09-21 富士フイルム株式会社 画像記録材料、及び新規化合物
JP4860525B2 (ja) 2007-03-27 2012-01-25 富士フイルム株式会社 硬化性組成物及び平版印刷版原版
EP2048539A1 (de) 2007-09-06 2009-04-15 FUJIFILM Corporation Verarbeitetes Pigment, pigmentverstreute Zusammensetzung, farbige, lichtempfindliche Zusammensetzung, Farbfilter, Flüssigkristallanzeigeelement und Festbildaufnahmeelement
JP2009091555A (ja) 2007-09-18 2009-04-30 Fujifilm Corp 硬化性組成物、画像形成材料及び平版印刷版原版
US9442372B2 (en) 2007-09-26 2016-09-13 Fujifilm Corporation Pigment dispersion composition, photocurable composition and color filter
JP4890408B2 (ja) 2007-09-28 2012-03-07 富士フイルム株式会社 重合性組成物及びそれを用いた平版印刷版原版、アルカリ可溶性ポリウレタン樹脂、並びに、ジオール化合物の製造方法
ATE475906T1 (de) 2007-09-28 2010-08-15 Fujifilm Corp Negatives lichtempfindliches material und negativer planographischer druckplattenvorläufer
KR101654666B1 (ko) 2008-03-17 2016-09-06 후지필름 가부시키가이샤 안료 분산 조성물, 착색 감광성 조성물, 광경화성 조성물, 컬러필터, 액정표시소자, 및 고체촬상소자
US7923197B2 (en) 2008-03-25 2011-04-12 Fujifilm Corporation Lithographic printing plate precursor
JP5554106B2 (ja) 2009-03-31 2014-07-23 富士フイルム株式会社 着色硬化性組成物、カラーフィルタの製造方法、カラーフィルタ、固体撮像素子、および液晶表示装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1085868A (fr) * 1952-05-30 1955-02-08 Ciba Geigy Procédé de préparation de nouveaux composés de la quinoxaline
US3573922A (en) * 1965-04-23 1971-04-06 Hughes Aircraft Co Photopolymerizable composition and process
DE2039861C3 (de) * 1970-08-11 1973-12-13 Kalle Ag, 6202 Wiesbaden-Biebrich Photopolymensierbare Kopier masse

Also Published As

Publication number Publication date
BE808179A (fr) 1974-06-04
JPS5928205B2 (ja) 1984-07-11
FR2221453A1 (de) 1974-10-11
NL7315878A (de) 1974-06-07
FR2221453B1 (de) 1978-09-08
FR2217355A1 (de) 1974-09-06
JPS4987780A (de) 1974-08-22
JPS4986383A (de) 1974-08-19
JPS5924147B2 (ja) 1984-06-07
GB1436589A (en) 1976-05-19
DE2360350A1 (de) 1974-06-06
CA980350A (en) 1975-12-23
FR2217355B1 (de) 1977-06-10

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