CA956166A - Photosensitive compositions for relief structures - Google Patents

Photosensitive compositions for relief structures

Info

Publication number
CA956166A
CA956166A CA131,733A CA131733A CA956166A CA 956166 A CA956166 A CA 956166A CA 131733 A CA131733 A CA 131733A CA 956166 A CA956166 A CA 956166A
Authority
CA
Canada
Prior art keywords
relief structures
photosensitive compositions
photosensitive
compositions
relief
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA131,733A
Other languages
English (en)
Other versions
CA131733S (en
Inventor
Tsunetoshi Kai
Mitsuhiro Inoue
Matuo Yoshida
Jun-Ichi Ueda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Kasei Corp
Original Assignee
Asahi Kasei Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Kasei Kogyo KK filed Critical Asahi Kasei Kogyo KK
Application granted granted Critical
Publication of CA956166A publication Critical patent/CA956166A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
    • C08F283/01—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to unsaturated polyesters

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
CA131,733A 1971-03-11 1972-01-05 Photosensitive compositions for relief structures Expired CA956166A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP46013009A JPS5033767B1 (xx) 1971-03-11 1971-03-11

Publications (1)

Publication Number Publication Date
CA956166A true CA956166A (en) 1974-10-15

Family

ID=11821156

Family Applications (1)

Application Number Title Priority Date Filing Date
CA131,733A Expired CA956166A (en) 1971-03-11 1972-01-05 Photosensitive compositions for relief structures

Country Status (7)

Country Link
US (1) US3794494A (xx)
JP (1) JPS5033767B1 (xx)
CA (1) CA956166A (xx)
DE (1) DE2207209C3 (xx)
FR (1) FR2129360A5 (xx)
GB (1) GB1350339A (xx)
IT (1) IT944098B (xx)

Families Citing this family (65)

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DE2429636C3 (de) * 1973-06-28 1986-05-07 Teijin Ltd., Osaka Lichtempfindliche Harzmasse
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US4518677A (en) * 1978-01-04 1985-05-21 Hercules Incorporated Process for making printing plates
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US4198238A (en) * 1978-06-22 1980-04-15 Hercules Incorporated Photopolymerizable composition
DE2846647A1 (de) * 1978-10-26 1980-05-08 Basf Ag Photopolymerisierbare mischung fuer die herstellung von druck- und reliefformen
DE2933871A1 (de) * 1979-08-21 1981-03-12 Siemens AG, 1000 Berlin und 8000 München Verfahren zur herstellung hochwaermebestaendiger reliefstrukturen und deren verwendung.
DE2933805A1 (de) * 1979-08-21 1981-03-12 Siemens AG, 1000 Berlin und 8000 München Verfahren zur herstellung hochwaermebestaendiger reliefstrukturen und deren verwendung
US4332873A (en) * 1979-08-22 1982-06-01 Hercules Incorporated Multilayer printing plates and process for making same
EP0030213A1 (de) * 1979-11-29 1981-06-10 Ciba-Geigy Ag Durch Licht vernetzbare Schicht auf Druckformen und Verfahren zur Herstellung von Offset-Druckplatten
US4306012A (en) * 1979-12-05 1981-12-15 Hercules Incorporated Process of radiation and heat treatment of printing medium
US4416974A (en) * 1979-12-05 1983-11-22 Hercules Incorporated Radiation curable ceramic pigment composition
US4403566A (en) * 1980-06-23 1983-09-13 Hercules Incorporated Apparatus for producing a printing plate
US4475810A (en) * 1980-10-06 1984-10-09 Hercules Incorporated Docking sensor system
US4450226A (en) * 1981-10-26 1984-05-22 Hercules Incorporated Method and apparatus for producing a printing plate
US4377679A (en) 1982-01-28 1983-03-22 Thiokol Corporation Photocurable compositions based on acrylate polyester urethanes
DE3536262A1 (de) * 1985-10-11 1987-04-16 Basf Ag Lagerstabile, in organischem loesemittel geloeste oder dispergierte vernetzbare zusammensetzungen, ihre herstellung und verwendung
DE3807929A1 (de) * 1988-03-10 1989-09-28 Basf Ag Verfahren zur herstellung von reliefformen
DE3908764C2 (de) * 1989-03-17 1994-08-11 Basf Ag Entwickler für die Herstellung photopolymerisierter flexographischer Reliefdruckformen
US5798019A (en) 1995-09-29 1998-08-25 E. I. Du Pont De Nemours And Company Methods and apparatus for forming cylindrical photosensitive elements
US5753414A (en) * 1995-10-02 1998-05-19 Macdermid Imaging Technology, Inc. Photopolymer plate having a peelable substrate
US6425327B1 (en) 1999-08-12 2002-07-30 E. I. Du Pont De Nemours And Company Method for forming a cylindrical photosensitive element
US6713646B2 (en) 2002-04-12 2004-03-30 Biosphere Medical Degradable crosslinkers, and degradable crosslinked hydrogels comprising them
US7838699B2 (en) * 2002-05-08 2010-11-23 Biosphere Medical Embolization using degradable crosslinked hydrogels
US6884905B2 (en) * 2002-07-23 2005-04-26 Biosphere Medical Degradable carbamate-containing bis(acryloyl) crosslinkers, and degradable crosslinked hydrogels comprising them
US8435603B2 (en) * 2003-12-05 2013-05-07 Conductive Inkjet Technology Limited Formation of solid layers on substrates
US7811744B2 (en) 2004-03-03 2010-10-12 Kodak IL. Ltd. Material for infrared laser ablated engraved flexographic printing plates
US8142987B2 (en) 2004-04-10 2012-03-27 Eastman Kodak Company Method of producing a relief image for printing
JP4342373B2 (ja) * 2004-04-30 2009-10-14 東京応化工業株式会社 凸版印刷用感光性印刷原版、凸版印刷版の製造方法、および該製造方法用遮光インク
JP2006003570A (ja) * 2004-06-16 2006-01-05 Tokyo Ohka Kogyo Co Ltd 印刷版製造用感光性組成物、並びに、これを用いた感光性印刷原版積層体および印刷版
JP2007015147A (ja) * 2005-07-05 2007-01-25 Tokyo Ohka Kogyo Co Ltd 凸版印刷用感光性積層印刷原版の製造方法、凸版印刷用感光性積層印刷原版、および凸版印刷版の製造方法
JP2007224093A (ja) * 2006-02-21 2007-09-06 Tokyo Ohka Kogyo Co Ltd 接着層形成用組成物、及びこれを用いた凸版印刷版、並びに凸版印刷版の製造方法
EP2225337B1 (de) 2007-11-19 2017-08-23 Basf Se Verwendung hochverzweigter polymere in polymerdispersionen für glanzfarben
AU2008327942A1 (en) 2007-11-19 2009-05-28 Basf Se Use of highly-branched polymers for producing polymer dispersions with improved freeze/thaw stability
ES2636995T3 (es) 2008-03-20 2017-10-10 Basf Se Dispersiones poliméricas que contienen polímeros que contienen fósforo y emulsionantes
DE102009026820A1 (de) * 2008-09-08 2010-03-11 Evonik Röhm Gmbh Funktionalisiertes (Meth)acrylatmonomer, Polymer, Beschichtungsmittel und Verfahren zur Herstellung und Vernetzung
PL2370516T3 (pl) 2008-12-01 2015-11-30 Basf Se Wodna kompozycja środka błonotwórczego zawierająca oligomery
US20120121921A1 (en) 2009-07-22 2012-05-17 Basf Se Aqueous polymer dispersion as a binding agent for plasters and coating materials having improved fire behavior
CN102612317B (zh) 2009-09-15 2015-07-01 巴斯夫欧洲公司 包含存在于混合网络中的抗微生物剂的水性分散体
PL2513154T3 (pl) 2009-12-16 2015-08-31 Basf Se Sposób wytwarzania wodnych hybrydowych środków błonotwórczych o małej zawartości monomerów resztkowych oraz zastosowanie tych środków błonotwórczych w farbach o wysokim połysku
US8785557B2 (en) 2009-12-16 2014-07-22 Basf Se Use of aqueous hybrid binders for gloss paints
JP5744067B2 (ja) 2010-02-18 2015-07-01 ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ 不飽和脂肪酸基を有する高分岐ポリカーボネートを含有する、ポリマー分散液
US8476000B2 (en) 2010-06-04 2013-07-02 Ryan Vest Method of producing a relief image from a liquid photopolymer resin
MY167866A (en) 2010-12-21 2018-09-26 Basf Se Multistage polymer dispersions, processes for preparing them, and use thereof
US8754151B2 (en) 2010-12-21 2014-06-17 Basf Se Multistage polymer dispersions, processes for preparing them, and use thereof
EP2636714A1 (de) 2012-03-09 2013-09-11 Basf Se Mehrstufige herstellung wässriger haftklebstoffdispersionen für die herstellung von selbstkle-benden artikeln
US9096090B2 (en) 2012-05-09 2015-08-04 Ryan W. Vest Liquid platemaking with laser engraving
US8735049B2 (en) 2012-05-22 2014-05-27 Ryan W. Vest Liquid platemaking process
CN104540906B (zh) 2012-06-05 2017-04-05 巴斯夫欧洲公司 多段聚合产物分散体用于涂布金属板的用途
BR112015000169A2 (pt) 2012-07-06 2017-06-27 Basf Se aglutinante híbrido aquoso, sistema de resina alquídica aquosa, composição de revestimento, processo para a preparação de um aglutinante híbrido aquoso, usos de um aglutinante híbrido aquoso e um sistema alquídico aquoso, e, método para aumentar o desenvolvimento de dureza
US9703201B2 (en) 2015-04-22 2017-07-11 Macdermid Printing Solutions, Llc Method of making relief image printing plates
JP2018538384A (ja) 2015-10-20 2018-12-27 ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ 繊維セメント板を被覆するためのコーティング組成物
US9740103B2 (en) 2015-11-09 2017-08-22 Macdermid Printing Solutions, Llc Method and apparatus for producing liquid flexographic printing plates
WO2017125277A1 (de) 2016-01-18 2017-07-27 Basf Se Verwendung eines einkomponentigen laminierklebstoffs zur verbundfolienkaschierung
EP3202795B1 (de) 2016-02-08 2018-08-08 Basf Se Verwendung einer klebstoffdispersion für die glanzfolienkaschierung
WO2017157934A1 (de) 2016-03-18 2017-09-21 Basf Se Feinteilige wässrige mehrstufige polymerisatdispersion, verfahren zu deren herstellung und deren verwendung als bindemittel
US10625334B2 (en) 2017-04-11 2020-04-21 Macdermid Graphics Solutions, Llc Method of producing a relief image from a liquid photopolymer resin
CN112004878A (zh) 2018-04-20 2020-11-27 巴斯夫欧洲公司 具有基于通过酮基或醛基的交联的凝胶含量的粘合剂组合物
US20220049135A1 (en) 2019-02-15 2022-02-17 Covestro Intellectual Property Gmbh & Co. Kg New systems for priming and adhesion of flooring

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3677920A (en) * 1968-07-06 1972-07-18 Asahi Chemical Ind Photopolymerizable diisocyanate modified unsaturated polyester containing acrylic monomers
DE2008334A1 (de) * 1969-02-24 1970-12-23 The Lubrizol Corp., Cleveland, Ohio (V.St.A.) Härtbare Formmassen auf der Basis von Polyestern
US3725231A (en) * 1971-08-20 1973-04-03 Lubrizol Corp Photosensitive diacetone acrylamide resins

Also Published As

Publication number Publication date
GB1350339A (en) 1974-04-18
DE2207209A1 (de) 1972-10-19
DE2207209C3 (de) 1974-05-22
AU3638971A (en) 1973-05-24
JPS5033767B1 (xx) 1975-11-04
DE2207209B2 (de) 1973-10-25
FR2129360A5 (xx) 1972-10-27
IT944098B (it) 1973-04-20
US3794494A (en) 1974-02-26

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