CA2689143A1 - Method and apparatus for growing a ribbon crystal with localized cooling - Google Patents
Method and apparatus for growing a ribbon crystal with localized cooling Download PDFInfo
- Publication number
- CA2689143A1 CA2689143A1 CA002689143A CA2689143A CA2689143A1 CA 2689143 A1 CA2689143 A1 CA 2689143A1 CA 002689143 A CA002689143 A CA 002689143A CA 2689143 A CA2689143 A CA 2689143A CA 2689143 A1 CA2689143 A1 CA 2689143A1
- Authority
- CA
- Canada
- Prior art keywords
- ribbon crystal
- given portion
- cooling
- gas
- partially formed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 239000013078 crystal Substances 0.000 title claims abstract description 123
- 238000000034 method Methods 0.000 title claims abstract description 39
- 238000001816 cooling Methods 0.000 title claims description 50
- 239000012530 fluid Substances 0.000 claims abstract description 23
- 239000012768 molten material Substances 0.000 claims abstract description 15
- 239000000463 material Substances 0.000 claims description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 3
- 229910002804 graphite Inorganic materials 0.000 claims description 3
- 239000010439 graphite Substances 0.000 claims description 3
- 239000007789 gas Substances 0.000 description 57
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 20
- 229910052710 silicon Inorganic materials 0.000 description 20
- 239000010703 silicon Substances 0.000 description 20
- 230000005499 meniscus Effects 0.000 description 12
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 229910052786 argon Inorganic materials 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 235000012431 wafers Nutrition 0.000 description 2
- 238000013459 approach Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/007—Pulling on a substrate
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/14—Heating of the melt or the crystallised materials
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/20—Controlling or regulating
- C30B15/22—Stabilisation or shape controlling of the molten zone near the pulled crystal; Controlling the section of the crystal
- C30B15/24—Stabilisation or shape controlling of the molten zone near the pulled crystal; Controlling the section of the crystal using mechanical means, e.g. shaping guides
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/06—Silicon
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
- Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
- Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
- Y10T117/1032—Seed pulling
- Y10T117/1052—Seed pulling including a sectioned crucible [e.g., double crucible, baffle]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
- Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
- Y10T117/1032—Seed pulling
- Y10T117/1068—Seed pulling including heating or cooling details [e.g., shield configuration]
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Silicon Compounds (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/760,542 | 2007-06-08 | ||
| US11/760,542 US7780782B2 (en) | 2007-06-08 | 2007-06-08 | Method and apparatus for growing a ribbon crystal with localized cooling |
| PCT/US2008/064854 WO2008150761A1 (en) | 2007-06-08 | 2008-05-27 | Method and apparatus for growing a ribbon crystal with localized cooling |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA2689143A1 true CA2689143A1 (en) | 2008-12-11 |
Family
ID=39637590
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA002689143A Abandoned CA2689143A1 (en) | 2007-06-08 | 2008-05-27 | Method and apparatus for growing a ribbon crystal with localized cooling |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US7780782B2 (enExample) |
| EP (1) | EP2162572A1 (enExample) |
| JP (1) | JP5290282B2 (enExample) |
| KR (1) | KR20100019528A (enExample) |
| CN (1) | CN101688324B (enExample) |
| CA (1) | CA2689143A1 (enExample) |
| IN (1) | IN2009CN07691A (enExample) |
| MX (1) | MX2009012745A (enExample) |
| MY (1) | MY149124A (enExample) |
| WO (1) | WO2008150761A1 (enExample) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20120164379A1 (en) * | 2010-12-22 | 2012-06-28 | Evergreen Solar, Inc. | Wide Sheet Wafer |
| US20120211917A1 (en) * | 2011-02-23 | 2012-08-23 | Evergreen Solar, Inc. | Wafer Furnace with Variable Flow Gas Jets |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL264214A (enExample) * | 1960-05-02 | 1900-01-01 | ||
| US4221754A (en) * | 1977-12-29 | 1980-09-09 | Nowak Welville B | Method for producing solid ribbons |
| US4217165A (en) * | 1978-04-28 | 1980-08-12 | Ciszek Theodore F | Method of growing a ribbon crystal particularly suited for facilitating automated control of ribbon width |
| US4627887A (en) * | 1980-12-11 | 1986-12-09 | Sachs Emanuel M | Melt dumping in string stabilized ribbon growth |
| US4603034A (en) * | 1980-12-12 | 1986-07-29 | Vickery Iii Earle R | Crystal growing system |
| US4873063A (en) * | 1986-01-06 | 1989-10-10 | Bleil Carl E | Apparatus for zone regrowth of crystal ribbons |
| US4751059A (en) * | 1986-12-05 | 1988-06-14 | Westinghouse Electric Corp. | Apparatus for growing dendritic web crystals of constant width |
| JP2587932B2 (ja) * | 1987-03-23 | 1997-03-05 | 大同ほくさん株式会社 | シリコンリボンの製造方法 |
| US6200383B1 (en) * | 1999-05-03 | 2001-03-13 | Evergreen Solar, Inc. | Melt depth control for semiconductor materials grown from a melt |
| JP3656821B2 (ja) * | 1999-09-14 | 2005-06-08 | シャープ株式会社 | 多結晶シリコンシートの製造装置及び製造方法 |
| JP2001122696A (ja) * | 1999-10-21 | 2001-05-08 | Matsushita Seiko Co Ltd | リボンシリコンウェハの製造方法 |
| US6814802B2 (en) * | 2002-10-30 | 2004-11-09 | Evergreen Solar, Inc. | Method and apparatus for growing multiple crystalline ribbons from a single crucible |
-
2007
- 2007-06-08 US US11/760,542 patent/US7780782B2/en not_active Expired - Fee Related
-
2008
- 2008-05-27 CA CA002689143A patent/CA2689143A1/en not_active Abandoned
- 2008-05-27 EP EP08780702A patent/EP2162572A1/en not_active Withdrawn
- 2008-05-27 IN IN7691CHN2009 patent/IN2009CN07691A/en unknown
- 2008-05-27 MY MYPI20095031A patent/MY149124A/en unknown
- 2008-05-27 CN CN2008800177324A patent/CN101688324B/zh not_active Expired - Fee Related
- 2008-05-27 KR KR1020097026578A patent/KR20100019528A/ko not_active Ceased
- 2008-05-27 WO PCT/US2008/064854 patent/WO2008150761A1/en not_active Ceased
- 2008-05-27 MX MX2009012745A patent/MX2009012745A/es active IP Right Grant
- 2008-05-27 JP JP2010511247A patent/JP5290282B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| MY149124A (en) | 2013-07-15 |
| JP2010528971A (ja) | 2010-08-26 |
| KR20100019528A (ko) | 2010-02-18 |
| WO2008150761A1 (en) | 2008-12-11 |
| US7780782B2 (en) | 2010-08-24 |
| JP5290282B2 (ja) | 2013-09-18 |
| CN101688324A (zh) | 2010-03-31 |
| EP2162572A1 (en) | 2010-03-17 |
| IN2009CN07691A (enExample) | 2015-10-09 |
| CN101688324B (zh) | 2013-03-13 |
| US20080302296A1 (en) | 2008-12-11 |
| MX2009012745A (es) | 2009-12-11 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EEER | Examination request |
Effective date: 20130523 |
|
| FZDE | Discontinued |
Effective date: 20150527 |