CA2604685C - Diagnosis and calibration system for icp-ms apparatus - Google Patents

Diagnosis and calibration system for icp-ms apparatus Download PDF

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Publication number
CA2604685C
CA2604685C CA2604685A CA2604685A CA2604685C CA 2604685 C CA2604685 C CA 2604685C CA 2604685 A CA2604685 A CA 2604685A CA 2604685 A CA2604685 A CA 2604685A CA 2604685 C CA2604685 C CA 2604685C
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Canada
Prior art keywords
parameter
sensitivity
aggregate
measurement
plasma
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CA2604685A
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English (en)
French (fr)
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CA2604685A1 (en
Inventor
Kenichi Sakata
Tatsuya Shibukawa
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Agilent Technologies Inc
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Agilent Technologies Inc
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Publication of CA2604685A1 publication Critical patent/CA2604685A1/en
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Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/26Plasma torches
    • H05H1/30Plasma torches using applied electromagnetic fields, e.g. high frequency or microwave energy

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
  • Electron Tubes For Measurement (AREA)
CA2604685A 2006-10-31 2007-09-27 Diagnosis and calibration system for icp-ms apparatus Active CA2604685C (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2006295462A JP4822346B2 (ja) 2006-10-31 2006-10-31 誘導結合プラズマ質量分析装置のための診断及び較正システム
JP2006-295462 2006-10-31

Publications (2)

Publication Number Publication Date
CA2604685A1 CA2604685A1 (en) 2008-04-30
CA2604685C true CA2604685C (en) 2016-06-28

Family

ID=39277834

Family Applications (1)

Application Number Title Priority Date Filing Date
CA2604685A Active CA2604685C (en) 2006-10-31 2007-09-27 Diagnosis and calibration system for icp-ms apparatus

Country Status (4)

Country Link
US (1) US7869968B2 (de)
JP (1) JP4822346B2 (de)
CA (1) CA2604685C (de)
DE (1) DE102007046367B4 (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200817931A (en) * 2006-07-10 2008-04-16 Asterion Inc System and method for performing processing in a testing system
JP4903515B2 (ja) * 2006-08-11 2012-03-28 アジレント・テクノロジーズ・インク 誘導結合プラズマ質量分析装置
KR101364645B1 (ko) * 2012-01-30 2014-02-20 한국원자력연구원 플라즈마 검출장치, 이를 구비하는 유도결합플라즈마 질량분석기 및 플라즈마와 이온신호의 상관관계 분석방법
JP6345934B2 (ja) * 2013-12-27 2018-06-20 アジレント・テクノロジーズ・インクAgilent Technologies, Inc. 質量分析メソッドの自動生成方法
CN106463329B (zh) 2014-02-14 2019-09-24 珀金埃尔默健康科学公司 用于多模式电感耦合等离子体质谱仪的自动化优化的系统及方法
CN103996890B (zh) 2014-05-26 2016-02-10 唐山轨道客车有限责任公司 用于有轨电车的热控制系统
GB2548071B (en) * 2015-12-18 2018-05-02 Thermo Fisher Scient Bremen Gmbh Liquid sample introduction system and method, for analytical plasma spectrometer
JP6734061B2 (ja) * 2016-01-29 2020-08-05 アジレント・テクノロジーズ・インクAgilent Technologies, Inc. プラズマ分光分析装置
JP6870406B2 (ja) * 2017-03-21 2021-05-12 株式会社島津製作所 タンデム四重極型質量分析装置および該装置の制御パラメータ最適化方法
EP3654739A4 (de) * 2017-07-13 2021-04-07 Shimadzu Corporation Plasmaerzeugungsvorrichtung, lichtemissionsanalysevorrichtung und massenanalysevorrichtung mit der plasmaerzeugungsvorrichtung und vorrichtungsstatusauswertungsverfahren
US11961727B2 (en) * 2019-08-07 2024-04-16 Shimadzu Corporation Mass spectrometer and program for mass spectrometer
CN112823282B (zh) * 2019-08-29 2022-02-15 埃耶士株式会社 金属微粒的分析方法及感应耦合等离子体质量分析方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07123035B2 (ja) 1987-06-29 1995-12-25 横河電機株式会社 高周波誘導結合プラズマ・質量分析装置
JP2593587B2 (ja) * 1991-03-12 1997-03-26 株式会社日立製作所 プラズマイオン源極微量元素質量分析装置
JP3215487B2 (ja) * 1992-04-13 2001-10-09 セイコーインスツルメンツ株式会社 誘導結合プラズマ質量分析装置
JP3578518B2 (ja) * 1995-06-21 2004-10-20 横河アナリティカルシステムズ株式会社 質量分析装置におけるレンズパラメータの最適化方法及び最適化装置
JPH09129174A (ja) * 1995-10-31 1997-05-16 Hitachi Ltd 質量分析装置
JPH116788A (ja) 1997-06-17 1999-01-12 Yokogawa Analytical Syst Kk 溶液の自動調製方法及び自動調製装置
JP2000340168A (ja) * 1999-05-28 2000-12-08 Hitachi Ltd プラズマイオン源質量分析装置及びイオン源位置調整方法
US7119330B2 (en) * 2002-03-08 2006-10-10 Varian Australia Pty Ltd Plasma mass spectrometer
JP4903515B2 (ja) 2006-08-11 2012-03-28 アジレント・テクノロジーズ・インク 誘導結合プラズマ質量分析装置

Also Published As

Publication number Publication date
JP4822346B2 (ja) 2011-11-24
US20080099671A1 (en) 2008-05-01
CA2604685A1 (en) 2008-04-30
US7869968B2 (en) 2011-01-11
JP2008111744A (ja) 2008-05-15
DE102007046367A1 (de) 2008-05-15
DE102007046367B4 (de) 2014-05-22

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