CA2504369C - Processus de revetement electrolytique d'un moule pour coulee en continu - Google Patents
Processus de revetement electrolytique d'un moule pour coulee en continu Download PDFInfo
- Publication number
- CA2504369C CA2504369C CA002504369A CA2504369A CA2504369C CA 2504369 C CA2504369 C CA 2504369C CA 002504369 A CA002504369 A CA 002504369A CA 2504369 A CA2504369 A CA 2504369A CA 2504369 C CA2504369 C CA 2504369C
- Authority
- CA
- Canada
- Prior art keywords
- process according
- mould
- casting mould
- coating
- strand casting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000011248 coating agent Substances 0.000 title claims abstract description 53
- 238000000576 coating method Methods 0.000 title claims abstract description 53
- 238000000034 method Methods 0.000 title claims abstract description 43
- 238000009749 continuous casting Methods 0.000 title claims abstract description 34
- 239000000463 material Substances 0.000 claims abstract description 32
- 239000003792 electrolyte Substances 0.000 claims abstract description 26
- 238000005266 casting Methods 0.000 claims abstract description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 12
- 239000010949 copper Substances 0.000 claims description 12
- 229910052802 copper Inorganic materials 0.000 claims description 11
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 10
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 7
- 229910052804 chromium Inorganic materials 0.000 claims description 7
- 239000011651 chromium Substances 0.000 claims description 7
- 239000002131 composite material Substances 0.000 claims description 5
- 239000007769 metal material Substances 0.000 claims description 5
- 229910052759 nickel Inorganic materials 0.000 claims description 5
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 claims description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 4
- 239000004033 plastic Substances 0.000 claims description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 3
- 239000000919 ceramic Substances 0.000 claims description 3
- 239000010936 titanium Substances 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 2
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 claims description 2
- 239000005751 Copper oxide Substances 0.000 claims description 2
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 claims description 2
- 239000004411 aluminium Substances 0.000 claims description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 2
- 229910052782 aluminium Inorganic materials 0.000 claims description 2
- 229910010293 ceramic material Inorganic materials 0.000 claims description 2
- 229910052801 chlorine Inorganic materials 0.000 claims description 2
- 239000000460 chlorine Substances 0.000 claims description 2
- 229910000431 copper oxide Inorganic materials 0.000 claims description 2
- 230000005672 electromagnetic field Effects 0.000 claims description 2
- 229940098779 methanesulfonic acid Drugs 0.000 claims description 2
- 239000002245 particle Substances 0.000 claims description 2
- 230000000737 periodic effect Effects 0.000 claims description 2
- 229910052697 platinum Inorganic materials 0.000 claims description 2
- 238000005406 washing Methods 0.000 claims description 2
- 241000282337 Nasua nasua Species 0.000 abstract 1
- 238000007789 sealing Methods 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000003618 dip coating Methods 0.000 description 2
- 241000282326 Felis catus Species 0.000 description 1
- 241000206607 Porphyra umbilicalis Species 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000013019 agitation Methods 0.000 description 1
- 210000000988 bone and bone Anatomy 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- -1 for example Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/08—Electroplating with moving electrolyte e.g. jet electroplating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22D—CASTING OF METALS; CASTING OF OTHER SUBSTANCES BY THE SAME PROCESSES OR DEVICES
- B22D11/00—Continuous casting of metals, i.e. casting in indefinite lengths
- B22D11/04—Continuous casting of metals, i.e. casting in indefinite lengths into open-ended moulds
- B22D11/059—Mould materials or platings
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/10—Agitating of electrolytes; Moving of racks
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/04—Electroplating with moving electrodes
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/18—Electroplating using modulated, pulsed or reversing current
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/04—Tubes; Rings; Hollow bodies
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/10—Electrodes, e.g. composition, counter electrode
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Electroplating Methods And Accessories (AREA)
- Continuous Casting (AREA)
- Electrolytic Production Of Metals (AREA)
- Mold Materials And Core Materials (AREA)
Abstract
L'invention concerne un procédé d'enduction galvanique d'une coquille (2) pour la coulée continue, selon lequel les faces internes (4) de la coquille (2) pour la coulée continue formant une empreinte (3) sont recouvertes d'une matière d'enduction, afin de réaliser ou de recréer une cote nominale d'empreinte. A cet effet, la coquille (2) pour la coulée continue sert de cathode, une anode (7) est disposée dans l'empreinte (3) et la matière d'enduction se trouve dans un électrolyte (25). L'empreinte (3) de la coquille (2) est traversée de manière ciblée par l'électrolyte (25) servant de support pour la matière d'enduction. Lors de l'enduction galvanique, seules les faces internes de l'empreinte étant mises en contact avec l'électrolyte, il est inutile de recouvrir les faces externes de la coquille. Les propriétés mécaniques sont largement maintenues homogènes sur l'ensemble de la zone et l'enduction est plus rapide que selon les procédés traditionnels.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH8762002 | 2002-05-27 | ||
CH20020876/02 | 2002-05-27 | ||
PCT/EP2003/005238 WO2003099490A1 (fr) | 2002-05-27 | 2003-05-19 | Procede d'enduction galvanique d'une coquille pour la coulee continue |
Publications (2)
Publication Number | Publication Date |
---|---|
CA2504369A1 CA2504369A1 (fr) | 2003-12-04 |
CA2504369C true CA2504369C (fr) | 2008-11-18 |
Family
ID=29555531
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA002504369A Expired - Fee Related CA2504369C (fr) | 2002-05-27 | 2003-05-19 | Processus de revetement electrolytique d'un moule pour coulee en continu |
Country Status (13)
Country | Link |
---|---|
EP (1) | EP1507612B1 (fr) |
JP (1) | JP5008111B2 (fr) |
KR (1) | KR101082896B1 (fr) |
CN (1) | CN100335200C (fr) |
AU (1) | AU2003236679B2 (fr) |
BR (1) | BR0311374B1 (fr) |
CA (1) | CA2504369C (fr) |
ES (1) | ES2452727T3 (fr) |
MX (1) | MXPA04011734A (fr) |
PL (1) | PL206254B1 (fr) |
RU (1) | RU2318631C2 (fr) |
WO (1) | WO2003099490A1 (fr) |
ZA (1) | ZA200408991B (fr) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9307648B2 (en) | 2004-01-21 | 2016-04-05 | Microcontinuum, Inc. | Roll-to-roll patterning of transparent and metallic layers |
US7329334B2 (en) * | 2004-09-16 | 2008-02-12 | Herdman Roderick D | Controlling the hardness of electrodeposited copper coatings by variation of current profile |
EP1849181A4 (fr) * | 2005-01-21 | 2009-03-18 | Microcontinuum Inc | Outils de replication et appareil et procedes de fabrication correspondants |
EA008676B1 (ru) * | 2005-08-22 | 2007-06-29 | Республиканское Унитарное Предприятие "Белорусский Металлургический Завод" | Способ нанесения двухслойного гальванического покрытия на медные гильзы и плиты кристаллизаторов |
WO2007100849A2 (fr) | 2006-02-27 | 2007-09-07 | Microcontinuum, Inc. | Formation d'outils de reproduction de motifs |
DE102006037728A1 (de) * | 2006-08-11 | 2008-02-14 | Sms Demag Ag | Kokille zum Stranggießen von flüssigem Metall, insbesondere von Stahlwerkstoffen |
DE202009013126U1 (de) | 2009-09-29 | 2009-12-10 | Egon Evertz Kg (Gmbh & Co.) | Kokille zum Stranggießen |
US9589797B2 (en) | 2013-05-17 | 2017-03-07 | Microcontinuum, Inc. | Tools and methods for producing nanoantenna electronic devices |
CN107034497A (zh) * | 2017-04-28 | 2017-08-11 | 长安大学 | 一种用于油井管接箍内表面的电镀装置 |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS51116123A (en) * | 1975-04-04 | 1976-10-13 | Pioneer Electronic Corp | Electrocasting mold drawing method |
DE2936177A1 (de) * | 1979-09-07 | 1981-05-21 | Evertz, Egon, 5650 Solingen | Verfahren und vorrichtung zur behandlung von kokillenwaenden |
JPS5647592A (en) * | 1979-09-25 | 1981-04-30 | Satoosen:Kk | Plating method of inner surface of casting mold for continuous casting |
JPS5937704B2 (ja) * | 1980-06-02 | 1984-09-11 | 川崎製鉄株式会社 | 連続鋳造用鋳型の製造法 |
JPS60145247A (ja) * | 1983-12-29 | 1985-07-31 | Kawasaki Steel Corp | 連続鋳造用鋳型とその製造方法 |
JPS63104752A (ja) * | 1986-10-22 | 1988-05-10 | Sumitomo Metal Ind Ltd | 連続鋳造用鋳型の表面処理方法 |
JPH0222495A (ja) * | 1988-07-11 | 1990-01-25 | Mitsubishi Heavy Ind Ltd | 連続鋳造用モールドのメッキ方法 |
JPH02149696A (ja) * | 1988-11-30 | 1990-06-08 | Kawasaki Steel Corp | 電気めっきにおける板エッジ部でのめっき付着量の制御方法 |
JPH071086A (ja) * | 1993-06-15 | 1995-01-06 | Daido Steel Co Ltd | 銅製鋳造モールドの補修方法 |
JPH07118889A (ja) * | 1993-09-02 | 1995-05-09 | Yamaha Motor Co Ltd | めっき液、めっき方法及び内面めっきエンジンシリンダ |
US5516415A (en) * | 1993-11-16 | 1996-05-14 | Ontario Hydro | Process and apparatus for in situ electroforming a structural layer of metal bonded to an internal wall of a metal tube |
JP3333025B2 (ja) * | 1993-12-08 | 2002-10-07 | 日本パーカライジング株式会社 | 金属材料の電気複合めっき方法および装置 |
JPH07169714A (ja) * | 1993-12-15 | 1995-07-04 | Casio Comput Co Ltd | メッキ方法およびその装置 |
TW318320B (fr) * | 1995-08-07 | 1997-10-21 | Eltech Systems Corp | |
FR2750438B1 (fr) * | 1996-06-27 | 1998-08-07 | Usinor Sacilor | Procede et installation de revetement electrolytique par une couche metallique de la surface d'un cylindre pour coulee continue de bandes metalliques minces |
US6071398A (en) * | 1997-10-06 | 2000-06-06 | Learonal, Inc. | Programmed pulse electroplating process |
JP3375549B2 (ja) * | 1998-09-29 | 2003-02-10 | 本田技研工業株式会社 | 筒状部材の複合メッキ方法 |
FR2806098B1 (fr) * | 2000-03-09 | 2002-08-16 | Usinor | Dispositif d'electrodeposition d'une piece metallique annulaire de forme complexe |
-
2003
- 2003-05-19 JP JP2004507003A patent/JP5008111B2/ja not_active Expired - Fee Related
- 2003-05-19 ES ES03735416.4T patent/ES2452727T3/es not_active Expired - Lifetime
- 2003-05-19 BR BRPI0311374-4A patent/BR0311374B1/pt not_active IP Right Cessation
- 2003-05-19 CN CNB038124483A patent/CN100335200C/zh not_active Expired - Fee Related
- 2003-05-19 MX MXPA04011734A patent/MXPA04011734A/es active IP Right Grant
- 2003-05-19 AU AU2003236679A patent/AU2003236679B2/en not_active Ceased
- 2003-05-19 EP EP03735416.4A patent/EP1507612B1/fr not_active Expired - Lifetime
- 2003-05-19 CA CA002504369A patent/CA2504369C/fr not_active Expired - Fee Related
- 2003-05-19 WO PCT/EP2003/005238 patent/WO2003099490A1/fr active Application Filing
- 2003-05-19 RU RU2004138096/02A patent/RU2318631C2/ru not_active IP Right Cessation
- 2003-05-19 PL PL371684A patent/PL206254B1/pl unknown
- 2003-05-19 KR KR1020047019176A patent/KR101082896B1/ko not_active IP Right Cessation
-
2004
- 2004-11-05 ZA ZA200408991A patent/ZA200408991B/xx unknown
Also Published As
Publication number | Publication date |
---|---|
CN100335200C (zh) | 2007-09-05 |
KR20050004877A (ko) | 2005-01-12 |
JP2005527705A (ja) | 2005-09-15 |
CA2504369A1 (fr) | 2003-12-04 |
ZA200408991B (en) | 2007-08-29 |
KR101082896B1 (ko) | 2011-11-11 |
JP5008111B2 (ja) | 2012-08-22 |
MXPA04011734A (es) | 2005-11-04 |
PL371684A1 (en) | 2005-06-27 |
BR0311374B1 (pt) | 2011-08-23 |
WO2003099490A1 (fr) | 2003-12-04 |
EP1507612B1 (fr) | 2013-12-11 |
RU2004138096A (ru) | 2005-06-10 |
RU2318631C2 (ru) | 2008-03-10 |
CN1655893A (zh) | 2005-08-17 |
ES2452727T3 (es) | 2014-04-02 |
AU2003236679B2 (en) | 2008-08-28 |
AU2003236679A1 (en) | 2003-12-12 |
BR0311374A (pt) | 2005-03-15 |
PL206254B1 (pl) | 2010-07-30 |
EP1507612A1 (fr) | 2005-02-23 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US20060118427A1 (en) | Electrolyte bath for trivalent chromium plating | |
CA2504369C (fr) | Processus de revetement electrolytique d'un moule pour coulee en continu | |
US7560015B2 (en) | Process for electrolytic coating of a strand casting mould | |
US4935109A (en) | Double-cell electroplating apparatus and method | |
RU2281990C2 (ru) | Способ и установка для гальванического осаждения никеля, кобальта, сплавов никеля или сплавов кобальта с использованием периодических импульсов тока | |
CN110699713A (zh) | 一种无氰金合金电铸液及其使用方法 | |
CN1382232A (zh) | 用于电解处理相互分开的板材块和箔材块的可导电表面的方法和装置以及该方法的应用 | |
US2424173A (en) | Electrolytic production of alloy coatings | |
JPS59190383A (ja) | 高速部分めつき方法およびその装置 | |
EP2606163B1 (fr) | MÉTHODE D'AJUSTEMENT DE LA CONCENTRATION EN NICKEL ET DU pH D'UNE SOLUTION DE PLACAGE | |
JPS585983B2 (ja) | 無電解金属析出用に安定して金属錯化物を製造する方法及び装置 | |
US9279189B2 (en) | Methods for forming defect-free anodized parts | |
KR102232160B1 (ko) | 도금액 순환 기능을 갖는 무전해 Ni-P-PTFE용 도금장치 및 이를 이용한 도금방법 | |
CN210104118U (zh) | 一种电镀用铜离子补充装置 | |
EP0185091A1 (fr) | Procede d'electrodeposition d'un metal et d'un abrasif granulaire sur un outil | |
JPH0275448A (ja) | 連続鋳造用鋳型の製造方法 | |
RU2147324C1 (ru) | Устройство для микродугового оксидирования колодцев корпуса шестеренного насоса | |
US4916098A (en) | Process and apparatus for manufacturing an electrocatalytic electrode | |
KR200430588Y1 (ko) | 균일 도금을 위한 차폐유도판 | |
KR200353493Y1 (ko) | 균일두께의 도금층을 갖게 하는 전기도금장치 | |
JPH1060695A (ja) | 陰陽可逆式イオン供給法 | |
JPH11222700A (ja) | 合金メッキ浴に消費された金属イオンを供給する方法および装置 | |
KR20030035098A (ko) | 전기도금장치 및 그 방법 | |
KR20050094083A (ko) | 균일두께의 도금층을 갖게 하는 전기도금방법 및 그도금장치 | |
Petrović | Technology improvement of copper plating on the constituents of internal crusher gauges |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
EEER | Examination request | ||
MKLA | Lapsed |
Effective date: 20200831 |