CA2352088A1 - High numerical aperture catadioptric lens - Google Patents

High numerical aperture catadioptric lens Download PDF

Info

Publication number
CA2352088A1
CA2352088A1 CA002352088A CA2352088A CA2352088A1 CA 2352088 A1 CA2352088 A1 CA 2352088A1 CA 002352088 A CA002352088 A CA 002352088A CA 2352088 A CA2352088 A CA 2352088A CA 2352088 A1 CA2352088 A1 CA 2352088A1
Authority
CA
Canada
Prior art keywords
lens group
lens
reticle
beamsplitter
projection system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
CA002352088A
Other languages
English (en)
French (fr)
Inventor
David M. Williamson
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SVG Lithography Systems Inc
Original Assignee
SVG Lithography Systems Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SVG Lithography Systems Inc filed Critical SVG Lithography Systems Inc
Publication of CA2352088A1 publication Critical patent/CA2352088A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/18—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical projection, e.g. combination of mirror and condenser and objective
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
CA002352088A 2000-07-21 2001-07-04 High numerical aperture catadioptric lens Abandoned CA2352088A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/620,886 US6486940B1 (en) 2000-07-21 2000-07-21 High numerical aperture catadioptric lens
US09/620,886 2000-07-21

Publications (1)

Publication Number Publication Date
CA2352088A1 true CA2352088A1 (en) 2002-01-21

Family

ID=24487824

Family Applications (1)

Application Number Title Priority Date Filing Date
CA002352088A Abandoned CA2352088A1 (en) 2000-07-21 2001-07-04 High numerical aperture catadioptric lens

Country Status (6)

Country Link
US (1) US6486940B1 (US06486940-20021126-M00001.png)
EP (2) EP1174749B1 (US06486940-20021126-M00001.png)
JP (1) JP4236397B2 (US06486940-20021126-M00001.png)
KR (1) KR100751446B1 (US06486940-20021126-M00001.png)
CA (1) CA2352088A1 (US06486940-20021126-M00001.png)
DE (1) DE60131603T2 (US06486940-20021126-M00001.png)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117031695A (zh) * 2023-08-21 2023-11-10 东莞锐视光电科技有限公司 光刻镜头装置

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0989434B1 (en) * 1998-07-29 2006-11-15 Carl Zeiss SMT AG Catadioptric optical system and exposure apparatus having the same
US6661580B1 (en) * 2000-03-10 2003-12-09 Kla-Tencor Technologies Corporation High transmission optical inspection tools
TW575904B (en) * 2001-08-21 2004-02-11 Asml Us Inc Optical projection for microlithography
DE10210899A1 (de) 2002-03-08 2003-09-18 Zeiss Carl Smt Ag Refraktives Projektionsobjektiv für Immersions-Lithographie
US7551361B2 (en) * 2003-09-09 2009-06-23 Carl Zeiss Smt Ag Lithography lens system and projection exposure system provided with at least one lithography lens system of this type
US7712905B2 (en) 2004-04-08 2010-05-11 Carl Zeiss Smt Ag Imaging system with mirror group
US7511798B2 (en) * 2004-07-30 2009-03-31 Asml Holding N.V. Off-axis catadioptric projection optical system for lithography
WO2006078843A1 (en) * 2005-01-19 2006-07-27 Litel Instruments Method and apparatus for determination of source polarization matrix
US7324185B2 (en) 2005-03-04 2008-01-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8248577B2 (en) 2005-05-03 2012-08-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20070264581A1 (en) * 2006-05-09 2007-11-15 Schwarz Christian J Patterning masks and methods
US7799486B2 (en) * 2006-11-21 2010-09-21 Infineon Technologies Ag Lithography masks and methods of manufacture thereof
CN105467563B (zh) * 2014-09-11 2019-02-22 玉晶光电(厦门)有限公司 便携设备之小型窄视场光学成像镜头

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3917399A (en) 1974-10-02 1975-11-04 Tropel Catadioptric projection printer
US4896952A (en) 1988-04-22 1990-01-30 International Business Machines Corporation Thin film beamsplitter optical element for use in an image-forming lens system
US4953960A (en) 1988-07-15 1990-09-04 Williamson David M Optical reduction system
JP2913725B2 (ja) * 1990-01-31 1999-06-28 株式会社ニコン 露光装置
US5220454A (en) 1990-03-30 1993-06-15 Nikon Corporation Cata-dioptric reduction projection optical system
JP2847883B2 (ja) 1990-03-30 1999-01-20 株式会社ニコン 反射屈折縮小投影光学系
US5089913A (en) 1990-07-11 1992-02-18 International Business Machines Corporation High resolution reduction catadioptric relay lens
DE4203464B4 (de) 1991-02-08 2007-02-01 Carl Zeiss Smt Ag Katadioptrisches Reduktionsobjektiv
JP3235077B2 (ja) 1991-09-28 2001-12-04 株式会社ニコン 露光装置、該装置を用いた露光方法、及び該装置を用いた半導体素子製造方法
US5212593A (en) 1992-02-06 1993-05-18 Svg Lithography Systems, Inc. Broad band optical reduction system using matched multiple refractive element materials
US5317794A (en) * 1992-09-08 1994-06-07 Automated Label Systems Company Method of delabelling
US5537260A (en) 1993-01-26 1996-07-16 Svg Lithography Systems, Inc. Catadioptric optical reduction system with high numerical aperture
JPH06310400A (ja) * 1993-04-12 1994-11-04 Svg Lithography Syst Inc 軸上マスクとウェーハ直線配列システム
DE4417489A1 (de) * 1994-05-19 1995-11-23 Zeiss Carl Fa Höchstaperturiges katadioptrisches Reduktionsobjektiv für die Miktrolithographie
KR960002671A (ko) * 1994-06-20 1996-01-26 김주용 반도체 소자의 금속층간 절연막 형성방법
JPH08203806A (ja) * 1995-01-25 1996-08-09 Sony Corp 露光照明装置
JPH0969491A (ja) * 1995-08-31 1997-03-11 Canon Inc 投影光学系及びそれを用いた半導体デバイスの製造方法
EP1079253A4 (en) * 1998-04-07 2004-09-01 Nikon Corp DEVICE AND PROCESS FOR PROJECTION EXPOSURE, AND OPTICAL SYSTEM WITH REFLECTION AND REFRACTION

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117031695A (zh) * 2023-08-21 2023-11-10 东莞锐视光电科技有限公司 光刻镜头装置
CN117031695B (zh) * 2023-08-21 2024-02-09 东莞锐视光电科技有限公司 光刻镜头装置

Also Published As

Publication number Publication date
JP4236397B2 (ja) 2009-03-11
KR20020008756A (ko) 2002-01-31
DE60131603D1 (de) 2008-01-10
US6486940B1 (en) 2002-11-26
JP2002090626A (ja) 2002-03-27
EP1903370A1 (en) 2008-03-26
DE60131603T2 (de) 2008-04-10
EP1174749A2 (en) 2002-01-23
EP1174749B1 (en) 2007-11-28
EP1174749A3 (en) 2003-12-17
KR100751446B1 (ko) 2007-08-23

Similar Documents

Publication Publication Date Title
EP0554994B1 (en) Broad band optical reduction system using matched refractive materials
JP3636212B2 (ja) 反射屈折縮小光学系
JP3747958B2 (ja) 反射屈折光学系
JP4717974B2 (ja) 反射屈折光学系及び該光学系を備える投影露光装置
KR100876153B1 (ko) 비구면 요소를 갖는 투영 노출 렌즈 시스템
US5999333A (en) Exposure apparatus having catadioptric projection optical system
EP0465882A2 (en) High resolution reduction catadioptric relay lens
JPH04234722A (ja) 補償型光学システム
JP2003532281A (ja) 照明偏光の制御を備えた光学縮小システム
CA2352088A1 (en) High numerical aperture catadioptric lens
JPH1048526A (ja) 高分解能高光度対物レンズ
JP2003532282A (ja) レチクル回折誘起バイアスのない光学縮小システム
EP1579271A2 (en) Large-field unit-magnification projection system
US7119880B2 (en) Projection optical system, exposure apparatus, and device manufacturing method
JPH1184248A (ja) 反射屈折縮小光学系
JP2007508591A (ja) 反射屈折投影対物レンズ
JPH11326767A (ja) 反射屈折縮小光学系
US7283294B2 (en) Catadioptric projection optical system, exposure apparatus having the same, device fabrication method
WO1999025008A1 (fr) Dispositif d'exposition par projection, procede d'exposition par projection, et procede de fabrication d'un dispositif d'exposition par projection
JPH10308344A (ja) 反射屈折投影光学系
JPH11295606A (ja) 直筒型反射屈折光学系
JPH11295605A (ja) 直筒型反射屈折光学系
JPH04248556A (ja) 縮小投影露光装置

Legal Events

Date Code Title Description
FZDE Discontinued
FZDE Discontinued

Effective date: 20040705