CA2216296C - Methode de formation d'images pour la fabrication de microappareils - Google Patents
Methode de formation d'images pour la fabrication de microappareils Download PDFInfo
- Publication number
- CA2216296C CA2216296C CA002216296A CA2216296A CA2216296C CA 2216296 C CA2216296 C CA 2216296C CA 002216296 A CA002216296 A CA 002216296A CA 2216296 A CA2216296 A CA 2216296A CA 2216296 C CA2216296 C CA 2216296C
- Authority
- CA
- Canada
- Prior art keywords
- light source
- light
- pattern
- aperture
- stop
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3028631A JP2633091B2 (ja) | 1991-02-22 | 1991-02-22 | 像投影方法、回路製造方法及び投影露光装置 |
JP028631/1991 | 1991-02-22 | ||
JP3128446A JP2890892B2 (ja) | 1991-04-30 | 1991-04-30 | 露光装置及びそれを用いた素子製造方法 |
JP128446/1991 | 1991-04-30 | ||
CA002061499A CA2061499C (fr) | 1991-02-22 | 1992-02-19 | Methode d'imagerie pour la fabrication de microdispositifs |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA002061499A Division CA2061499C (fr) | 1991-02-22 | 1992-02-19 | Methode d'imagerie pour la fabrication de microdispositifs |
Publications (2)
Publication Number | Publication Date |
---|---|
CA2216296A1 CA2216296A1 (fr) | 1992-08-23 |
CA2216296C true CA2216296C (fr) | 2003-04-15 |
Family
ID=27169025
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA002216296A Expired - Lifetime CA2216296C (fr) | 1991-02-22 | 1992-02-19 | Methode de formation d'images pour la fabrication de microappareils |
Country Status (1)
Country | Link |
---|---|
CA (1) | CA2216296C (fr) |
-
1992
- 1992-02-19 CA CA002216296A patent/CA2216296C/fr not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
CA2216296A1 (fr) | 1992-08-23 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
EEER | Examination request | ||
MKEX | Expiry |