CA2184054A1 - Optical device assembly for optical isolator and production method thereof - Google Patents
Optical device assembly for optical isolator and production method thereofInfo
- Publication number
- CA2184054A1 CA2184054A1 CA002184054A CA2184054A CA2184054A1 CA 2184054 A1 CA2184054 A1 CA 2184054A1 CA 002184054 A CA002184054 A CA 002184054A CA 2184054 A CA2184054 A CA 2184054A CA 2184054 A1 CA2184054 A1 CA 2184054A1
- Authority
- CA
- Canada
- Prior art keywords
- optical
- material plate
- device assembly
- analyzer
- faraday rotator
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 355
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 35
- 239000000463 material Substances 0.000 claims abstract description 287
- 238000005476 soldering Methods 0.000 claims abstract description 79
- 238000000034 method Methods 0.000 claims abstract description 53
- 230000000712 assembly Effects 0.000 claims abstract description 13
- 238000000429 assembly Methods 0.000 claims abstract description 13
- 239000011104 metalized film Substances 0.000 claims description 116
- 238000005520 cutting process Methods 0.000 claims description 36
- 239000002184 metal Substances 0.000 claims description 31
- 229910052751 metal Inorganic materials 0.000 claims description 31
- 239000003795 chemical substances by application Substances 0.000 claims description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 7
- 239000006087 Silane Coupling Agent Substances 0.000 claims description 5
- 230000005540 biological transmission Effects 0.000 claims description 4
- 238000002360 preparation method Methods 0.000 claims description 4
- 239000013078 crystal Substances 0.000 description 18
- 239000010408 film Substances 0.000 description 16
- 239000010410 layer Substances 0.000 description 15
- 230000000052 comparative effect Effects 0.000 description 13
- 229910000679 solder Inorganic materials 0.000 description 13
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N titanium dioxide Inorganic materials O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 10
- 239000000853 adhesive Substances 0.000 description 9
- 230000001070 adhesive effect Effects 0.000 description 9
- 238000005219 brazing Methods 0.000 description 9
- 238000010438 heat treatment Methods 0.000 description 9
- 239000000126 substance Substances 0.000 description 9
- 239000000843 powder Substances 0.000 description 8
- 230000000694 effects Effects 0.000 description 7
- 238000004544 sputter deposition Methods 0.000 description 7
- 239000007822 coupling agent Substances 0.000 description 6
- 239000002223 garnet Substances 0.000 description 6
- 229910015363 Au—Sn Inorganic materials 0.000 description 5
- 229910045601 alloy Inorganic materials 0.000 description 5
- 239000000956 alloy Substances 0.000 description 5
- 238000004140 cleaning Methods 0.000 description 5
- 238000004891 communication Methods 0.000 description 5
- 239000000498 cooling water Substances 0.000 description 5
- 239000000428 dust Substances 0.000 description 5
- 238000003780 insertion Methods 0.000 description 5
- 230000037431 insertion Effects 0.000 description 5
- 238000012986 modification Methods 0.000 description 5
- 230000004048 modification Effects 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 230000009471 action Effects 0.000 description 4
- 239000007791 liquid phase Substances 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- 125000004432 carbon atom Chemical group C* 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 229910052697 platinum Inorganic materials 0.000 description 3
- 239000005871 repellent Substances 0.000 description 3
- 238000001771 vacuum deposition Methods 0.000 description 3
- NJXPYZHXZZCTNI-UHFFFAOYSA-N 3-aminobenzonitrile Chemical compound NC1=CC=CC(C#N)=C1 NJXPYZHXZZCTNI-UHFFFAOYSA-N 0.000 description 2
- 229910020220 Pb—Sn Inorganic materials 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 229910052681 coesite Inorganic materials 0.000 description 2
- 238000012733 comparative method Methods 0.000 description 2
- 229910052906 cristobalite Inorganic materials 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 229910052682 stishovite Inorganic materials 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 229910052905 tridymite Inorganic materials 0.000 description 2
- 229910017401 Au—Ge Inorganic materials 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/09—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on magneto-optical elements, e.g. exhibiting Faraday effect
- G02F1/093—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on magneto-optical elements, e.g. exhibiting Faraday effect used as non-reciprocal devices, e.g. optical isolators, circulators
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Nonlinear Science (AREA)
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
Applications Claiming Priority (10)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP338571/94 | 1994-12-27 | ||
| JP33857194A JP3439279B2 (ja) | 1994-12-27 | 1994-12-27 | 光アイソレータの製造方法 |
| JP94451/95 | 1995-03-27 | ||
| JP09445195A JP3556010B2 (ja) | 1995-03-27 | 1995-03-27 | 光アイソレータ |
| JP17922495A JPH0933859A (ja) | 1995-07-14 | 1995-07-14 | 光アイソレータおよびその光学素子の製造方法 |
| JP179224/95 | 1995-07-14 | ||
| JP26938895A JP3582913B2 (ja) | 1995-09-21 | 1995-09-21 | 光アイソレータの製造方法 |
| JP269388/95 | 1995-09-21 | ||
| JP337260/95 | 1995-12-25 | ||
| JP33726095A JPH09179068A (ja) | 1995-12-25 | 1995-12-25 | 光アイソレータ用光学素子組立体の製造方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA2184054A1 true CA2184054A1 (en) | 1996-07-04 |
Family
ID=27525700
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA002184054A Abandoned CA2184054A1 (en) | 1994-12-27 | 1995-12-27 | Optical device assembly for optical isolator and production method thereof |
Country Status (6)
| Country | Link |
|---|---|
| EP (1) | EP0747747B1 (enExample) |
| KR (1) | KR100286956B1 (enExample) |
| CN (1) | CN1146245A (enExample) |
| CA (1) | CA2184054A1 (enExample) |
| DE (1) | DE69503039T2 (enExample) |
| WO (1) | WO1996020423A1 (enExample) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5808793A (en) * | 1996-01-17 | 1998-09-15 | Hewlett-Packard Company | Low-cost compact optical isolators |
| KR101603135B1 (ko) * | 2011-02-10 | 2016-03-14 | 휴렛-팩커드 디벨롭먼트 컴퍼니, 엘.피. | 격자 기반 편광자 및 광학 아이솔레이터 |
| CN102707461B (zh) * | 2012-05-31 | 2015-03-04 | 福建华科光电有限公司 | 偏振无关光学隔离器的制造方法、光学件键合工艺和溶液 |
| CN105974615A (zh) * | 2016-07-11 | 2016-09-28 | 武汉优信光通信设备有限责任公司 | 光路无胶自由空间隔离器的制造方法 |
| CN108015412A (zh) * | 2016-11-01 | 2018-05-11 | 福州高意光学有限公司 | 一种光学元件与基片的粘接方法 |
| EP3874305B1 (en) * | 2018-10-30 | 2023-09-20 | Magic Leap, Inc. | Polymer eyepiece assemblies for augmented and mixed reality systems |
| CN117680802B (zh) * | 2024-01-11 | 2024-05-10 | 贵州永红航空机械有限责任公司 | 钛合金微通道换热器制备方法 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03179317A (ja) * | 1989-12-07 | 1991-08-05 | Namiki Precision Jewel Co Ltd | 光アイソレータ用ファラデー回転子及びそのメタライズ法 |
| JPH04338916A (ja) * | 1990-08-06 | 1992-11-26 | Kyocera Corp | 光アイソレータ用素子及び該光アイソレータ用素子を用いた光アイソレータ，半導体レーザモジュール |
| JP2697354B2 (ja) * | 1991-05-10 | 1998-01-14 | 日本電気株式会社 | 光アイソレータの製造方法 |
| JP3413219B2 (ja) * | 1992-07-20 | 2003-06-03 | エヌイーシートーキン株式会社 | 光アイソレータ用光学素子の接着方法 |
| JP3439275B2 (ja) * | 1994-11-25 | 2003-08-25 | エヌイーシートーキン株式会社 | 光アイソレータの製造方法 |
-
1995
- 1995-12-27 CN CN95192601A patent/CN1146245A/zh active Pending
- 1995-12-27 DE DE69503039T patent/DE69503039T2/de not_active Expired - Fee Related
- 1995-12-27 KR KR1019960704694A patent/KR100286956B1/ko not_active Expired - Fee Related
- 1995-12-27 CA CA002184054A patent/CA2184054A1/en not_active Abandoned
- 1995-12-27 EP EP95942297A patent/EP0747747B1/en not_active Expired - Lifetime
- 1995-12-27 WO PCT/JP1995/002740 patent/WO1996020423A1/ja not_active Ceased
Also Published As
| Publication number | Publication date |
|---|---|
| KR100286956B1 (ko) | 2001-04-16 |
| EP0747747A4 (enExample) | 1996-12-18 |
| EP0747747B1 (en) | 1998-06-17 |
| WO1996020423A1 (fr) | 1996-07-04 |
| DE69503039D1 (de) | 1998-07-23 |
| EP0747747A1 (en) | 1996-12-11 |
| DE69503039T2 (de) | 1998-11-19 |
| CN1146245A (zh) | 1997-03-26 |
| KR970701364A (ko) | 1997-03-17 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EEER | Examination request | ||
| FZDE | Dead |