CA2120537A1 - Megasonic cleaning system using compressed, condensed gases - Google Patents
Megasonic cleaning system using compressed, condensed gasesInfo
- Publication number
- CA2120537A1 CA2120537A1 CA002120537A CA2120537A CA2120537A1 CA 2120537 A1 CA2120537 A1 CA 2120537A1 CA 002120537 A CA002120537 A CA 002120537A CA 2120537 A CA2120537 A CA 2120537A CA 2120537 A1 CA2120537 A1 CA 2120537A1
- Authority
- CA
- Canada
- Prior art keywords
- substrate
- gas
- chamber
- undesired
- carbon dioxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 238000004140 cleaning Methods 0.000 title claims abstract description 60
- 239000007789 gas Substances 0.000 title claims abstract description 40
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims abstract description 64
- 229910002092 carbon dioxide Inorganic materials 0.000 claims abstract description 49
- 239000007788 liquid Substances 0.000 claims abstract description 41
- 239000001569 carbon dioxide Substances 0.000 claims abstract description 32
- 238000000034 method Methods 0.000 claims abstract description 32
- 230000008569 process Effects 0.000 claims abstract description 25
- 239000000758 substrate Substances 0.000 claims abstract description 25
- 239000000203 mixture Substances 0.000 claims abstract description 15
- 239000003607 modifier Substances 0.000 claims abstract description 14
- 229910018503 SF6 Inorganic materials 0.000 claims abstract description 5
- SFZCNBIFKDRMGX-UHFFFAOYSA-N sulfur hexafluoride Chemical compound FS(F)(F)(F)(F)F SFZCNBIFKDRMGX-UHFFFAOYSA-N 0.000 claims abstract description 5
- 229960000909 sulfur hexafluoride Drugs 0.000 claims abstract description 5
- 229910052724 xenon Inorganic materials 0.000 claims abstract description 3
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 claims abstract description 3
- 239000000356 contaminant Substances 0.000 claims description 34
- 239000012530 fluid Substances 0.000 claims description 29
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 claims description 9
- 239000000463 material Substances 0.000 claims description 5
- 230000008093 supporting effect Effects 0.000 claims description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 5
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 claims description 4
- 230000002452 interceptive effect Effects 0.000 claims description 2
- 229960004592 isopropanol Drugs 0.000 claims description 2
- 239000003350 kerosene Substances 0.000 claims description 2
- -1 ni-trous oxide Chemical compound 0.000 claims description 2
- 229910052757 nitrogen Inorganic materials 0.000 claims description 2
- GQPLMRYTRLFLPF-UHFFFAOYSA-N Nitrous Oxide Chemical compound [O-][N+]#N GQPLMRYTRLFLPF-UHFFFAOYSA-N 0.000 abstract description 5
- 239000001272 nitrous oxide Substances 0.000 abstract description 2
- 239000002245 particle Substances 0.000 description 8
- 239000002904 solvent Substances 0.000 description 8
- 238000000527 sonication Methods 0.000 description 7
- 231100000252 nontoxic Toxicity 0.000 description 6
- 230000003000 nontoxic effect Effects 0.000 description 6
- 238000011109 contamination Methods 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- 230000008859 change Effects 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- 150000002500 ions Chemical class 0.000 description 3
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- 241001237728 Precis Species 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 230000001276 controlling effect Effects 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000011049 filling Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 238000010926 purge Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000004506 ultrasonic cleaning Methods 0.000 description 2
- 235000012431 wafers Nutrition 0.000 description 2
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- 241000905957 Channa melasoma Species 0.000 description 1
- VOPWNXZWBYDODV-UHFFFAOYSA-N Chlorodifluoromethane Chemical compound FC(F)Cl VOPWNXZWBYDODV-UHFFFAOYSA-N 0.000 description 1
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- 244000228957 Ferula foetida Species 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 240000004543 Vicia ervilia Species 0.000 description 1
- 239000000908 ammonium hydroxide Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000001273 butane Substances 0.000 description 1
- 239000011365 complex material Substances 0.000 description 1
- 230000006837 decompression Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000000383 hazardous chemical Substances 0.000 description 1
- 239000002920 hazardous waste Substances 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 229910052743 krypton Inorganic materials 0.000 description 1
- DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- QYSGYZVSCZSLHT-UHFFFAOYSA-N octafluoropropane Chemical compound FC(F)(F)C(F)(F)C(F)(F)F QYSGYZVSCZSLHT-UHFFFAOYSA-N 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 229960004065 perflutren Drugs 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000002285 radioactive effect Effects 0.000 description 1
- 230000003134 recirculating effect Effects 0.000 description 1
- 230000001172 regenerating effect Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 239000003440 toxic substance Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
- B08B7/0021—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by liquid gases or supercritical fluids
-
- D—TEXTILES; PAPER
- D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
- D06F—LAUNDERING, DRYING, IRONING, PRESSING OR FOLDING TEXTILE ARTICLES
- D06F19/00—Washing machines using vibrations for washing purposes
-
- D—TEXTILES; PAPER
- D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
- D06F—LAUNDERING, DRYING, IRONING, PRESSING OR FOLDING TEXTILE ARTICLES
- D06F43/00—Dry-cleaning apparatus or methods using volatile solvents
- D06F43/08—Associated apparatus for handling and recovering the solvents
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/26—Cleaning or polishing of the conductive pattern
Landscapes
- Engineering & Computer Science (AREA)
- Textile Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US4468493A | 1993-04-12 | 1993-04-12 | |
| US044,684 | 1993-04-12 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA2120537A1 true CA2120537A1 (en) | 1994-10-13 |
Family
ID=21933740
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA002120537A Abandoned CA2120537A1 (en) | 1993-04-12 | 1994-04-05 | Megasonic cleaning system using compressed, condensed gases |
Country Status (5)
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106513376A (zh) * | 2016-10-31 | 2017-03-22 | 辽宁工程技术大学 | 超声波清洗方法及装置 |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19509573C2 (de) | 1995-03-16 | 1998-07-16 | Linde Ag | Reinigung mit flüssigem Kohlendioxid |
| US5881577A (en) * | 1996-09-09 | 1999-03-16 | Air Liquide America Corporation | Pressure-swing absorption based cleaning methods and systems |
| EP0893166A4 (en) * | 1996-09-25 | 2004-11-10 | Shuzurifuresher Kaihatsukyodok | WASHING SYSTEM USING LIQUID, HIGH DENSITY GAS |
| US6880560B2 (en) * | 2002-11-18 | 2005-04-19 | Techsonic | Substrate processing apparatus for processing substrates using dense phase gas and sonic waves |
| KR101214321B1 (ko) * | 2004-06-14 | 2012-12-21 | 가스 터빈 이피션시 에이비 | 엔진 세척으로부터의 폐 액체를 수집하여 처리하는 수집 장치 및 이동 카트 |
| CN102489478A (zh) * | 2011-12-29 | 2012-06-13 | 镇江市港南电子有限公司 | 一种硅片清洗方法 |
| JP6979852B2 (ja) * | 2017-10-26 | 2021-12-15 | 株式会社Ｓｃｒｅｅｎホールディングス | 処理液供給装置、基板処理装置、および処理液供給方法 |
| CN110201654B (zh) * | 2019-07-11 | 2024-04-09 | 国家电网有限公司 | 基于超声空化效应的六氟化硫吸附剂回收处理系统及方法 |
| CN117711991A (zh) * | 2024-02-05 | 2024-03-15 | 苏州智程半导体科技股份有限公司 | 一种晶圆槽式清洗设备 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4618263A (en) * | 1982-09-22 | 1986-10-21 | Mccord James W | Sound suppressor in a liquid medium |
| US5213619A (en) * | 1989-11-30 | 1993-05-25 | Jackson David P | Processes for cleaning, sterilizing, and implanting materials using high energy dense fluids |
| JPH03190131A (ja) * | 1989-12-19 | 1991-08-20 | Iwatani Internatl Corp | 半導体基板の洗浄装置 |
| JPH05182943A (ja) * | 1991-12-27 | 1993-07-23 | Idemitsu Kosan Co Ltd | 基板の処理方法および処理装置 |
| US5316591A (en) * | 1992-08-10 | 1994-05-31 | Hughes Aircraft Company | Cleaning by cavitation in liquefied gas |
| US5279316A (en) * | 1992-08-18 | 1994-01-18 | P.C.T. Systems, Inc. | Multiprocessing sonic bath system for semiconductor wafers |
-
1994
- 1994-04-05 CA CA002120537A patent/CA2120537A1/en not_active Abandoned
- 1994-04-08 DE DE69401980T patent/DE69401980T2/de not_active Expired - Lifetime
- 1994-04-08 EP EP94105507A patent/EP0624405B1/en not_active Expired - Lifetime
- 1994-04-08 TW TW083103101A patent/TW262402B/zh active
- 1994-04-12 JP JP6073273A patent/JP2857054B2/ja not_active Expired - Lifetime
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106513376A (zh) * | 2016-10-31 | 2017-03-22 | 辽宁工程技术大学 | 超声波清洗方法及装置 |
| CN106513376B (zh) * | 2016-10-31 | 2022-05-31 | 辽宁工程技术大学 | 超声波清洗方法及装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0751645A (ja) | 1995-02-28 |
| DE69401980D1 (de) | 1997-04-17 |
| DE69401980T2 (de) | 1997-11-20 |
| TW262402B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1995-11-11 |
| JP2857054B2 (ja) | 1999-02-10 |
| EP0624405B1 (en) | 1997-03-12 |
| EP0624405A1 (en) | 1994-11-17 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EEER | Examination request | ||
| FZDE | Dead |