CA2050265A1 - Fluide electrorheologique homogene - Google Patents
Fluide electrorheologique homogeneInfo
- Publication number
- CA2050265A1 CA2050265A1 CA2050265A CA2050265A CA2050265A1 CA 2050265 A1 CA2050265 A1 CA 2050265A1 CA 2050265 A CA2050265 A CA 2050265A CA 2050265 A CA2050265 A CA 2050265A CA 2050265 A1 CA2050265 A1 CA 2050265A1
- Authority
- CA
- Canada
- Prior art keywords
- fluid
- electrorhelogical
- homogeneous
- liquid crystal
- sedimentation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K19/00—Liquid crystal materials
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K19/00—Liquid crystal materials
- C09K19/04—Liquid crystal materials characterised by the chemical structure of the liquid crystal components, e.g. by a specific unit
- C09K19/40—Liquid crystal materials characterised by the chemical structure of the liquid crystal components, e.g. by a specific unit containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen or sulfur, e.g. silicon, metals
- C09K19/406—Liquid crystal materials characterised by the chemical structure of the liquid crystal components, e.g. by a specific unit containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen or sulfur, e.g. silicon, metals containing silicon
- C09K19/408—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
- C10M171/00—Lubricating compositions characterised by purely physical criteria, e.g. containing as base-material, thickener or additive, ingredients which are characterised exclusively by their numerically specified physical properties, i.e. containing ingredients which are physically well-defined but for which the chemical nature is either unspecified or only very vaguely indicated
- C10M171/001—Electrorheological fluids; smart fluids
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP02-226653 | 1990-08-30 | ||
JP22665390 | 1990-08-30 | ||
JP03-26283 | 1991-02-20 | ||
JP3026283A JPH04266997A (ja) | 1991-02-20 | 1991-02-20 | 均一系の電気粘性流体 |
JP03-27371 | 1991-02-21 | ||
JP2737191 | 1991-02-21 |
Publications (2)
Publication Number | Publication Date |
---|---|
CA2050265A1 true CA2050265A1 (fr) | 1992-03-01 |
CA2050265C CA2050265C (fr) | 1999-10-05 |
Family
ID=27285342
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA002050265A Expired - Fee Related CA2050265C (fr) | 1990-08-30 | 1991-08-29 | Fluide electrorheologique homogene |
Country Status (6)
Country | Link |
---|---|
US (2) | US5354489A (fr) |
EP (3) | EP0657525B1 (fr) |
KR (2) | KR950010168B1 (fr) |
AT (3) | ATE130359T1 (fr) |
CA (1) | CA2050265C (fr) |
DE (3) | DE69127213T2 (fr) |
Families Citing this family (49)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5387370A (en) * | 1991-07-24 | 1995-02-07 | Tonen Corporation | Electroviscous fluid |
US5308525A (en) * | 1991-11-20 | 1994-05-03 | Dow Corning Toray Silicone Co., Ltd. | Electroviscous fluid comprising a base neutralized carboxyaryl group-containing organopolysiloxane polyelectrolyte |
US5702630A (en) * | 1992-07-16 | 1997-12-30 | Nippon Oil Company, Ltd. | Fluid having both magnetic and electrorheological characteristics |
EP0579229B1 (fr) * | 1992-07-16 | 1998-09-30 | Nippon Oil Company, Ltd. | Huile ayant des effets magnétiques et électrorheologues simultanément |
DE69315030D1 (de) * | 1992-08-07 | 1997-12-11 | Fujikura Kasei Kk | Elektrosensitive Zusammensetzung |
GB9301895D0 (en) * | 1993-01-30 | 1993-03-17 | Dow Corning | Liquid crystal siloxanes and device elements |
GB9301883D0 (en) * | 1993-01-30 | 1993-03-17 | Dow Corning | Liquid crystal siloxanes and device elements |
DE69407476T2 (de) * | 1993-05-21 | 1998-04-16 | Nippon Oil Co Ltd | Elektrorheologische Flüssigkeit |
US5460748A (en) * | 1993-06-02 | 1995-10-24 | Nippon Oil Company, Limited | Liquid crystalline polymer film, process for producing same, and utilization thereof |
GB9318776D0 (en) * | 1993-09-10 | 1993-10-27 | Dow Corning | Liquid crystal devices |
JPH07238290A (ja) * | 1994-03-01 | 1995-09-12 | Nippon Oil Co Ltd | 電気粘性流体 |
US5498358A (en) * | 1994-04-29 | 1996-03-12 | Akzo Nobel N.V. | Lubricant containing oligomer with flexible and mesogenic segments |
KR0129664Y1 (ko) * | 1994-06-30 | 1999-01-15 | 김광호 | 로보트의 방진장치 |
JPH08210240A (ja) * | 1994-07-27 | 1996-08-20 | Fujikura Kasei Co Ltd | アクチュエータ |
JPH09255982A (ja) * | 1996-03-26 | 1997-09-30 | Nippon Oil Co Ltd | 電気粘性流体 |
US6172720B1 (en) | 1997-05-23 | 2001-01-09 | Kent Displays Incorporated | Low viscosity liquid crystal material |
US6366330B1 (en) | 1997-05-23 | 2002-04-02 | Kent Displays Incorporated | Cholesteric liquid crystal display that prevents image sticking |
DE19917014B4 (de) * | 1999-04-15 | 2006-12-14 | Voith Turbo Gmbh & Co. Kg | Schwingungsdämpfer |
AU1251101A (en) * | 1999-09-09 | 2001-04-10 | Rutgers, The State Of University Of New Jersey | Remote mechanical mirroring using controlled stiffness and actuators (memica) |
US6484566B1 (en) | 2000-05-18 | 2002-11-26 | Rheologics, Inc. | Electrorheological and magnetorheological fluid scanning rheometer |
DE10108533C2 (de) * | 2001-02-22 | 2003-09-25 | Schenck Ag Carl | Drehmomentwandler auf Basis elektrorheologischer und/oder magnetorheologischer Flüssigkeiten |
US6827822B2 (en) * | 2001-11-09 | 2004-12-07 | Temple University Of The Commonwealth System Of Higher Education | Method and apparatus for increasing and modulating the yield shear stress of electrorheological fluids |
US6802404B1 (en) | 2003-09-25 | 2004-10-12 | Tenneco Automotive Operating Company Inc. | Electro-rheological or magneto-rheological controlled hydraulic restriction |
WO2005090364A1 (fr) * | 2004-02-27 | 2005-09-29 | Toray Industries, Inc. | Compose de silicium et son procede de fabrication |
US20050274455A1 (en) * | 2004-06-09 | 2005-12-15 | Extrand Charles W | Electro-active adhesive systems |
US8394483B2 (en) | 2007-01-24 | 2013-03-12 | Micron Technology, Inc. | Two-dimensional arrays of holes with sub-lithographic diameters formed by block copolymer self-assembly |
US8083953B2 (en) | 2007-03-06 | 2011-12-27 | Micron Technology, Inc. | Registered structure formation via the application of directed thermal energy to diblock copolymer films |
US8557128B2 (en) * | 2007-03-22 | 2013-10-15 | Micron Technology, Inc. | Sub-10 nm line features via rapid graphoepitaxial self-assembly of amphiphilic monolayers |
US8294139B2 (en) | 2007-06-21 | 2012-10-23 | Micron Technology, Inc. | Multilayer antireflection coatings, structures and devices including the same and methods of making the same |
US7959975B2 (en) * | 2007-04-18 | 2011-06-14 | Micron Technology, Inc. | Methods of patterning a substrate |
US8097175B2 (en) | 2008-10-28 | 2012-01-17 | Micron Technology, Inc. | Method for selectively permeating a self-assembled block copolymer, method for forming metal oxide structures, method for forming a metal oxide pattern, and method for patterning a semiconductor structure |
US8372295B2 (en) | 2007-04-20 | 2013-02-12 | Micron Technology, Inc. | Extensions of self-assembled structures to increased dimensions via a “bootstrap” self-templating method |
US8404124B2 (en) * | 2007-06-12 | 2013-03-26 | Micron Technology, Inc. | Alternating self-assembling morphologies of diblock copolymers controlled by variations in surfaces |
US8080615B2 (en) | 2007-06-19 | 2011-12-20 | Micron Technology, Inc. | Crosslinkable graft polymer non-preferentially wetted by polystyrene and polyethylene oxide |
US8999492B2 (en) | 2008-02-05 | 2015-04-07 | Micron Technology, Inc. | Method to produce nanometer-sized features with directed assembly of block copolymers |
US8101261B2 (en) | 2008-02-13 | 2012-01-24 | Micron Technology, Inc. | One-dimensional arrays of block copolymer cylinders and applications thereof |
US7981221B2 (en) * | 2008-02-21 | 2011-07-19 | Micron Technology, Inc. | Rheological fluids for particle removal |
US8426313B2 (en) | 2008-03-21 | 2013-04-23 | Micron Technology, Inc. | Thermal anneal of block copolymer films with top interface constrained to wet both blocks with equal preference |
US8425982B2 (en) * | 2008-03-21 | 2013-04-23 | Micron Technology, Inc. | Methods of improving long range order in self-assembly of block copolymer films with ionic liquids |
US8114300B2 (en) | 2008-04-21 | 2012-02-14 | Micron Technology, Inc. | Multi-layer method for formation of registered arrays of cylindrical pores in polymer films |
US8114301B2 (en) | 2008-05-02 | 2012-02-14 | Micron Technology, Inc. | Graphoepitaxial self-assembly of arrays of downward facing half-cylinders |
US8304493B2 (en) | 2010-08-20 | 2012-11-06 | Micron Technology, Inc. | Methods of forming block copolymers |
DE102011018177A1 (de) | 2011-04-19 | 2012-10-25 | Raino Petricevic | Paste und deren Verwendung |
US8900963B2 (en) | 2011-11-02 | 2014-12-02 | Micron Technology, Inc. | Methods of forming semiconductor device structures, and related structures |
DE102012004586A1 (de) | 2012-03-09 | 2013-09-12 | Fludicon Gmbh | Elektrorheologische Zusammensetzung |
US9087699B2 (en) | 2012-10-05 | 2015-07-21 | Micron Technology, Inc. | Methods of forming an array of openings in a substrate, and related methods of forming a semiconductor device structure |
US9229328B2 (en) | 2013-05-02 | 2016-01-05 | Micron Technology, Inc. | Methods of forming semiconductor device structures, and related semiconductor device structures |
US9177795B2 (en) | 2013-09-27 | 2015-11-03 | Micron Technology, Inc. | Methods of forming nanostructures including metal oxides |
CN111454761B (zh) * | 2020-04-23 | 2022-02-08 | 中国科学院上海高等研究院 | 具有烷基端链的有机液晶摩擦改进剂及其制备方法 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3119459A1 (de) * | 1981-05-15 | 1982-12-09 | Consortium für elektrochemische Industrie GmbH, 8000 München | Fluessig-kristalline eigenschaften aufweisende, vernetzte organopolysiloxane |
GB8615527D0 (en) * | 1986-06-25 | 1986-07-30 | Secr Defence | Liquid crystal polymers |
GB2208515B (en) * | 1987-05-15 | 1990-12-19 | Gen Electric Co Plc | Electro-rheological fluid materials |
JP2710779B2 (ja) * | 1987-06-03 | 1998-02-10 | 株式会社クラレ | 高分子液晶化合物への電場印加方法 |
JPH01271431A (ja) * | 1988-04-22 | 1989-10-30 | Toray Dow Corning Silicone Co Ltd | 液晶性オルガノポリシロキサン及びその製造方法 |
US5266229A (en) * | 1988-05-12 | 1993-11-30 | Tonen Corporation | Stable electro-rheological fluid having a high viscosity-increasing effect |
JPH0618882B2 (ja) * | 1988-10-24 | 1994-03-16 | 信越化学工業株式会社 | 液晶相を有するオルガノポリシロキサン化合物 |
JPH02127494A (ja) * | 1988-11-08 | 1990-05-16 | Chisato Kajiyama | 液晶性組成物 |
JPH02193115A (ja) * | 1989-01-23 | 1990-07-30 | Chisato Kajiyama | 情報記録媒体 |
EP0400654B1 (fr) * | 1989-06-02 | 1996-01-17 | Idemitsu Kosan Company Limited | Méthode et appareil pour orienter un matériau cristal liquide et dispositif à cristal liquide ainsi orienté |
US5032307A (en) * | 1990-04-11 | 1991-07-16 | Lord Corporation | Surfactant-based electrorheological materials |
JPH07238290A (ja) * | 1994-03-01 | 1995-09-12 | Nippon Oil Co Ltd | 電気粘性流体 |
-
1991
- 1991-08-28 US US07/751,052 patent/US5354489A/en not_active Expired - Lifetime
- 1991-08-29 DE DE69127213T patent/DE69127213T2/de not_active Expired - Fee Related
- 1991-08-29 DE DE69128156T patent/DE69128156T2/de not_active Expired - Fee Related
- 1991-08-29 AT AT91202199T patent/ATE130359T1/de not_active IP Right Cessation
- 1991-08-29 EP EP95200314A patent/EP0657525B1/fr not_active Expired - Lifetime
- 1991-08-29 CA CA002050265A patent/CA2050265C/fr not_active Expired - Fee Related
- 1991-08-29 AT AT95200315T patent/ATE156512T1/de not_active IP Right Cessation
- 1991-08-29 EP EP95200315A patent/EP0657526B1/fr not_active Expired - Lifetime
- 1991-08-29 AT AT95200314T patent/ATE159979T1/de not_active IP Right Cessation
- 1991-08-29 EP EP91202199A patent/EP0478034B1/fr not_active Expired - Lifetime
- 1991-08-29 DE DE69114651T patent/DE69114651T2/de not_active Expired - Fee Related
- 1991-08-30 KR KR1019910015158A patent/KR950010168B1/ko not_active IP Right Cessation
-
1995
- 1995-04-27 KR KR1019950010195A patent/KR950010167B1/ko not_active IP Right Cessation
- 1995-12-29 US US08/580,474 patent/US5891356A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0478034B1 (fr) | 1995-11-15 |
EP0657525B1 (fr) | 1997-11-05 |
ATE130359T1 (de) | 1995-12-15 |
EP0657525A3 (fr) | 1995-07-05 |
ATE156512T1 (de) | 1997-08-15 |
DE69128156D1 (de) | 1997-12-11 |
KR950010167B1 (ko) | 1995-09-11 |
DE69127213T2 (de) | 1998-03-12 |
KR950010168B1 (ko) | 1995-09-11 |
US5891356A (en) | 1999-04-06 |
DE69114651D1 (de) | 1995-12-21 |
EP0657526B1 (fr) | 1997-08-06 |
ATE159979T1 (de) | 1997-11-15 |
EP0657526A3 (fr) | 1995-07-05 |
EP0657526A2 (fr) | 1995-06-14 |
CA2050265C (fr) | 1999-10-05 |
EP0478034A1 (fr) | 1992-04-01 |
DE69114651T2 (de) | 1996-04-18 |
EP0657525A2 (fr) | 1995-06-14 |
US5354489A (en) | 1994-10-11 |
DE69127213D1 (de) | 1997-09-11 |
DE69128156T2 (de) | 1998-05-28 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
EEER | Examination request | ||
MKLA | Lapsed |