CA1329916C - Electrodeposition of high moment cobalt iron - Google Patents
Electrodeposition of high moment cobalt ironInfo
- Publication number
- CA1329916C CA1329916C CA000568030A CA568030A CA1329916C CA 1329916 C CA1329916 C CA 1329916C CA 000568030 A CA000568030 A CA 000568030A CA 568030 A CA568030 A CA 568030A CA 1329916 C CA1329916 C CA 1329916C
- Authority
- CA
- Canada
- Prior art keywords
- plating bath
- grams per
- per liter
- cobalt
- concentration
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000004070 electrodeposition Methods 0.000 title claims abstract description 21
- FQMNUIZEFUVPNU-UHFFFAOYSA-N cobalt iron Chemical compound [Fe].[Co].[Co] FQMNUIZEFUVPNU-UHFFFAOYSA-N 0.000 title claims abstract description 6
- 238000000034 method Methods 0.000 claims abstract description 38
- 229910003321 CoFe Inorganic materials 0.000 claims abstract description 32
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims abstract description 31
- 238000007747 plating Methods 0.000 claims abstract description 30
- 239000010409 thin film Substances 0.000 claims abstract description 25
- 239000010408 film Substances 0.000 claims abstract description 21
- 239000000758 substrate Substances 0.000 claims abstract description 20
- 229910052742 iron Inorganic materials 0.000 claims abstract description 15
- DBMJMQXJHONAFJ-UHFFFAOYSA-M Sodium laurylsulphate Chemical compound [Na+].CCCCCCCCCCCCOS([O-])(=O)=O DBMJMQXJHONAFJ-UHFFFAOYSA-M 0.000 claims abstract description 14
- 229910017052 cobalt Inorganic materials 0.000 claims abstract description 13
- 239000010941 cobalt Substances 0.000 claims abstract description 13
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims abstract description 13
- CVHZOJJKTDOEJC-UHFFFAOYSA-N saccharin Chemical compound C1=CC=C2C(=O)NS(=O)(=O)C2=C1 CVHZOJJKTDOEJC-UHFFFAOYSA-N 0.000 claims abstract description 13
- 230000005294 ferromagnetic effect Effects 0.000 claims abstract description 7
- 238000009713 electroplating Methods 0.000 claims description 16
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 claims description 12
- KTVIXTQDYHMGHF-UHFFFAOYSA-L cobalt(2+) sulfate Chemical compound [Co+2].[O-]S([O-])(=O)=O KTVIXTQDYHMGHF-UHFFFAOYSA-L 0.000 claims description 12
- BAUYGSIQEAFULO-UHFFFAOYSA-L iron(2+) sulfate (anhydrous) Chemical compound [Fe+2].[O-]S([O-])(=O)=O BAUYGSIQEAFULO-UHFFFAOYSA-L 0.000 claims description 11
- 239000004327 boric acid Substances 0.000 claims description 7
- 239000004094 surface-active agent Substances 0.000 claims description 7
- 239000011248 coating agent Substances 0.000 claims description 6
- 238000000576 coating method Methods 0.000 claims description 6
- 239000004615 ingredient Substances 0.000 claims description 6
- 229910001313 Cobalt-iron alloy Inorganic materials 0.000 claims description 5
- 238000000151 deposition Methods 0.000 claims description 5
- 230000008021 deposition Effects 0.000 claims description 5
- 239000003792 electrolyte Substances 0.000 claims description 5
- 229910000359 iron(II) sulfate Inorganic materials 0.000 claims description 5
- 238000005137 deposition process Methods 0.000 claims description 3
- XLYOFNOQVPJJNP-ZSJDYOACSA-N heavy water Substances [2H]O[2H] XLYOFNOQVPJJNP-ZSJDYOACSA-N 0.000 claims 4
- 239000006174 pH buffer Substances 0.000 claims 4
- 230000005291 magnetic effect Effects 0.000 abstract description 17
- 229910000889 permalloy Inorganic materials 0.000 abstract description 8
- 231100000331 toxic Toxicity 0.000 abstract description 7
- 230000002588 toxic effect Effects 0.000 abstract description 7
- 239000000470 constituent Substances 0.000 abstract description 5
- 230000035699 permeability Effects 0.000 abstract description 5
- 230000005381 magnetic domain Effects 0.000 abstract description 3
- 239000006172 buffering agent Substances 0.000 abstract description 2
- 150000003839 salts Chemical class 0.000 abstract description 2
- 238000009736 wetting Methods 0.000 abstract description 2
- 239000000080 wetting agent Substances 0.000 abstract description 2
- 239000000243 solution Substances 0.000 description 8
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 4
- 239000000956 alloy Substances 0.000 description 4
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 3
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 229910052770 Uranium Inorganic materials 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- -1 alkali metal salt Chemical class 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 229910000358 iron sulfate Inorganic materials 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 229940081974 saccharin Drugs 0.000 description 2
- 235000019204 saccharin Nutrition 0.000 description 2
- 239000000901 saccharin and its Na,K and Ca salt Substances 0.000 description 2
- BRPNNYXZQLLLSN-UHFFFAOYSA-N sodium;dodecane Chemical compound [Na+].CCCCCCCCCCC[CH2-] BRPNNYXZQLLLSN-UHFFFAOYSA-N 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 244000118350 Andrographis paniculata Species 0.000 description 1
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 1
- UOACKFBJUYNSLK-XRKIENNPSA-N Estradiol Cypionate Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H](C4=CC=C(O)C=C4CC3)CC[C@@]21C)C(=O)CCC1CCCC1 UOACKFBJUYNSLK-XRKIENNPSA-N 0.000 description 1
- 229910000640 Fe alloy Inorganic materials 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 239000000872 buffer Substances 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910000361 cobalt sulfate Inorganic materials 0.000 description 1
- 229940044175 cobalt sulfate Drugs 0.000 description 1
- MOTZDAYCYVMXPC-UHFFFAOYSA-N dodecyl hydrogen sulfate Chemical compound CCCCCCCCCCCCOS(O)(=O)=O MOTZDAYCYVMXPC-UHFFFAOYSA-N 0.000 description 1
- 229940043264 dodecyl sulfate Drugs 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- ATADHKWKHYVBTJ-UHFFFAOYSA-N hydron;4-[1-hydroxy-2-(methylamino)ethyl]benzene-1,2-diol;chloride Chemical compound Cl.CNCC(O)C1=CC=C(O)C(O)=C1 ATADHKWKHYVBTJ-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- APVPOHHVBBYQAV-UHFFFAOYSA-N n-(4-aminophenyl)sulfonyloctadecanamide Chemical compound CCCCCCCCCCCCCCCCCC(=O)NS(=O)(=O)C1=CC=C(N)C=C1 APVPOHHVBBYQAV-UHFFFAOYSA-N 0.000 description 1
- AYOOGWWGECJQPI-NSHDSACASA-N n-[(1s)-1-(5-fluoropyrimidin-2-yl)ethyl]-3-(3-propan-2-yloxy-1h-pyrazol-5-yl)imidazo[4,5-b]pyridin-5-amine Chemical compound N1C(OC(C)C)=CC(N2C3=NC(N[C@@H](C)C=4N=CC(F)=CN=4)=CC=C3N=C2)=N1 AYOOGWWGECJQPI-NSHDSACASA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910002070 thin film alloy Inorganic materials 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/562—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of iron or nickel or cobalt
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S205/00—Electrolysis: processes, compositions used therein, and methods of preparing the compositions
- Y10S205/922—Electrolytic coating of magnetic storage medium, other than selected area coating
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Thin Magnetic Films (AREA)
- Magnetic Heads (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US056,089 | 1987-05-29 | ||
| US07/056,089 US4756816A (en) | 1987-05-29 | 1987-05-29 | Electrodeposition of high moment cobalt iron |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA1329916C true CA1329916C (en) | 1994-05-31 |
Family
ID=22002078
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA000568030A Expired - Fee Related CA1329916C (en) | 1987-05-29 | 1988-05-27 | Electrodeposition of high moment cobalt iron |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US4756816A (esLanguage) |
| EP (1) | EP0293107A3 (esLanguage) |
| JP (1) | JPS63307294A (esLanguage) |
| AU (1) | AU1635788A (esLanguage) |
| CA (1) | CA1329916C (esLanguage) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102383149A (zh) * | 2011-11-09 | 2012-03-21 | 广东达志环保科技股份有限公司 | 一种环保三价铬电镀液及其电镀方法 |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0447044A1 (en) * | 1990-02-23 | 1991-09-18 | Eaton Corporation | Magneto-elastic film and process |
| JP2544845B2 (ja) * | 1990-08-23 | 1996-10-16 | インターナショナル・ビジネス・マシーンズ・コーポレイション | 磁性薄膜、ラミネ―ト、磁気記録ヘッドおよび磁気遮蔽体ならびにラミネ―トの製造方法 |
| JPH06176926A (ja) * | 1992-12-02 | 1994-06-24 | Matsushita Electric Ind Co Ltd | 組成変調軟磁性膜およびその製造方法 |
| DE19949549A1 (de) * | 1999-10-14 | 2001-04-26 | Hille & Mueller Gmbh & Co | Elektrolytisch beschichtetes Kaltband, vorzugsweise zur Verwendung für die Herstellung von Batteriehülsen sowie Verfahren zur Beschichtung desselben |
| US6797141B1 (en) * | 1999-11-25 | 2004-09-28 | Enthone Inc. | Removal of coagulates from a non-glare electroplating bath |
| US6855240B2 (en) * | 2000-08-09 | 2005-02-15 | Hitachi Global Storage Technologies Netherlands B.V. | CoFe alloy film and process of making same |
| US6776891B2 (en) | 2001-05-18 | 2004-08-17 | Headway Technologies, Inc. | Method of manufacturing an ultra high saturation moment soft magnetic thin film |
| US6795273B2 (en) | 2002-01-08 | 2004-09-21 | Quantum Materials Design, Inc. | Magnetic recording head with high saturation magnetization write pole having alternating interface-defining Fe/Co layers |
| US7001499B2 (en) | 2002-01-18 | 2006-02-21 | Hitachi Global Storage Technologies Netherlands B.V. | Method for electroplating a body-centered cubic nickel-iron alloy thin film with a high saturation flux density |
| RU2239672C2 (ru) * | 2002-11-12 | 2004-11-10 | Курская государственная сельскохозяйственная академия им. проф. И.И. Иванова | Способ электролитического осаждения сплава железо-молибден-кобальт |
| US20080197021A1 (en) * | 2007-02-16 | 2008-08-21 | Headway Technologies, Inc. | Method to make superior soft (low Hk), high moment magnetic film and its application in writer heads |
| US10132699B1 (en) * | 2014-10-06 | 2018-11-20 | National Technology & Engineering Solutions Of Sandia, Llc | Electrodeposition processes for magnetostrictive resonators |
| US11697885B2 (en) * | 2016-09-19 | 2023-07-11 | University Of Central Florida Research Foundation, Inc. | Production of nanoporous films |
| JP7197933B2 (ja) | 2021-05-27 | 2022-12-28 | 石原ケミカル株式会社 | アンダーバリアメタルとソルダー層とを含む構造体 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2507400A (en) * | 1943-08-02 | 1950-05-09 | Sk Wellman Co | Method of electroplating with iron and cobalt |
| US4053373A (en) * | 1975-07-09 | 1977-10-11 | M & T Chemicals Inc. | Electroplating of nickel, cobalt, nickel-cobalt, nickel-iron, cobalt-iron and nickel-iron-cobalt deposits |
| US4014759A (en) * | 1975-07-09 | 1977-03-29 | M & T Chemicals Inc. | Electroplating iron alloys containing nickel, cobalt or nickel and cobalt |
| US4208254A (en) * | 1976-09-22 | 1980-06-17 | Satoshi Ichioka | Method of plating an iron-cobalt alloy on a substrate |
| US4102756A (en) * | 1976-12-30 | 1978-07-25 | International Business Machines Corporation | Nickel-iron (80:20) alloy thin film electroplating method and electrochemical treatment and plating apparatus |
| US4526968A (en) * | 1981-08-24 | 1985-07-02 | M&T Chemicals Inc. | Quaternary aminehydroxypropane sulfobetaines |
| US4430171A (en) * | 1981-08-24 | 1984-02-07 | M&T Chemicals Inc. | Electroplating baths for nickel, iron, cobalt and alloys thereof |
| US4661216A (en) * | 1986-04-21 | 1987-04-28 | International Business Machines Corporation | Electrodepositing CoNiFe alloys for thin film heads |
-
1987
- 1987-05-29 US US07/056,089 patent/US4756816A/en not_active Expired - Lifetime
-
1988
- 1988-05-12 EP EP88304303A patent/EP0293107A3/en not_active Withdrawn
- 1988-05-17 AU AU16357/88A patent/AU1635788A/en not_active Abandoned
- 1988-05-27 JP JP63128564A patent/JPS63307294A/ja active Granted
- 1988-05-27 CA CA000568030A patent/CA1329916C/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102383149A (zh) * | 2011-11-09 | 2012-03-21 | 广东达志环保科技股份有限公司 | 一种环保三价铬电镀液及其电镀方法 |
| CN102383149B (zh) * | 2011-11-09 | 2014-07-02 | 广东达志环保科技股份有限公司 | 一种环保三价铬电镀液及其电镀方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| US4756816A (en) | 1988-07-12 |
| EP0293107A2 (en) | 1988-11-30 |
| JPS63307294A (ja) | 1988-12-14 |
| JPH0225996B2 (esLanguage) | 1990-06-06 |
| EP0293107A3 (en) | 1990-08-01 |
| AU1635788A (en) | 1988-12-01 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MKLA | Lapsed |