CA1248278A - Radiation-sensitive coating agent - Google Patents

Radiation-sensitive coating agent

Info

Publication number
CA1248278A
CA1248278A CA000465022A CA465022A CA1248278A CA 1248278 A CA1248278 A CA 1248278A CA 000465022 A CA000465022 A CA 000465022A CA 465022 A CA465022 A CA 465022A CA 1248278 A CA1248278 A CA 1248278A
Authority
CA
Canada
Prior art keywords
formula
radical
atoms
radiation
structural elements
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA000465022A
Other languages
English (en)
French (fr)
Inventor
Ottmar Rohde
Josef Pfeifer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Novartis AG
Original Assignee
Ciba Geigy AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Geigy AG filed Critical Ciba Geigy AG
Application granted granted Critical
Publication of CA1248278A publication Critical patent/CA1248278A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L79/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
    • C08L79/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C08L79/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
    • G03F7/0125—Macromolecular azides; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0387—Polyamides or polyimides
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/128—Radiation-activated cross-linking agent containing

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Paints Or Removers (AREA)
CA000465022A 1983-10-12 1984-10-10 Radiation-sensitive coating agent Expired CA1248278A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH5572/83-8 1983-10-12
CH557283 1983-10-12

Publications (1)

Publication Number Publication Date
CA1248278A true CA1248278A (en) 1989-01-03

Family

ID=4295824

Family Applications (1)

Application Number Title Priority Date Filing Date
CA000465022A Expired CA1248278A (en) 1983-10-12 1984-10-10 Radiation-sensitive coating agent

Country Status (5)

Country Link
US (1) US4656116A (enExample)
EP (1) EP0141781B1 (enExample)
JP (1) JPS60155277A (enExample)
CA (1) CA1248278A (enExample)
DE (1) DE3485008D1 (enExample)

Families Citing this family (36)

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US4786569A (en) * 1985-09-04 1988-11-22 Ciba-Geigy Corporation Adhesively bonded photostructurable polyimide film
US4705540A (en) * 1986-04-17 1987-11-10 E. I. Du Pont De Nemours And Company Polyimide gas separation membranes
JPH0820726B2 (ja) * 1986-05-29 1996-03-04 日本合成ゴム株式会社 感放射線性樹脂組成物
JP2637400B2 (ja) * 1986-06-19 1997-08-06 宇部興産株式会社 有機溶媒可溶性のレリーフパターン形成用感光性ポリイミド組成物
EP0252883B1 (de) * 1986-07-08 1991-01-16 Ciba-Geigy Ag Beschichtetes Material enthaltend eine strahlungsempfindliche Polyimidschicht mit speziellen Diaminodiphenylmethaneinheiten
US4996123A (en) * 1986-07-11 1991-02-26 Matsushita Electric Industrial Co., Ltd. Optically oriented photoresist pattern forming method using organic crystal in photoresist layer with specified refracting indices formula
US4830953A (en) * 1986-08-18 1989-05-16 Ciba-Geigy Corporation Radiation-sensitive coating composition with polyazide and polyimide and process of photo-crosslinking the coating
US4717394A (en) * 1986-10-27 1988-01-05 E. I. Du Pont De Nemours And Company Polyimide gas separation membranes
US4717393A (en) * 1986-10-27 1988-01-05 E. I. Du Pont De Nemours And Company Polyimide gas separation membranes
US4851506A (en) * 1986-12-29 1989-07-25 Ciba-Geigy Corporation Photostructurable polyimide mixtures
US5102959A (en) * 1987-12-15 1992-04-07 Ciba-Geigy Corporation Auto-photocrosslinkable copolyimides and polyimide compositions
US4925912A (en) * 1987-12-15 1990-05-15 Ciba-Geigy Corporation Auto-photocrosslinkable copolyimides and polyimide compositions
US4935490A (en) * 1988-04-13 1990-06-19 E. I. Dupont De Nemours And Company Highly soluble aromatic polyimides
US4851505A (en) * 1988-04-13 1989-07-25 E. I. Du Pont De Nemours And Company Highly soluble aromatic polyimides
JP2575815B2 (ja) * 1988-06-14 1997-01-29 東芝ケミカル株式会社 プリント回路板の製造方法
KR950011927B1 (ko) * 1989-12-07 1995-10-12 가부시끼가이샤 도시바 감광성 조성물 및 수지봉지형 반도체장치
US5173542A (en) * 1989-12-08 1992-12-22 Raychem Corporation Bistriazene compounds and polymeric compositions crosslinked therewith
US5270453A (en) * 1989-12-08 1993-12-14 Raychem Corporation Aromatic bistriazene compounds
US5091289A (en) * 1990-04-30 1992-02-25 International Business Machines Corporation Process for forming multi-level coplanar conductor/insulator films employing photosensitive polyimide polymer compositions
US5229257A (en) * 1990-04-30 1993-07-20 International Business Machines Corporation Process for forming multi-level coplanar conductor/insulator films employing photosensitive polymide polymer compositions
CA2040994A1 (en) * 1990-05-08 1991-11-09 David D. Ngo Photoimageable polyimide coating
US5446074A (en) * 1993-12-17 1995-08-29 International Business Machines Corporation Photosensitive polyimide precursors
KR20010083905A (ko) * 1998-10-14 2001-09-03 추후보정 분극된 폴리머 중간층 유전체를 이용한 개선된 멀티-칩모듈 검사 및 방법
US6379865B1 (en) 2000-04-11 2002-04-30 3M Innovative Properties Company Photoimageable, aqueous acid soluble polyimide polymers
DE60105754T2 (de) * 2000-04-28 2005-06-23 Mitsui Chemicals, Inc. Polyimid und polyamidsäure
CN1522387A (zh) * 2001-05-30 2004-08-18 钟渊化学工业株式会社 光敏性树脂组合物及用该组合物的光敏性干膜抗蚀剂、光敏性射线遮挡膜
US6803092B2 (en) 2001-06-26 2004-10-12 3M Innovative Properties Company Selective deposition of circuit-protective polymers
JP2009227953A (ja) * 2008-02-25 2009-10-08 Ube Ind Ltd 耐溶剤性が改良された成形体の製造方法
KR102219068B1 (ko) 2013-05-17 2021-02-23 후지필름 일렉트로닉 머티리얼스 유.에스.에이., 아이엔씨. 새로운 폴리머 및 이를 포함하는 열경화성 조성물
EP3099730A4 (en) * 2014-01-31 2017-08-09 Fujifilm Electronic Materials USA, Inc. Novel polyimide compositions
KR102295475B1 (ko) * 2015-02-11 2021-08-30 삼성디스플레이 주식회사 액정 광배향제, 이를 이용한 액정 광배향막, 이의 제조방법 및 상기 액정 광배향막을 포함하는 액정 표시 장치
US10563014B2 (en) 2017-09-11 2020-02-18 Fujifilm Electronic Materials U.S.A., Inc. Dielectric film forming composition
JP2022550611A (ja) 2019-10-04 2022-12-02 フジフイルム エレクトロニック マテリアルズ ユー．エス．エー．， インコーポレイテッド 平坦化プロセス及び組成物
WO2021105086A1 (en) 2019-11-26 2021-06-03 Merck Patent Gmbh Non-thiol nitrogen based hydrophobic polymer brush materials and use thereof for modification of substrate surfaces
KR20220120691A (ko) 2020-01-16 2022-08-30 후지필름 일렉트로닉 머티리얼스 유.에스.에이., 아이엔씨. 건식 필름
JP7633666B2 (ja) * 2021-06-21 2025-02-20 株式会社ピーアイ技術研究所 感光性ポリイミド樹脂組成物

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NL177718C (nl) * 1973-02-22 1985-11-01 Siemens Ag Werkwijze ter vervaardiging van reliefstructuren uit warmte-bestendige polymeren.
US4118374A (en) * 1974-09-09 1978-10-03 Sumitomo Chemical Company, Limited Production of aromatic polyamides from dicarboxylic acid and diamine
US4197133A (en) * 1977-10-14 1980-04-08 Ciba-Geigy Corporation Photo-curable compositions of matter containing bis-azidophthalimidyl derivatives
WO1980000706A1 (fr) * 1978-09-29 1980-04-17 Hitachi Ltd Composition polymere sensible a la lumiere
DE2919840A1 (de) * 1979-05-16 1980-11-20 Siemens Ag Verfahren zur phototechnischen herstellung von reliefstrukturen
DE2919841A1 (de) * 1979-05-16 1980-11-20 Siemens Ag Verfahren zur phototechnischen herstellung von reliefstrukturen
GB2092164B (en) * 1980-12-17 1984-12-05 Hitachi Ltd Loght or radiation-sensitive polymer composition
JPS57168942A (en) * 1981-04-13 1982-10-18 Hitachi Ltd Photosensitive polymer composition
JPS58223149A (ja) * 1982-06-22 1983-12-24 Toray Ind Inc 感光性ポリイミド用現像液
EP0119719B1 (en) * 1983-03-03 1987-05-06 Toray Industries, Inc. Radiation sensitive polymer composition
US4629777A (en) * 1983-05-18 1986-12-16 Ciba-Geigy Corporation Polyimides, a process for their preparation and their use

Also Published As

Publication number Publication date
US4656116A (en) 1987-04-07
JPS60155277A (ja) 1985-08-15
EP0141781A2 (de) 1985-05-15
JPH056596B2 (enExample) 1993-01-26
EP0141781A3 (en) 1987-08-05
DE3485008D1 (de) 1991-10-10
EP0141781B1 (de) 1991-09-04

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Legal Events

Date Code Title Description
MKEX Expiry