CA1223082A - Process and apparatus for etching copper masked by a nickel-gold mask - Google Patents

Process and apparatus for etching copper masked by a nickel-gold mask

Info

Publication number
CA1223082A
CA1223082A CA000479094A CA479094A CA1223082A CA 1223082 A CA1223082 A CA 1223082A CA 000479094 A CA000479094 A CA 000479094A CA 479094 A CA479094 A CA 479094A CA 1223082 A CA1223082 A CA 1223082A
Authority
CA
Canada
Prior art keywords
copper
conductor
nickel
circuit board
etchant
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA000479094A
Other languages
English (en)
French (fr)
Inventor
Norvell J. Nelson
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
PSI Star Inc
Original Assignee
PSI Star Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by PSI Star Inc filed Critical PSI Star Inc
Application granted granted Critical
Publication of CA1223082A publication Critical patent/CA1223082A/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/02Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
    • H05K3/067Etchants
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23FNON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00Etching metallic material by chemical means
    • C23F1/02Local etching
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/02Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
    • H05K3/061Etching masks
    • H05K3/062Etching masks consisting of metals or alloys or metallic inorganic compounds
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/03Conductive materials
    • H05K2201/0332Structure of the conductor
    • H05K2201/0335Layered conductors or foils
    • H05K2201/0338Layered conductor, e.g. layered metal substrate, layered finish layer or layered thin film adhesion layer

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • ing And Chemical Polishing (AREA)
CA000479094A 1984-05-17 1985-04-15 Process and apparatus for etching copper masked by a nickel-gold mask Expired CA1223082A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US06/611,190 US4543153A (en) 1984-05-17 1984-05-17 Process and apparatus for etching copper masked by a nickel-gold mask
US611,190 1984-05-17

Publications (1)

Publication Number Publication Date
CA1223082A true CA1223082A (en) 1987-06-16

Family

ID=24447987

Family Applications (1)

Application Number Title Priority Date Filing Date
CA000479094A Expired CA1223082A (en) 1984-05-17 1985-04-15 Process and apparatus for etching copper masked by a nickel-gold mask

Country Status (6)

Country Link
US (1) US4543153A (cg-RX-API-DMAC7.html)
JP (1) JPS6152375A (cg-RX-API-DMAC7.html)
CA (1) CA1223082A (cg-RX-API-DMAC7.html)
DE (1) DE3516760A1 (cg-RX-API-DMAC7.html)
FR (1) FR2564683A1 (cg-RX-API-DMAC7.html)
GB (1) GB2159102B (cg-RX-API-DMAC7.html)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3430075A1 (de) * 1984-08-16 1986-02-27 Robert Bosch Gmbh, 7000 Stuttgart Verfahren zum herstellen einer messsonde zur verwendung bei der messung der temperatur oder masse eines stroemenden mediums
US4695348A (en) * 1986-09-15 1987-09-22 Psi Star Copper etching process and product
DE3701456A1 (de) * 1987-01-20 1988-07-28 Herrmann Ritzenhoff Fa Verfahren zur herstellung von dekorativen oder informativen musterungen an gegenstaenden, die aus einfach oder gegebenenfalls mehrfach plattierten blechen gebildet wurden
GB2206541A (en) * 1987-07-02 1989-01-11 Psi Star Inc Manufacturing printed circuit boards
US4925522A (en) * 1989-08-21 1990-05-15 Gte Products Corporation Printed circuit assembly with contact dot
US5108562A (en) * 1991-02-06 1992-04-28 International Business Machines Electrolytic method for forming vias and through holes in copper-invar-copper core structures
US5304284A (en) * 1991-10-18 1994-04-19 International Business Machines Corporation Methods for etching a less reactive material in the presence of a more reactive material
FR2776020B1 (fr) * 1998-03-11 2000-05-05 Renault Procede de controle de l'injection dans un moteur a combustion interne et allumage commande, alimente par du carburant gazeux liquefie ou par un carburant gazeux sous des conditions soniques
DE102009015604A1 (de) * 2009-04-02 2010-10-07 Siemens Aktiengesellschaft Verfahren zur Strukturierung einer auf einem Substrat befindlichen Schicht mit mehreren Lagen
EP2918707B1 (en) 2014-03-12 2019-05-22 Rolls-Royce North American Technologies, Inc. Anisotropic etching of metallic substrates
EP3518631A1 (en) 2018-01-29 2019-07-31 AT & S Austria Technologie & Systemtechnik Aktiengesellschaft Anisotropic etching using highly branched polymers

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1047275A (cg-RX-API-DMAC7.html) *
GB229414A (en) * 1923-11-29 1925-02-26 Robert David Lewis Improvements in air tubes or pipes for use in colliery ventilation and the like
GB840284A (en) * 1957-04-12 1960-07-06 Machlett Lab Inc Improvements in high voltage switching tubes
DE1164528B (de) * 1960-02-10 1964-03-05 Ruwel Werke Gmbh Verfahren zum Herstellen von gedruckten Leiterplatten
US3287191A (en) * 1963-07-23 1966-11-22 Photo Engravers Res Inc Etching of printed circuit components
GB1364660A (en) * 1971-12-02 1974-08-29 Standard Telephones Cables Ltd Method of producing electrical interconnection patterns
JPS5313177B2 (cg-RX-API-DMAC7.html) * 1973-06-20 1978-05-08
JPS5540120B2 (cg-RX-API-DMAC7.html) * 1974-11-30 1980-10-15
SE404863B (sv) * 1975-12-17 1978-10-30 Perstorp Ab Forfarande vid framstellning av ett flerlagerkort

Also Published As

Publication number Publication date
US4543153A (en) 1985-09-24
FR2564683A1 (fr) 1985-11-22
DE3516760A1 (de) 1985-11-21
GB2159102A (en) 1985-11-27
JPH0136555B2 (cg-RX-API-DMAC7.html) 1989-08-01
GB2159102B (en) 1988-03-02
GB8512466D0 (en) 1985-06-19
JPS6152375A (ja) 1986-03-15

Similar Documents

Publication Publication Date Title
CA1223082A (en) Process and apparatus for etching copper masked by a nickel-gold mask
US4445978A (en) Method for fabricating via connectors through semiconductor wafers
US4992135A (en) Method of etching back of tungsten layers on semiconductor wafers, and solution therefore
US4054484A (en) Method of forming crossover connections
EP0164757A3 (en) A method of etching copper circuit boards and an etch solution
EP0326204A3 (en) Method for realizing an electrical contact to an electronic device
EP0170477A3 (en) Multilayer systems and their method of production
TWI256723B (en) Process for manufacturing multiple layer wiring substrate onto which thin film capacitor is incorporated
US3586922A (en) Multiple-layer metal structure and processing
EP0185303A3 (en) Electrically conducting copper layers and process for their production
US5472735A (en) Method for forming electrical connection to the inner layers of a multilayer circuit board
EP0178181A3 (en) Methods for producing an aperture in a surface
CA1051559A (en) Process for the production of printed circuits with solder rejecting sub-zones
GB1591264A (en) Electrical connection to semiconductor integrated circuits
US5403466A (en) Silver plating process for lead frames
EP0277118B1 (en) Removable commoning bar
US4873565A (en) Method and apparatus for providing interconnection between metallization layers on semiconductor devices
CA2022400A1 (en) Method for improving insulation resistance of printed circuits
EP0095256A1 (en) Method of making printed circuits
IE801669L (en) Manufacture of printed circuits
US4077852A (en) Selective gold plating
US4963510A (en) Method and apparatus for providing interconnection between metallization layers on semiconductors devices
US6360434B1 (en) Circuit fabrication
JP3714812B2 (ja) 配線基板の導体パターン形成方法
US5468345A (en) Method of making a high-definition printed circuit

Legal Events

Date Code Title Description
MKEX Expiry