CA1170345A - Enhanced open circuit voltage in amorphous silicon photovoltaic devices - Google Patents
Enhanced open circuit voltage in amorphous silicon photovoltaic devicesInfo
- Publication number
- CA1170345A CA1170345A CA000361399A CA361399A CA1170345A CA 1170345 A CA1170345 A CA 1170345A CA 000361399 A CA000361399 A CA 000361399A CA 361399 A CA361399 A CA 361399A CA 1170345 A CA1170345 A CA 1170345A
- Authority
- CA
- Canada
- Prior art keywords
- amorphous silicon
- photovoltaic device
- silicon
- exposing
- deposition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/10—Semiconductor bodies
- H10F77/16—Material structures, e.g. crystalline structures, film structures or crystal plane orientations
- H10F77/169—Thin semiconductor films on metallic or insulating substrates
- H10F77/1692—Thin semiconductor films on metallic or insulating substrates the films including only Group IV materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F10/00—Individual photovoltaic cells, e.g. solar cells
- H10F10/10—Individual photovoltaic cells, e.g. solar cells having potential barriers
- H10F10/18—Photovoltaic cells having only Schottky potential barriers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
- H10F71/10—Manufacture or treatment of devices covered by this subclass the devices comprising amorphous semiconductor material
- H10F71/103—Manufacture or treatment of devices covered by this subclass the devices comprising amorphous semiconductor material including only Group IV materials
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/153—Solar cells-implantations-laser beam
Landscapes
- Photovoltaic Devices (AREA)
- Light Receiving Elements (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US99,421 | 1979-12-03 | ||
| US06/099,421 US4266984A (en) | 1979-12-03 | 1979-12-03 | Enhanced open circuit voltage in amorphous silicon photovoltaic devices |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA1170345A true CA1170345A (en) | 1984-07-03 |
Family
ID=22274927
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA000361399A Expired CA1170345A (en) | 1979-12-03 | 1980-10-02 | Enhanced open circuit voltage in amorphous silicon photovoltaic devices |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US4266984A (OSRAM) |
| JP (1) | JPS5693378A (OSRAM) |
| AU (1) | AU540064B2 (OSRAM) |
| CA (1) | CA1170345A (OSRAM) |
| DE (1) | DE3045194A1 (OSRAM) |
| FR (1) | FR2471671A1 (OSRAM) |
| GB (1) | GB2064867B (OSRAM) |
| IT (1) | IT1134557B (OSRAM) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4226897A (en) * | 1977-12-05 | 1980-10-07 | Plasma Physics Corporation | Method of forming semiconducting materials and barriers |
| DE3176910D1 (en) * | 1980-02-15 | 1988-11-17 | Matsushita Electric Industrial Co Ltd | Semiconductor photoelectric device |
| US4471036A (en) * | 1983-06-29 | 1984-09-11 | The United States Of America As Represented By The United States Department Of Energy | Electrochemical photovoltaic cells and electrodes |
| EP0153043A3 (en) * | 1984-02-15 | 1986-09-24 | Energy Conversion Devices, Inc. | Ohmic contact layer |
| US5155565A (en) * | 1988-02-05 | 1992-10-13 | Minnesota Mining And Manufacturing Company | Method for manufacturing an amorphous silicon thin film solar cell and Schottky diode on a common substrate |
| US20160181456A1 (en) * | 2014-12-22 | 2016-06-23 | Yong-Hang Zhang | Low-Cost and High-Efficiency Tandem Photovoltaic Cells |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4064521A (en) * | 1975-07-28 | 1977-12-20 | Rca Corporation | Semiconductor device having a body of amorphous silicon |
| FR2413780A1 (fr) * | 1977-12-29 | 1979-07-27 | Thomson Csf | Procede de realisation d'un contact " metal-semi-conducteur " a barriere de potentiel de hauteur predeterminee, et composant semi-conducteur comportant au moins un contact obtenu par ce procede |
-
1979
- 1979-12-03 US US06/099,421 patent/US4266984A/en not_active Expired - Lifetime
-
1980
- 1980-10-02 CA CA000361399A patent/CA1170345A/en not_active Expired
- 1980-12-01 DE DE19803045194 patent/DE3045194A1/de not_active Withdrawn
- 1980-12-02 AU AU64984/80A patent/AU540064B2/en not_active Ceased
- 1980-12-02 IT IT8026379A patent/IT1134557B/it active
- 1980-12-03 JP JP16972580A patent/JPS5693378A/ja active Pending
- 1980-12-03 GB GB8038798A patent/GB2064867B/en not_active Expired
- 1980-12-03 FR FR8025651A patent/FR2471671A1/fr active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| AU540064B2 (en) | 1984-11-01 |
| JPS5693378A (en) | 1981-07-28 |
| GB2064867A (en) | 1981-06-17 |
| US4266984A (en) | 1981-05-12 |
| AU6498480A (en) | 1981-06-11 |
| FR2471671A1 (fr) | 1981-06-19 |
| DE3045194A1 (de) | 1981-09-03 |
| IT1134557B (it) | 1986-08-13 |
| IT8026379A0 (it) | 1980-12-02 |
| FR2471671B1 (OSRAM) | 1985-04-26 |
| GB2064867B (en) | 1983-06-08 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CA1148669A (en) | Gradient doping in amorphous silicon | |
| US5667597A (en) | Polycrystalline silicon semiconductor having an amorphous silicon buffer layer | |
| EP0162529B1 (en) | Amorphous or microcrystalline semiconductor memory device | |
| US4117506A (en) | Amorphous silicon photovoltaic device having an insulating layer | |
| US4213798A (en) | Tellurium schottky barrier contact for amorphous silicon solar cells | |
| CA1122687A (en) | Amorphous semiconductors equivalent to crystalline semiconductors | |
| US5180690A (en) | Method of forming a layer of doped crystalline semiconductor alloy material | |
| US4166918A (en) | Method of removing the effects of electrical shorts and shunts created during the fabrication process of a solar cell | |
| EP0060363B1 (en) | Method of manufacture of a pin amorphous silicon semi-conductor device | |
| EP0002383A1 (en) | Method and apparatus for depositing semiconductor and other films | |
| US4598304A (en) | Thin film devices of silicon | |
| AU598996B2 (en) | Functional znse:h deposited films | |
| US4637869A (en) | Dual ion beam deposition of amorphous semiconductor films | |
| US4446168A (en) | Method of forming amorphous silicon | |
| CA1170345A (en) | Enhanced open circuit voltage in amorphous silicon photovoltaic devices | |
| JPH0143449B2 (OSRAM) | ||
| US4677738A (en) | Method of making a photovoltaic panel | |
| EP0139488A1 (en) | A method for sputtering a pin or nip amorphous silicon semiconductor device with the P and N-layers sputtered from boron and phosphorus heavily doped targets | |
| US4698235A (en) | Siting a film onto a substrate including electron-beam evaporation | |
| EP0680384B1 (en) | Microwave energized process for the preparation of high quality semiconductor material | |
| US5049523A (en) | Method of forming semiconducting materials and barriers | |
| EP0030162A2 (en) | Amorphous silicon MIS device | |
| JPH079059B2 (ja) | 炭素薄膜の製造方法 | |
| Carlson | Amorphous silicon | |
| JPH0262482B2 (OSRAM) |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MKEX | Expiry |