CA1099849A - Acid-resistant copolymer and photographic element incorporating same - Google Patents

Acid-resistant copolymer and photographic element incorporating same

Info

Publication number
CA1099849A
CA1099849A CA264,871A CA264871A CA1099849A CA 1099849 A CA1099849 A CA 1099849A CA 264871 A CA264871 A CA 264871A CA 1099849 A CA1099849 A CA 1099849A
Authority
CA
Canada
Prior art keywords
polymer
mole percent
recurring units
general structure
support
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA264,871A
Other languages
English (en)
French (fr)
Inventor
Robert C. Daly
Ronald H. Engebrecht
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Priority to CA364,071A priority Critical patent/CA1106544A/en
Application granted granted Critical
Publication of CA1099849A publication Critical patent/CA1099849A/en
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00Chemical modification by after-treatment
    • C08F8/14Esterification
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2810/00Chemical modification of a polymer
    • C08F2810/30Chemical modification of a polymer leading to the formation or introduction of aliphatic or alicyclic unsaturated groups

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
CA264,871A 1976-08-02 1976-11-04 Acid-resistant copolymer and photographic element incorporating same Expired CA1099849A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CA364,071A CA1106544A (en) 1976-08-02 1980-11-05 Acid-resistant copolymer and photographic element incorporating same

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US71099276A 1976-08-02 1976-08-02
US710,992 1976-08-02

Publications (1)

Publication Number Publication Date
CA1099849A true CA1099849A (en) 1981-04-21

Family

ID=24856346

Family Applications (1)

Application Number Title Priority Date Filing Date
CA264,871A Expired CA1099849A (en) 1976-08-02 1976-11-04 Acid-resistant copolymer and photographic element incorporating same

Country Status (5)

Country Link
JP (1) JPS5317688A (enrdf_load_stackoverflow)
CA (1) CA1099849A (enrdf_load_stackoverflow)
DE (1) DE2733912A1 (enrdf_load_stackoverflow)
FR (1) FR2360611A1 (enrdf_load_stackoverflow)
GB (1) GB1584009A (enrdf_load_stackoverflow)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55144874A (en) * 1979-04-24 1980-11-12 Sanyo Kokusaku Pulp Co Porous filter tip for paper wound tobacco and method
DE2934045A1 (de) * 1979-08-23 1981-03-26 Körber AG, 21033 Hamburg Anordnung zum elektrischen perforieren einer bewegten huellmaterialbahn fuer zigaretten
JPS5669038A (en) * 1979-11-07 1981-06-10 Tanaka Kikinzoku Kogyo Kk Electric discharge machining electrode
JPS5678500A (en) * 1979-11-30 1981-06-27 Tanaka Kikinzoku Kogyo Kk Electrical discharge machining
JPS5821735A (ja) * 1981-07-31 1983-02-08 Daicel Chem Ind Ltd アルカリ現像可能な感光性樹脂組成物
CN101819292B (zh) * 2004-07-16 2013-02-20 日东电工株式会社 相位差膜及其用途以及新型改性聚合物
JP6148967B2 (ja) * 2013-10-31 2017-06-14 富士フイルム株式会社 積層体、有機半導体製造用キットおよび有機半導体製造用レジスト組成物
CN114057945B (zh) * 2021-12-15 2023-06-20 北京市建筑工程研究院有限责任公司 一种适用于光伏柔性支撑的双护套钢绞线索及其制备方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE623971A (enrdf_load_stackoverflow) * 1961-10-23

Also Published As

Publication number Publication date
JPS613804B2 (enrdf_load_stackoverflow) 1986-02-04
GB1584009A (en) 1981-02-04
FR2360611B1 (enrdf_load_stackoverflow) 1981-11-13
JPS5317688A (en) 1978-02-17
DE2733912A1 (de) 1978-02-09
DE2733912C2 (enrdf_load_stackoverflow) 1988-12-08
FR2360611A1 (fr) 1978-03-03

Similar Documents

Publication Publication Date Title
JP2757375B2 (ja) 光重合性組成物
US5455143A (en) Aminoketone sensitizers for aqueous soluble photopolymer compositions
US4147552A (en) Light-sensitive compositions with 3-substituted coumarin compounds as spectral sensitizers
US4062686A (en) Sensitizers for photocrosslinkable polymers
JPH0588365A (ja) 高速で水性溶媒によつて現像できる感光性重合体組成物
JPS5942684B2 (ja) 感光性組成物
US3073699A (en) Addition polymerizable dye-forming compositions, elements, and processes
CA1099849A (en) Acid-resistant copolymer and photographic element incorporating same
US4684599A (en) Photoresist compositions containing quinone sensitizer
US4035189A (en) Image forming curable resin compositions
US4263394A (en) Aqueous alkaline soluble photopolymerizable material
JPS6353992B2 (enrdf_load_stackoverflow)
US3879356A (en) Light-sensitive polymeric compositions
US3702765A (en) Alkali-soluble light sensitive polymers and compositions and processes for using such polymers
US3647446A (en) Process for preparing high-relief printing plates
US4152159A (en) Acid-resistant copolymer and photographic element incorporating same
US4271260A (en) Positive nonsilver washout systems containing dihydropyridines and photooxidants
US3696072A (en) Light-sensitive polymers
US3748131A (en) Photosensitive composition and element comprising light sensitive polymers
US3782938A (en) Photosensitive element comprising polymers with cyclopropenyl groups and process
US3912697A (en) Light-sensitive polymers
US3881935A (en) Photosensitive polymer composition
CA1050804A (en) Photographic print-out compositions containing reductones as stabilizer for leuco dyes
US3703373A (en) Processes and elements for preparation of photomechanical images
US3795640A (en) Furfuryl,allyl and methylol acrylamide esters of polymeric acids

Legal Events

Date Code Title Description
MKEX Expiry