JPS5317688A - Aciddresistant copolymers and photographic element - Google Patents

Aciddresistant copolymers and photographic element

Info

Publication number
JPS5317688A
JPS5317688A JP9046977A JP9046977A JPS5317688A JP S5317688 A JPS5317688 A JP S5317688A JP 9046977 A JP9046977 A JP 9046977A JP 9046977 A JP9046977 A JP 9046977A JP S5317688 A JPS5317688 A JP S5317688A
Authority
JP
Japan
Prior art keywords
aciddresistant
copolymers
photographic element
etching
polymer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9046977A
Other languages
English (en)
Other versions
JPS613804B2 (ja
Inventor
Kaateisu Darii Robaato
Henrii Engeburehito Ronarudo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Publication of JPS5317688A publication Critical patent/JPS5317688A/ja
Publication of JPS613804B2 publication Critical patent/JPS613804B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/14—Esterification
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2810/00—Chemical modification of a polymer
    • C08F2810/30—Chemical modification of a polymer leading to the formation or introduction of aliphatic or alicyclic unsaturated groups

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP9046977A 1976-08-02 1977-07-29 Aciddresistant copolymers and photographic element Granted JPS5317688A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US71099276A 1976-08-02 1976-08-02

Publications (2)

Publication Number Publication Date
JPS5317688A true JPS5317688A (en) 1978-02-17
JPS613804B2 JPS613804B2 (ja) 1986-02-04

Family

ID=24856346

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9046977A Granted JPS5317688A (en) 1976-08-02 1977-07-29 Aciddresistant copolymers and photographic element

Country Status (5)

Country Link
JP (1) JPS5317688A (ja)
CA (1) CA1099849A (ja)
DE (1) DE2733912A1 (ja)
FR (1) FR2360611A1 (ja)
GB (1) GB1584009A (ja)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55144874A (en) * 1979-04-24 1980-11-12 Sanyo Kokusaku Pulp Co Porous filter tip for paper wound tobacco and method
JPS5658486A (en) * 1979-08-23 1981-05-21 Hauni Werke Koerber & Co Kg Apparatus for electrically drilling moved strip like material for cigarette
JPS5669038A (en) * 1979-11-07 1981-06-10 Tanaka Kikinzoku Kogyo Kk Electric discharge machining electrode
JPS5678500A (en) * 1979-11-30 1981-06-27 Tanaka Kikinzoku Kogyo Kk Electrical discharge machining
JPS5821735A (ja) * 1981-07-31 1983-02-08 Daicel Chem Ind Ltd アルカリ現像可能な感光性樹脂組成物
WO2006008894A1 (ja) * 2004-07-16 2006-01-26 Nitto Denko Corporation 新規変性ポリマー、その製造方法およびその用途
JP2015087613A (ja) * 2013-10-31 2015-05-07 富士フイルム株式会社 積層体、有機半導体製造用キットおよび有機半導体製造用レジスト組成物

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114057945B (zh) * 2021-12-15 2023-06-20 北京市建筑工程研究院有限责任公司 一种适用于光伏柔性支撑的双护套钢绞线索及其制备方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE623971A (ja) * 1961-10-23

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55144874A (en) * 1979-04-24 1980-11-12 Sanyo Kokusaku Pulp Co Porous filter tip for paper wound tobacco and method
JPS5734991B2 (ja) * 1979-04-24 1982-07-26
JPS5658486A (en) * 1979-08-23 1981-05-21 Hauni Werke Koerber & Co Kg Apparatus for electrically drilling moved strip like material for cigarette
JPH0115273B2 (ja) * 1979-08-23 1989-03-16 Hauni Werke Koerber & Co Kg
JPS5669038A (en) * 1979-11-07 1981-06-10 Tanaka Kikinzoku Kogyo Kk Electric discharge machining electrode
JPS5678500A (en) * 1979-11-30 1981-06-27 Tanaka Kikinzoku Kogyo Kk Electrical discharge machining
JPS6365480B2 (ja) * 1979-11-30 1988-12-15
JPS5821735A (ja) * 1981-07-31 1983-02-08 Daicel Chem Ind Ltd アルカリ現像可能な感光性樹脂組成物
WO2006008894A1 (ja) * 2004-07-16 2006-01-26 Nitto Denko Corporation 新規変性ポリマー、その製造方法およびその用途
US7722935B2 (en) 2004-07-16 2010-05-25 Nitto Denko Corporation Retardation film, use of said retardation film, and novel modified polymer
JP2015087613A (ja) * 2013-10-31 2015-05-07 富士フイルム株式会社 積層体、有機半導体製造用キットおよび有機半導体製造用レジスト組成物

Also Published As

Publication number Publication date
FR2360611A1 (fr) 1978-03-03
JPS613804B2 (ja) 1986-02-04
FR2360611B1 (ja) 1981-11-13
GB1584009A (en) 1981-02-04
DE2733912C2 (ja) 1988-12-08
DE2733912A1 (de) 1978-02-09
CA1099849A (en) 1981-04-21

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