CA1024663A - Method for forming openings through insulative layers in the fabrication of integrated circuits - Google Patents

Method for forming openings through insulative layers in the fabrication of integrated circuits

Info

Publication number
CA1024663A
CA1024663A CA213,806A CA213806A CA1024663A CA 1024663 A CA1024663 A CA 1024663A CA 213806 A CA213806 A CA 213806A CA 1024663 A CA1024663 A CA 1024663A
Authority
CA
Canada
Prior art keywords
fabrication
integrated circuits
forming openings
insulative layers
insulative
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA213,806A
Other languages
English (en)
French (fr)
Other versions
CA213806S (en
Inventor
Theodore H. Baker
Majid Ghafghaichi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Application granted granted Critical
Publication of CA1024663A publication Critical patent/CA1024663A/en
Expired legal-status Critical Current

Links

Classifications

    • H10P14/60—
    • H10P95/00—
    • H10P14/69215—
CA213,806A 1973-12-26 1974-11-15 Method for forming openings through insulative layers in the fabrication of integrated circuits Expired CA1024663A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US427887A US3922184A (en) 1973-12-26 1973-12-26 Method for forming openings through insulative layers in the fabrication of integrated circuits

Publications (1)

Publication Number Publication Date
CA1024663A true CA1024663A (en) 1978-01-17

Family

ID=23696704

Family Applications (1)

Application Number Title Priority Date Filing Date
CA213,806A Expired CA1024663A (en) 1973-12-26 1974-11-15 Method for forming openings through insulative layers in the fabrication of integrated circuits

Country Status (7)

Country Link
US (1) US3922184A (enExample)
JP (1) JPS528677B2 (enExample)
CA (1) CA1024663A (enExample)
DE (1) DE2453528C2 (enExample)
FR (1) FR2272489B1 (enExample)
GB (1) GB1451160A (enExample)
IT (1) IT1025191B (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4436593A (en) 1981-07-13 1984-03-13 Memorex Corporation Self-aligned pole tips
JPS63167881U (enExample) * 1987-04-23 1988-11-01
EP0383610B1 (en) * 1989-02-17 1997-10-08 Matsushita Electronics Corporation Manufacturing method of semiconductor device
JPH02237135A (ja) * 1989-03-10 1990-09-19 Fujitsu Ltd 半導体装置の製造方法
US5279990A (en) * 1990-03-02 1994-01-18 Motorola, Inc. Method of making a small geometry contact using sidewall spacers
US5589423A (en) * 1994-10-03 1996-12-31 Motorola Inc. Process for fabricating a non-silicided region in an integrated circuit
US10217707B2 (en) * 2016-09-16 2019-02-26 International Business Machines Corporation Trench contact resistance reduction

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3504430A (en) * 1966-06-27 1970-04-07 Hitachi Ltd Method of making semiconductor devices having insulating films
FR1569872A (enExample) * 1968-04-10 1969-06-06
US3753803A (en) * 1968-12-06 1973-08-21 Hitachi Ltd Method of dividing semiconductor layer into a plurality of isolated regions
US3673018A (en) * 1969-05-08 1972-06-27 Rca Corp Method of fabrication of photomasks
US3649393A (en) * 1970-06-12 1972-03-14 Ibm Variable depth etching of film layers using variable exposures of photoresists
DE2127569A1 (de) * 1970-06-25 1971-12-30 Western Electric Co Verfahren zur Herstellung einer dicken Oxidausbildung auf integrierten Halbleiterschaltungen
US3713922A (en) * 1970-12-28 1973-01-30 Bell Telephone Labor Inc High resolution shadow masks and their preparation
US3823015A (en) * 1973-01-02 1974-07-09 Collins Radio Co Photo-masking process

Also Published As

Publication number Publication date
GB1451160A (en) 1976-09-29
JPS528677B2 (enExample) 1977-03-10
JPS5098279A (enExample) 1975-08-05
DE2453528C2 (de) 1982-04-15
FR2272489B1 (enExample) 1978-02-24
IT1025191B (it) 1978-08-10
US3922184A (en) 1975-11-25
DE2453528A1 (de) 1975-07-10
FR2272489A1 (enExample) 1975-12-19

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